• 제목/요약/키워드: 탄소 박막

검색결과 363건 처리시간 0.022초

탄소나노튜브 길이 변화에 대한 확산방지층과 박막 증착 온도의 영향 (The Effect of Diffusion Barrier and thin Film Deposition Temperature on Change of Carbon Nanotubes Length)

  • 홍순규;이형우
    • 한국분말재료학회지
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    • 제24권3호
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    • pp.248-253
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    • 2017
  • In this study, we investigate the effect of the diffusion barrier and substrate temperature on the length of carbon nanotubes. For synthesizing vertically aligned carbon nanotubes, thermal chemical vapor deposition is used and a substrate with a catalytic layer and a buffer layer is prepared using an e-beam evaporator. The length of the carbon nanotubes synthesized on the catalytic layer/diffusion barrier on the silicon substrate is longer than that without a diffusion barrier because the diffusion barrier prevents generation of silicon carbide from the diffusion of carbon atoms into the silicon substrate. The deposition temperature of the catalyst and alumina are varied from room temperature to $150^{\circ}C$, $200^{\circ}C$, and $250^{\circ}C$. On increasing the substrate temperature on depositing the buffer layer on the silicon substrate, shorter carbon nanotubes are obtained owing to the increased bonding force between the buffer layer and silicon substrate. The reason why different lengths of carbon nanotubes are obtained is that the higher bonding force between the buffer layer and the substrate layer prevents uniformity of catalytic islands for synthesizing carbon nanotubes.

전기 분해법을 이용한 다이아몬드 상 탄소 박막 증착에서의 암모니아수 첨가 효과 (Adding effect of ammonia solution on deposition of diamond phase carbon thin films by electrolysis method)

  • 권민철;김은미;박홍준;김용;이재열;신동혁
    • 한국진공학회지
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    • 제8권4B호
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    • pp.524-529
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    • 1999
  • We deposited diamond phase carbon thin films on Si substrate by the electrolysis of methanol solution. A little amount of ammonia solution was added to increase the current density of the electrolyte. We analyzed films by XRD and SEM. The chemical change of electrolyte during the electrolysis process was characterized by FTIR. We obtained better quality diamond phase carbon films at a lower applying boltage(300V) and temperature ($40^{\circ}C$) by adding ammonia solution to methanol electrolyte. Diamond (111), (220), (311) peaks were shown distinctively in XRD graph. Addition of ammonia solution resulted in lowering the applying bias voltage to 300V and the substrate temperature to $40^{\circ}C$ still maintaining a high current density at 80mA/$\textrm{cm}^2$, which prohibited a great loss of solution from vaporization. Possible change of chemical reaction due to the addition of ammonia solution was also discussed.

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저점성 SWNT 분산액 도포용 슬릿 노즐 설계를 위한 유동해석 (A STUDY ON FLOW IN A SLIT NOZZLE FOR DISPENSING A LOW-VISCOSITY SOLUTION OF SINGLE-WALLED CARBON NANOTUBES)

  • 손병철;곽호상;이상현
    • 한국전산유체공학회지
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    • 제14권1호
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    • pp.78-85
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    • 2009
  • A combined theoretical and numerical study is conducted to design a slit nozzle for large-area liquid coating. The objectives are to guarantee the uniformity in the injected flow and to provide the capability of explicit control of flow rate. The woking fluid is a dilute aqueous solution containing single-walled carbon nanotubes and its low viscosity and the presence of dispersed materials pose technical hurdles. A theoretical analysis leads to a guideline for the geometric design of a slit nozzle. The CFD-based numerical experiment is employed as a verification tool. A new flow passage unit, connected to the nozzle chamber, is proposed to permit the control of flow rate by using the commodity pressurizer. The numerical results confirm the feasibility of this idea. The optimal geometry of internal structure of the nozzle has been searched for numerically and the related issues are discussed.

축방향 압축력을 받는 원통형 박막소재의 좌굴후 탄소성 대변형에 관한 실험 및 해석 연구 (Experimental and Numerical Study on the Elastic-Plastic, Large Deflection, Post-Buckling Behavior of Axially Compressed Circular Cylindrical Tubes)

  • 권세문;윤희도
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2001년도 춘계학술대회논문집A
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    • pp.969-974
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    • 2001
  • Circular cylindrical tubes are widely used in structures such as vehicles and aircraft structures, where light weight and high compressive/bending/torsional load carrying capacity are required. When axially compressed, relatively thick circular cylindrical tubes deform in a so-called ring mode. Each ring develops and completely collapses one by one until the entire length of the tube collapses. During the collapse process the tube absorbs a large amount of energy. Like honey-comb structures, circular cylindrical tubes are light weighted, are capable of high axial compressive load, and absorb a large amount of energy before being completely collapsed. In this report, the subject of axial plastic buckling of circular cylindrical tubes was reviewed first. Then, the axial collapse process of the tubes in a so-called ring mode was studied both experimentally and numerically. In the experiment, steel tubes were axially compressed slowly until they were completely collapsed. Fixed boundary condition was provided. Numerical study involves axisymmetric, elastic-plastic, large deflection, self-contact mechanisms. The measured and calculated results were presented and compared with each other. The purpose of the study was to evaluate the load carrying capacity and the energy absorbing capacity of the tube.

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플라즈마를 이용한 그래핀의 산화

  • 이병주;정구환
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.460-460
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    • 2011
  • 그래핀은 탄소원자로 구성된 2차원의 나노재료로서 우수한 기계적, 전기적, 광학적 특성을 지닌다. 이러한 특성들을 기반으로 그래핀은 디스플레이, 터치스크린, 전 자기 차폐재 등의 다양한 분야로의 응용이 가능하다고 예측되고 있다. 한편 이러한 특성은 그래핀의 구조 및 결함, 불순물 등에 의하여 변화한다고 알려져 있으며, 이러한 특성의 변화를 통해 전자소자로의 응용도 가능 하다고 예측되고 있다. 따라서 그래핀의 구조를 제어하고 적절한 결함 및 불순물을 부여하는 것은 그래핀의 기초물성 연구 뿐 아니라 응용연구 에 있어서도 매우 중요하다고 할 수 있다. 본 연구에서는 공기 플라즈마를 이용하여 그래핀의 구조변형을 도모하였다. 그래핀은 열화학 기상증착법 (thermal chemical vapor deposition; TCVD)을 이용하여 300 nm 두께의 니켈박막이 증착된 기판위에 합성하였다. 합성된 그래핀은 산화처리 시 기판의 영향을 배제하고자 트렌치(trench) 구조의 산화막 실리콘 기판위로 전사함으로서 공중에 떠 있는 (air suspended) 구조를 구현하였다. 산화처리를 위한 장치는 직류 플라즈마 장치를 이용하였으며 0.1 Torr의 압력에서 0.4W의 파워로 공기 플라즈마를 방전하여 5분간의 산화처리와 특성평가를 매회 반복함으로서 처리시간에 따른 산화처리의 영향을 관찰하였다. 그 결과 공기 플라즈마 산화처리를 통해 그래핀에 결함을 부여하고 그래핀의 구조변형이 가능함을 확인하였다. 그래핀의 특성분석을 위해서는 광학현미경, 라만 분광기, 원자간힘현미경 등을 이용하였다.

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진공아크방전으로 제작된 다이아몬드상 탄소 박막이 코팅된 실리콘 전계 방출 소자의 전계 방출 특성 (Field emission properties of the silicon field emission arrays coated with diamond-like carbon film prepared by filtered cathodic vacuum arc technique)

  • 황한욱;김용상
    • 한국전기전자재료학회논문지
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    • 제13권4호
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    • pp.326-331
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    • 2000
  • We have fabricated the field emitter arrays coated with diamond-like carbon (DLC) films that improved the field emission characteristics. The nitrogen doped DLC films are prepared by the filtered cathodic vacuum are (FCVA) tehnique. The activation energy of the nitrogen doped DLC films are derived from electrical conductivity measurements. The silicon field emission arrays (FEAs) were prepared by the VLSI technique. The turn-on field was rapidly decreasing and the emission current was remarkably increasing the DLC-coated FEAs than the non-coated silicon FEAs. In the nitrogen doped FEAs, the turn-on field decreased and the emission current increased with increasing the nitrogen found out the field emission current and the work function of the DLC-coated FEAs was remarkably decreased than that of the non-coated silicon FEAs. As nitrogen doping concentrations are increased the work function of FEAs is decreased and the field emission properties are improved in nitrogen doped DLC-coated FEAs. This phenomenon in due the fact that the Fermi energy level moves to the conduction band by increasing nitrogen doping concentration.

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탄소계 박막의 성장과 특성에 대한 나노 Buffer Layer의 영향 (Effect of Nano Buffer Layer on Property and Growth of Carbon Thin Film)

  • 류정탁
    • 한국전기전자재료학회논문지
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    • 제16권1호
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    • pp.53-59
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    • 2003
  • Using Platinum-silicide (PtSi) formed between silicon substrate and carbon film, we have improved the field emission of electrons from carbon films. Pt films were deposited on n-Si(100) substrates at room temperature by DC sputter technique. After deposition, these PtSi thin films were annealed at 400 ~ $600^{\circ}C$ in a vacuum chamber, and the carbon films were deposited on those Pt/Si substrates by laser ablation at room temperature. The field emission property of C/Pt/Si system is found to be better than that of C/Si system and it is showed that property was improved with increasing annealing temperature. The reasons why the field emission from carbon film was improved can be considered as follows, (1)the resistance of carbon films was decreased due to graphitization, (2)electric field concentration effectively occurred because the surface morphology of carbon film deposited on Pt/si substrates with rough surface, (3)it is showed that annealing induced reaction between Pt film and Si substrate, as a consequence that the interfacial resistance between Pt film and Si substrate was decreased.

CFUBM Sputtering법으로 증착시킨 티타늄이 첨가된 비정질 탄소 박막의 기계적 특성 연구 (Mechanical Properties of Ti doped Amorphous Carbon Films prepared by CFUBM Sputtering Method)

  • 조형준;박용섭;김형진;최원석;홍병유
    • 한국전기전자재료학회논문지
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    • 제20권8호
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    • pp.706-710
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    • 2007
  • Ti-containing amorphous carbon (a-C:Ti) films shows attractive mechanical properties such as low friction coefficient, good adhesion to various substrate and high wear resistance. The incorporation of titanium in a-C films is able to improve the electrical conductivity, friction coefficient and adhesion to various substrates. In this study, a-C:Ti films were depositied on Si wafer by closed-field unbalanced magnetron (CFUBM) sputtering system composed two targets of carbon and titanium. The tribological properties of a-C:Ti films were investigated with the increase of DC bias voltage from 0 V to - 200 V. The hardness and elastic modulus of films increase with the increase of DC bias voltage and the maximum hardness shows 21 GPa. Also, the coefficient of friction exhibites as low as 0.07 in the ambient. In the result, the a-C:Ti film obtained by CFUBM sputtering method improved the tribological properties with the increase of DC bias volatage.

비대칭 마그네트론 스퍼터링법에 의한 비정질 질화탄소 박막의 합성 및 윤활 특성 (Synthesis and Lubricant Properties of Nitrogen doped Amorphous Carbon (a-C:N) Thin Films by Closed-field unbalanced Magnetron Sputtering Method)

  • 박용섭;조형준;최원석;홍병유
    • 한국전기전자재료학회논문지
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    • 제20권8호
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    • pp.701-705
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    • 2007
  • The incorporation of N in a-C film is able to improve the friction coefficient and the adhesion to various substrates. In this study, a-C:N films were deposited on Si and steel substrates by closed-field unbalanced magnetron (CFUBM) sputtering system in $Ar/N_2$ plasma. The lubricant characteristics was investigated for a-C:N deposited with total working pressure from 4 to 7 mTorr. We obtained high hardness up to 24GPa, friction coefficient lower than 0.1 and the smooth surface of having the extremely low roughness (0.16 nm). The physcial properties of a-C:N thin film are related to the increase of cross-linked $sp^2$ bonding clusters in the film. However, the decrease of hardness, elastic modulus and the increase of surface roughness, friction coefficient with the increase of $N_2$ partial pressrue might be due to the effect of energetic ions as a result of the increase of ion bombardment with the increase of ion density in the plasma.

탄소 기판을 이용한 박막 실리콘 태양전지의 배리어 층 효과 (The Effect of Barrier Layer on Thin-film Silicon Solar Cell Using Graphite Substrates)

  • 조영준;이동원;조준식;장효식
    • 한국전기전자재료학회논문지
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    • 제29권8호
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    • pp.505-509
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    • 2016
  • We have investigated the characteristics of amorphous silicon (a-Si) thin-film solar cell by inserting barrier layer. The conversion efficiency of a-Si thin-film solar cells on graphite substrate shows nearly zero because of the surface roughness of the graphite substrate. To enhance the performance of solar cells, the surface morphology of the back side were modified by changing the barrier layer on graphite. The surface roughness of graphite substrate with the barrier layer grown by plasma enhanced chemical vapor deposition (PECVD) reduced from ~2 um to ~75 nm. In this study, the combination of the barrier layer on graphite substrate is important to increase solar cell efficiency. We achieved ~ 7.8% cell efficiency for an a-Si thin-film solar cell on graphite substrate with SiNx/SiOx stack barrier layer.