• 반도체디스플레이기술학회지
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• 제21권3호
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• pp.130-134
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• 2022

An anti-reflective coating is used to improve the performance of the solar cell. The anti-reflective coating changes the value of the short-circuit current about the thickness. However, the current-voltage characteristics about the anti-reflective coating are difficult to calculate without simulation tool. In this paper, a modeling technique to determine the short-circuit current value and the current-voltage characteristics in accordance with the thickness is proposed. In addition, artificial neural network is used to predict the short-circuit current with the dependence of temperature and thickness. Simulation results incorporating the artificial neural network model are obtained using MATLAB/Simulink and show the current-voltage characteristic according to the thickness of the anti-reflective coating.

• 한국세라믹학회지
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• 제32권1호
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• pp.57-62
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• 1995

The coating condition of reproducible anti-reflective coating film and the light transmittance characteristics of the prepared anti-reflective coating glass were investigated as a study for the preparation of single-layer anti-reflective coating glasss. In case of coating with the sol in which the solvent was substituted with the ethanol with the addition of 0.1 mol HNO3, the coated glass showed the minimum value of the refractive index of 1.464, light transmittance of 94.2% at 550nm standard wavelength which is 3.2% higher than that of the parent glass, and the reflectance in the entire wave range of visible light. The refractive index represented its minimum at the sol concentration of 1.0 mol per 100mols of water and the higher the sol concentration, the higher the refractive index, resulting in the decrease of the light transmitance. The production condition of the reproducible anti-reflective coating on glass with the maximum transmittance of 94.2% was 4cm/min of withdrawal speed, 40$0^{\circ}C$ and 1 hour of heat treatment temperature and time, resulting in the film thickness of 94nm.

• Applied Science and Convergence Technology
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• 제25권4호
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• pp.73-76
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• 2016

Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

• 한국군사과학기술학회지
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• 제17권5호
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• pp.672-679
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• 2014

To improve sensing capability of infrared, heat-resistance and mechanical properties, the $SiO_2$ and $TiO_2$ anti-reflective layers were coated on sapphire substrate by MOCVD. The standard wavelength was 4,600nm, and the thickness of anti-reflective layers were 379 and 758nm in case of ${\lambda}/4$ and ${\lambda}/2$ of incident angle($65^{\circ}$), respectively. The $SiO_2$ and $TiO_2$ anti-reflective layers were coated 12.6 and 9.7nm/min of deposition rates by increasing oxygen pressure to set the ideal refractive index of 1.283. In case of $SiO_2({\lambda}/2)$ coating, the transmittance increased from 55.0 to 62.7%. The transmittance of $TiO_2({\lambda}/2)$ anti-reflective layer also increased from 55.0 to 64.8%. The flexural strength of $SiO_2({\lambda}/2)$ and $TiO_2({\lambda}/2)$ layer coated sapphire increased from 337.8 to 362.9 and 371.8MPa, respectively. The flexural strength at $500^{\circ}C$ of these materials also increased respectively to 304.5, 358.2MPa from 265.9MPa. From these results, we confirmed these materials can be used as transmission window of infrared light.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2009년도 추계학술대회 논문집
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• pp.217-220
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• 2009

This paper presents fabrication method of nano-structured PMMA substrates as well as evaluations of their optical transmittance. For anti-reflective surface, surface coating method had been conventionally used. However, it requires high cost, complicated process and post-processing times. In this study, we suggested the fabrication method of anti-reflective surface by the hot embossing process. Using the nano patterned master fabricated by anodic aluminum oxidation process. Anodic aluminum oxide(AAO) is widely used as templates or a molds for various applications such as carbon nano tube (CNT), nano rod and nano dots. Anodic aluminum oxidation process provides highly ordered regular nano-structures on the large area, while conventional pattering methods such as E-beam and FIB can fabricate arbitrary nano-structures on small area. We fabricated a porous alumina hole array with various inter-pore distance and pore diameter. In order to replicate nano-structures using alumina nano hole array patterns, we have carried out hot-embossing process with PMMA substrates. Finally the nano-structured PMMA substrates were fabricated and their optical transmittances were measured in order to evaluate the charateristivs of anti-reflection. Anti-reflective structure can be applied to various displays and automobile components.

• 한국생산제조학회지
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• 제18권6호
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• pp.697-701
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• 2009

A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• 공업화학
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• 제21권5호
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• pp.564-569
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• 2010

박막 및 디스플레이 분야에서는 광학 부품소재의 우수한 광 투과성과 투명성을 요구하는 수요가 증가함에 따라 우수한 반사방지 특성의 부여에 대하여 관심이 집중되고 있는 실정이다. 본 연구에서는 반사방지 기능을 부여하기 위하여 졸-겔법에 의한 수열합성법을 통하여 기저 물질 표면에 산화알루미늄을 나노 크기 꽃 형태의 프레임 구조를 가진 단일 산화물층을 형성시키고자 하였다. 코팅 층 시편의 특성은 UV-Vis 분광기, FT-IR 분광기, XRD 및 FE-SEM을 이용하여 분석하였다. 알루미나 졸이 코팅된 시편들의 모폴로지는 수열합성의 온도와 시간 및 초음파 제공에 의해 조절되도록 하였다. 꽃 형태의 나노 프레임 구조 형태로 구성된 코팅 층에서 높은 광투과율과 반사방지특성이 발현되었다.

• 한국정보통신학회논문지
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• 제24권10호
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• pp.1306-1311
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• 2020

본 연구에서는 Ni cluster를 이용하여 제작된 나노 구조체를 반사방지막으로 활용하여 비가시광 UV 광통신용 신호 수신단에 적용 가능한 AlGaN 광다이오드의 성능을 개선하는 구조를 제안하였다. 반사방지막의 제작은 SiO2 위에 Ni cluster를 형성한 후 SiO2를 부분적으로 식각하는 방식으로 제조하였다. 반사방지막이 적용된 샘플은 반사방지막이 없는 구조의 샘플에 비해 상대적으로 작아진 반사도를 보였으며 나노구조체가 없는 SiO2 가 증착된 구조에 비해서 입사 광파장의 변화에 대해 균일한 반사도를 보였다. 최종적으로 2 nm 두께의 Ni 층을 열처리하여 제작된 Ni cluster를 이용한 반사방지막을 적용하여 UV 광다이오드를 제작하였고, 그 결과 SiO2 단일막을 가진 센서에 비해 240 nm에서 270 nm 파장영역에서 개선된 광반응도를 보였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.981-984
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• 2005

Many flat panel displays displays rely on polymeric substrates with thin film coatings, such as anti-reflective, anti-static and hardcoats, to improve optical and mechanical properties of the display. In this paper we briefly discuss the principles underlying the mechanical robustness of such coated structures, and examine two fitness-for-use tests currently employed by the industry. We compare the teachings with some results obtained with our hardcoats and anti-reflective coatings.

• Journal of information and communication convergence engineering
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• 제10권3호
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• pp.295-299
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• 2012

Defect generation during organic bottom anti-reflective coating (BARC) in the photo lithography process is closely related to humidity control in the BARC coating unit. Defects are related to the water component due to the humidity and act as a blocking material for the etching process, resulting in an extreme pattern bridging in the subsequent BARC etching process of the poly etch step. In this paper, the lower limit for the humidity that should be stringently controlled for to prevent defect generation during BARC coating is proposed. Various images of defects are inspected using various inspection tools utilizing optical and electron beams. The mechanism for defect generation only in the specific BARC coating step is analyzed and explained. The BARC defect-induced gate pattern bridging mechanism in the lithography process is also well explained in this paper.