• 제목/요약/키워드: 5 nm & 7 nm technology

검색결과 668건 처리시간 0.026초

65-nm CMOS 공정을 이용한 24 GHz 전력증폭기 설계 (Design of a 24 GHz Power Amplifier Using 65-nm CMOS Technology)

  • 서동인;김준성;;김병성
    • 한국전자파학회논문지
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    • 제27권10호
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    • pp.941-944
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    • 2016
  • 본 논문에서는 차량 충돌 방지 및 생활 감시용 근거리 레이다(Short Range Radar: SRR)를 위한 24 GHz 전력증폭기를 삼성 65-nm CMOS 공정을 이용하여 설계하였다. 제안한 회로는 2단 차동 전력증폭기로 공통소스 구조를 사용하고, 트랜스포머 구조를 사용하여 단일 대 차동변환, 임피던스 정합, 전력결합을 하였다. 측정결과, 24 GHz에서 15.5 dB의 최대 이득과 3.6 GHz의 3 dB 대역폭을 얻었다. 측정된 최대 출력 전력은 13.1 dBm, 입력 $P1_{dB}$는 -4.72 dBm, 출력 $P1_{dB}$는 9.78 dBm이며, 측정된 최대 전력 효율은 17.7 %이다. 본 전력증폭기는 1.2 V의 공급전원으로부터 74 mW의 DC 전력을 소모한다.

형광분광법을 이용한 수용액 중의 carbaryl의 정량 (Determination of carbaryl in aqueous solution by fluorescence spectrometry)

  • 김욱현;이상학
    • 분석과학
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    • 제22권4호
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    • pp.307-312
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    • 2009
  • 수용액 중의 carbaryl을 형광분광법을 이용하여 정량하기 위한 분석방법에 대하여 연구하였다. 분석의 최적 조건을 구하기 위해서 들뜸 파장, 계면활성제의 농도, 보조계면활성제인 ethanol의 농도 및 방출 파장의 방출 세기에 대한 영향을 조사하였다. Carbaryl 용액에 계면활성제인 sodium dodecyl sulfate (SDS)을 첨가하였을 때 방출세기가 조금 증가하였으며 보조계면활성제인 ethanol을 첨가하였을 때 방출 세기가 현저히 증가함을 관찰하였다. 최적 분석 조건의 들뜸 파장, 계면활성제의 농도, 보조계면활성제인 ethanol의 농도 및 방출 파장은 각각 281 nm, $1.0{\times}10^{-2}mol/L$, 20% (v/v), 349 nm 이었다. 최적 분석조건에서 carbaryl의 검정곡선의 감응범위와 검출한계($3{\sigma}$)는 각각 $5{\times}10^{-7}$에서 $1.0{\times}10^{-4}mol/L$$1.1{\times}10^{-8}mol/L$이었다. 검정곡선에서 직선성이 성립하는 농도 범위에서 상관계수(S/N=3)는 0.9996이었다.

Structural and electrical properties of (Ba0.7Sr0.3)TiO3 thin films for the application of electro-caloric devices

  • Kwon, Min-Su;Lee, Sung-Gap;Kim, Kyeong-Min;Choi, Seungkeun
    • Journal of Ceramic Processing Research
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    • 제20권4호
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    • pp.395-400
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    • 2019
  • This study was conducted on the structural and electrical properties of (Ba0.7Sr0.3)TiO3 thin films prepared by the sol-gel and spin-coating methods in order to investigate their applicability to electrocaloric devices. All specimens showed a tetragonal crystal structure and lattice constants of a = 3.972 Å, c = 3.970 Å. The mean grain size of specimens sintered at 800 ℃ was about 30 nm, and the average thickness of 5 times coated specimens was 304~311 nm. In the specimen sintered at 750 ℃, The relative dielectric constant and loss of specimens measured at 20 ℃ were 230 and 0.130, respectively, while dependence of the dielectric constant on unit DC voltage was -8.163 %/V. The remanent polarization and coercive fields were 95.5 μC/㎠ and 161.3 kV/cm at 21 ℃, respectively. And, the highest electrocaloric property of 2.69 ℃ was observed when the electric field of 330 kV/cm was applied.

$TiO_2$ sol-gel 합성에 의한 아라미드 섬유의 내광성 증진 (Improving the photo-stability of ${\rho}$-aramid fiber by $TiO_2$ nanoparticle)

  • 심지현;박성민;김명순;권일준;권서윤;이승구
    • 한국염색가공학회:학술대회논문집
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    • 한국염색가공학회 2012년도 제46차 학술발표회
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    • pp.109-109
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    • 2012
  • 아라미드 섬유는 태양광의 직사광선에 계속 노출될 경우 120주 경과 후에는 강도가 3분의 1로 떨어지는 단점이 있다. 이와 같은 단점을 보완하기 위해 나노 크기의 금속산화물인 $TiO_2$ 졸-겔 나노합성법을 이용하여 나노졸을 제조하고 이를 직물에 함침하는 공정을 통하여 아라미드 섬유의 내광성 증진에 대해 연구하였다. TTIP, TEOS 등의 금속전구체를 이용하여 구형의 나노졸 합성에 의한 $TiO_2$ 나노졸을 수분산형태의 졸로서 섬유가공 공정상에 접목하였다. 제조된 나노크기의 $TiO_2$ 입자분포와 크기, 미세구조 및 결정상을 알아보기 위해 입도분포분석기, TEM, XRD를 이용하였다. $TiO_2$ 나노졸을 함침한 아라미드 직물은 내광성은 24, 48, 96시간 동안 Xenon-arc 광조사한 후, 물성변화를 분석하였다. 나노졸 합성시 반응물의 농도 및 용액의 pH 조건에 따른 나노졸의 미세구조를 TEM을 이용하여 관찰한 결과, 반응물의 농도에 따라 평균입도는 313.7nm, 500.5nm, 840.3nm, 1002nm로 커졌다. 하지만, 반응물의 농도가 증가할수록 시간이 지남에 따라 입자들이 층 분리 현상이 관찰되었으며, 단분산된 나노졸 입자를 제조하기 위해서는 TTIP의 투입량을 0.67mole(200ml)로 유지하였다. 또한 이를 아라미드 직물에 함침하여 광조사 시간에 따른 아라미드 섬유의 물리적 특성의 변화를 분석하였다.

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반응 용기법을 이용한 InP/ZnS 양자점 합성과정에서 InP 코어의 성장기구 (Growth mechanism of InP and InP/ZnS synthesis using colloidal synthesis)

  • 서한욱;정다운;이빈;현승균;김범성
    • 한국분말재료학회지
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    • 제24권1호
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    • pp.6-10
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    • 2017
  • This study investigates the main growth mechanism of InP during InP/ZnS reaction of quantum dots (QDs). The size of the InP core, considering a synthesis time of 1-30 min, increased from the initial 2.56 nm to 3.97 nm. As a result of applying the proposed particle growth model, the migration mechanism, with time index 7, was found to be the main reaction. In addition, after the removal of unreacted In and P precursors from bath, further InP growth (of up to 4.19 nm (5%)), was observed when ZnS was added. The full width at half maximum (FWHM) of the synthesized InP/ZnS quantum dots was found to be relatively uniform, measuring about 59 nm. However, kinetic growth mechanism provides limited information for InP / ZnS core shell QDs, because the surface state of InP changes with reaction time. Further study is necessary, in order to clearly determine the kinetic growth mechanism of InP / ZnS core shell QDs.

Adjunctive effect of 470-nm and 630-nm light-emitting diode irradiation in experimental periodontitis treatment: a preclinical study

  • Dongseob Lee;Jungwon Lee;Sun-Hee Ahn;Woosub Song;Ling Li;Yang-Jo Seol;Yong-Moo Lee;Ki-Tae Koo
    • Journal of Periodontal and Implant Science
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    • 제54권1호
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    • pp.13-24
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    • 2024
  • Purpose: This study investigated the adjunctive effect of light-emitting diodes (LEDs) in the treatment of experimental periodontitis. Methods: Experimental periodontitis was induced by placing ligatures around the mandibular second, third, and fourth premolars of 6 beagles for 3 months. After ligature removal, periodontitis progressed spontaneously for 2 months. The animals' hemimandibles were allocated among the following 3 groups: 1) no treatment (control), 2) scaling and root planing (SRP), and 3) SRP with LED irradiation at 470-nm and 630-nm wavelengths (SRP/LED). The probing pocket depth (PPD) and gingival recession (GR) were measured at baseline, 6 weeks, and 12 weeks. The clinical attachment level (CAL) was calculated. After 12 weeks, histological and histomorphometric assessments were performed. The distances from the gingival margin to the apical extent of the junctional epithelium (E) and to the connective tissue (CT) attachment were measured, as was the total length of soft tissue (ST). Results: PPD and CAL increased at 12 weeks compared with baseline in the control group (6.31±0.43 mm to 6.93±0.50 mm, and 6.46±0.60 mm to 7.61±0.78 mm, respectively). PPD and CAL decreased at 12 weeks compared with baseline in the SRP group (6.01±0.59 to 4.81±0.65 mm, and 6.51±0.98 to 5.39±0.93 mm, respectively). PPD and CAL decreased at 12 weeks compared with baseline in the SRP/LED group (6.03±0.39 to 4.46±0.47 mm, and 6.11±0.47 to 4.78±0.57 mm, respectively). The E/ST and CT/ST ratios significantly differed among the 3 groups (P<0.05). The clinical parameters and histologic findings demonstrated that 470-nm and 630-nm wavelength LED irradiation accompanying SRP could improve treatment results. Conclusions: Within the study limitations, 470 nm and 630 nm wavelength LED irradiation might provide additional benefits for periodontitis treatment.

Formation of Sn-dispersed Si Nanoparticles by Co-grinding

  • Kim, Bong-Chull;Uono, Hiroyuki;Ue, Makoto;Senna, Mamoru
    • 한국세라믹학회지
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    • 제46권6호
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    • pp.545-547
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    • 2009
  • An immiscible Si/Sn (=7/3 by volume) powder mixture was subjected to simple grinding and subsequent leaching process to give Sn nanopowder reinforced or dispersed in Si powder. Crystallite and their agglomerates of Si were ca. 15 nm and 100 nm, respectively. Sn remained at 4.5 vol% in Si powder after aqueous HCl leaching, dispersively occluded in Si matrix as confirmed by ICP analysis and cross sectional TEM observation.

우렁쉥이 육으로부터 Carotenoprotein의 분리.정제 및 특성 (Purification and Characterization of Carotenoprotein from the Muscle of Ascidian, Halocynthia roretzi)

  • 강옥주;변희국;전유진;김종배;김세권
    • Applied Biological Chemistry
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    • 제41권1호
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    • pp.31-41
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    • 1998
  • 우렁쉥이의 육에 존재하는 carotenoprotein을 추출하여 이온교환수지 및 겔크로마토그래피를 이용하여 정제하였으며, 정제된 carotenoprotein의 분자량, pH 안정성, 열안정성, 변성제의 영향, 아미노산 조성 및 지방산 조성을 분석하였다. Carotenoprotein의 정제도는 5배, 수율은 2.9%였으며, 1 mg당 $0.15\;{\mu}g$ carotenoid가 함유되어 있었다. Carotenoprotein의 최대 흡수파장은 UV/Vis 스펙트럼에서 463 nm 및 439 nm였으며, 분자량은 64.4 kDa으로 단일 polypeptide로 이루어져 있었다. Carotenoprotein은 pH 7.0부근의 중성영역에서 안정하였고, 열안정성은$65^{\circ}C$에서 2시간 이내에 90%이상 유지하였으며, SDS 변성제에 의해 5 nm 단파장 영역으로 이동하였다. Carotenoprotein의 아미노산 조성은 Gly, hsn, Gln 및 Ser의 함량이 전체 아미노산의 35.3%로 전체적으로 산성의 성질을 보였으며, 구성지방산 조성의 함량은 monoene산이 45.2%로 가장 많았고, 다음으로 포화지방산 및 polyene산이 각각 38.1% 및 11.7%였다.

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Reinforcing Efficiencies of Two Different Cellulose Nanocrystals in Polyvinyl Alcohol-Based Nanocomposites

  • Park, Byung-Dae;Causin, Valerio
    • Current Research on Agriculture and Life Sciences
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    • 제31권4호
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    • pp.250-255
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    • 2013
  • As a renewable nanomaterial, cellulose nanocrystal (CNC) isolated from wood grants excellent mechanical properties in developing high performance nanocomposites. This study was undertaken to compare the reinforcing efficiency of two different CNCs, i.e., cellulose nanowhiskers (CNWs) and cellulose nanofibrils (CNFs) from hardwood bleached kraft pulp (HW-BKP) as reinforcing agent in polyvinyl alcohol (PVA)-based nanocomposite. The CNWs were isolated by sulfuric acid hydrolysis while the CNFs were isolated by 2,2,6,6-tetramethylpiperidine-1-oxyl radical (TEMPO)-mediated oxidation. Based on measurements using transmission electron microscopy, the individual CNWs were about $6.96{\pm}0.87nm$ wide and $178{\pm}55nm$ long, while CNFs were $7.07{\pm}0.99nm$ wide. The incorporation of CNWs and CNFs into the PVA matrix at 5% and 1% levels, respectively, resulted in the maximum tensile strength, indicating different efficiencies of these CNCs in the nanocomposites. Therefore, these results suggest a relationship between the reinforcing potential of CNCs and their physical characteristics, such as their morphology, dimensions, and aspect ratio.

A 32nm and 0.9V CMOS Phase-Locked Loop with Leakage Current and Power Supply Noise Compensation

  • Kim, Kyung-Ki;Kim, Yong-Bin
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제7권1호
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    • pp.11-19
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    • 2007
  • This paper presents two novel compensation circuits for leakage current and power supply noise (PSN) in phase locked loop (PLL) using a nanometer CMOS technology. The leakage compensation circuit reduces the leakage current of the charge pump circuit which becomes more serious problem due to the thin gate oxide and small threshold voltage in nanometer CMOS technology and the PSN compensation circuit decreases the effect of power supply variation on the output frequency of VCO. The PLL design is based on a 32nm predictive CMOS technology and uses a 0.9V power supply voltage. The simulation results show that the proposed PLL achieves a 88% jitter reduction at 440MHz output frequency compared to the PLL without leakage compensator and its output frequency drift is little to 20% power supply voltage variations. The PLL has an output frequency range of $40M{\sim}725MHz$ with a multiplication range of 11023, and the RMS and peak-to-peak jitter are 5ps and 42.7ps, respectively.