• Title/Summary/Keyword: 투과 전자 현미경

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Reliability Test of the TEM Rotation Holder for 3-D Structure Analysis (3차원적 구조분석을 위한 TEM Rotation Holder의 신뢰도 점검)

  • Kim, Jin-Gyu;Jeong, Jong-Man;Kim, Young-Min;Kim, Youn-Joong
    • Applied Microscopy
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    • v.36 no.3
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    • pp.209-216
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    • 2006
  • Accuracy and precision of the goniometer and the specimen holder should be measured and corrected to improve reliability of 3-D structure analysis using transmission electron microscopy (TEM). In this study, we described the operation principle and performance of the Gatan rotation holder. Through analysis of the images taken inside the microscope, rotation angles were measured within the accuracy of ${\pm}0.42^{\circ}$. For comparison the rotation angles were measured outside the microscope using a home-made measurement tool, which resulted in the accuracy of ${\pm}0.6^{\circ}$. Additionally, we found abnormal specimen drifts during rotation probably due to the unstable engagement between the specimen cup and the rotation belt.

Study on Surface Damage of Specimen for Transmission Electron Microscopy(TEM) Using Focused Ion Beam(FIB) (집속 이온빔을 이용한 투과 전자 현미경 시편의 표면 영향에 관한 연구)

  • Kim, Dong-Sik
    • 전자공학회논문지 IE
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    • v.47 no.2
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    • pp.8-12
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    • 2010
  • TEM is a powerful tool for semiconductor material analyses in structure or biological sample in micro structure. TEM observation need to make to coincide specimens for special purpose. in this paper, we have experimented for minimum surface damage on bulk wafer and patterned specimen by various conditions such as accelerating energy, depth of ion beam, ion milling types, and etc. in various specimen preparation methods by FIB (Focus Ion Beam). The optimal qualified specimens are contain low mounts of surface damage(about 5 nm) on patterned specimen.

Fault Analysis of Semiconductor Device (반도체 장치의 결함해석)

  • Park, S.J.;Choi, S.B.;Oh, C.S.
    • Journal of Energy Engineering
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    • v.25 no.1
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    • pp.192-197
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    • 2016
  • We have surveyed on technical method of fault analysis of semiconductor device. Fault analysis of semiconductor should first be found the places of fault spots. For this process they are generally used the testers; EB(emission beam tester), EM(emission microscope), OBIRCH(optical beam induced resistance change method) and LVP(laser voltage probing) etc. Therefore we have described about physical interpretation and technical method in using scanning electron microscope, transmission electron microscope, focused ion beam tester and Nano prober.