• Title/Summary/Keyword: .RuO$_2$ electrode

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The Leakage Current Properties of BST thin films with Unsymmetrical Electrode Materials (BST 박막의 비대칭전극재료에 따른 누설전류특성)

  • 전장배;김덕규;박영순;박춘배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.329-332
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    • 1999
  • In this paper, BST((Bao.&o,dTi0:3) thin films were deposited by the rf magnetron sputtering method on Pt/$SiO_2$/Si substrate. Pt, $RuO_2$, Ag, Cu films for the formation of top electrode were deposited on BST thm films. And then Top Electrodes/BST/Pt capacitors were annealed with rapid thermal annealing(RTA) at various temperature. We have investigated effect of post-annealing on the electrical properties such as dielectric constant and leakage current of the capacitors. It was found that electrical properties of the capacitors were greatly depended on the annealing temperatures as well as the materials of top electrodes. In BST thin films with Pt top electrode was annealed at $700^{\circ}C$. the dielectric constant was measured to the value of 346 at l[kHzl and the leakage current was obtained to the value of $8.76\times10^8$[A/$\textrm{cm}^2$] at the forward bias of 2[V].

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Electrochemical Oxidation of Amoxicillin in Its Commercial Formulation on Thermally Prepared RuO2/Ti

  • Auguste, Appia Foffie Thiery;Quand-Meme, Gnamba Corneil;Ollo, Kambire;Mohamed, Berte;Sahi placide, Sadia;Ibrahima, Sanogo;Lassine, Ouattara
    • Journal of Electrochemical Science and Technology
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    • v.7 no.1
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    • pp.82-89
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    • 2016
  • In this work, a ruthenium dioxide electrode has been prepared by thermal decomposition at 400 ℃ then used for the oxidation of commercial amoxicillin. The physical characterization showed that RuO2 electrode presents a mud cracked structure. Its electrochemical characterization has revealed an increase of the voltammetric charge in acid electrolyte compared to neutral electrolyte indicating the importance of protons in its surface redox processes. The voltammetric study of the oxidation of amoxicillin has been investigated. It has been obtained that the oxidation of amoxicillin is controlled by both adsorption and diffusion processes. Moreover, the oxidation of amoxicillin occurs via direct and indirect processes in free or electrolyte containing chlorides. Through preparative electrolysis, enhancement of amoxicillin oxidation was observed in the presence of chloride where the amoxicillin degradation yield reached more than 50 % compared to less than 5% in the absence of chlorides. Spectrophotometric investigations have revealed the degradation of intermediates absorbing at 350 nm.

Microstructural Investigation of $Ba_{0.7}Sr_{0.3}TiO_3$ (BST) Thin Films on Various Electrodes and Buffers

  • Seokmin Hong;Rhim, Sung-Min;Heungjin Bak;Ilsin An;Kim, Ok-Kyung
    • The Korean Journal of Ceramics
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    • v.6 no.4
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    • pp.333-338
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    • 2000
  • $Ba_{0.7}Sr_{0.3}TiO_3$(BST) thin films were deposited simultaneously on various electrodes and buffers by the sputtering technique. When the substrate temperature was varied, the BST thin film on each electrode showed good crystallinity above $550^{\circ}C$ as revealed by X-ray diffraction measurements. The surface morphology, determined by atomic force microscopy, indicated that the roughness of BST thin films on $RuO_2$was substrate dependent. However, BST thin films on Ru electrodes are smoother and showed no substrate dependence, probably because the precursor surface diffusion length was greater than the sinusoidal perturbations of the wavelength.

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Effect of Diffusion Layer for Cell Performance in DMFC (직접메탄올 연료전지에서 전지 성능에 대한 확산층의 영향)

  • Kwon Bu-Kil;Park Kyung-Won;Choi Jong-Ho;Sung Yung-Eun
    • 한국전기화학회:학술대회논문집
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    • 2001.06a
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    • pp.179-184
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    • 2001
  • The diffusion layer within MEA(membrane electrode assembly) has been evaluated important factor for improvement of cell performance in DMFC. The diffusion layer in MEA structure leads to the reduction of catalyst loss in active catalysts layer as well as prevention of water-flooding in cathode. Cell performance is directly affected by interior properties of diffusion layer materials. Acetylene Black and $RuO_2$ with large pore size and low porosity compared to Vulcan XC-72R gave better performance caused by vigorous methanol diffusion and water removal. And $RuO_2$ as diffusion layer materials showed different behavior in anode and cathode compartment, that is, diffusion layers in anode and cathode side make methanol diffusion and water removal facilitate, respectively.

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Comparison of Luminescence Properties of Electrochemical Luminescence Cells for Various Electrode Materials and Structures

  • Pooyodying, Pattarapon;Ok, Jung-Woo;Sung, Youl-Moon
    • Journal of Electrical Engineering and Technology
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    • v.12 no.4
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    • pp.1605-1610
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    • 2017
  • The electrochemical luminescence (ECL) device was investigated, which has similar structure to the dye-sensitized solar cell. The structure of the ECL cell in this experiment reliably induces a large amount of the oxidation around electrodes. The band gap of the ECL electrode is of 3.0 - 3.2 eV. Titanium dioxide ($TiO_2$) nanoparticle has following properties: a band gap of 3.4 eV, a low-priced material, and 002 preferred orientation (Z-axis). Zinc Oxide (ZnO) nanorod is easy to grow in a vertical direction. In this paper, in order to determine material suitable for the ECL device, the properties of various materials for electrodes of ECL devices such as ZnO nanorod (ZnO-NR) and $TiO_2$ nanoparticle ($TiO_2-NP$) were compared. The threshold voltage of the light emission of the ZnO-NR was 2.0 V which is lower than 2.5 V of $TiO_2-NP$. In the other hand, the luminance of $TiO_2-NP$ was $44.66cd/m^2$ and was higher than that of $34cd/m^2$ of ZnO-NR at the same applied voltage of 4 V. Based on the experimental results, we could conclude that $TiO_2-NP$ is a more suitable electrode material in ECL device than the ZnO-NR.

Preparation and electrochemical characterization of Ziconuim oxide ($ZrO_2/Ti$ 막의 제조와 전기화학적 성질)

  • Hong, Kyeong-Mi;Son, Won-Keun;Kim, Tae-Il;Park, Soo-Gil
    • Proceedings of the KIEE Conference
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    • 2005.11a
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    • pp.191-193
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    • 2005
  • This study has investigated the effects of the etching method of a Ti substrate for a metal oxide electrode on the electrochemical characteristics of the electrode. The HCl etching develops a fine and homogeneous roughness on the Ti substrate. Fabrication and material properties of the catalytic oxide electrode, which is known to be so effective to destruct refractory organics in aqueous waste, were studied. A method to enhance the fabrication reproducibility of the oxide electrode was tested for Ru, Zr, Sn oxide on the Ti substrate using SEM, XRD, Cyclic voltammetry.

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Development of PEMWE MEA & System for Discrete Regenerative Fuel Cell (분리형 재생 연료전지를 위한 수전해 MEA 및 시스템 개발)

  • CHOI, NAKHEON;YOON, DAEJIN;HAN, CHANGHYUN;LEE, JUNYEONG;SONG, MINAH;JUNG, HYEYOUNG;CHOI, YUNKI;MOON, SANGBONG
    • Transactions of the Korean hydrogen and new energy society
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    • v.27 no.4
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    • pp.335-340
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    • 2016
  • Hydrogen production through proton exchange membrane water electrolysis (PEMWE) is expeditiously receiving international attention for renewable energy sources as well as energy storage system applications due to its environmentally friendly uses. A series of $Ir_{0.2}Ru_{0.8}O_2$ $Ir_{0.5}Ru_{0.8}O_2$ & $IrO_2$ catalysts were synthesized and electrochemically evaluated by using linear sweep voltammetry (LSV) technique. Furthermore, the PEMWE performances of full cells were evaluated by recording I-V Curves. The developed PEMWE stack was also operated in combination with a proton exchange membrane fuel cell (PEMFC) to demonstrate the discrete regenerative fuel cell (DRFC) performances. Produced hydrogen and oxygen from PEMWE were used as a fuel to operate PEMFC to establish a DRFC system.

New Ruthenium Complexes for Semiconductor Device Using Atomic Layer Deposition

  • Jung, Eun Ae;Han, Jeong Hwan;Park, Bo Keun;Jeon, Dong Ju;Kim, Chang Gyoun;Chung, Taek-Mo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.363-363
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    • 2014
  • Ruthenium (Ru) has attractive material properties due to its promising characteristics such as a low resistivity ($7.1{\mu}{\Omega}{\cdot}cm$ in the bulk), a high work function of 4.7 eV, and feasibility for the dry etch process. These properties make Ru films appropriate for various applications in the state-of-art semiconductor device technologies. Thus, it has been widely investigated as an electrode for capacitor in the dynamic random access memory (DRAM), a metal gate for metal-oxide semiconductor field effect transistor (MOSFET), and a seed layer for Cu metallization. Due to the continuous shrinkage of microelectronic devices, better deposition processes for Ru thin films are critically required with excellent step coverages in high aspect ratio (AR) structures. In these respects, atomic layer deposition (ALD) is a viable solution for preparing Ru thin films because it enables atomic-scale control of the film thickness with excellent conformality. A recent investigation reported that the nucleation of ALD-Ru film was enhanced considerably by using a zero-valent metallorganic precursor, compared to the utilization of precursors with higher metal valences. In this study, we will present our research results on the synthesis and characterization of novel ruthenium complexes. The ruthenium compounds were easy synthesized by the reaction of ruthenium halide with appropriate organic ligands in protic solvent, and characterized by NMR, elemental analysis and thermogravimetric analysis. The molecular structures of the complexes were studied by single crystal diffraction. ALD of Ru film was demonstrated using the new Ru metallorganic precursor and O2 as the Ru source and reactant, respectively, at the deposition temperatures of $300-350^{\circ}C$. Self-limited reaction behavior was observed as increasing Ru precursor and O2 pulse time, suggesting that newly developed Ru precursor is applicable for ALD process. Detailed discussions on the chemical and structural properties of Ru thin films as well as its growth behavior using new Ru precursor will be also presented.

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A Study on the Separation of Membrane and Leaching of Platinum and Ruthenium by Hydrochloric Acid from MEA of Fuel Cell (연료전지용(燃料電池用) 막전극접합체(膜電極接合體)의 막분리(膜分離) 및 염산(鹽酸)에 의한 백금(白金)과 루테늄의 침출(浸出)에 관(關)한 연구(硏究))

  • Lee, Jin-A;Kang, Hong-Yoon;Ryu, Ho-Jin
    • Resources Recycling
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    • v.21 no.3
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    • pp.15-20
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    • 2012
  • In this paper, we carried out separation of membrane and leaching of Pt and Ru using hydrochloric acid from MEA(membrane-electrode assembly) of fuel cell. In this method, these were separated from MEA of fuel cell using the distilled water, 10 vol.% butanol solution and 15 vol.% cationic surfactant(Koremul-LN-7) by dipping method without the dispersion of catalyst particles. And the leaching of Pt and Ru containing in the separated carbon paper catalysts has been studied by hydrochloric acid using $HNO_3$ or $H_2O_2$ as a oxidant. The leaching ratio of Pt and Ru were higher when $H_2O_2$ was used as a oxidant and the optimum conditions were obtained in 8M HCl, the amount of $H_2O_2$ 5M and 6 hours of leaching time at $90^{\circ}C$. In this condition, extraction of Pt and Ru were 98% and 71.5%, respectively.