• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1778-1783
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• 2008

A compact and two-dimensional atomic force microscope (AFM) using an orthogonal sample scanner, a calibrated homodyne laser interferometer and a commercial AFM head was developed for use in the nanometrology field. The x and y position of the sample with respect to the tip are acquired by using the laser interferometer in the open-loop state, when each z data point of the AFM head is taken. The sample scanner which has a motion amplifying mechanism was designed to move a sample up to $100{\times}100{\mu}m^2$ in orthogonal way, which means less crosstalk between axes. Moreover, the rotational errors between axes are measured to ensure the accuracy of the calibrated AFM within the full scanning range. The conventional homodyne laser interferometer was used to measure the x and y displacements of the sample and compensated via an X-ray interferometer to reduce the nonlinearity of the optical interferometer. The repeatability of the calibrated AFM was measured to sub-nm within a few hundred nm scanning range.

• Bulletin of the Korean Chemical Society
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• 제28권1호
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• pp.85-88
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• 2007

Ab initio periodic Hartree-Fock calculations with the full potential and minimum basis set are applied to interpretation of scanning tunneling microscope (STM) and atomic force microscope (AFM) images on 1TVTe2. Our results show that the simulated STM image shows asymmetry while the simulated AFM image shows the circular electron densities at the bright spots without asymmetry of electron density to agree with the experimental AFM image. The bright spots of both the STM and AFM images of VTe2 are associated with the surface Te atoms, while the patterns of bright spots of STM and AFM images are different.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.268-271
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• 2005

Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2000년도 추계학술대회논문집
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• pp.643-648
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• 2000

The AFM is an imaging tool or a profiler with unprecedented 3-D resolution for various surface types. The AFM technology, however, leaves a lot of room for improvement due to its delicate and fragile probing mechanism. The distance between probe tip and sample surface must be maintained in below the nano meter level in order to measure the sample surface in Angstrom resolution. In this paper, the mode analysis of AFM system, modification based on the mode analysis are performed and finally the sample surface is measured by the home-built AFM.

• Applied Microscopy
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• 제51권
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• pp.7.1-7.9
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• 2021

Neuromorphic systems require integrated structures with high-density memory and selector devices to avoid interference and recognition errors between neighboring memory cells. To improve the performance of a selector device, it is important to understand the characteristics of the switching process. As changes by switching cycle occur at local nanoscale areas, a high-resolution analysis method is needed to investigate this phenomenon. Atomic force microscopy (AFM) is used to analyze the local changes because it offers nanoscale detection with high-resolution capabilities. This review introduces various types of AFM such as conductive AFM (C-AFM), electrostatic force microscopy (EFM), and Kelvin probe force microscopy (KPFM) to study switching behaviors.

• 한국진공학회지
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• 제5권4호
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• pp.309-314
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• 1996

VLSI 공정에 평탄화를 위하여 사용되는 SOG과 AFM lithography에 resist 재료로서 이용되는 것이 확인되었다. 이에 기초하여, 본 연구는, SOG가 VLSI lithography 공정에 이용되기 위한 coating막 두께의 가변, 현상을 위한 etching time 및 etching selectivity의 가변, 패턴의 크기에 따르는 적정 공급전압을 선택 등으로 공정의 여유도를 크게 개선하였다. 공급전압 60V, FE 전류량 5nA로서 800$\AA$의 fine 패턴을 얻었다. 차세대 DRAM 제작공정 기술을 위한 AFM lithography에 있어서, SOG의 사용은 공정 여유도가 양호함에 의하여 크게 전망되는 기술이 될 것이다.

• 한국기계가공학회지
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• 제13권6호
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• pp.30-36
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• 2014

Many different cells types have been found to be highly sensitive to mechanical force imposed by their surroundings. The cellular response to external mechanical forces has very important effects on numerous biological phenomena. In spite of its importance in biological processes, the cell adhesion force remains difficult to measure quantitatively at the cellular level. In this paper, to enhance quantitative measurements of cell adhesive interactions, a new attaching system and a method in which a glass bead can be attached to an AFM cantilever was designed and fabricated, and the degree of range displacement was controlled in the system. In an experiment, the movement of the stage in the attaching system and the attaching process were measured. The effectiveness of this system was confirmed as well in the experiment. In addition, through a commercial AFM system, the spring constant of the modified AFM probe could be measured.

• 한국미생물·생명공학회지
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• 제24권5호
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• pp.630-635
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• 1996

For a survey of the occurrence of aflatoxin M$_{1}$ (AFM$_{1}$) in domestic cow's milk, we developed an enzyme-linked immunosorbent assay (ELISA) system, and quantitated the toxin in cow's milk. In order to produce specific antibodies AFM, conjugated to bovine serum albumin (AFM$_{1}$-BSA) and Freund's adjuvant were immunized subcutaneously to rabbits. By use of the antiserum showing the highest titer and AFB$_{1}$-HRP conjugate, we established a competitive direct ELISA (cdELISA) for AFM$_{1}$, whose detection limit was 0.003 ppb. The cross-reactivities of the antiserum against aflatoxin M$_{1}$ M$_{2}$, B$_{1}$, B$_{2}$, G$_{1}$, G$_{2}$, B$_{2a}$, and G$_{2a}$, were 100, 29.9, 25.0, 2.7, 13.0, 0.65, 0, and 0%, respectively. When the cdELISA was applied to the cow's milk spiked with AFM$_{1}$ and followed by cleanup with C$_{18}$ cartridge, the mean recovery of the assay was 104% (mean of CV, 6.4%) in the final concentration of 0.01-1 ppb (10-1, 000 ppt). When cow's milk samples gathered from markets and farms were assayed by the cdELISA, the mean concentration and SD of AFM$_{1}$ was 80.4 $\pm$ 55.0 ppt (n=64; range, 5.6-280 ppt).

• Transactions on Electrical and Electronic Materials
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• 제13권1호
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• pp.35-38
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• 2012

In this study, we have attempted to characterize the photovoltaic effect in real-time measurement of photoinduced current in a poly-Si-based solar cell using photoconductive atomic force microscopy (PC-AFM). However, the high contact resistance that originates from the metal-semiconductor Schottky contact disturbs the current flow and makes it difficult to measure the photoinduced current. To solve this problem, a thin metallic film has been coated on the surface of the device, which successfully decreases the contact resistance. In the PC-AFM analysis, we used a metal-coated conducting cantilever tip as the top electrode of the solar cell and light from a halogen lamp was irradiated on the PC-AFM scanning region. As the light intensity becomes stronger, the current value increases up to $200{\mu}A$ at 80 W, as more electrons and hole carriers are generated because of the photovoltaic effect. The ratio of the conducting area at different conditions was calculated, and it showed a behavior similar to that generated by a photoinduced current. On analyzing the PC-AFM measurement results, we have verified the correlation between the light intensity and photoinduced current of the poly-Si-based solar cell in nanometer scale.

• 한국정밀공학회지
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• 제23권6호
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• pp.96-103
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• 2006

To establish of standard technique of nano-length measurement in 2D plane, new AFM system has been designed. In the long range (about several tens of ${\mu}m$), measurement uncertainty is dominantly affected by the Abbe error of XY scanning stage. No linear stage is perfectly straight; in other words, every scanning stage is subject to tilting, pitch and yaw motion. In this paper, an AFM system with minimum offset of XY sensing is designed. And XY scanning stage is designed to minimize rotation angle because Abbe errors occur through the multiply of offset and rotation angle. To minimize the rotation angle optimal design has performed by maximizing the stiffness ratio of motion direction to the parasitic motion direction of each stage. This paper describes the design scheme of full AFM system, especially about XY stage. Full range of fabricated XY scanner is $100{\mu}m\times100{\mu}m$. And tilting, pitch and yaw motion are measured by autocollimator to evaluate the performance of XY stage. As a result, XY scanner can have good performance. Using this AFM system, 3um pitch specimen was measured. The uncertainty of total system has been evaluated. X and Y direction performance is different. X-direction measuring performance is better. So to evaluate only ID pitch length, X-direction scanning is preferable. Its expanded uncertainty(k=2) is $\sqrt{(3.96)^2+(4.10\times10^{-5}{\times}p)^2}$ measured length in nm.