• Journal of the Korean Graphic Arts Communication Society
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• v.29 no.3
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• pp.17-30
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• 2011

The polarizer is an important optical element used in a variety of applications. Nano-wire grid polarizers in the form of sub-wavelength metallic gratings are an attractive alternative to conventional polarizers, because they provide high extinction ratio. This study has been carried out to fabrication of the 17inch area size nano-wire grid polarizer(NWGP) The master for NWGPs with a pitch of 200nm and the area size $730mm{\times}450mm$ were fabricated using laser interference lithography and aluminum sputtering and wet etching. And The NWGP fabrication process was using by the Roll to-Roll UV imprinting and was applied to flexible PET film. The results were a transmission of light (Tp) 46.7%, reflectance (Rs) 40.1% and Extinction ratio of above 16 for the visible light range.

• 프린팅코리아
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• v.14 no.3
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• pp.56-61
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• 2014

스마트폰의 등장 이후, 사람들의 미디어 이용 패턴는 급격히 변했다. 유비쿼터스 가속화로 언제, 어디서든 미디어를 사용할 수 있게 됐기 때문이다. 홈페이지, 블로그를 비롯해 페이스북과 트위터 등 소셜미디어의 등장으로 소비자는 단순히 정보를 습득하는 'Push형 이용'에서, 자신의 의사를 표현하는 '참여형 이용'으로 변하고 있다. 이런 변화 속에서 브랜드들은 소셜미디어를 통해 소비자들과 적극적인 관계 맺기에 나서고 있다. '이것은 좋은 브랜드 또는 제품입니다'라고 단순하게 말하는 데 그치는 것이 아닌, '좋은 브랜드 또는 제품'임을 직접적으로 보여주며 소비자와 관계자를 맺는 시대가 도래한 것이다. 인쇄도 마찬가지다. 이제는 인쇄도 B2B가 아닌 B2C 즉 소비자와 직접 대면하는 업종으로 변하고 있다. 소비자들과의 소통 여부가 인쇄산업 활성화에도 반드시 필요한 요소가 되고 있다.

• 프린팅코리아
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• s.25
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• pp.116-118
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• 2004

인류의 소중한 문화유산인 '직지'가 지난 4월 유네스코로부터 세계기록유산분야 최초의 시상제도인 '직지상'으로 제정된 것을 기념하기 위한 경축 세미나가 지난 6월 4일 오후 청주 고인쇄박물관 세미나실에서 열렸다. 이날 세미나의 제1주제는 허권 유네스코 문화팀장이 '직지상 의미와 전망'을 주제로 발표하고 김승환 충북대 교수의 사회로 황재봉 시의원, 임병무 충북일보 논설위원이 토론을 벌였다. 이어 제2주제로 박조원 한국문화정책연구원의 '직지상 제정과 세계화 추진'이란 주제발표와 전순동 충북대 교수의 사회로 강형기 충북대 교수의 박종관 충북민예총 사무처장이 토론을 벌였다. 제3주제는 노영민 국회의원이 '국가차원의 직지문화정책과 지원방안'이란 주제발표를 한데 이어 이동주 직지세계화추진단장, 남윤성 청주문화방송 특집부장의 토론이 있었다. 다음은 노영민 의원이 발표한 내용을 요약 소개한다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.414-415
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• 2007

PMMA light guiding plate with nano pattern was fabricated by nano imprinting technology. Silicon mold was fabricated by conventional photolithography. A nickel stamper was fabricated by electroplating process using silicon mold. Nano imprinting was performed on PMMA plate at $140^{\circ}C$ under pressure of 20kN. The nano pattern on PMMA plate was investigated using FE-SEM.

• The Journal of Korean Academy of Prosthodontics
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• v.46 no.2
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• pp.157-168
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• 2008

Statement of problem: Over the past two decades, implant supported fixed prosthesis have been widely used. However, there are few studies conducted systematically and intensively on the splinting effect of implant systems in mandible. Purpose: The purpose of this study was to investigate the changes in stress distributions in the mandibular implants with splinting or non-splinting crowns by performing finite element analysis. Materials and methods: Cortical and cancellous bone were modeled as homogeneous, transversely isotropic, linearly elastic. Perfect bonding was assumed at all interfaces. Implant models were classified as follows. Group 1: $Br{{\aa}}nemark$ length 8.5mm 13mm splinting type Group 2: $Br{{\aa}}nemark$ length 8.5mm 13mm Non-splinting type Group 3: ITI length 8.5mm 13mm splinting type Group 4: ITI length 8.5mm 13mm Non-splinting type An load of 100N was applied vertically and horizontally. Stress levels were calculated using von Mises stresses values. Results: 1. The stress distribution and maximum von Mises stress of two-length implants (8.5mm, 13mm) was similar. 2. The stress of vertical load concentrated on mesial side of implant while the stress of horizontal load was distributed on both side of implant. 3. Stress of internal connection type was spreading through abutment screw but the stress of external connection type was concentrated on cortical bone level. 4. Degree of stress reduction was higher in the external connection type than in the internal connection type.

• Journal of the Institute of Electronics Engineers of Korea CI
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• v.47 no.1
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• pp.15-21
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• 2010

This paper proposes the multimedia fingerprinting code insertion algorithm when video content is distributed in P2P environment, and designs the collusion codebook SRP(Small RISC Processor) embedded system for the collusion attack prevention. In the implemented system, it is detecting the fingerprinting code inserted in the video content of the client user in which it requests an upload to the web server and in which if it is certified content then transmitted to the streaming server then the implemented system allowed to distribute in P2P network. On the contrary, if it detects the collusion code, than the implemented system blocks to transmit the video content to the streaming server and discontinues to distribute in P2P network. And also it traces the colluders who generate the collusion code and participates in the collusion attack. The collusion code of the averaging attack is generated with 10% of BIBD code v. Based on the generated collusion code, the codebook is designed. As a result, when the insert quantity of the fingerprinting code is 0.15% upper in bitplane 0~3 of the Y(luminance) element of I-frame at the video compression of ASF for a streaming service and MP4 for an offline offer of video content, the correlation coefficient of the inserted original code and the detected code is above 0.15. At the correlation coefficient is above 0.1 then the detection ratio of the collusion code is 38%, and is above 0.2 then the trace ratio of the colluder is 20%.

• Journal of the Microelectronics and Packaging Society
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• v.30 no.2
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• pp.65-70
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• 2023

Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

• Journal of the Microelectronics and Packaging Society
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• v.29 no.1
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• pp.55-59
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• 2022

In this paper, we compared the electric field and absorptance of nano particles in nanostructures by amplifying the electric field around the nanoparticles through plasmon resonance and comparing the structure that can increase the absorptance with the nanostructure by using the Finite Different Time Domain (FDTD) simulation. In addition, the width of the nanostructure was adjusted to 240 nm ~ 300 nm, and the light absorptance rate was higher as the gap between the particles was short. In addition, a study was conducted on the formation of nanoparticles and nanostructures on the surface through UV imprint. In order to form particles in the structure, the nano particles were first arranged in the mold used for the fabrication of the structure using spray coating, and then fabricated through UV imprinting. The nanostructure and particles were formed together by scanning electron microscopy.

• Journal of the Korean Society for Precision Engineering
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• v.34 no.3
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• pp.199-203
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• 2017

Hot embossing techniques are used to engrave patterns on plastic substrates. Roll based hot embossing uses a heated roll for a continuous process. A heated roll with relief patterns is impressed on a preheated plastic substrate. Then, the substrate is cooled down quickly to prevent thermal shrinkage. The roll speed is normally very slow to ensure substrate temperature increase up to the glass transition temperature. In this paper, we propose a noncontact preheating technique using focused infrared light. The infrared light is focused as a line beam on a plastic substrate using an elliptical mirror just before entering the hot embossing roll. The mid range infrared light efficiently raises the substrate temperature. For preliminary tests, substrate deformation and temperature changes were monitored according to substrate speed. The experiments show that the proposed technique is a good possibility for high speed hot embossing.

• Transactions of Materials Processing
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• v.14 no.5 s.77
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• pp.473-476
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• 2005

The demand of on-chip total analyzing system with MEMS (micro electro mechanical system) bio/chemical sensor is rapidly increasing. In on-chip total analyzing system, to detect the bio/chemical products with submicron feature size, a filtration system with nano-filter is required. One of the conventional methods to fabricate nano-filter is to use direct patterning or RIE (reactive ion etching). However, those procedures are very costly and are not suitable fur mass production. In this study, we suggested new fabrication method for a nano-filter based on replication process, which is simple and low cost process. After the Si master was fabricated by laser interference lithography and reactive ion etching process, the polymeric mold was replicated by UV-imprint process. Metallic nano-filter was fabricated after removing the polymeric part of metal deposited polymeric mold. Finally, our fabrication method was applied to metallic nano-filter with $1{\mu}m$ pitch size and $0.4{\mu}m$ hole size for bacteria sensor application.