• 분석과학
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• 제11권5호
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• pp.347-352
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• 1998

본 연구에서는 유리질 탄소 전극 표면에 혼성원자가를 가지는 무기 금속 고분자 막을 도포한 변형전극을 제조하고, 이들 변형전극의 전기화학적인 특성을 순환 전압 전류법으로 조사하였다. 그리고 이들 변형전극들을 작업전극으로 하여 메탄올과 L-ascorbic acid의 양극산화 거동을 조사하였다. Mixed valence rethenium oxo/cyanoruthenate(mv Ru-O/CN-Ru) 막, mv ruthenium oxo/cyanoferrate(mv Ru-O/$Fe(CN)_6$) 막, 및 mv ruthenium oxo/cyanoruthenate/Rhodium(mv Ru-O/CN-Ru/Rh) 막을 각각 도포하는 과정은 지정된 전위범위를 50 mV/sec의 주사속도로 전위를 걸어줌으로써 쉽게 도포할 수 있었으며, 동일한 과정을 반복 주사함으로써 막의 두께를 조절 하였다. 메탄올의 양극 산화거동을 조사한 결과는 다음과 같았다. mv Ru-O/CN-Ru 변형전극에서 메탄올의 검정곡선은 농도 기울기가 $-7.552{\mu}A/mM$로서 10 mM에서 80 mM 까지의 농도범위에서 비교적 좋은 감도를 보였다. mv Ru-O/$Fe(CN)_6$ 변형 전극의 경우에 농도 기울기는 $-5.13{\mu}A/mM$ 이었지만, 농도에 대한 전류관계의 직선 범위는 10 mM에서 100 mM까지로서 Ru 고분자 막 변형전극보다 더 넓은 범위에서 좋은 직선관계를 보였다. mv Ru-O/CN-Ru 막을 두 종류의 바탕전극에 각각 도포한 변형전극에 대하여 L-ascorbic acid의 양극 산화거동을 조사한 결과, 유리질 탄소 전극에 Ru 고분자 막을 입힌 변형전극이 Rh 막을 도포한 유리질 탄소전극에 Ru 고분자 막을 입힌 변형전극(mv Ru-O/CN-Ru/Rh)에서 보다 감도가 예민하였다. Ru 고분자 막 변형전극을 사용했을 경우에 검정곡선은 0.1 mM에서 5 mM 까지의 L-ascorbic acid 농도 범위에서 직선관계를 보였고, 기울기와 상관계수는 각각 $-84.78{\mu}A/mM$, 0.998이었다.

• Environmental Engineering Research
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• 제25권3호
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• pp.324-334
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• 2020

Tannery wastewater is known to contain high concentrations of organic compounds, pathogens, and other toxic inorganic elements such as heavy metals, nitrogen, sulfur, etc. Biological methods such as aerobic and anaerobic processes are unsuitable for tannery wastewater treatment due to its high salinity, and electrochemical oxidation offers a promising method to solve this problem. In this study, raw tannery wastewater treatment using DSA® Ti/RuO₂, Ti/IrO₂ and Ti/BDD electrodes with continuous flow systems was examined. Effects of current densities and electrolysis times were investigated, to evaluate the process performance and energy consumption. The results showed that a Ti/BDD electrode is able to reach higher treatment efficiency than Ti/IrO₂, and Ti/RuO₂ electrodes across all parameters, excluding Total Nitrogen. The main mechanism of tannery wastewater oxidation at a Ti/BDD electrode is based on direct oxidation on the electrode surface combined with the generation of oxidants such as °OH and Cl₂, while at DSA® Ti/RuO₂ and Ti/IrO₂ electrodes, the oxidation mechanisms are based on the generation of chlorine. After treatment, the effluents can be discharged to the environment after 6-12 h of electrolysis. Electrooxidation thus offers a promising method for removing the nutrients and non-biodegradable organic compounds in tannery wastewater.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.364-368
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• 1997

We have investigated Pt and RuO$_2$as a bottom electrode for a device application of PZT thin film. The bottom electrodes were prepared by using an RF magnetron sputtering method. We studied some of the property influencing factors such as substrate temperature, gas flow rate, and RF power. An oxygen partial pressure from 0 to 50% was investigated. The results show that only Ru metal was grown without supp1ying any O$_2$gas. Both Ru and RuO$_2$phases were formed for O$_2$partial pressure between 10∼40%. A Pure RuO$_2$ phase was obtained with O$_2$partial pressure of 50%. A substrate temperature from room temperature to 400$^{\circ}C$ was investigated with XRD for the film crystallinity examination. The substrate temperature influenced the surface morphology and the resistivity of Pt and RuO$_2$as well as the film crystal structure. From the various considerations, we recommend the substrate temperature of 300$^{\circ}C$ for the bottom electrode growth. Because PZT film growth on top of bottom electrode requires a temperature process higher than 500$^{\circ}C$, bottom electrode properties were investigated as a function of post anneal temperature. As post anneal temperature was increased, the resistivity of Pt and RuO$_2$was decreased. However, almost no change was observed in resistivity for an anneal temperature higher than 700$^{\circ}C$. From the studies on resistivity and surface morphology, we recommend a post anneal temperature less than 600$^{\circ}C$.

• Korean Chemical Engineering Research
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• 제47권1호
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• pp.11-16
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• 2009

단일벽 탄소나노튜브의 표면 위에 동력학적 전위법으로 산화루테늄($RuO_2$)의 석출 및 루테늄-코발트 혼합산화물(Ru-Co mixed oxide)의 공석출에 의해 산화환원 수퍼커페시터용 복합전극을 제조하였다. 루테늄 성분이 13.13 wt%, 코발트 성분이 2.89 wt%가 석출된 Ru-Co 혼합산화물 전극은 낮은 전위 스캔속도($10\;mV\;s^{-1}$)에서는 $RuO_2$ 전극과 유사한 비용량(${\sim}620\;F\;g^{-1}$)을 나타내지만, 높은 스캔속도($500\;mV\;s^{-1}$)에서는 $RuO_2$ 전극보다 큰 비용량을 보인다. 높은 스캔 속도에서 Ru-Co 혼합산화물 전극이 비용량의 증가를 나타내는 것은 Ru 성분을 통한 전기전도성을 Co 성분이 구조적으로 지지해주기 때문이다.

• Environmental Engineering Research
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• 제24권4호
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• pp.646-653
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• 2019

Recovery of valuable metals in the industrial wastewater and sludge has attracted an attention owing to limited metallic resources in the earth. In this study, we firstly fabricated Ti/Ir-Ru electrodes by spin coating technique for effective recovery of Cu in electrowinning process. Two different Ti/Ir-Ru electrodes were fabricated using 100 and 500 mM of precursors (i.e., Ir-Ru). SEM-EDX and AFM revealed that Ir and Ru were homogenously distributed on the surface of Ti plate by the spin coating, in particular the electrode prepared by 500 mM showed distinct boundary line between Ir-Ru layer and Ti substrate. XRD, XPS, and cyclic voltammetry also revealed that characteristics of IrO₂, RuO₂, and TiO₂ and its electrocatalytic property increased as the concentration of coating precursor increased. Finally, we carried out Cu recovery experiments using two Ti/Ir-Ru as anodes in electrowinning process, showing that both anodes showed a complete removal of Cu (1 and 10 g/L) within 6 h reaction, but much higher kinetic rate constant was obtained by the anode prepared by 500 mM. The findings in this study can provide a fundamental knowledge for surface characteristics of Ti/Ir-Ru electrode prepared by spin coating method and its potential feasibility for effective electrowinning process.

• 한국결정성장학회지
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• 제34권2호
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• pp.55-60
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• 2024

화학적 박리법을 이용하여 나노미터 두께를 갖는 2차원(2D) RuO₂ 나노시트를 합성하였다. 차세대 투명전극 소재로 주목받고 있는 Ag-nanowire(NW)와 본 연구에서 합성된 2D-RuO₂를 하이브리드화하였다. 기판 위에 Ag-NW 코팅 후 2D-RuO₂를 추가로 코팅하였다. 광투과도의 감소는 있었지만 2D-RuO₂를 하이브리드화하여 면저항 감소 효과를 확인할 수 있었다. 또한 제조된 투명전극의 유연성 실험도 진행하였다. 벤딩 후 면저항 변화로 확인하였다. 2D-RuO₂의 추가 코팅으로 투명전극 유연성이 향상되었다.

• 대한환경공학회지
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• 제34권11호
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• pp.715-719
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• 2012

단위면적당($cm^2$) 루테늄의 코팅량이 1.5 mg, 2.5 mg, 3.5 mg, 5.5 mg, 8.5 mg의 $RuO_2$/Ti 전극을 제조하여 코팅량에 따른 전기화학적 특성 차이와 염소 발생에 미치는 영향을 조사하였다. 순환전압 실험 결과 루테늄이 코팅된 전극의 염소 발생 과전압은 약 1.15 V (vs. Ag/AgCl)로 거의 일정하였다. 그러나 교류 임피던스 분광법, 동전위분극실험 결과 단위면적당($cm^2$) 루테늄의 코팅량이 2.5 mg, 3.5 mg $RuO_2$/Ti 전극의 저항은 각각 $0.4582{\Omega}$, $0.5267{\Omega}$, 부식속도는 각각 0.082 mm/yr, 0.058 mm/yr로 내구성이 가장 우수하였다. 염소 발생량은 단위면적당($cm^2$) 루테늄의 코팅량 3.5 mg 전극이 15.2 mg/L로 가장 높게 측정되었다.

• 한국환경과학회지
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• 제17권9호
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• pp.1023-1032
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• 2008

The feasibility study of the application of the photoelectrocatalytic and electrolytic/UV decolorization of Rhodamine B (RhB) was investigated in the photoelectrocatalytic and electrolytic/UV process with $TiO_2$ photoelectrode and DSA (dimensionally stable anode) electrode. Three types of $TiO_2$ photoelectrode were used. Thermal oxidation electrode (Th-$TiO_2$) was made by oxidation of titanium metal sheet; sol-gel electrode (5G-$TiO_2$) and powder electrode (P-$TiO_2$) were made by coating and then heating a layer of titania sol-gel and slurry $TiO_2$ on titanium sheet. DSA electrodes were Ti and Ru/Ti electrode. The relative performance for RhB decolorization of each of the photoelecoodes and DSA electrodes is: Ru/Ti > Ti > SG-$TiO_2$ > Th-$TiO_2$. It was observed that photoelectrocatalytic decolorization of RhB is similar to the sum of the photocatalytic and electrolytic decolorization. Therefore the synergetic effect was not showed in pthotoelectrocatalytic reaction. $Na_{2}SO_{4}$ and NaCl showed different decolorization effect between pthotoelectrocatalytic and electrolytic/UV reaction. In the presence of the NaCl, RhB decolorization of Ru/Ti DSA electrode was higher than that of the other photoelectrode and Ti electrode. Optimum current, NaCl dosage and UV lamp power of the electrolytic/UV process (using Ru/Ti electrode) were 0.75 A, 0.5 g/L and 16 W, respectively.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1998년도 추계학술대회 논문집 학회본부 C
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• pp.801-803
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• 1998

We investigated Pt and $RuO_2$ as a bottom electrode and PZT thin film for ferroelectric applications. XRD examination shows that a mixed phase of (111) and (200) Pt peak for the temperature ranged from RT to $200^{\circ}C$, and a preferred (111) orientation for the substrate temperature of $300^{\circ}C$. From the XRD and AFM results, we recommend the substrate temperature of $300^{\circ}C$, 80 W for the Pt bottom electrode growth. From the study of an oxygen partial pressure from 0 to 50%, we learned that only Ru metal was grown with $0{\sim}5%$, a mixed phase of Ru and $RuO_2$ for $10{\sim}40%$, pure $RuO_2$ at 50%. Having optimized the bottom electrode growth conditions, we employed two step process in PZT film capacitor: PZT film growth at the low substrate temperature of $300^{\circ}C$ and then post RTA anneal treatments. PZT films were randomly oriented on $RuO_2$ and (110) preferentially oriented on Pt electrode. Leakage current density of PZT film demonstrated two to three orders higher for $RuO_2$ bottom electrode. From C-V results we observed a dielectric constant of PZT film higher than 1200. This paper presents the optimized process conditions of the bottom electrodes and properties of PZT thin films on these electrodes.

• Corrosion Science and Technology
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• 제2권5호
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• pp.238-242
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• 2003

The characteristics of Ru etching using $O_2/Cl_2$ plasmas were investigated by employing inductively coupled plasma (ICP) etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with the gas flow ratio, bias power, total gas flow rate, and source power were scrutinized. A high etching slope (${\sim}86^{\circ}$) and a smooth surface after etching was attained using $O_2/Cl_2$ inductively coupled plasma.