• 한국표면공학회지
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• 제48권5호
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• pp.185-193
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• 2015

Anodization of die-casted AZ91D magnesium alloy was carried out using silicate based electrolyte solution instead of fluoride based solution to improve biocompatibility of oxidized layers. The anodic layer obtained from silicate based solution has smaller size of pore and smoother surface, resulting in lower corrosion rate in simulate body solution (SBF). Effect of enhanced structural and chemical properties in oxidized layer on biocompatibility was carefully considered.

• 대한화학회지
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• 제38권12호
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• pp.885-890
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• 1994

텅스텐 전극을 작업전극으로 사용하여 산성수용액에서 아닐린의 전기화학적 중합을 순환 전압-전류법으로 연구하였다. 아닐린 분자는 2전자 전이에 의하여 탈수소 아닐린이온으로 산화하고, 중성아닐린을 공격하여 중합체를 만든다. 그러나 백금전극의 경우와는 다르게 중합과정은 주로 아닐린의 산화에 의해서 일어난다. 성장속도는 백금전극의 경우와 비교하여 느린 것으로 나타났다. 분해생성물은 벤조퀴논이 아니라 p-phenylenediamine(p-PDA)으로 확인 되었는데 이것은 1.0 V 이하의 전위에서 p-PDA의 산화가 관측되지 않은 결과와도 일치한다.

• 한국세라믹학회지
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• 제20권1호
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• pp.31-36
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• 1983

The photoelectrochemical conversion by polycrystalline $TiO_2$ electrodes is effected by applied voltage oxidized $TiO_2$ thickness temperature and concentration of a, P. E. C cell. Anodic current starts at -0.8V in 1N-NaOH solu-tion and photocurrent appears around 420nm frequency. And the emf of the cell drops with the rate of 58.5mV/PH.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1993년도 하계학술대회 논문집 B
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• pp.1143-1146
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• 1993

The magnetic properties of aluminium anodized film in which Co-Fe alloy electrodeposited are investigated with regard to the alloy composition of magnetic films. The electrodeposited Co-Fe particles are confirmed to be single phase Co-Fe alloys by X-ray diffractions. The coercive force as well as the magnetic anisotropy energy can be controlled by changing the composition of the alloy. Magneticfilms having high saturation magnetization and high coercive force were obtained.

• 대한전자공학회논문지SD
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• 제40권8호
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• pp.560-564
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• 2003

본 논문에서는 RTP(rapid thermal process)를 이용한 새로운 산화방법을 고안했으며, 이는 짧은 시간에 다공질 실리콘을 산화시킴으로써 이 기술은 여타 방법에 비해 경제적이고 간편한 방법으로 짧은 시간에 두꺼운 산화막을 성장시킬 수 있는 장점을 가지고 있다. 먼저, 양극반응을 통해 PSL(porous silicon layer)을 형성한 후 이를 저온 산화시킨 후에 급속 열처리 산화공정(RTO: rapid thermal oxidation)를 이용해서 OPSL(oxidized porous silicon layer)을 제조하고, 그 물성 및 전기적 특성을 조사하여, 열 산화로 제작된 OPSL과 그 특성을 비교하였다. 시편의 절연 파괴전압은 약 3.9 MV/cm의 값을 보여 벌크 산화막보다는 적은 값이지만 절연 재료로서는 충분한 값이고, 누설전류는 0 ∼ 50 V의 인가 전압에서 100 ∼ 500 ㎀의 값을 보였다. 그리고, XPS 결과는 RTO 공정 추가가 저온 산화막의 완전 산화에 크게 기여함을 확인하였으며, 저온 산화막의 표면 및 내부에서도 산화반응이 완전하게 이루어졌음을 확인하였다. 이 결과로부터 저온 OPSL을 제조할 때, RTO 공정이 OPSL의 산화 및 치밀화(densification)의 증가에 크게 기여함을 알 수 있었다. 따라서, 이의 방법으로 제조된 OPSL은 저온을 요구하는 공정에서 소자의 절연막, 전기적인 분리층 그리고 실리콘 고주파용 기판 등으로 활용될 수 있을 것으로 보인다.

• 대한치과기공학회지
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• 제27권1호
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• pp.79-88
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• 2005

This study was performed to investigate the surface properties of electrochemically oxidized pure niobium by anodic oxide and hydrothermal treatment technique. Niobium specimens of $10\times10mm$ in dimension were polished sequentially from #600, #800, #1000 emery paper. The surface pure niobium specimens were anodized in an electrolytic solution that was dissolved calcium and phosphate in water. The electrolytic voltage was set in the range of 250 V and the current density was 10 $mA/cm^2$. The specimen was hydrothermal treated in high-pressure steam at 300$^{\circ}C$ for 2 hours using an autoclave. Then, specimens were immersed in the Hanks' solution with pH 7.4 at 37$^{\circ}C$ for 30 days. The surface of specimen was characterized by scanning electron microscope(SEM), energy dispersive X-ray microanalysis(EDX), potentiostat/galvanostat test, and cytotoxicity test. The results obtained was summarized as follows; According to the result of measuring corrosion behavior at 0.9% NaCl, corrosion resistance was improved more specimens treated with anodic oxide than in hydrothermal treated ones. The multi-porous oxide layer on surface treated through anodic oxidation showed a structure that fine pores overlap one another, and the early precipitation of apatite was observed on the surface of hydrothermal treated samples. According to the result of EDX after 30 days deposition in Hanks' solution, Ca/P was 1.69 in hydrothermal treated specimens. In MTT test, specimens treated through anodic oxidation and hydrothermal treated ones showed spectrophotometer similar to that of the control group. Thus no significant difference in cytotoxicity was observed (P>0.05).

• ETRI Journal
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• 제26권4호
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• pp.315-320
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• 2004

This paper proposes a 10-${\mu}m$ thick oxide layer structure that can be used as a substrate for RF circuits. The structure has been fabricated using an anodic reaction and complex oxidation, which is a combined process of low-temperature thermal oxidation (500 $^{\circ}C$ for 1 hr at $H_2O/O_2$) and a rapid thermal oxidation (RTO) process (1050 ${\circ}C$, for 1 min). The electrical characteristics of the oxidized porous silicon layer (OPSL) were almost the same as those of standard thermal silicon dioxide. The leakage current density through the OPSL of 10 ${\mu}m$ was about 10 to 50 $nA/cm^2$ in the range of 0 to 50 V. The average value of the breakdown field was about 3.9 MV/cm. From the X-ray photo-electron spectroscopy (XPS) analysis, surface and internal oxide films of OPSL prepared by a complex process were confirmed to be completely oxidized. The role of the RTO process was also important for the densification of the porous silicon layer (PSL) oxidized at a lower temperature. The measured working frequency of the coplanar waveguide (CPW) type short stub on an OPSL prepared by the complex oxidation process was 27.5 GHz, and the return loss was 4.2 dB, similar to that of the CPW-type short stub on an OPSL prepared at a temperature of 1050 $^{\circ}C$ (1 hr at $H_2O/O_2$). Also, the measured working frequency of the CPW-type open stub on an OPSL prepared by the complex oxidation process was 30.5 GHz, and the return was 15 dB at midband, similar to that of the CPW-type open stub on an OPSL prepared at a temperature of $1050^{\circ}C$ (1 hr at $H_2O/O_2$).

• 한국전기전자재료학회논문지
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• 제16권6호
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• pp.471-476
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• 2003

Au/oxide/n-InP Schottky diodes were fabricated from heteroepitaxial InP layers grown on GaAs substrates by the metalorganic vapor phase epitaxy (MOVPE) method from a new combination of source materials: ethyldimethylindium (EDMIn) and tertiarybutylphosphine (TBP). Anodic oxidation technique by using a solution of 10 g of ammonium pentaborate in 100 cc of ethylene glycole as the electrolyte was used to deposit a thin oxide layer. The barrier heights determined from three different techniques, current-voltage (I-V) measurements at room temperature and in the temperature range of 273 K - 373 K, and room temperature capacitance-voltage (C-V) measurements are in good agreement, 0.7 - 0.9 eV which is considerably high as compared to the 0.45 - 0.55 eV in Au/n-InP Schottky diode without a Passivation layer. The ideality factors of 1.1 - 1.3 of the Schottky diodes were also determined from the I-Y characteristics. Deep level transient spectroscopy (DLTS) studies revealed only one shallow electron state at 92.6 meV below the bottom of the conduction band and no deep state in the heteroepitaxial InP layers grown from EDMIn and TBP.

• Journal of Electrochemical Science and Technology
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• 제4권1호
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• pp.1-18
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• 2013

Gallium is an important element in the production of a variety of compound semiconductors for optoelectronic devices. Gallium has a low melting point and is easily oxidized to give oxides of different compositions that depend on the conditions of solutions containing Ga. Gallium electrode reaction is highly irreversible in acidic media at the dropping mercury electrode. The passive film on a gallium surface is formed during anodic oxidation of gallium metal in alkaline media. Besides, some results in published reports have not been consistent and reproducible. An increase in the demand of intermetallic compounds and semiconductors containing gallium gives rise to studies on electrosynthesis of them and an increase of gallium concentration in the environment with various application of gallium causes the development of electroanalysis tools of Ga. It is required to understand the electrochemistry of Ga and to predict the electrochemical behavior of Ga to meet these needs. Any review papers related to the electrochemistry of gallium have not been published since 1978, when the review on the subject was published by Popova et al. In this study, the redox behavior, anodic oxidation, and electrodeposition of gallium, and trace determination of gallium by stripping voltammetries will be reviewed.

• 구강회복응용과학지
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• 제21권1호
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• pp.33-42
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• 2005

This study was performed to investigate the surface properties and in vitro biocompatibility of electrochemically oxidized Ti-6Al-7Nb alloy by anodic spark discharge technique. Discs of Ti-6Al-7Nb alloy of 20 mm in diameter and 2 mm in thickness were polished sequentially from #300 to 1000 SiC paper, ultrasonically washed with acetone and distilled water for 5 min, and dried in an oven at $50^{\circ}C$ for 24 hours. Anodizing was performed using a regulated DC power supply. The applied voltages were given at 240, 280, 320, and 360 V and current density of $30mA/cm^2$. Hydrothermal treatment was conducted by high pressure steam at $300^{\circ}C$ for 2 hours using a autoclave. Samples were soaked in the Hanks' solution with pH 7.4 at $36.5^{\circ}C$ during 30 days. The results obtained were summarized as follows; 1. The oxide films were porous with pore size of $1{\sim}5{\mu}m$. The size of micropores increased with increasing the spark forming voltage. 2. The main crystal structure of the anodic oxide film was anatase type as analyzed with thin-film X-ray diffractometery. 3. Needle-like hydroxyapatite (HA) crystals were observed on anodic oxide films after hydrothermal treatment at $300^{\circ}C$ for 2 hours. The precipitation of HA crystals was accelerated with increasing the spark forming voltage. 4. The precipitation of the fine asperity-like HA crystals were observed after being immersed in Hanks' solution at $37^{\circ}C$. The precipitation of HA crystals was accelerated with increasing the spark forming voltage and the time of immersion in Hanks' solution. 5. The Ca/P ratio of the precipitated HA layer was equivalent to that of HA crystal as increasing the spark forming voltage and the time of immersion in Hanks' solution.