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http://dx.doi.org/10.6109/jkiice.2020.24.10.1306

Improved photoresponsivity of AlGaN UV photodiode using antireflective nanostructure  

Dac, Duc Chu (School of Electronic and Electrical Engineering, Hong-Ik University)
Choi, June-Heang (School of Electronic and Electrical Engineering, Hong-Ik University)
Kim, Jeong-Jin (Metamaterial Electronic Device Research Center, Hong-Ik University)
Cha, Ho-Young (School of Electronic and Electrical Engineering, Hong-Ik University)
Abstract
In this study, we proposed an anti-reflective nano-structure to improve the photoresponsivity of AlGaN UV photodiode that can be used as a receiver in a solar blind UV optical communication system. The anti-reflective nano-structure was fabricated by forming Ni nano-clusters on SiO2 film followed by etching the underneath SiO2 film. A sample with the anti-reflective nano-structure exhibited lower surface reflection along with less dependency on the wavelength in comparison with a sample without the nano-structure. Finally, a UV photodiode was fabricated by applying an anti-reflective structure produced by heat-treating a 2 nm-thick Ni layer. The photodiode fabricated with the proposed nano-structure exhibited noticeable improvement in the photoresponsivity at the wavelength range from 240 nm to 270 nm in comparison with the same photodiode with a SiO2 film without the nano-structure.
Keywords
AlGaN; Solar-blind UV optical communication; Photodiode; Anti-reflective structure;
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Times Cited By KSCI : 2  (Citation Analysis)
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