• KSCE Journal of Civil and Environmental Engineering Research
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• v.11 no.2
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• pp.27-37
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• 1991

The behavior of a negative buoyant flow flowing into a small reservoir is analysed by experiments and dimensional analysis. The nondimensional plunge point, head velocity, head travel distance and the dilution of density current are dependent on the inflow densimetric Froude number, Fre. The thickness of density current, flow pattern and density difference are different from two cases as follows; before the front of head arrive at the downstream end and after. Before the arrival, the thickness of density current is dependent on Fre and after the arrival, time and Fre. It was found that they can be expressed as power laws.

• Journal of the Korean Vacuum Society
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• v.21 no.5
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• pp.225-232
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• 2012

It is described that the proton beam induceds micro-size defects and electronic deep levels in n or p type single crystal silicon. Positron lifetime and Coincidence Doppler Broadening Positron Annihilation Spectroscopy were applied to study of characteristics of p type and n type silicon samples. In this investigation the numerical analysis of the Doppler spectra was employed to the determination of the shape parameter, S, defined as the ratio between the amount of counts in a central portion of the spectrum and the total counts of whole spectrum. The samples were exposed by 3.98 MeV proton beams ranging between 0 to ${\sim}10^{14}$ particles. The S-parameter values strongly depend on the irradiated proton beam, that indicated the defects generate more. Positron lifetime shows that positrons trapped in vacancies and lifetime ${\tau}_2$ increased according to proton irradiation.

• Journal of the Korean Vacuum Society
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• v.14 no.4
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• pp.258-262
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• 2005

We report on the field emission properties from vertically aligned carbon nanotubes (CNTs) produced by a triode PECVD with a SiNx capping layer on metal catalyst. It is found that the CNTs density can be controlled by the capping layer thickness and decreases with increasing SiNx thickness. The CNT density of $\~$ 104/$cm^{2}$ exhibited highest electron emission characteristics, the threshold field of 1.2 V/$\mu$m and the current density of 0.17 mA/$cm^{2}$ at 3.6 V/$\mu$m. We have carried out investigation of electron emission stability under ambient gas of N2. The electron emission stability was improved with decreasing CNT density. Under $1\times$$10^{-5}$ Torr ambient pressure, the CNTs in 5 $\mu$m hole show electron emission current higher than $1\times$$10^{-4}$ A/cm2 and it's electron emission uniformity has $2\%$.

• Korean Journal of Crystallography
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• v.14 no.1
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• pp.16-23
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• 2003

The electronic structure and chemical bonding of β-MnO₂ were theoretically investigated by DV-X/sub α/ (the discrete variation X/sub α/) method. which is a sort of the first principle molecular orbital method using Hatre-Fock-Slater approximation. The calculations on several cluster models having different sizes were carried out for the determination of a model suited for analyzing bulk state. The Mn/sub 15/O/sub 56/ model was selected as a sufficiently suitable model for the calculation of electronic state and chemical bonding by the comparison of the calculated XPS (X-ray photo-electron spectrum) and experimentally measured XPS. By using this model, the electron energy level, the density of state, the bond overlap population, the charge density distribution, and the net ionic transfer between cations and anions were calculated and discussed.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2005.11a
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• pp.469-474
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• 2005

Tn this study, the noll-destructive computed X-ray tomography was adopted to observe the density distribution of the needle-punched C-C composites nozzle throat. The density distribution of the C-C was evaluated within ${\pm}0.01g/cm^3$ with 98.74% confidence when the correction of the image and high signal-to-noise ratio were achieved by the optimization of the beam hardening, the electrical noise and the scattered X-ray. The density variation of the C/C with the computed tomography was in good agreement with the results obtained by the water immersion method and the observation with scanning electron microscope.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.149.1-149.1
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• 2014

전자총의 방출전류량과 소스크기, 그리고 방출 각전류밀도(angular current density)를 측정함으로서 얻어지는 전자총의 휘도(brightness)는 대물렌즈의 수차와 더불어 전자현미경의 성능을 좌우한다. 국내업체의 전자현미경은 대부분 상대적으로 휘도가 낮지만 작동압력이 10-5 Torr의 이하여서 제작과 사용이 용이한 텅스텐 필라멘트 열전자총을 채용하고 있다. 주사전자현미경의 성능을 좌우하는 프로브 크기와 전류량은 광학계의 배율과 전자총의 휘도에 의해서 결정되며, 설계시 전자현미경의 사양을 결정하기 위해서는 전자총의 휘도 측정이 필수이다. 한국표준과학연구원에서는 국내에서 생산되는 전자현미경용 열전자총의 휘도를 측정하기 위해, 전자총의 방출 각전류밀도와 소스 크기를 측정할 수 있는 전자총 휘도 측정 시스템을 개발하고 있다. 본 발표에서는 개발중인 시스템의 측정 원리를 기술한다. 또한 외부 자기장에 의한 교란을 방지하기 위해 연자성 재료인 연강으로 제작한 진공챔버의 진공특성을 보고한다.

• The Magazine of the IEIE
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• v.7 no.1
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• pp.27-32
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• 1980

• KIPE Magazine
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• v.10 no.5
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• pp.29-32
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• 2005

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.131.1-131.1
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• 2015

플라즈마 진단법으로서 컷오프 탐침과 랑뮤어 탐침은 다양한 분야에서 많은 연구가 진행되었다. 하지만 고밀도 및 균일성 관점에서 많은 이점을 가지고 있는 자화유도결합플라즈마에서 컷오프 탐침의 적용 가능성에 대한 연구는 많이 부족하다. 본 연구에서는 두 가지 탐침법을 이용하여 전자밀도를 비교하고 각각의 특성을 분석하였다. 먼저 랑뮤어 탐침법을 이용하여 RF파워, 압력, 외부자기장에 따른 플라즈마 변수(전자밀도, 전자온도, 플라즈마 전위)를 측정하였다. 외부자기장을 인가하였을 때 전자구속으로 인하여 전 영역의 전자밀도는 증가하였지만 R방향의 전자밀도 분포는 균일하지 않았다. 반면 전자온도는 외부자기장을 인가하였을 때 챔버 중심에서 감소하였으며, 챔버 끝에서 전자온도는 증가하였다. 즉, R방향의 전자온도 분포는 U형태가 나타났다. 또한 컷오프 탐침으로 전자밀도를 측정한 결과 비교적 낮은 $10^{11}/cm^3$ 이하에서 정확한 컷오프 주파수를 확인하여 전자밀도를 구할 수 있었으며, 그 이상의 전자밀도를 갖는 경우 동축케이블의 손상 문제로 인하여 신뢰성 있는 결과를 얻기는 힘들다. 현재 이 문제를 해결하기 위한 연구가 지속적으로 진행 중이다.

• Journal of IKEEE
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• v.26 no.1
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• pp.83-88
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• 2022

With high performance and wide application, a CNTFET has been attracting a lot of attention as a next-eneration semiconductor, but the manufacturing process of CNTFET has not been mature enough, which makes commercialization difficult. In order to overcome the imperfections of the CNTFET manufacturing process and to increase the possibility of commercialization, this paper analyzes the CNTFET SRAM performance variation according to the CNTFET partial density change based on the recently reported CNTFET manufacturing process. Through HSPICE circuit simulation analysis using the existing 32nm CNTFET HSPICE library file, transistors whose performance variation is less sensitive to partial CNT density are selected among the six transistors constituting the SRAM cell and acceptable CNT density range is proposed. As the result of analysis, it is found that when the CNT density of the two transistors connected to the bit line in SRAM cell changed from 6/32nm to 8/32nm, the deviation of SRAM performance is less than 9% and when the CNT density is less than 5/32nm, the SRAM delay is increased by more than 8 time.