• Title/Summary/Keyword: 임프린트

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Study on the Formation of Residual Layer Thickness by Changing Magnitude and Period of UV Imprinting Pressure (UV임프린트 공정에서 임프린팅 가압력 및 가압시간에 따른 레진 잔막 두께형성에 대한 실험연구)

  • Shin, Dong-Hyuk;Jang, Si-Youl
    • Tribology and Lubricants
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    • v.26 no.5
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    • pp.297-302
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    • 2010
  • This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

Deformation of Polymer Resist in NIL Process by Molecular Dynamic Simulation (분자동역학기법을 이용한 나노 임프린트 리소그래피 공정에서의 고분자 변형모사)

  • Woo, Young-Seok;Lee, Woo-Il
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.337-342
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    • 2007
  • In this study, molecular dynamics simulation of nano imprint lithography in which patterned stamp is pressed onto amorphous polyethylene(PE) surface are performed to study the behaviour of polymer. Force fields including bond, angle, torsion, and Lennard Jones potential are used to describe the inter-molecular and intra-molecular force of PE molecules and stamp, substrate. Periodic boundary condition is used in horizontal direction and canonical NVT ensemble is used to control the system temperature. As the simulation results, the behaviour of polymer is investigated during the imprinting process. The mechanism of polymer deformation is studied by means of inspecting the surface shape, volume, density, atom distribution. Deformation of the polymer resist was found for various of the stamp geometry and the alignment state of the polymer molecules.

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Ag nanorod manufacturing using nano-imprint lipography process and application of amorphous thin film solar cells (나노 임프린트 공정을 이용한 Ag 나노로드 제조 및 비정질 박막 태양전지 적용)

  • Jang, JiHoon;Han, Kang-Soo;Cho, Jun-Sik;Lee, Heon;Park, Hai Woong;Song, Jinsoo;Lee, Jeong Chul
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.103.2-103.2
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    • 2011
  • 비정질 실리콘 태양전지의 효율을 증가하기 위하여 많이 사용되는 방법 중 하나는 입사되는 빛의 산란을 증가하여 태양전지의 광흡수를 증가시키는 방법이다. 이를 위하여 양극전극으로 사용되는 TCO층의 일정한 패턴 처리를 통하여 광산란을 증가시키는 방법이 사용되고 있다. 본 연구에서는 나노 임프린트 리소그래피방법을 사용하여 Ag 나노로드를 증착한 기판을 제조하고 이를 비정질 실리콘 태양전지에 적용하였다. 실험결과, 그림과 같이 높이와 너비가 300nm 정도로 일정한 패턴의 Ag 나노로드를 제조하였다. 또한, 그 위에 증착된 Si 박막의 경우, 나노로드 전체를 감싸는 돔 형태로 성장하였다. 이와 같은 나노로드 위에 substrate n-i-p 구조의 비정질 박막 태양전지를 증착하고 그 특성변화를 분석하고자 하였다.

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A Study on the expectation of residual layer thickness in roller pressing imprint process (롤러 가압 임프린트 공정에서 잔류막 두께 예측에 관한 연구)

  • Cho, Young Tae;Jung, Yoon-Gyo
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.12 no.1
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    • pp.104-109
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    • 2013
  • In order to apply nano imprint technology in large area process, roller pressing is promising because of its low cost and high productivity. When pressing mold by roller, liquid resin is locally squeezed between mold and substrate. In this study, the main focus is to understand which process parameter affects residual layer. To do this, a simple analytical model was introduced. Especially, we consider the aspect ratio of patterns as essential cause of variation of the thickness in the equation. As a result, when the aspect ratio of pattern in the mold increases, the thickness of residual layer also increases. In conclusion, we show that the uniformity of residual layer could be accomplished by the control of velocity and pressing force in roller pressing imprint process.

박막형 태양전지 기판용 반사방지구조 형성 및 반사방지 효과에 의한 효율 향상

  • Han, Gang-Su;Sin, Ju-Hyeon;Kim, Gang-In;Lee, Heon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.27.1-27.1
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    • 2010
  • 본 연구에서는 박막형 태양전지의 효율 향상을 위한 한 가지 방법으로써 박막 태양전지의 기판으로 사용되는 유리 표면위에 반사방지 기능을 갖는 미세 구조물을 형성하였다. 형성된 미세구조물은 가시광선 영역의 빛의 파장보다 작고 원뿔형 구조를 가지고 있어서 빛의 점진적인 굴절률 변화를 야기하며, 이러한 구조적 굴절률 변화에 의한 반사억제 효과를 확인 할 수 있었다. 이러한 반사방지효과는 곧 태양전지의 효율 향상으로 나타났다. 미세구조물 형성을 위한 방법으로는 나노임프린트 리소그래피 기술과 니켈 재질의 금속 몰드를 사용하였으며, 반사방지구조를 형성하기 위해서 열경화 방식의 임프린트 레진이 사용되었다.

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Dimensional Stability of an Imprinted Microoptic Waveguide (임프린트 기반 마이크로 광도파로의 변형 특성 연구)

  • Ryu, Jin-Hwa;Kim, Chang-Seok;Jeong, Myung-Yung
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.11
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    • pp.100-106
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    • 2008
  • We have studied the characteristic changes of optical device using imprint lithography. An imprinted structure is inherently involved in residual stress due to the temperature and the pressure cycle during fabrication process. A structure with residual stress undergoes stress relaxation, which leads io dimensional change. Therefore, annealing processes was performed to reduce the residual stress of imprinted polymer channel. Reduction of residual stress was confirmed through dimensional change, birefringence, and the mechanical properties. We have fabricated an optical device, and it saw the optical intensity changes within 0.1% for 1 month.