• Title/Summary/Keyword: 3,3-dimethyl-1-butene

Search Result 25, Processing Time 0.019 seconds

Mechanistic Studies on the Anormalous Photocycloaddition Reaction of 5-Styryl-1,3-dimethyluracil and 2,3-Dimethyl-2-butene: Formation of the “Apparent Forbidden” [$_\pi4_s + _\pi2_s$] Cycloadduct

  • Eun Ju Shin;Ho Kwon Kang;Sang Chul Shim
    • Bulletin of the Korean Chemical Society
    • /
    • v.12 no.4
    • /
    • pp.434-437
    • /
    • 1991
  • Irradiation of 5-styryl-1,3-dimethyluracil (5-SDU) with 2,3-dimethyl-2-butene (DMB) gives a [4+2] cycloadduct which is converted into a [2+2] cycloadduct on the prolonged irradiation. Triplet sensitization, quenching, and external heavy atom effect on the [4+2] photocycloaddition reaction demonstrate the singlet pathway and salt effect excludes a radical ion pair precursor possibility. Polar solvents increase the reaction efficiency implying a polar exciplex involvement in the [4+2] photocycloaddition reaction. Inverse temperature dependence both on the reaction and DMB fluorescence quenching of 5-SDU indicates the presence of a singlet exciplex intermediate.

Pulsed MOCVD of Cu Seed Layer Using a (hfac)Cu(3,3-dimethyl-1-butene) Source and H2 Reactant (수소 환원기체와 (hfac)Cu(3,3-dimethyl-1-butene) 증착원을 이용한 Pulsed MOCVD로 Cu seed layer 증착 특성에 미치는 영향에 관한 연구)

  • Park Jaebum;Lee Jinhyung;Lee Jaegab
    • Korean Journal of Materials Research
    • /
    • v.14 no.9
    • /
    • pp.619-626
    • /
    • 2004
  • Pulsed metalorganic chemical vapor deposition (MOCVD) of conformal copper seed layers, for the electrodeposition Cu films, has been achieved by an alternating supply of a Cu(I) source and $H_2$ reactant at the deposition temperatures from 50 to $100^{\circ}C$. The Cu thickness increased proportionally to the number of cycles, and the growth rate was in the range from 3.5 to $8.2{\AA}/cycle$, showing the ability to control the nano-scale thickness. As-deposited films show highly smooth surfaces even for films thicker than 100 nm. In addition about a $90\%$ step coverage was obtained inside trenches, with an aspect ratio greater than 30:1. $H_2$, introduced as a reactant gas, can play an active role in achieving highly conformal coating, with increased grain sizes.

Exploration of Essential Structure of Malloapelta B for the Inhibitory Activity Against TNF Induced $NF-{\kappa}B$ Activation

  • Luu, Chinh Van;Chau, Minh Van;Lee, Jung-Joon;Jung, Sang-Hun
    • Archives of Pharmacal Research
    • /
    • v.29 no.10
    • /
    • pp.840-844
    • /
    • 2006
  • For the exploration of pharmacophoric moiety of malloapelta B (1) possessing the inhibitory activity of $NF-{\kappa}B$ activation, structural variation of ${\alpha},{\beta}-unsaturated$ carbonyl motif was attempted. 1 was reduced by catalytic hydrogenation, sodium borohydride, and lithium aluminumhydride. Catalytic hydrogenation with 30 psi or 15 psi of $H_2$ gas of 1 generated 8-butyl-5,7-dimethoxy-2,2-dimethylchroman (2) and 1-(5,7-dimethoxy-2,2-dimethylchroman-8-yl)butan-1-one (3), respectively. Reduction with sodium borohydride occurred at the double bond of ${\alpha},{\beta}-unsaturated$ ketone of 1 to give 1-(5,7-dimethoxy-2,2-dimethyl-2H-chromen-8-yl)butan-1-one (4). Reduction of 1 with lithium aluminumhydride and then quenched with methanol and water produced unexpected products, 1-(5,7-dimethoxy-2,2-dimethyl-2H-chromen-8-yl)-3-methoxy-1-butene (5) and 1-(5,7-dimethoxy-2,2-dimethyl-2H-chromen-8-yl)-3-hydroxy-1-butene (6). These are formed from the isomerization of initial product 9 through the continuous conjugate carbocation intermediate 11. Addition of ethylmagnesium bromide and dimethyl malonate anion to 1 gave the conjugate adducts 7 and 8. Ethylmagesium bromide and sodium borohydride reduction unusually gave the conjugate addition due to steric congestion around carbonyl group of 1. Compound 2 exhibits the reduced inhibitory activity against $NF-{\kappa}B$ activation and the others do not show the activity. Therefore ${\alpha},{\beta}-unsaturated$ carbonyl group of 1 should be important for its inhibitory activity.

Effect of Neutral Ligand(L) on the Precursor Characteristics of (hfac)Cu(I)L and on Cu MOCVD Process (중성리간드(L)가 (hfac)Cu(I)L 전구체의 특성 및 구리 MOCVD 공정에 미치는 영향)

  • 최경근;김경원;이시우
    • Korean Journal of Materials Research
    • /
    • v.11 no.3
    • /
    • pp.184-184
    • /
    • 2001
  • The effect of neutral ligand(L) on the precursor characteristics of (hfac)Cu(I)-L and on Cu MOCVD Process was studied. The neutral ligands of (hac)Cu(I)-L$_{x}$, such as ATMS(allytrimethylsilane), VTMS(vinyltrimethylsilane), VCH(vinylcyclohexane), MP(4-methyl-1-pentene), ACP(allylcyclopentane), and DMB(3,3-dimethyl-1-butene) were investigated. When the dissociation temperature of Cu(I)-L bond is low, low temperature deposition below $100^{\circ}C$ is possible and the resistivity of the film is low. But thermal stability of the precursor is low in this case. The resistivity is almost the same regardless of L at the deposition temperature range of $125~175^{\circ}C$. The resistivity is increased as the molecular weight of L becomes higher above $225^{\circ}C$ The vapor pressure of the precursor was closely related to the boiling point of L, the lower the boiling point of L, the higher the vapor pressurere.

Effect of Neutral Ligand(L) on the Precursor Characteristics of (hfac)Cu(I)L and on Cu MOCVD Process (중성리간드(L)가 (hfac)Cu(I)L 전구체의 특성 및 구리 MOCVD 공정에 미치는 영향)

  • Choe, Gyeong-Geun;Kim, Gyeong-Won;Lee, Si-U
    • Korean Journal of Materials Research
    • /
    • v.11 no.3
    • /
    • pp.185-190
    • /
    • 2001
  • The effect of neutral ligand(L) on the precursor characteristics of (hfac)Cu(I)-L and on Cu MOCVD Process was studied. The neutral ligands of (hac)Cu(I)-L$_{x}$, such as ATMS(allytrimethylsilane), VTMS(vinyltrimethylsilane), VCH(vinylcyclohexane), MP(4-methyl-1-pentene), ACP(allylcyclopentane), and DMB(3,3-dimethyl-1-butene) were investigated. When the dissociation temperature of Cu(I)-L bond is low, low temperature deposition below $100^{\circ}C$ is possible and the resistivity of the film is low. But thermal stability of the precursor is low in this case. The resistivity is almost the same regardless of L at the deposition temperature range of $125~175^{\circ}C$. The resistivity is increased as the molecular weight of L becomes higher above $225^{\circ}C$ The vapor pressure of the precursor was closely related to the boiling point of L, the lower the boiling point of L, the higher the vapor pressurere.

  • PDF

Deposition of Amorphous Carbon Layer by PECVD (PECVD에 의한 비정질 탄소층 증착)

  • Bae, Geun-Hak;Kim, Gyeong-Su;No, Hyeong-Uk;Park, So-Yeon;Kim, Ho-Sik
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2007.04a
    • /
    • pp.84-85
    • /
    • 2007
  • 3,3-Dimethyl-1-butene (C6H12) monomer를 이용하여 RF power와 압력에 따라 막을 증착하였다. 증착된 비정질 탄소막은 power/pressure (W/Torr)가 증가할수록 Raman 스펙트럼에서 D peak가 증가하였고, ring 구조의 막을 형성하였다. 또한 ring 구조의 막이 형성됨으로써 hardness와 modulus는 각각 12 GPa과 85 GPa로 선형적으로 증가하는 것으로 나타났다.

  • PDF

Photochemistry of Conjugated Polyacetylenes. Photoreaction of 1,4-Diphenylbutadiyne with a Mixture of Olefins

  • Chang Beom Chung;Geon-Soo Kim;Jang Hyuk Kwon;Shim Sang Chul
    • Bulletin of the Korean Chemical Society
    • /
    • v.14 no.4
    • /
    • pp.506-510
    • /
    • 1993
  • Irradiation of 1,4-diphenylbutadiyne (DPB) with a mixture of electron-deficient and electron-rich olefins in deaerated tetrahydrofuran yields a 1 : 1 primary photoadduct between DPB and electron-deficient olefins. Irradiation of the primary photoadduct of DPB and dimethyl fumarate (DMFu) with various olefins such as DMFu, acrylonitrile (AN), and 2,3-dimethyl-2-butene (DMB) in deaerated tetrahydrofuran yields regiospecific 1 : 1 photoadducts. The electron-deficient olefins are more reactive than electron-rich olefins in the photoreaction which proceeds through excited triplet state.

Physicochemical and Functional Properties of Turnip (순무의 이화학적 및 기능적 특성)

  • 박용곤;김흥만;박미원;김성란;최인욱
    • Journal of the Korean Society of Food Science and Nutrition
    • /
    • v.28 no.2
    • /
    • pp.333-341
    • /
    • 1999
  • This study was conducted to investigate physicochemical and functional properties of turnip. The concentrations of antocyanin in the rind of root was 3.24mg%, which was about 3.5 times higher than those in the flesh. Among free amino acids in each part of turnip, glutamic acid showed the highest concentrations(132.5mg%) in the root followed by alanine(25.0mg%), valine (23.3mg%), and serine (20.7mg%). Contents of minerals in the root of turnip were 395.7mg% for potassium, 187mg% for calcium, 53.6mg% for phosphate, and 40.7mg% for magnesium. According to dynamic heasdspace analysis, dimethyl disulfide was the most abundant flavor components from the juice of fresh turnip and other volatile components such as dimethyl trisulfide, 1 hexanal, 2 methyl 1 butamine, and 1 penten 3 ol were also identified. From the blanched turnip, however, 3 isothiocyanato 1 propene and 4 isothiocyanato 1 butene were mainly detected. Fresh and blanched turnips were extracted with water or 70% acetone to investigate percent yield. The concentrations of total polyphenols in the extracts of fresh turnip were higher than those of blanched turnip. The nitrite scavenging effects of water and 70% acetone extracts from fresh or blanched turnip were decreased as pH was increased. Between two water extracts, the 30oC water extracts showed the higher values of electron donating ability than 95$^{\circ}C$ water extracts.

  • PDF

방사선 조사에 의한 김치의 휘발성 유기화합물의 변화 특성

  • 서혜영;김준형;송현파;박순연;김관수;최택열;손길선;변명우;김경수
    • Proceedings of the Korean Society of Postharvest Science and Technology of Agricultural Products Conference
    • /
    • 2003.10a
    • /
    • pp.149.2-149
    • /
    • 2003
  • 비조사 김치와 2.5, 5 및 10 kGy로 방사선 조사된 김치로부터 SDE 방법으로 추출한 휘발성 유기화합물을 분석하여 변화를 확인하였다. 김치의 주요 휘발성 유기화합물로 ethyl formate, ethyl acetate, ethanol, dimethyl disulfide, methyl 2-propenyl disulfide가 다량 함유되어 있었고, ethyl methyl disulfide, 4-cyano-1-butene, pentane dinitrile 등도 상당량 함유되어 있었다. Ethyl formate, ethyl acetate, ethanol은 조사선량이 증가함에 따라 상당량 증가하는 것으로 확인되었으며, dimethyl disulfide, ethyl methyl disulfide, methyl propyl disulfide, pentane dinitrile, S-methyl methyl thiosulfonate 등도 선량이 증가함에 따라 함량이 증가하였다. 1-Penten-3-ol은 조사선량에 따라 감소하였다.

  • PDF