• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.182.1-182.1
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• 2016

전자빔의 운동에너지를 변화시켜 전자기장을 발생시키는 진공튜브 장치는 기본적으로 전자빔 발생부인 전자총을 핵심 구성부로 사용한다. 이러한 전자총을 이용하는 진공튜브로는 핵융합을 위해 플라즈마 가열용의 RF를 발생시키는 자이로트론 튜브와 방사광 가속기에서 전자를 가속시키는데 이용되는 클라이스트론 튜브 등이 있으며, 군사적으로는 레이더를 비롯하여 유도미상일에 들어가는 탐색기, 전투기에서 사용되는 송수신용 마이크로파 발생장치 등의 핵심부품인 진행파관 진공튜브 등이 있다. 이러한 응용분야에서는 기본적으로 고출력의 전자파를 필요로 하기 때문에 반도체를 이용한 장치로는 그 성능을 구현할 수 없다. 따라서 열음극을 사용하는 전자총을 기반으로 한 다양한 형태의 진공튜브 장치가 주로 이용되고 있다. 현재 고출력 마이크로파 진공튜브용 열음극 전자총은 대부분 외국에서 수입하고 있는데 그 이유는 전자총의 핵심 부품인 열음극 캐소드를 국내에서 개발하지 못하였기 때문이다. 하지만 본 연구에서는 텅스텐 기반의 함침형 열음극 캐소드를 국내에서 자체 개발하는데 성공하였다. 전통적으로 미국에서 개발해온 함침형 열음극 캐소드는 텅스텐 소결체에 기공을 학보하고 여기에 Ba을 중심으로 한 알칼리성 물질들을 일정비율로 혼합하여 함침한 것으로 일함수 2.1~2.3 eV 수준의 물성을 갖는다. 이에 따라 방출할 수 있는 전류의 양은 운용 온도 $1000^{\circ}C$ 정도에서 전류밀도로 대략 수 $A/cm^2$ 수준이다. 본 연구에서 개발한 캐소드는 S-type으로 알려진 것으로 BaO : CaO : $Al_2O_3$ = 4 : 1 : 1 비율로 함침되었다. 고진공장치에서 전류측정 결과 $1040^{\circ}C$에서 $10.6A/cm^2$의 전류밀도를 기록하였으며 이에 대하여 Richardson-Dushman equation으로 계산하였을 때, 약 1.9 eV의 일함수를 갖는 것을 알 수 있었다. 이는 현재 많은 응용분야에서 사용하고 있으며 함침형 캐소드에 Os이나 Ir 등의 물질을 코팅하여 일함수를 낮추고 전류밀도를 향상시킨 M-type 캐소드의 결과와 유사한 수준이다.

• 한국신재생에너지학회:학술대회논문집
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• 2006.11a
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• pp.467-470
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• 2006

For a mobile application such as cellular phone, micro fuel cells should be extremely compact and thin. RHFC can be an alternative solution because RHFC gives higher power density than DMFC and does not need ahydrogen storage vessel In this paper, RHFC using methanol fuel is made as a novel planar design without a PROX. Both reformer and cell are made closely in a same plate to share the heater of reformer with the cell. The PBI membrane is used in the cell. The reason is that high temperature of reformer can cause a performance drop when perfluorosulfonic acid membrane such as Nafion is used such a high temperature operation also guarantees the higher CO tolerance to MEA catalyst. The cell is designed as an air-breathing type which the cathode of the cell is opened to the air. The commercial Cu/ZnO/Al2O3 steam reformer catalyst is packed in reformer channel. The active area of MEA is $11.9cm^2$ and the peak power density was $27.5mW/cm^2$.

• Journal of the Korean Chemical Society
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• v.38 no.1
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• pp.34-40
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• 1994

First observation of uranium using a diode laser was published recently. The experiment was performed by the optogalvanic spectroscopy using diode lasers. A laser source causes the current change in a hollow cathode discharge lamp when metal atoms in plasma absorb the diode laser light. The optogalvanic signal is collected by detecting the current change. This work is the extended investigation of our previous research, the uranium detection using a diode laser. New electronic transitions of uranium and thorium in 775∼850 nm were investigated using diode lasers. In addition, the Rb(Ⅰ) optogalvanic spectra at 780.02 nm and 794.76 nm were studied. The Rb(Ⅰ) spectrum at 780.02 nm showed the isotopic features and hyperfine splittings. This work provides a key idea that the diode lasers are useful in the specrochemical analysis of the radioactive actinides that have a rich spectrum with transitions which can be easily reached with AlGaAs diode lasers. Also, this study shows that the diode lasers can be an important tool to find the spectroscopic parameters of actinides and rare earth elements which have not known.

• Journal of the Korean Ceramic Society
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• v.42 no.2 s.273
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• pp.117-122
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• 2005

Electron Beam Physical Vapor Deposition (EB-PVD) is a typical technology for thermal barrier coating with Yttria Stabilized Zirconia (YSZ) on aero gas turbine engine. In this study EB-PVD method was used to fabricate dense YSZ film on NiO-YSZ as a electrolyte of Solid Oxide Fuel Cell (SOFC). Dense YSZ films of -10 $\mu$m thickness showed nano surface structure depending on deposition temperature. Electrical conductivities of YSZ film and electric power density of the single cell were evaluated after screen- printing $LaSrCoO_3$ as a cathode.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.61 no.11
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• pp.1646-1649
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• 2012

The $O_2$ annealing technique has considerably suppressed the leakage current of GaN power devices, but this forms NiO at Ni-based Schottky contact with increasing on-resistance. The purpose of the present study was to fabricate 1.5 kV GaN Schottky barrier diodes by improving $O_2$-annealing process and GaN buffer. The proposed $O_2$ annealing performed after alloying ohmic contacts in order to avoid NiO construction. The ohmic contact resistance ($R_C$) was degraded from 0.43 to $3.42{\Omega}-mm$ after $O_2$ annealing at $800^{\circ}C$. We can decrease RC by lowering temperature of $O_2$ annealing. The isolation resistance of test structure which indicated the surface and buffer leakage current was significantly increased from $2.43{\times}10^7$ to $1.32{\times}10^{13}{\Omega}$ due to $O_2$ annealing. The improvement of isolation resistance can be caused by formation of group-III oxides on the surface. The leakage current of GaN Schottky barrier diode was also suppressed from $2.38{\times}10^{-5}$ to $1.68{\times}10^{-7}$ A/mm at -100 V by $O_2$ annealing. The GaN Schottky barrier diodes achieved the high breakdown voltage of 700, 1400, and 1530 V at the anode-cathode distance of 5, 10, and $20{\mu}m$, respectively. The optimized $O_2$ annealing and $4{\mu}m$-thick C-doped GaN buffer obtained the high breakdown voltage at short drift length. The proposed $O_2$ annealing is suitable for next-generation GaN power switches due to the simple process and the low the leakage current.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2017.05a
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• pp.149-149
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• 2017

Aluminum alloys have poor corrosion resistance compared to the pure aluminum due to the additive elements. Thus, anodizing technology artificially generating thick oxide films are widely applied nowadays in order to improve corrosion resistance. Anodizing is one of the surface modification techniques, which is commercially applicable to a large surface at a low price. However, most studies up to now have focused on its commercialization with hardly any research on the assessment and improvement of the physical characteristics of the anodized films. Therefore, this study aims to select the optimum temperature of sulfuric electrolyte to perform excellent corrosion resistance in the harsh marine environment through electrochemical experiment in the seawater upon generating porous films by variating the temperatures of sulfuric electrolyte. To fabricate uniform porous film of 5083 aluminum alloy, we conducted electro-polishing under the 25 V at $5^{\circ}C$ condition for three minutes using mixed solution of ethanol (95 %) and perchloric (70 %) acid with volume ratio of 4:1. Afterward, the first step surface modification was performed using sulfuric acid as an electrolyte where the electrolyte concentration was maintained at 10 vol.% by using a jacketed beaker. For anode, 5083 aluminum alloy with thickness of 5 mm and size of $2cm{\times}2cm$ was used, while platinum electrode was used for cathode. The distance between the two was maintained at 3 cm. Anodic polarization test was performed at scan rate of 2 mV/s up to +3.0 V vs open circuit potential in natural seawater. Surface morphology was compared using 3D analysis microscope to observe the damage behavior. As a result, the case of surface modification showed a significantly lower corrosion current density than that without modification, indicating excellent corrosion resistance.

• Korean Journal of Materials Research
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• v.18 no.4
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• pp.199-203
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• 2008

High-efficiency phosphorescent organic light emitting diodes using TCTA-TAZ as a double host and $Ir(ppy)_3$ as a dopant were fabricated and their electro-luminescence properties were evaluated. The fabricated devices have the multi-layered organic structure of 2-TNATA/NPB/(TCTA-TAZ) : $Ir(ppy)_3$/BCP/SFC137 between an anode of ITO and a cathode of LiF/AL. In the device structure, 2-TNATA[4,4',4"-tris(2-naphthylphenyl-phenylamino)-triphenylamine] and NPB[N,N'-bis(1-naphthyl)-N,N'-diphenyl-1,1'-biphenyl-4,4'-diamine] were used as a hole injection layer and a hole transport layer, respectively. BCP [2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline] was introduced as a hole blocking layer and an electron transport layer, respectively. TCTA [4,4',4"-tris(N-carbazolyl)-triphenylamine] and TAZ [3-phenyl-4-(1-naphthyl)-5-phenyl-1,2,4-triazole] were sequentially deposited, forming a double host doped with $Ir(ppy)_3$ in the [TCTA-TAZ] : $Ir(ppy)_3$ region. Among devices with different thickness combinations of TCTA ($50\;{\AA}-200\;{\AA}$) and TAZ ($100\;{\AA}-250\;{\AA}$) within the confines of the total host thickness of $300\;{\AA}$ and an $Ir(ppy)_3$-doping concentration of 7%, the best electroluminescence characteristics were obtained in a device with $100\;{\AA}$-think TCTA and $200\;{\AA}$-thick TAZ. The $Ir(ppy)_3$ concentration in the doping range of 4%-10% in devices with an emissive layer of [TCTA ($100\;{\AA}$)-TAZ ($200\;{\AA}$)] : $Ir(ppy)_3$ gave rise to little difference in the luminance and current efficiency.

• Journal of the Semiconductor & Display Technology
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• v.7 no.2
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• pp.49-53
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• 2008

The yellow base polymer light emitting diodes(PLEDs) with double emission and hole blocking layers were prepared to improve the light efficiency. ITO(indium tin oxide) and PEDOT : PSS[poly(3,4-ethylenedioxythiophene) : poly(styrene sulfolnate)] were used as cathode and hole transport materials. The PFO[poly(9,9-dioctylfluorene)] and MEH-PPV[poly(2-methoxy-5(2-ethylhe xoxy)-1,4-phenylenevinyle)] were used as the light emitting host and guest materials, respectively. TPBI[Tpbi1,3,5-tris(N-phenylbenzimidazol-2-yl)benzene] was used as hole blocking layer. To investigate the optimization of device structure, we prepared four kinds of PLED devices with different structures such as single emission layer(PFO : MEH-PPV), two double emission layer(PFO/PFO : MEH-PPV, PFO : MEH-PPV/PFO) and double emission layer with hole blocking layer(PFO/PFO : MEH-PPV/TPBI). The electrical and optical properties of prepared devices were compared. The prepared PLED showed yellow emission color with CIE color coordinates of x = 0.48, y = 0.48 at the applied voltage of 14V. The maximum luminance and current density were found to be about 3920 cd/$m^2$ and 130 mA/$cm^2$ at 14V, respectively for the PLED device with the structure of ITO/PEDOT : PSS/PFO/PFO : MEH-PPV/TPBI/LiF/Al.

• Journal of Korea Society of Waste Management
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• v.35 no.7
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• pp.653-659
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• 2018

In the industrial wastewater that occupies a large proportion of river pollution, the wastewater generated in textile, leather, and plating industries is hardly decomposable. Though dyeing wastewater has generally been treated using chemical and biological methods, its characteristics cause treatment efficiencies such as chemical oxygen demand (COD) and suspended solids (SS) to be reduced only in the activated sludge method. Currently, advanced oxidation technology for the treatment of dyeing wastewater is being developed worldwide. Electro-coagulation is highly adapted to industrial wastewater treatment because it has a high removal efficiency and a short processing time regardless of the biodegradable nature of the contaminant. In this study, the effects of the current density and the electrolyte condition on the COD removal efficiency in dyeing wastewater treatment by using electro-coagulation were tested with an aluminum anode and a stainless steel cathode. The results are as follows: (1) When the current density was adjusted to $20A/m^2$, $40A/m^2$, and $60A/m^2$ under the condition without electrolyte, the COD removal efficiency at 60 min was 62.3%, 72.3%, and 81.0%, respectively. (2) The removal efficiency with NaCl addition was 7.9% higher on average than that with non-addition at all current densities. (3) The removal efficiency with $Na_2SO_4$ addition was 4.7% higher on average than that with non-addition at all current densities.

• Journal of Electrochemical Science and Technology
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• v.14 no.2
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• pp.184-193
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• 2023

This study investigates the effects of a carbon fiber layer formed on the surface of an etched aluminum current collector on the electrochemical properties of the activated carbon electrodes for an electric double layer capacitor. A particle size analyzer, field-emission SEM, and nitrogen adsorption/desorption isotherm analyzer are employed to analyze the structure of the carbon fiber layer. The electric and electrochemical properties of the activated carbon electrodes using a carbon fiber layer are evaluated using an electrode resistance meter and a charge-discharge tester, respectively. To uniformly coat the surface with carbon fiber, we applied a planetary mill process, adjusted the particle size, and prepared the carbon paste by dispersing in a binder. Subsequently, the carbon paste was coated on the surface of the etched aluminum current collector to form the carbon under layer, after which an activated carbon slurry was coated to form the electrodes. Based on the results, the interface resistance of the EDLC cell made of the current collector with the carbon fiber layer was reduced compared to the cell using the pristine current collector. The interfacial resistance decreased from 0.0143 Ω·cm² to a maximum of 0.0077 Ω·cm². And degradation reactions of the activated carbon electrodes are suppressed in the 3.3 V floating test. We infer that it is because the improved electric network of the carbon fiber layer coated on the current collector surface enhanced the electron collection and interfacial diffusion while protecting the surface of the cathode etched aluminum; thereby suppressing the formation of Al-F compounds.