• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.653-656
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• 2005

This paper introduces design, fabrication and experiment process of a novel scanner for the high speed AFM(Atomic Force Microscope). A proper design modification is proposed through analyses on the dynamic characteristics of the existing linear motion stages using a dynamic analysis program, Recurdyn. Since the scanning speed of each direction is allowed to be different, the linear motion stage for the high-speed scanner of AFM can be so designed to have different resonance frequencies for the modes with one dominant displacement in the desired directions. One way to achieve this objective is to use one-direction flexure mechanism for each direction and to mount one stage for fast motion on the other stage for slow motion. This unsymmetrical configuration separates the frequencies of the two vibration modes with one dominant displacement in each desired direction, hence, the coupling between the motions in the two directions. In addition, a pair of actuators is used for each axis to decrease the cross talks in the two motions and gives a force large enough to actuate the slow motion stage, which carries the fast motion stage. After these design modifications, a novel scanner with scanning speed higher than 10 Hz can be achieved to realize undistorted images in the high speed AFM.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1778-1783
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• 2008

A compact and two-dimensional atomic force microscope (AFM) using an orthogonal sample scanner, a calibrated homodyne laser interferometer and a commercial AFM head was developed for use in the nanometrology field. The x and y position of the sample with respect to the tip are acquired by using the laser interferometer in the open-loop state, when each z data point of the AFM head is taken. The sample scanner which has a motion amplifying mechanism was designed to move a sample up to $100{\times}100{\mu}m^2$ in orthogonal way, which means less crosstalk between axes. Moreover, the rotational errors between axes are measured to ensure the accuracy of the calibrated AFM within the full scanning range. The conventional homodyne laser interferometer was used to measure the x and y displacements of the sample and compensated via an X-ray interferometer to reduce the nonlinearity of the optical interferometer. The repeatability of the calibrated AFM was measured to sub-nm within a few hundred nm scanning range.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.629-630
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• 2011

• Transactions of the Korean Society of Mechanical Engineers A
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• v.30 no.12 s.255
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• pp.1611-1617
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• 2006

A compact and two-dimensional atomic force microscope (AFM) using an orthogonal sample scanner, a calibrated homodyne laser interferometer and a commercial AFM head was developed for use in the nano-metrology field. The x and y position of the sample with respect to the tip are acquired by using the laser interferometer in the open-loop state, when each z data point of the AFM head is taken. The sample scanner which has a motion amplifying mechanism was designed to move a sample up to $100{\times}100{\mu}m^2$ in orthogonal way, which means less crosstalk between axes. Moreover, the rotational errors between axes are measured to ensure the accuracy of the calibrated AFM within the full scanning range. The conventional homodyne laser interferometer was used to measure the x and y displacements of the sample and compensated via an X-ray interferometer to reduce the nonlinearity of the optical interferometer. The repeatability of the calibrated AFM was measured to sub-nm within a few hundred nm scanning range.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.10a
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• pp.258-258
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• 2003

• Journal of the Korean Society for Precision Engineering
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• v.21 no.11
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• pp.75-82
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• 2004

A metrological atomic force microscope (M-AFM) was developed fur the length measurements of nanometer range, through the modification of a commercial AFM. To eliminate nonlinearity and crosstalk of the PZT tube scanner of the commercial AFM, a two-axis flexure hinge scanner employing built-in capacitive sensors is used for X-Y motion instead of PZT tube scanner. Then two-dimensional displacement of the scanner is measured using two-axis heterodyne laser interferometer to ensure the meter-traceability. Through the measurements of several specimens, we could verify the elimination of nonlinearity and crosstalk. The uncertainty of length measurements was estimated according to the Guide to the Expression of Uncertainty in Measurement. Among several sources of uncertainty, the primary one is the drift of laser interferometer output, which occurs mainly from the variation of refractive index of air and the thermal stability. The Abbe error, which is proportional to the measured length, is another primary uncertainty source coming from the parasitic motion of the scanner. The expanded uncertainty (k =2) of length measurements using the M-AFM is √(4.26)$^2$+(2.84${\times}$10$^{-4}$ ${\times}$L)$^2$(nm), where f is the measured length in nm. We also measured the pitch of one-dimensional grating and compared the results with those obtained by optical diffractometry. The relative difference between these results is less than 0.01 %.

• Transactions of the Korean Society for Noise and Vibration Engineering
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• v.15 no.11 s.104
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• pp.1295-1302
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• 2005

This paper shows experimental evaluation results of the nano-positioning planar scanner used in the scanning probe microscope. The planar scanner is composed of flexure guides, piezoelectric actuators and feedback sensors as like explained in detail in Ref. (5). First, the fabrication methods were explained. Second, as the static Properties of the Planar scanner. we evaluated the maximum travel range & crosstalk. Also, we presented the correcting method for crosstalk using electric circuits finally. as the dynamic properties of the planar scanner, we evaluated the first resonant frequency. Also, we presented the actual AFM(atomic force microscope) imaging results with up to 2Hz imaging scan rate. Experimental results show that properties of the proposed planar scanner are well enough to be used in SPM applications like AFM.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.6 s.183
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• pp.96-103
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• 2006

To establish of standard technique of nano-length measurement in 2D plane, new AFM system has been designed. In the long range (about several tens of ${\mu}m$), measurement uncertainty is dominantly affected by the Abbe error of XY scanning stage. No linear stage is perfectly straight; in other words, every scanning stage is subject to tilting, pitch and yaw motion. In this paper, an AFM system with minimum offset of XY sensing is designed. And XY scanning stage is designed to minimize rotation angle because Abbe errors occur through the multiply of offset and rotation angle. To minimize the rotation angle optimal design has performed by maximizing the stiffness ratio of motion direction to the parasitic motion direction of each stage. This paper describes the design scheme of full AFM system, especially about XY stage. Full range of fabricated XY scanner is $100{\mu}m\times100{\mu}m$. And tilting, pitch and yaw motion are measured by autocollimator to evaluate the performance of XY stage. As a result, XY scanner can have good performance. Using this AFM system, 3um pitch specimen was measured. The uncertainty of total system has been evaluated. X and Y direction performance is different. X-direction measuring performance is better. So to evaluate only ID pitch length, X-direction scanning is preferable. Its expanded uncertainty(k=2) is $\sqrt{(3.96)^2+(4.10\times10^{-5}{\times}p)^2}$ measured length in nm.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1438-1441
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• 2005

To establish of standard technique of nano-length measurement in 2D plane, new AFM system has been designed. In this system, measurement uncertainty is dominantly affected by the Abbe error of XY scanning stage. No linear stage is perfectly straight; in other words, every scanning stage is subject to tilting, pitch and yaw motion. In this paper, an AFM system with minimum offset of XY sensing is designed. And XY scanning stage is designed to minimize rotation angle because Abbe errors occur through the multiply of offset and rotation angle. To minimize the rotation angle optimal design has performed by maximizing the stiffness ratio of motion direction to the parasitic motion direction of each stage. This paper describes the design scheme of full AFM system, especially about XY stage. Full range of fabricated XY scanner is $100um\times{100um}$. And tilting, pitch and yaw motion are measured by autocollimator to evaluate the performance of XY stage. Using this AFM system, 3um pitch specimen was measured. As a result, the uncertainty of total system has been evaluated.

• Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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• 2005.11a
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• pp.879-882
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• 2005

This paper shows a method for design of the nano-positioning planar scanner used in the scanning probe microscope. The planar scanner is composed of flexure guides, piezoelectric actuators and feedback sensors. In the design of flexure guides, the Castigliano's theorem was used to find the stiffness of the guide. The motion amplifying mechanism was used in the piezoelectric actuator to achieve a large travel range. We found theoretically the travel range of the total system and verified using the commercial FEM(Finite element method) program. The maximum travel range of the planar scanner is above than 140 $\mu$m. The 3 axis positioning capability was verified by the mode analysis using the FEM program. Moreover, we presented the actual AFM(Atomic Force Microscope) imaging results with up to 2Hz imaging scan rate. Experimental results show that the properties of the proposed planar scanner is well enough to be used in SPM applications like AFM.