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A Study on the expectation of residual layer thickness in roller pressing imprint process  

Cho, Young Tae (Dept. of Mechanical Eng., Changwon National Univ.)
Jung, Yoon-Gyo (Dept. of Mechanical Eng., Changwon National Univ.)
Publication Information
Journal of the Korean Society of Manufacturing Process Engineers / v.12, no.1, 2013 , pp. 104-109 More about this Journal
Abstract
In order to apply nano imprint technology in large area process, roller pressing is promising because of its low cost and high productivity. When pressing mold by roller, liquid resin is locally squeezed between mold and substrate. In this study, the main focus is to understand which process parameter affects residual layer. To do this, a simple analytical model was introduced. Especially, we consider the aspect ratio of patterns as essential cause of variation of the thickness in the equation. As a result, when the aspect ratio of pattern in the mold increases, the thickness of residual layer also increases. In conclusion, we show that the uniformity of residual layer could be accomplished by the control of velocity and pressing force in roller pressing imprint process.
Keywords
Nano Imprint Process; Roller Pressing; Residual Layer;
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1 Ian McMackin, Jin Choi, Philip Schumaker, Van Nguyen, Frank Xu, Ecron Thompson, Daniel Babbs, S.V. Sreenivasan, Michael Watts, Norman Schumaker, "Step and repeat UV Nanoimprint Lithography Tools and Processes", Proceedings of SPIE Vol. 5374, pp. 222-231, 2004.
2 Michael D. Austin, Haixiong Ge, Wei Wu, Mingtao Li, Zhaoning Yu, D. Wasserman, S. A. Lyon and Stephen Y. Chou, "Fabrication of 5 nm line width and 14 nm pitch features by nanoimprint lithography", Applied Physics Letters, Vol. 84, No. 26, pp. 5299-5301, 2004   DOI   ScienceOn
3 Wei Wu, William M. Tong, J. Bartman, Y. Chen, Robert Walmsley, Zhaoning Yu, Qiangfei Xia, Inkyu Park, Carl Picciotto, Jun Gao, Shih-Yuan Wang, Deborah Morecroft, Joel Yang, Karl K. Berggren and R. Stanley Williams, "Sub-10nm nanoimprint lithography by Wafer Bowing", Nano Letters, Vol.8, No.11, pp. 3865-3869, 2008.   DOI   ScienceOn
4 Hua Tan, Andrew Gilbertson and Stephen Y. Chou, "Roller Nanoimprint Lithography", Journalof Vacuum Science & Technology B, Vol. 16, No. 16, pp. 3926-3928, 1998.   DOI   ScienceOn
5 J.G. Kim, Y. Sim, Y. Cho, J.W. Seo, S. Kwon, J.W. Park, H.G. Choi, H. Kim, S. Lee, "Large Area Pattern Replication by Nanoimprint Lithography for LCD-TFT Application", Microelectronic Engineering, Vol. 86, No. 12, pp. 2427-2431, 2009.   DOI   ScienceOn
6 Se Hyun Ahn and L. Jay Guo, "Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting", ACS Nano, Vol. 3, No. 8, pp. 2304-2310, 2009.   DOI   ScienceOn
7 Heydermana, L. J., Schifta, H., Davida, C., Gobrechta, J., Schweizerb, T., "Flow Behavior of Thin Polymer Films Used for Hot Embossing Lithography", Microelectronic Engineering, Vol. 54, pp. 229-245, 2000.   DOI   ScienceOn