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http://dx.doi.org/10.4313/JKEM.2007.20.8.706

Mechanical Properties of Ti doped Amorphous Carbon Films prepared by CFUBM Sputtering Method  

Cho, Hyung-Jun (성균관대학교 정보통신공학부)
Park, Yong-Seob (성균관대학교 정보통신공학부)
Kim, Hyung-Jin (성균관대학교 정보통신공학부)
Choi, Won-Seok (성균관대학교 정보통신공학부)
Hong, Byung-You (성균관대학교 정보통신공학부)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.20, no.8, 2007 , pp. 706-710 More about this Journal
Abstract
Ti-containing amorphous carbon (a-C:Ti) films shows attractive mechanical properties such as low friction coefficient, good adhesion to various substrate and high wear resistance. The incorporation of titanium in a-C films is able to improve the electrical conductivity, friction coefficient and adhesion to various substrates. In this study, a-C:Ti films were depositied on Si wafer by closed-field unbalanced magnetron (CFUBM) sputtering system composed two targets of carbon and titanium. The tribological properties of a-C:Ti films were investigated with the increase of DC bias voltage from 0 V to - 200 V. The hardness and elastic modulus of films increase with the increase of DC bias voltage and the maximum hardness shows 21 GPa. Also, the coefficient of friction exhibites as low as 0.07 in the ambient. In the result, the a-C:Ti film obtained by CFUBM sputtering method improved the tribological properties with the increase of DC bias volatage.
Keywords
Amorphous carbon; CFUBM sputtering; Hardness; Friction coefficient; Adhesion;
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Times Cited By KSCI : 1  (Citation Analysis)
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