• Title/Summary/Keyword: AlN crystal

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Hot Wall Epitaxy(HWE)범에 의한 $CuInSe_2$ 단결정 박막 성장과 가전자대 갈라짐에 대한 광전류 연구 (Growth and photocurrent study on the splitting of the valence band for $CuInSe_2$ single crystal thin film by hot wall epitaxy)

  • 홍명석;홍광준
    • 한국결정성장학회지
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    • 제14권6호
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    • pp.244-252
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    • 2004
  • $CuISe_2$ 단결정 박막은 수평 전기로에서 합성한 $CuInSe_2$ 다결정을 증발원으로하여, hot wall epitaxy(HWE) 방법으로 증발원과 기판(반절연성-GaAs(100))의 온도를 각각 $620^{\circ}C$, $410^{\circ}C$로 고정하여 단결정 박막을 성장하였다. 이때 단결정 박막의 결정성은 광발광 스펙트럼과 이중결정 선 요동곡선(DCRC) 으로 부터 구하였다. Hall 효과는 van der Pauw 방법에 의해 측정되었으며, 293K에서 운반자 농도와 이동도는 각각 $9.62\times10^{16}/\textrm{cm}^3$, 296 $\textrm{cm}^2$/Vㆍs 였다. $CuAlSe_2$/Si(Semi-Insulated) GaAs(100) 단결정 박막의 광흡수와 광전류 spectra를 293k에서 10K까지 측정하였다. 광흡수 스펙트럼으로부터 band gap $E_g$(T)는 Varshni 공식에 따라 계산한 결과 1.1851 eV-($8.99\times10^{-4} eV/K)T^2$/(T+153k)였다. 광전류 스펙트럼으로 부터 Hamilton matrix(Hopfield quasicubic mode)법으로 계산한 결과 crystal field splitting Δcr값이 0.0087eV이며 spin-orbit Δso값은 0.2329 eV임을 확인하였다. 10K일 때 광전류 봉우리들은 n = 1일때 $A_1-, B_1$-와 $C_1$-exciton봉우리임을 알았다.

CMnAl TRIP Steel Surface Modification During CGL Processing

  • Gong, Y.F.;Lee, Y.R.;Kim,, Han-S.;Cooman, B.C.De
    • Corrosion Science and Technology
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    • 제9권2호
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    • pp.81-86
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    • 2010
  • The mechanisms of selective oxidation of intercritically annealed CMnAl TRIP steels in a Continuous Galvanizing Line (GCL) were studied by cross-sectional observation of the surface and sub-surface regions by means of High Resolution Transmission Electron Microscopy (HR-TEM). The selective oxidation and nitriding of an intercritically annealed CMnAl TRIP steel in a controlled dew point 10%$H_2+N_2$ atmosphere resulted in the formation of c-xMnO.$MnO_2$ (1${\leq}$x<3) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) particles on the steel surface. Single crystal c-xMnO.$SiO_2$ ($2{\leq}x{\leq}4$) oxide particles were also observed on the surface. A thin film of crystalline c-xMnO.$SiO_2$ (2${\leq}$x<3) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) was present between these particles. In the sub-surface region, internal oxidation, nitriding and intermetallic compound formation were observed. In the first region, large crystalline c-xMnO.$SiO_2$ ($1{\geq}x{\geq}2$) and c-xMnO.$Al_2O_3$ ($x{\geq}1$) oxides particles were present. In the second region, c-AlN particles were observed, and in a third region, small $MnAl_x$ (x>1) intermetallic compound particles were observed.

금속 갈륨과 암모니아의 직접반응에 의한 GaN 후막성장과 특성 연구 (The Growth and Characterization of GaN Films by Direct reaction of Ga and $NH_3$)

  • 양승현;남기석;임기영;양영석
    • 한국재료학회지
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    • 제10권3호
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    • pp.241-245
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    • 2000
  • 고온에서 증발된 금속 갈륨 (Ga)을 암모니아 ($NH_3$) 기체와 직접 반응시켜 사파이어 (${\alpha}-Al_2O_3$) 기판 위에 GaN 후막을 성장하였다. 성장된 GaN는 주로 [0002] 방향으로 성장하였으나 낮은 성장온도에서는 [1011] 방향의 성장이 관찰되었으며 V-형태를 가진 매우 거친 표면을 보였다. 그러나 성장온도가 증가하면 [1010]와 [1011] 방향으로 성장이 관찰되었으며 피라미드면을 가진 육방정 결정이 성장되었다. 성장된 GaN의 두께는 온도가 증가할수록 증가하였으나, $1270^{\circ}C$의 고온에서는 열분해를 일으켜 두께가 감소하였다. 공급된 $NH_3$의 유량이 증가할수록 GaN의 결정성과 광특성은 향상되었다. X-선 회절기 (X-ray diffraction)와 광루미네센스(photoluminescence) 분석결과로 GaN 후막이 (1010) 면으로 성장되면 황색발광이 증가됨을 관찰할 수 있었다.

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Growth of O- and Zn-polar ZnO films by DC magnetron sputtering

  • Yoo, Jin-Yeop;Choi, Sung-Kuk;Jung, Soo-Hoon;Cho, Young-Ji;Lee, Sang-Tae;Kil, Gyung-Suk;Lee, Hyun-Jae;Yao, Takafumi;Chang, Ji-Ho
    • 한국결정성장학회지
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    • 제22권1호
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    • pp.1-4
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    • 2012
  • O- and Zn-polar ZnO films were grown by DC magnetron sputtering. Growth of high-quality, single-crystal ZnO thin films were confirmed by XRD and pole figure analysis. O-polar ZnO was grown on an $Al_2O_3$ substrate, which was confirmed by a slow growth rate (378 nm/hr), a fast etching rate (59 nm/min), and by the hillocks on the surface after etching. Zn-polar ZnO was grown on a GaN/$Al_2O_3$ substrate, which was confirmed by a fast growth rate (550 nm/hr), a slow etching rate (28 nm/min), and by pits on the surface after etching. Results from the present study show that it is possible to use DC-sputtering to grow ZnO film with the same polarity as other epitaxial growth methods.

다양한 기판위에 성장한 1차원 ZnO 나노막대의 특성평가 및 미세구조 분석 (Microstructural analysis and characterization of 1-D ZnO nanorods grown on various substrates)

  • 공보현;김동찬;조형균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.116-117
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    • 2006
  • I-D ZnO nanostructures were fabricated by thermal evaporation method on Si(100), GaN and $Al_2O_3$ substrates without a catalyst at the reaction temperature of $700^{\circ}C$. Only pure Zn powder was used as a source material and Ar was used as a carrier gas. The shape and growth direction of synthesized ZnO nanostructures is determined by the crystal structure and the lattice mismatch between ZnO and substrates. The ZnO nanostructure on Si substrate were inclined regardless of their substrate orientation. The origin of ZnO/Si interface is highly lattice-mismatched and the surface of the Si substrate inevitably has the $SiO_2$ layer. The ZnO nanostructure on the $Al_2O_3$ substrate was synthesized into the rod shape and grown into particular direction. For the GaN substrate, however, ZnO nanostructure with the honeycomb-like shape was vertically grown, owing to the similar lattice parameter with GaN substrate.

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폴리머 매트릭스를 전구체로 사용한 SrAl2O4:Eu2+,Dy3+ 축광성 형광체의 합성 및 형광 특성 (Synthesis and Photo Luminescent Characteristics of SrAl2O4:Eu2+,Dy3+ Phosphor using Polymer Matrix)

  • 김수종;권혁실
    • 한국전기전자재료학회논문지
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    • 제20권8호
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    • pp.671-679
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    • 2007
  • [ $SrAl_2O_4:Eu^{2+},\;Dy^{3+}$ ] phosphor was synthesized using the impregnation method, and its photoluminescence and long-afterglow properties were investigated, A mixture of $Sr(NO_3)_2,\;Al(NO_3)_2\;9H_2O,\;EuCl_3\;6H_2O,\;DyCl_3\;6H_2O,\;NdCl_3\;6H_2O$ salts were dissolved in distilled water and impregnating into the polymer precursor. After drying, the impregnated mixture was heat treated at $900-1400^{\circ}C$ for 2h in a $N_2-H_2$ reduction atmosphere. The microstructure and crystal structure of the $SrAl_2O_4:Eu^{2+},\;Dy^{3+}$ powders were examined by scanning electron microscopy and X-ray diffraction, respectively. The photoluminescence spectra showed an excitation band along over wide wavelength of 250-450nm, and a broaden emission with a maxima peak at 360nm. In addition, the spectra also showed a good long after glow that decayed over a 1000sec period after 10 min excitation illumination.

Realization and Analysis of p-Type ZnO:Al Thin Film by RF Magnetron Sputtering

  • Jin, Hu-Jie;Jeong, Yun-Hwan;Park, Choon-Bae
    • Transactions on Electrical and Electronic Materials
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    • 제9권2호
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    • pp.67-72
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    • 2008
  • Al-doped p-type ZnO thin films were fabricated by RF magnetron sputtering on n-Si (100) and homo-buffer layers in pure oxygen ambient. ZnO ceramic mixed with 2 wt% $Al_2O_3$ was selected as a sputtering target. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are arranged from $1.66{\times}10^{16}$ to $4.04{\times}10^{18}\;cm^{-2}$, mobilities from 0.194 to $198\;cm^2V{-1}s^{-1}$ and resistivities from 0.0963 to $18.4\;{\Omega}cm$. FESEM cross section images of different parts of a p-type ZnO:Al thin film annealed at $800^{\circ}C$ show a compact structure. Measurement for same sample shows that density is $5.40\;cm^{-3}$ which is smaller than theoretically calculated value of $5.67\;cm^{-3}$. Photoluminescence (PL) spectra at 10 K show a shoulder peak of p-type ZnO film at about 3.117 eV which is ascribed to electron transition from donor level to acceptor level (DAP).

화학적-기계적 혼성공정에 의한 초미세 Fe-6Al-9Si 합금분말의 합성 (Synthesis of Extremely Fine Fe-6Al-9Si Alloy Powders by Chemical-Mechanical Hybrid Process)

  • 윤종운;이기선
    • 한국재료학회지
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    • 제15권3호
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    • pp.166-171
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    • 2005
  • Fe-6Al-9Si(N) alloy powders were synthesized by hybrid process of chemical nitrification and mechanical milling. The nitriding treatment on Fe-6Al-9Si alloy powders formed $\gamma'-Fe_4N$ phase on the powders surface. The nitriding-treated powders were pulverized by horizontal high-energy ball milling machine. The longer ball milling time tended to reduce the size of alloy powders. In ball milling for 36h, extremely fine powders with about $7\~9wt\%$ nitrogen were obtained. Through X-ray diffraction analysis on the powders, it was found out that the longer milling time caused a disappearance of the crystallinity of $\alpha-Fe$ in the powders. TEM study confirmed that the powders is comprised of a few tens nano-meter sized crystals, including $\alpha-Fe$ phase with partially $\gamma'-Fe_4N$ phase. Hysteresis curves of the synthesized powders measured by VSM revealed lower saturation magnetization and higher coercivity, which seemed to be attributed to nitrogen-impregnation and severe residual stress developed during the high energy milling. Microstructure observation on the powder annealed at 873 K for 1 h showed 10 to 20 nm sized $\alpha-Fe$ crystal. Such a enhanced crystallinity significantly increased the magnetization and decreased the coercivity, which was attributed to not only the crystallinity but also residual stress relaxation.

Liquid-Phase Sintered SiC Ceramics with Oxynitride Additives

  • Rixecker, G.;Biswas, K.;Wiedmann, I.;Sldinger, F.
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 2000년도 Proceedings of 2000 International Nano Crystals/Ceramics Forum and International Symposium on Intermaterials
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    • pp.1-33
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    • 2000
  • Silicon carbide ceramics with sintering additives from the system AlN-Y$_2$O$_3$ can be gas-pressure sintered to theoretical density. While commonly a combination of sesquioxides is used such as Al$_2$O$_3$-Y$_2$O$_3$, the oxynitrid additives offer the advantage that only a nitrogen atmosphere is require instead of a powder. By starting form a mixture of ${\beta}$-SiC and ${\alpha}$-SiC, and by performing dedicated heat treatments after densification, anisotropic grain growth is obtained which leads to a platelet microstructure showing enhance fracture toughness. In the present work, recent improvement of the mechanical behaviour of these materials at ambient and high temperatures is reported. By means of a surface oxidation treatment in air it is possible to obtain four-point bending strengths in excess of 1 GPa, and the strength retention at high temperatures is significantly improved.

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새로운 HVT 성장방법을 이용한 CIGS 결정성장 (New fabrication of CIGS crystals growth by a HVT method)

  • 이강석;전헌수;이아름;정세교;배선민;조동완;옥진은;김경화;양민;이삼녕;안형수;배종성;하홍주
    • 한국결정성장학회지
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    • 제20권3호
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    • pp.107-112
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    • 2010
  • 높은 광흡수 계수를$(1{\times}10^5cm^{-1})$ 가지는 CIGS는 Ga의 비율에 따라서 밴드갭을 조절할 수 있다는 장점을 지니고 있다. CIGS의 밴드갭은 Ga의 비율에 따라 $CuInSe_2$(Eg: 1.0 eV)에서 $CuGaSe_2$(Eg: 1.68 eV)까지의 범위에 존재하며, 태양전지에 서 이상적인 fill factor 모양을 가지도록 Ga의 비율을 높게 조성한다. CIGS 흡수층을 제작하는 방법에는 co-evaporator 방식이 가장 널리 사용되며 연구되고 있다. 이에 본 연구에서는 수평 형태의 hydride vapor transport (HVT)법을 고안하여 CIGS 나노 구조 및 에피성장을 시도하였다. HVT법은 $N_2$ 분위기에서 원료부의 CIGS 혼합물을 HCl과 반응시켜 염화물 기체상태로 변환 후 growth zone까지 이동하여 성장을 하는 방식이다. 성장기판은 c-$Al_2O_3$ 기판과 u-GaN을 사용하였다. 성장 후 field emission scanning electron microscopy(FE-SEM)과 energy dispersive spectrometer(EDS)를 이용하여 관찰하였다.