• Journal of Korean Society of Water and Wastewater
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• v.32 no.3
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• pp.221-233
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• 2018

Two climate change scenarios, the RCP (Representative Concentration Pathways) 4.5 and the RCP 8.5 in the fifth Assessment Report (AR5) by Intergovernmental Panel on Climate Change (IPCC), were applied in the Yocheon basin area using the SWAT (Soil and Water Assessment Tool) model to estimate changes in flow rates and pollutant loadings in the future. Field stream flow rate data in Songdong station and water quality data in Yocheon-1 station between 2013~2015 were used for model calibration. While $R^2$ value of flow rate calibration was 0.85 and $R^2$ value of water qualities were in the 0.12~0.43 range. The total study period was divided into 4 sub periods as 2030s (2016~2040), 2050s (2041~2070) and 2080s (2071~2100). The predicted results of flow rates and water quality concentrations were compared with results in calibrated periods, 2015s (2013~2015). In both RCP scenarios, flow rate and TSS (Total Suspended Solid) loadings were estimated to be in increasing trend while TN (Total Nitrogen) and TP (Total Phosphorus) loadings showed decreasing patterns. Also, flow rates and pollutant loadings showed larger differences between the maximum and the minimum values in RCP 4.5 than RCP 8.5 scenarios indicating more severe effect of drought and flood, respectively. Dependent on simulation period and rainfall periods in a year, flow rate, TSS, TN and TP showed different trends in each scenario. This emphasizes importance of considerations on time and space when analyzing climate change impacts of each variable under various scenarios.

• Transactions of the Korean Society of Mechanical Engineers
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• v.16 no.6
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• pp.1156-1162
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• 1992

The effect of aspect ratio on the flow characteristics of elliptic jets was experimentally investigated. The flow characteristics of sharp-edged elliptic nozzles with aspect ratio of 1 (round nozzle), 2 and 4 were measured by using a 3-D LDV system along the major and minor axis at X/De = 2, 3, 5, 7 and along the centerline up to X/De = 14. At each measurement point mean velocites, turbulent intensities, skewness of three orthogonal velocity components, and Reynolds shear stress were obtained. The Reynolds number based on the nozzle exit velocity and nozzle equivalent diameter(De) was about 4 * 10$^{4}$. Difference in the spreading rate along the major and minor axis was remarkable. The jet half width along the major axis decreased at first and then increased again with going downstream. But the jet width along the minor axis increased steadly. The elliptic jet of AR = 2 had two switching points within the measurement range, while that of AR = 4 had only one. (AAA) : The elliptic jet of AR = 2 showed larger velocity decay rate than that of AR = 1 and AR = 4. The effect of aspect ratio on the flow characteristics of elliptic jets was dominant in the near jet regions of X/De < 7, and the skewness and Reynolds shear stress had quite different distribution depending on the aspect ratio of the elliptic nozzle.

• Journal of the Korean institute of surface engineering
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• v.37 no.3
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• pp.164-168
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• 2004

Polycrystalline silicon thin films were deposited by inductively coupled plasma (ICP) assisted magnetron sputtering using a gas mixture of Ar and $H_2$ on a glass substrate at $250^{\circ}C$. At constant Ar mass flow rate of 10 sccm, the working pressure was changed between 10mTorr and 70mTorr with changing $H_2$ flow rate. The effects of RF power applied to ICP coil and $Ar/H_2$ gas mixing ratio on the properties of the deposited Si films were investigated. The crystallinity was evaluated by both X-ray diffraction and Raman spectroscopy. From the results of Raman spectroscopy, the crystallinity was improved as hydrogen mixing ratio was increased up to$ Ar/H_2$=10/16 sccm; the maximum crystalline fraction was 74% at this condition. When RF power applied to ICP coil was increased, the crystallinity was also increased around 78%. In order to investigate the surface roughness of the deposited films, Atomic Force Microscopy was used.

• Journal of Biomedical Engineering Research
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• v.31 no.3
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• pp.177-186
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• 2010

In 3D ultrasound color Doppler imaging (CDI), 8-16 pulse transmissions (ensembles) per each scanline are used for effective clutter rejection and flow estimation, but it yields a low volume acquisition rate. In this paper, we have evaluated three flow estimation methods: autoregression (AR), eigendecomposition (ED), and autocorrelation combined with adaptive clutter rejection (AC-ACR) for a small ensemble size (E=4). The performance of AR, ED and AC-ACR methods was compared using 2D and 3D in vivo data acquired under different clutter conditions (common carotid artery, kidney and liver). To evaluate the effectiveness of three methods, receiver operating characteristic (ROC) curves were generated. For 2D kidney in vivo data, the AC-ACR method outperforms the AR and ED methods in terms of the area under the ROC curve (AUC) (0.852 vs. 0.793 and 0.813, respectively). Similarly, the AC-ACR method shows higher AUC values for 2D liver in vivo data compared to the AR and ED methods (0.855 vs. 0.807 and 0.823, respectively). For the common carotid artery data, the AR provides higher AUC values, but it suffers from biased estimates. For 3D in vivo data acquired from a kidney transplant patient, the AC-ACR with E=4 provides an AUC value of 0.799. These in vivo experiment results indicate that the AC-ACR method can provide more robust flow estimates compared to the AR and ED methods with a small ensemble size.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.521-522
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• 2006

In this paper, hybrid air-water discharges were used to develop an optimal condition for providing a high level of water decomposition for hydrogen yield. Electrical and optical phenomena accompanying the discharges were investigated along with feeding gases, flow rates, and point-to-plane electrode gap distance. The primary focus of this experiment was put on the optical emission of the near UV range, with the energy threshold sufficient for water dissociation and excitation. The $OH(A^{2+},'=0\;X^2,"=0$) band's optical emission intensity indicated the presence of plasma chemical reactions involving hydrogen formation. In the gaseous atmosphere saturated with water vapor the OH(A-X) band intensity was relatively high compared to the liquid and transient phases although the optical emission strongly depended on the flow rate and type of feeding gas. In the gaseous phase discharge phenomenon for Ar carrier gas transformed into a gliding arc via the flow rate growth. OH(A-X) band's intensity increased according to the flow rate or residence time of He feeding gas. Reciprocal tendency was acquired for $N_2$ and Ar carrier gases. The peak value of OH(A-X) intensity was observed in the proximity of the water surface, however in the cases of Ar and $N_2$ with 0.5 SLM flow rate peaks shifted to the region below the water surface. Rotational temperature ($T_{rot}$) was estimated to be in the range of 900-3600 K, according to the carrier gas and flow rate, which corresponds to the arc-like-streamer discharge.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.18 no.3
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• pp.355-362
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• 2020

The corrosion behavior of the Inconel X-750 alloy was investigated for its potential application under a Cl₂-O₂ mixed gas flow in an Ar atmosphere. The corrosion rate was found to be negligible at temperatures up to 400℃ under a flow rate of 30 mL·min^-1 Cl₂ + 170 mL·min^-1 Ar, whereas an exponential increase was observed in the corrosion rate at temperatures greater than 500℃. The suppression of the corrosion reaction due to the presence of O₂ was verified experimentally at flow rates of 30 mL·min^-1 Cl₂ (4.96 g·m^-2·h^-1), 20 mL·min^-1 Cl₂ + 10 mL·min^-1 O₂ (2.02 g·m^-2 ·h^-1), and 10 mL·min^-1 Cl₂ + 20 mL·min^-1 O₂ (1.34 g·m^-2·h^-1) under a constant Ar flow rate of 170 mL·min^-1 at 600℃ for 8 h. The surface morphology analysis results revealed that porous surfaces with tunnel-type holes were produced under the Cl₂-O₂ mixed-gas condition. Furthermore, the effects of the Cl₂ flow rate on the corrosion rate were investigated, indicating that its impact was negligible within the range of 5-30 mL·min^-1 Cl₂ at 600℃.

• Journal of Powder Materials
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• v.17 no.5
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• pp.379-384
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• 2010

In the present work, bismuth nanopowders with various particle size distributions were synthesized by controlling argon (Ar) gas flow rate and chamber pressure of a gas condensation (GC) apparatus. From the analyses of transmission electron microscopy (TEM) images and nitrogen gas adsorption results, it was found that as Ar gas flow rate increased, the specific surface area of bismuth increased and the average particles size decreased. On the other hand, as the chamber pressure increased, the specific surface area of bismuth decreased and the average particles size increased. The optimum gas flow rate and chamber pressure for the maximized electrochemical active surface area were determined to be 8 L/min and 50 torr, respectively. The bismuth nanopowders synthesized at the above condition exhibit 13.47 $m^2g^{-1}$ of specific surface area and 45.6 nm of average particles diameter.

• Journal of the Semiconductor & Display Technology
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• v.8 no.4
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• pp.59-63
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• 2009

This paper presents two dimensional simulation results of an inductively coupled $Ar/O_2$ plasma reactor. The effects of operating conditions on the plasma properties and the uniformity of atomic oxygen near the wafer were systematically investigated. The plasma density had the linear dependence on the chamber pressure, the flow rate of the feed gas and the power deposited into the plasma. On the other hand, the electron temperature decreased almost linearly with the chamber pressure and the flow rate of the feed gas. The power deposited into the plasma nearly unaffected the electron temperature. The simulation results showed that the uniformity of atomic oxygen near the wafer could be improved by lowering the chamber pressure and/or the flow rate of the feed gas. However, the power deposited into the plasma had an adverse effect on the uniformity.

• Proceedings of the KIEE Conference
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• 1997.07e
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• pp.1657-1659
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• 1997

Electron temperature and electron density were measured in a radio-frequency inductively coupled plasma (RFICP) using a probe measurements. Measurement was conducted in an argon discharge for pressures from 10 [mTorr] to 40 [mTorr] and input rf power from 100 [W] to 800 [W], Ar flow rate from 5 [sccm] to 30 [sccm], Spatial distribution electron temperature and electron density were measured for discharge with same aspect ratio (R/L=2). Electron temperature and electron density were discovered depending on both pressure and power, Ar flow rate. Electron density was increased with increasing input power and in creasing pressure, increasing Ar flow rate. Radial distribution of the electron density was peaked in the plasma center. Normal distribution of the electron density was peaked in the center between quartz plate and substrate. From these results, We found out the generation mechanism of Radio-Frequency Inductively Coupled Plasma.

• Journal of the Semiconductor & Display Technology
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• v.11 no.1
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• pp.29-33
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• 2012

In this study, we have investigated the structural and electrical characteristics of IZO thin films deposited under hydrogen atmosphere on flexible substrate for the OLED (organic light emitting diodes) devices. For this purpose, PES was used for flexible substrate and IZO thin films were deposited by RF magnetron sputtering under hydrogen ambient gases (Ar, $Ar+H^2$) at room temperature. In order to investigate the influences of the hydrogen, the flow rate of hydrogen in argon mixing gas has been changed from 0.1sccm to 0.5sccm. All the samples show amorphous structure regardless of flow rate. The electrical resistivity of IZO films increased with increasing flow rate of $H^2$ under $Ar+H^2$. All the films showed the average transmittance over 85% in the visible range. The OLED device was fabricated with different IZO electrodes made by configuration of IZO/$\acute{a}$-NPD/DPVB/$Alq_3$/LiF/Al to elucidate the performance of IZO substrate. OLED devices with the amorphous-IZO (a-IZO) anode film show good current density-voltage-luminance characteristics. This suggests that flat surface roughness and low electrical resistivity of a-IZO anode film lead to more efficient anode material in OLED devices.