• Proceedings of the Korean Ceranic Society Conference
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• 2002.10a
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• pp.162.1-162
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• 2002

• Proceedings of the Optical Society of Korea Conference
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• 2009.10a
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• pp.305-307
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• 2009

• Proceedings of the Optical Society of Korea Conference
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• 2005.07a
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• pp.6-7
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• 2005

• Electrical & Electronic Materials
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• v.9 no.5
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• pp.445-449
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• 1996

Structural and optical characteristics in Se thin film fabricated by EBE method had been studied. Se thin film was deposited with noncrystalline until substrate temperature of >$100^{\circ}C$ Color of its surface had red genealogy, and its optical energy band gap was about 2.45 eV. But Se film was grown with monoclinic at substrate temperature of over >$150^{\circ}C$ Also, color of its surface had gray genealogy, and its optical energy band gap was about 2.31 eV. Finally, after heat-treatment at >$150^{\circ}C$ for 15 min with substrate temperature of >$100^{\circ}C$ noncrystalline Se was proved to be hexagonal, and color of its surface had dark gray genealogy, and its optical energy band gap was about 2.06 eV. From the results, it was known that Se thin film for photoelectric device with the lowest optical energy band gap was accepted from hexagonal structure.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.193.2-193.2
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• 2014

열차폐 코팅(Thermal Barrier Coating)은 주로 항공기 엔진이나 화력발전용 터빈 등의 $1300^{\circ}C$ 이상의 고온에서 사용되는 부품에 적용되어 모재(내열합금)의 손상 방지 및 에너지 효율 향상을 위해 사용되고 있다. 열차폐 코팅의 경우 Plasma Spray 공법과 EB-PVD(전자빔 물리 증착법) 공법이 가장 많이 사용되고 있다. Plasma Spray에 의한 열차폐 코팅 공정은 생산 비용이 저렴하고 수평형 적층 구조를 통한 높은 열전도율을 가지는 장점이 있으며, EB-PVD 공정은 수직형 구조의 열차폐막을 통해 내열 충격성과 내열 사이클성이 양호하다는 장점이 있다. 본 연구에서는 열 사이클의 내구성이 뛰어난EB-PVD를 이용하여 열차폐 코팅 공정연구를 진행하였다. 본 연구소에서 사용하고 있는 EB-PVD 는 종래의 장치와는 달리 70 kW급 전자총 5기가 장착 되어 있으며, 각각 시편 가열용 전자총 2기 및 피코팅용 가열 전자총 3기로 구성되어 있다. 이런 구성을 통해 다양한 종류의 열차폐 박막과 높은 결정성과 치밀도를 가지는 박막 형성할 수 있을 것이다. 본 발표에서는 EB-PVD 공정 연구결과 및 향후 실용화를 위한 개발 연구 방향에 대해서 기술하였다.

• The Korean Journal of Applied Statistics
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• v.27 no.4
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• pp.543-552
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• 2014

High bandwidth RF such as Bluetooth, GPRS, EDGE, 3GSM, HSDPA is papular in the mobile phone market. A non-conducting metal coating process requires an e-beam deposition of metal, two steps of UV hard coating primer and top coating; however, it is inefficient. We navigate to the electron beam irradiation conditions(resin surface treatment conditions) in the PC/ABS resin injection process. By analyzing the experimental results, we find the optimum development conditions for the electro deposition pre-treatment process and mass production lines using the plasma generated electron beam source.

• Journal of the Korean Vacuum Society
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• v.8 no.1
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• pp.43-50
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• 1999

We have studied the alignment and the lattice quality of hexagonal rings of h-BN films synthesized by ion beam assisted deposition (IBAD) method. Boron was e-beam evaporated at 1.5 $\AA$/sec and nitrogen gas was ionized using end-hall type ion gun at 60, 80, and 100 eV, respectively. Substrate was either not heated or heated at 200, 400, 500, and $800^{\circ}C$, respectively. As nitrogen ion energy increases, c-axes of hexagonal rings tend to align parallel to the substrate, which is explained by larger compressive stress at higher ion energies. Alignment of c-axis increases with temperature and shows maximum around $400^{\circ}C$. The lattice quality of hexagonal rings improves with temperature. Such behaviors can be understood from two counter trends of increasing the atomic mobility and decreasing compressive stress with temperature. Hardness of h-BN films shows the same trend with the alignment of c-axis. Ion beam assisted deposition method seems to be effective for aligning hexagonal rings and optimizing h-BN properties.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.350.1-350.1
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• 2014

분포 브래그 반사기(distributed Bragg reflector; DBR)는 광센서, 도파로, 태양전지, 반도체 레이저 다이오드, 광검출기와 같은 고성능 광 및 광전소자 응용분야에 널리 사용되고 있다. 일반적으로, DBR은 박막의 두께를 4분의 1 파장(${\lambda}/4$)으로 가지는 서로 다른 저굴절율 물질과 고굴절율 물질을 교대로 적층 (pair)한 다중 pair로 제작되어지며, DBR의 반사 특성과 반사대역폭은 두 물질의 굴절율 차이와 pair의 수에 영향을 받는다. 그러나, 서로 다른 굴절율을 갖는 두 물질을 이용하는 DBR의 경우, 두 물질간 열팽창계수의 불일치, 접착력 문제, 높은 굴절율 차이를 갖는 물질 선택의 어려움 등 많은 문제점을 지니고 있다. 최근, 경사입사각증착법을 이용한 동일 재료(예, 인듐 주석 산화물, 게르마늄, 실리콘)기반의 DBR 제작 및 특성에 대한 연구가 보고되고 있다. 높은 입사각을 갖고 박막이 증착될 경우, 저율을 갖는 다공박막 제작이 가능하여 경사입사각증착법으로 homogeneous 물질 기반의 고반사 특성을 갖는 다중 pair의 DBR을 제작할 수 있다. 본 실험은, 갈륨비소 기판 위에 경사입사각증착법 및 전자빔증착법을 이용하여 중심파장 960 nm가 되는 이산화 티타늄 기반의 DBR을 제작하였고, 제작된 샘플의 증착된 박막의 표면 및 단면의 프로파일은 주사전자현미경을 사용하여 관찰하였으며, UV-Vis-NIR 스펙트로미터를 이용하여 반사율 특성을 조사하였다.

• Applied Chemistry for Engineering
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• v.20 no.6
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• pp.612-616
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• 2009

Transparent conductive oxide (TCO) films have been widely used in the field of flat panel display industry. Transparent conductive indium zinc oxide (IZO) thin films with excellent chemical stability have attracted much attention as an alternative material for indium tin oxide (ITO) films. In this study, using a $In_2O_3$ and ZnO powder mixture with a ratio of 90 : 10wt% as a target, IZO films were prepared on polynorbornene (PNB) substrates by electron beam evaporation. The effect of substrate temperature and $O_2$ introduction flow rate were investigated in terms of electrical and optical properties of deposited IZO films. The best electrical and optical properties we obtained from this study were sheet resistance value of $5.446{\times}10^2{\Omega}/{\boxempty}$ and optical transmittance of 87.4% at 550 nm at $O_2$ introduction flow rate of 4 sccm, deposition rate of $2{\AA}$/sec, thickness of 1000 $\AA$ and substrate temperature of $150^{\circ}C$.

• Journal of the Korean Vacuum Society
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• v.8 no.1
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• pp.70-74
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• 1999

MgO-CaO protective layers with various composition were prepared by electron beam evaporation to improve the characteristics of conventional pure MgO thin films as a protective layer for AC-PDP. The maximum deposition rate of pure MgO was 1025 $\AA$/min and decreased with increasing [(CaO/(MgO+CaO)] ratio of evaporation starting materials. From XRD analyses, a trend of peak shift to the lower 2$\theta$ angle side was shown as CaO content increased and it stoped when the concentration of CaO was 0.13, which corresponds to the maximum solubility of CaO in MgO. The optimum composition of the protective thin films was Mg 47.1 at%, Ca 1.3 at%, O 51.6 at%, and firing voltage, memory margin and deposition rate of the film with this composition was 176 V, 0.5 and 515 $\AA$/min, respectively.