• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1531-1534
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• 2005

Nano pattern is being utilized to produce micro optical components, sensors, and information storage devices. In this study, a study on nano pattern fabrication using raster-scan type Focused Ion Beam (FIB) milling is introduced. Because the intensity of ion beam has Gaussian distribution, the overlapping of the Gaussian beam results in a 3D pattern, and the shape of the pattern can be adjusted by variation of FIB milling parameters, such as overlap, ion dose, and dwell time. The Gaussian shape of single beam intensity has been investigated by experiment, and 3D nano patterns with pitch of 200nm generated by FIB is demonstrated.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.12 s.189
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• pp.122-127
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• 2006

This paper reports on the development of carbon nanotube tip modified with focused ion beam(FIB). We used an electric field which causes dielectrophoresis, to align and deposit CNTs on a metal-coated canning Probe Microscope (SPM) tip. Using the CNT attached SPM tip, we have obtained an enhanced resolution and wear property compared to that from the bare silicon tip through the scanning of the surface of the bio materials. The carbon nanotube tip was aligned toward the source of the ion beam allowing their orientation to be changed at precise angles. By this technique, metal coated carbon nanotube tips that are several micrometer in length are prepared for SPM.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.31 no.1 s.256
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• pp.139-144
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• 2007

This paper presents development of carbon nanotube (CNT) tip modified by focused ion beam (FIB) and experimental results in non-contact mode of atomic force microscopy (AFM) using fabricated tip. We used an electric field which causes dielectrophoresis, to align and deposit CNTs on a conventional silicon tip. The morphology of the fabricated CNT tip was then modified into a desired shape using focused ion beam. We measured anodic aluminum oxide sample and trench structure to estimate the performance of FIB-modified tip and compared with those of conventional Si tip. We demonstrate that FIB modified tip in non contact mode had superior characteristics than conventional tip in the respects of wear, image resolution and sidewall measurement.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.489-490
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• 2006

To establish fabrication techniques for nano structure understanding of focused ion beam (FIB) milling process is required. In this study the mathematical model containing the factors related to FIB milling is developed to acquire the optimal fabrication condition. Then, the model is verified by comparison with various nano pattern fabricated in actual FIB system. Consequently, it is demonstrated that the nano patterns with the smallest pitch can be fabricated using developed FIB milling model.

• Journal of the Korean Ceramic Society
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• v.40 no.8
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• pp.765-769
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• 2003

Time-Of-flight Impact-Collision Ion Scattering Spectroscopy (TOF-ICISS) using 2 keV He$\^$+/ ion was applied to study the geometrical structure of the Si(100) surface. The scattered ion intensity was measured along the [011] azimuth varying the incident angle. The focusing effects were appeared at the incident angles of 20$^{\circ}$, 28$^{\circ}$, 46$^{\circ}$, 63$^{\circ}$, and 80$^{\circ}$. The Si atomic position was simulated by calculating the shadow cone to explain the five focusing effects. The four focusing effects at 28$^{\circ}$, 46$^{\circ}$, 63$^{\circ}$, and 80$^{\circ}$ resulted from the {011} surface where no dimers existed on the outermost surface. On the contrary, the scattering between two Si atoms in a dimer resulted in the focusing peak at 20$^{\circ}$.

• Journal of the Korean Vacuum Society
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• v.15 no.3
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• pp.259-265
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• 2006

We measured sputtering yield of RF $O_2-plasma$ treated MgO protective layer for AC-PDP(plasma display panel) using a Focused ion Beam System(FIB). A 10 kV acceleration voltage was applied. The sputtering yield of the untreated sample and the treated sample were 0.33 atoms/ion and 0.20 atoms/ion, respectively. The influence of the plasma-treatment of MgO thin film was characterized by XPS and AFM analysis. We observed that the binding energy of the O 1s spectra, the FWHM of O 1s spectra and the RMS(root-mean-square) of surface roughness decreased to 2.36 eV, 0.6167 eV and 0.32 nm, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.173-173
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• 2012

사이클로트론은 암진단에 사용되는 방사성동위원소를 생산하기 위한 중요한 입자 가속장치이다. 현재 핵의학 의료진단에 필요한 방사성동위원소를 제공하기 위해 세계적으로 사이클로트론의 활용도가 점점 증가하고 있다. 한국원자력의학원에 설치된 MC50 (양성자 최대 가속에너지 50 MeV, 60 uA)과 C30 (양성자 최대 에너지 30 MeV, 250 uA) 사이클로트론은 생명의학, 반도체 검출기, 핵자료 데이터, 방사성동위원소 개발 등 다양한 분야의 연구를 지원하고 있다. MC50 사이클로트론은 수소 입자를 포함하여 중양자, 알파 입자를 가속할 수 있으며 중성자 빔을 인출 할 수 있다. 수소 음이온 또는 양이온을 가속 할 수 있으며 표적에는 고에너지의 양이온이 조사되며, 핵반응을 통해 방사성동위원소가 생성된다. 양성자 빔을 이용하여 암세포를 사멸 시키는 치료법, 돌연변이로 새로운 종의 개발 등 다양한 응용성이 있다. 하전입자를 가속하는 사이클로트론의 주요 구성요소는 (1) 진공시스템, (2) 전자석 시스템, (3) 고주파 시스템, (4) 이온원 (5) 빔 인출장치 (6) 빔전환 장치 (수직에서 수평 방향으로 전환), (7) 빔 집속 및 진단 장치 등 이다. 본 발표에서는 85년부터 운영한 MC50 사이클로트론과 02년부터 가동된 사이클로트론의 운영 현황 및 다양한 응용분야와 향후 RI 빔 인출을 위한 계획을 소개하고자 한다.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.326-329
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• 2005

As a flexible method to fabricate sub-micrometer patterns, Focused Ion Beam (FIB) instrument and Self-Assembled Monolayer (SAM) resist are introduced in this work. FIB instrument is known to be a very precise processing machine that is able to fabricate micro-scale structures or patterns, and SAM is known as a good etch resistance resist material. If SAM is applied as a resist in FIB processing fur fabricating nano-scale patterns, there will be much benefit. For instance, low energy ion beam is only needed for machining SAM material selectively, since ultra thin SAM is very sensitive to $Ga^+$ ion beam irradiation. Also, minimized beam spot radius (sub-tens nanometer) can be applied to FIB processing. With the ultimate goal of optimizing nano-scale pattern fabrication process, interaction between SAM coated specimen and $Ga^+$ ion dose during FIB processing was observed. From the experimental results, adequate ion dose for machining SAM material was identified.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1194-1197
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• 2005

Micro nozzle is employed as a dynamic passive valve in micro fluidic devices. Micro nozzle array is used in micro droplet generation in bio-medical applications and propulsion device for actuating satellite and aerospace ship in vacuum environments. Aperture angle and the channel length of the micro nozzle affect its retification efficiency, and thus it is needed to produce micro nozzle precisely. MEMS process has a limit on making a micro nozzle with high-aspect ratio. Reactive ion etching process can make high-aspect ratio structure, but it is difficult to make the complex shape. Focused ion beam deposition has advantage in machining of three-dimensional complex structures of sub-micron size. Moreover, it is possible to monitor machining process and to correct defected part at simultaneously. In this study, focused ion beam deposition was applied to micro nozzle production.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.8
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• pp.966-974
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• 2011

The use of ion beams in the micro/nano scale is greatly increased by technology development. Especially, focused ion beams (FIBs) have a great potential to fabricate the device in sub micro scale. Nevertheless, FIB has several limitations, surface swelling in low ion dose regime, precipitation of incident ions, and the redeposition effect due to the sputtered atoms. In this research, we demonstrate a way which can be used to fabricate mold structures on a silicon substrate using FIBs. For the purpose of the demonstration, two essential subjects are necessary. One is that focused ion beam diameter as well as shape has to be measured and verified. The other one is that the accurate rotational symmetric model of ion-solid interaction has to be mathematically developed. We apply those two, measured beam diameter and mathematical model, to fabricate optical lenses mold on silicon. The characteristics of silicon mold fabrication will be discussed as well as simulation results.