• Proceedings of the Optical Society of Korea Conference
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• 2008.02a
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• pp.79-80
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• 2008

• Journal of the Korean Institute of Intelligent Systems
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• v.23 no.6
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• pp.527-532
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• 2013

Depth estimation is an essential factor for robot vision, 3D scene modeling, and motion control. The depth estimation method is based on focusing values calculated in a series of images by a single camera at different distance between lens and object. In this paper, we proposed a relative depth estimation method using focus measure. The proposed method is implemented by focus value calculated for each image obtained at different lens position and then depth is finally estimated by considering relative distance of two patterns. We performed various experiments on the effective focus measures for depth estimation by using various patterns and their usefulness.

• Korean Journal of Optics and Photonics
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• v.7 no.2
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• pp.101-111
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• 1996

Optical microscopes integrated with CCD cameras are widely used for automatic inspection of precision circuit patterns fabricated on glass masks and silicon wafers. For this application it is important to position the object always is focus so that the image appears in good quality while the microscope scans the object. However, as the magnification of the microscope is taken large for fine resolution the depth of focus becomes small, often in submicron ranges, requiring special care in focusing. This study proposes a new auto-focusing method, which can be readily incorporated in existing optical configuration of microscope. This method is based on optical triangulation using a separate beam of laser and two photodiodes, eliminating focus errors caused by surface roughness and waviness. Experimental results prove that the method can produce focus error signals which are very sensitive with a resolution of 5 nm within 0.5 ${\mu}{\textrm}{m}$ accuracy.

• Korean Journal of Optics and Photonics
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• v.13 no.2
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• pp.117-122
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• 2002

Some 10$\times$10 micro-lens arrays of a period of 300 ${\mu}{\textrm}{m}$, a thickness of 17 ${\mu}{\textrm}{m}$, and a focal length of 2.2 mm are fabricated by exposing a thick layer of photoresist through a grayscale mask via UV proximity printing. The grayscale mask is fabricated in a holographic film by reducing (6.6X) a high-resolution black-and-white film where a grayscale patters of a micro-lens array designed by a computer has been written using a film recorder. The proposed method has the advantage of a low fabrication cost, a fill-factor of almost 100% and the ease of realizing an aspheric lens.

• Korean Journal of Optics and Photonics
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• v.15 no.6
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• pp.575-582
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• 2004

We analyse the beam characteristics of the thermal-birefringence compensated symmetric resonator which consists of two laser rods with rod-end curvatures. The numerical results show that the stability and the beam quality can be improved in high power operation region when the rod-ends are made in the form of a negative lens. The thermal birefringence of the symmetric two-rods resonator is shown to be well compensated when the two rods closely contact each other.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.256.1-256.1
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• 2014

21세기 정보화 시대의 도래와 함께 반도체 및 디스플레이 분야는 고부가가치산업으로 급격히 성장하였고, 현재까지도 미래의 지속적인 시장 창출을 위하여 기술개발과 투자로 초미세화, 고효율, 대면적화에 대한 원천기술 확보가 중요시되고 있다. 반도체 및 디스플레이의 대면적화가 진행됨에 따라 플라즈마 공정장비의 대면적화도 활발히 기술개발이 진행되고 있으며, 대면적화에 있어 플라즈마의 공간균일도는 생산수율 및 공정균일화를 위해 기본적으로 평가되어야 하는 중요한 지표가 되었다. 하지만 종래의 진단법들은 대면적 플라즈마 진단에 매우 제한적이기 때문에 본 연구에서는 대면적 플라즈마의 공간균일도 평가를 위해 플라즈마의 방출광 측정을 기초로 하는 진단계를 개발하였다. 플라즈마 방출광을 이용한 진단은 플라즈마에 섭동을 주지 않고 전자온도의 변화 및 공간균일도를 평가할 수 있다. 이 진단법은 두 마주보는 한쪽 면이 평평한 볼록렌즈(plano-convex lens)로 이루어진 수광시스템과 역변환 알고리즘을 통해 선 적분된 방출광으로부터 플라즈마 방출광의 국지적 정보를 측정하는 것이다. 플라즈마와 같이 크기가 큰 광원의 경우 렌즈 광학계에서 필연적으로 수반되는 선적분된(chord-integrated) 방출광을 제거하기 위해 구조에 따른 시스템 함수를 이용한 푸리에 변환 알고리즘을 개발하였고, 이를 통해 렌즈 초점거리의 정확한 방출광 세기만 재구성하였다. 이러한 재구성 방법을 이용하여 렌즈의 거리를 움직이며 대면적 플라즈마의 방출광 분포측정을 수행하였고, 이에 대한 결과를 발표하고자 한다.

• Journal of the Korean Society of Surveying, Geodesy, Photogrammetry and Cartography
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• v.22 no.2
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• pp.127-135
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• 2004

The calibration of lens to be used and the planning of photographing planning layout is very important to achieve the requested accuracy in the precision measurement by close-range photogrammetry. Establishment of absolute coordinate system is regarded as another important factor for the purpose of measuring absolute deformation of photogrammetric object. In this study, the following tasks were performed : (1) calibration of super-wide-angle lens or focal length 21mm fer close-range photographing used by 35mm metric camera, (2) development of the measuring system for monitoring of absolute deformation through periodic observation of small area, and, (3) application of this system to monitor the absolute deformation of surface of underwater structure in fixed cycle and to present the efficiency of the system.

• Korean Journal of Optics and Photonics
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• v.19 no.5
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• pp.365-369
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• 2008

The optimal condition for focusing an electron beam was investigated employing an electrostatic deflector in a low voltage micro-column. At fixed voltage of the electron emission tip, the focusing electron beam with source lens showed a larger scan field size and poorer visibility than those with an Einzel lens. Theoretical 3-D simulation indicated that a focusing electron beam with a source lens should have a larger spot size and deflection than those of a focusing Einzel lens.

• Korean Journal of Optics and Photonics
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• v.13 no.2
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• pp.92-97
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• 2002

A real-time OTF (optical transfer function) measuring system with on- and off-axis nodal slide bench type for the camera lens is fabricated and evaluated. It consists of a nodal slide bench including a T-bar for the OTF measurement of an off-axis object, two dimensional CCD (charge coupled device) with pixel of 9.9${\mu}{\textrm}{m}$$\times$9.6${\mu}{\textrm}{m}$ for real-time OTF measurment, and a collimating lens of focal length of 300 mm for the optimization of this system. The OTF system is corrected by using the OTF of a SIRA lens of fnumber of F/8 and focal length 50 mm. In order to confirm the reliability of the OTF system, two MTFs (modulus transfer functions) of CCTV & VIDEO lens (JAPAN, AVENIR-SE 2514) of focal length of 25mm and field of view 10.6$^{\circ}$are measured by the camera bench type OTF system of reference OTF system and the nodal slide bench type OTF system and compared with each other. As a result, these two values are agree well with each other within 4% from 0 1p/mm to 100 1p/mm.

• Korean Journal of Optics and Photonics
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• v.24 no.5
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• pp.224-230
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• 2013

Laser Lift-Off (LLO) is a process that removes a GaN or AIN thin layer from a sapphire wafer to manufacture vertical-type LEDs. It consists of a light source, an attenuator, a mask, a projection lens and a beam homogenizer. In this paper, we design an attenuator and a projection lens. We use the 'ZEMAX' optical design software for analysis of depth of focus and for a projection lens design which makes $7{\times}7mm^2$ beam size by projecting a beam on a wafer. Using the 'LightTools' lighting design software, we analyze the size and uniformity of the beam projected by the projection lens on the wafer. The performance analysis found that the size of the square-shaped beam is $6.97{\times}6.96mm^2$, with 91.8 % uniformity and ${\pm}30{\mu}m$ focus depth. In addition, this study performs dielectric coating using the 'Essential Macleod' to increase the transmittance of an attenuator. As a result, for 23 layers of thin films, the transmittance total has 10-96% at angle of incidence $45-60^{\circ}$ in S-polarization.