• 대한화학회지
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• 제34권1호
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• pp.85-90
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• 1990

Tetrakis(picolinato)tungsten(IV) 착물에 과량의 methylpicolinic acid를 가하여, 무극성 용액에서 얼마나 inert한지를 60 ~ 120$^{\circ}C$ 및 키실렌의 환류조건에서 분광학적 방법을 관찰하였다. 산소접촉 여부에 무관하게 90$^{\circ}C$에서 2일간은 inert하였으나 산소접촉하에서는 존재하는 리간드농도 제곱에 역비례하는 속도상수를 보이며 급격히 산화되며 리간드를 잃었다. Ar기체하에서 sealing한 시료는 반응속도상수 [k($sec^{-1}$)] = $8.8{\times} 10^{-7}$를 보이며 50일까지 반응속도론적으로 안정하였다. 배위된 질소의 인접 양성자($H_6$)의 화학적 이동은 없었으나 리간드를 잃음에 따라 intensity가 감소하였으며 새로운 유리리간드의 $H_6$ peak가 생성됨을 확인하여 치환반응은 일어나지 않고 착물이 산화되며 리간드를 잃고 있음을 확인하였다.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2017년도 제48회 춘계학술대회논문집
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• pp.583-586
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• 2017

마이크로 터보제트엔진을 이용하여 S형상 배기노즐의 플룸의 적외선 신호 특성을 이해하기 위하여 적외선 신호 특정 연구를 수행하였다. 엔진 배기노즐은 원형노즐과 가로세로비가 5인 사각형 노즐 그리고 가로세로비가 5.2인 S형상의 배기노즐을 제작하여 실험을 수행하였다. 배기가스에서 방출되는 적외선 신호는 가로세로비가 클수록 적외선 신호의 크기가 점차 감소하는 경향을 보였고 배기노즐의 형상이 S형상의 경우 사각형 노즐 보다 적외선 신호가 28.4% 감소하는 것을 확인하였다.

• 한국재료학회지
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• 제12권9호
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• pp.735-739
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• 2002

$(Y,Gd)BO_3$: Eu, $Zn_2$$SiO_4$ : Mn and $BaMgAl_{10}$ $O_{17}$ : Eu phosphors used in PDP were continuously irradiated by vacuum ultra violet generated from the penning gas (96%Ar+4%Xe) discharge and then the change of emitting intensity with time was investigated. The brightness of these phosphors decreased exponentially with VUV excitation time. The experimental data showed that the degradation rate increased in the order of $Zn_2$$SiO_4$ : Mn>(Y,Gd)$BO_3$: Eu>$BaMgAl_{10}$ $O_{17}$ : Eu phosphor. This different degradation property of phosphors was interpreted in terms of brightness saturation and stability against VUV irradiation. It was found that the degradation property of $(Y,Gd)BO_3$ : Eu red phosphor synthesized by ultrasonic thermal spray was superior to commercial phosphor.

• 한국세라믹학회지
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• 제37권7호
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• pp.686-692
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• 2000

Tin-doped In2O3 (ITO) films were fabricated using a d.c. magnetron reactive sputteirng of a In-10 wt% Sn alloy target in an Ar and O2 gas mixture. To understand the behavior of the carrier mobility in ITO films with O2 partial pressure, the resistivity, carrier concentration and mobility, film density, and intrinsic stress in the films were measured with O2 partial pressure. It was found experimentally that the carrier mobility increased rapidly as the film density increased. In the ITO film with the density close to theoretical one, the mean free path was the same as the columnar diameter. This indicated that the mobility in ITO films was strongly influenced by the crystall size. However, in the case where the film density was smaller than a theoretical density, the mean free paths were also smaller the columnar diameter. It was analyzed that the electron scattering at pores and holes within the crystalline was the major obstacle for electron conduction in ITO films. The measurement of intrinsic stress in ITO films also made it clear that the density of ITO films was controlled by the bombardment of oxygen neutrals on the growing film.

• 한국세라믹학회지
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• 제39권4호
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• pp.409-412
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• 2002

대기압 하에서 정상적으로 저온 플라스마가 발생 가능한 장치를 개발했다. 개발한 장치는 접지전극을 유전체로 피복한 용량결합형 전극구조로 되어 있다. rf(13.56 M Hz)을 여기 원으로서 사용한 아르곤(Ar) 또는 헬륨(He)은 플라스마 가스로서 사용했다. 발생한 플라스마는 발광분광법, 플로브 진단법에 의해 특성을 검토했다. 그 결과 전자온도>여기온도>가스온도 관계에 있는 비평형 상태의 플라스마였다. 본 장치를 사용하여 발생한 플라스마에 반응가스(CF4)을 첨가해서 대기 개방 계에서 Si(100)식각($1.5{\mu}m$/min)에 적용하여 높은 처리속도를 실현했다.

• The Korean Journal of Ceramics
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• 제6권4호
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• pp.354-358
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• 2000

The SnO$_2$film was deposited on a corning glass 1737 substrate by plasma enhanced chemical vapor deposition using a gas mixture of SnCl$_4$, $O_2$, and Ar. The film thickness was measured using $\alpha$-step and was about 9400$\AA$. The conventional X-ray diffractometry and pole figure attachment were used to refine the crystal structure of SnO$_2$ thin film. Six pole figures, (200), (211), (310), (301), (321), and (411), were measured with CoK$_\alpha$ radiation in reflection geometry. The X-ray diffraction data were measured at room temperature using CuK$_\alpha$ radiation with graphite monochromator. The agreement between calculated and observed patterns for the normal direction of SnO$_2$ thin film was not satisfactory due to the severely preferred orientation effect. The Rietveld refinement of heavily textured SnO$_2$ thin film was successfully achieved by adopting the pole density distribution of each reflection obtained from the inverse pole figure as a correction factor for the preferred orientation effect. The R-weighted pattern, R$_wp$, was 15.30%.

• 한국세라믹학회지
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• 제50권4호
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• pp.288-293
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• 2013

Zn-In-Sn-O films were prepared at room temperature by combinatorial RF-magnetron co-sputtering system. The cationic contents of the films were varied using a compositionally combinatorial technique. The effects of the oxygen partial pressure and film compositionon the structural and electrical properties were investigated. The Zn-In-Sn-O films deposited at Ar gas atmosphere showed an amorphous phaseirrespective of the film composition. However, the amorphous Zn-In-Sn-O films with a Zn content below 30.0 at% were converted into a bixbyite type-ITO polycrystalline phase with an increase in the oxygen partial pressure. The resistivity, carrier concentration, and Hall mobility were strongly affected by the oxygen partial pressure and chemical composition of the film. At sufficiently high carrier densities above $5{\times}10^{18}cm^{-3}$, the conduction behavior of amorphous Zn-In-Sn-O film changes from thermally activated to degenerate band conduction accompanied with high mobility.

• 한국표면공학회지
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• 제52권6호
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• pp.342-349
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• 2019

Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N₂/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied with a frequency of 350 kHz, and duty ratio of 40%(1.1 ㎲). The effects of pulsed DC substrate bias voltage on the crystallinity, color, electrical properties of TiN_x films have been investigated using XRD, SEM, XPS and measurement of the electrical properties such as electrical conductivity, carrier concentration, mobility. The deposition rates of TiN_x films was decreased with application of the pulsed DC substrate bias voltage. The TiN_x films deposited without and with pulsed bias of -50V to substrate exhibits gray and gold colors, respectively. XPS depth profiling revealed that the introduction of the substrate bias voltage resulted in decreasing oxygen concentration in TiN_x films, and increasing the electrical conductivities, carrier concentration, and mobility to about 10 times, 5 times, and 2 times degree, respectively.

• Transactions on Electrical and Electronic Materials
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• 제5권1호
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• pp.11-14
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• 2004

An rf triode magnetron sputtering system is designed and installed its construction in vacuum chamber. In order to calibrate the rf triode magnetron sputtering for thin films deposition processes, the effects of different glow discharge conditions were investigated in terms of the deposition rate measurements. The basic parameters for calibrating experiment in this sputtering system are rf power input, gas pressure, plasma current, and target-to-substrate distance. Because a knowledge of the deposition rate is necessary to control film thickness and to evaluate optimal conditions which are an important consideration in preparing better thin films, the deposition rates of copper as a testing material under the various sputtering conditions are investigated. Furthermore, a triode sputtering system designed in our team is simulated by the SIMION program. As a result, it is sure that the simulation of electron trajectories in the sputtering system is confined directly above the target surface by the force of E${\times}$B field. Finally, some teats with the above 4 different sputtering conditions demonstrate that the deposition rate of rf triode magnetron sputtering is relatively higher than that of the conventional sputtering system. This means that the higher deposition rate is probably caused by a high ion density in the triode and magnetron system. The erosion area of target surface bombarded by Ar ion is sputtered widely on the whole target except on both magnet sides. Therefore, the designed rf triode magnetron sputtering is a powerful deposition system.

• 한국전기전자재료학회논문지
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• 제21권5호
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• pp.463-467
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• 2008

Aluminum nitride (AlN) thin films have been deposited on Au electrodes by using reactive RF magnetron sputtering method in a gas mixture of Ar and $N_2$ at different substrate temperature. It was found that substrate temperature was varied in the range up to $400^{\circ}C$, highly c-axis oriented film can be obtained at $300^{\circ}C$ with full width at half maximum (FWHM) $3.1^{\circ}$. Increase in surface roughness from 3.8 nm to 5.9 nm found to be associated with increase in grain size, with substrate temperature; however, the AlN film fabricated at $400^{\circ}C$ exhibited a granular type of structure with non-uniform grains. The Al 2p and N 1s peak in the X-ray photoelectron spectroscopy (XPS) spectrum confirmed the formation of Al-N bonds. The XPS spectrum also indicated the presence of oxynitrides and oxides, resulting from the presence of residual oxygen in the vacuum chamber. It is concluded that the AlN film deposited at substrate temperature of $300^{\circ}C$ exhibited the most desirable properties for the application of high-frequency surface acoustic devices.