• Korean Journal of Materials Research
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• v.8 no.9
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• pp.825-830
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• 1998

자화된 유도결합형 C4F8 플라즈마로 SiO2를 건식식각시 실리콘 표면에 발생하는 손상과 오염에 대하여 연구하였다. 오염의 분석을 위해서 XPS, SIMS, TEM을 사용하였으며, 손상정도를 측정하기 위해서 HRTEM과 Schottky-diode 구성을 통한 I-V특성 측정을 사용하였다. 유도 결합형 C4F8 플라스마에 0에서 18Gauss까지의 자장이 가해짐에 따라서 실리콘 표면에 생기는 잔류막의 두께가 SiO2식각속도와 선택비의 증가와 함께 증가하였으며, XPS를 통하여 그 조성이 fluorine-rich에서 carbon-rich 한 상태로 변화함을 알 수 있었다. 자장을 가하지 않는 상태에서는 표면에서 $40\AA$부근까지 고밀도의 손상층이 관찰되었으나, 자장을 가함에 따라서 노출된 손상층의 깊이는 깊어지나 그 밀도는 줄어들음을 HRTEM을 통하여 관찰 할 수 있었다. Schottky-diode를 통한 I-V특성곡선의 분석으로 자장이 증가함에 따라서 전기적인 손상이 감소함을 알 수 있었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.11 no.4
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• pp.261-266
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• 1998

In developing the high density memory device, the etching of fine pattern is becoming increasingly important. Therefore, definition of ultra fine line and space pattern and minimization of damage and contamination are essential process. Also, the high density plasma in low operating pressure is necessary. The candidates of high density plasma sources are electron cyclotron resonance plasma, helicon wave plasma, helical resonator, and inductively coupled plasma. In this study, planar type magnetized inductively coupled plasma etcher has been built. The density and temperature of Ar plasma are measured as a function of rf power, flow rate, external magnetic field, and pressure. The oxide etch rate and selectivity to polysilicon are measured as the above mentioned conditions and self-bias voltage.

• Korean Journal of Optics and Photonics
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• v.31 no.3
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• pp.125-133
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• 2020

An innovative method for separating overlapping latent fingerprints, using laser-induced plasma spectroscopy (LIPS) combined with multivariate analysis, is reported in the current study. LIPS provides the capabilities of real-time analysis and high-speed scanning, as well as data regarding the chemical components of overlapping fingerprints. These spectra provide valuable chemical information for the forensic classification and reconstruction of overlapping latent fingerprints, by applying appropriate multivariate analysis. This study utilizes principal-component analysis (PCA) and partial-least-squares (PLS) techniques for the basis classification of four types of fingerprints from the LIPS spectra. The proposed method is successfully demonstrated through a classification example of four distinct latent fingerprints, using discrimination such as soft independent modeling of class analogy (SIMCA) and partial-least-squares discriminant analysis (PLS-DA). This demonstration develops an accuracy of more than 85% and is proven to be sufficiently robust. In addition, by laser-scanning analysis at a spatial interval of 125 ㎛, the overlapping fingerprints were separated as two-dimensional forms.

• Journal of the Korean Vacuum Society
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• v.6 no.1
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• pp.91-96
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• 1997

The electrical characteristics and the plasma parameters of planar inductively coupled plasmas (ICP) have been measured. The resistance of the total load including the coil and the plasma varied from 1 to 4 W and the inductance from 1.5 m to 2 mH when the power was changed from 100 to 1000 W and the pressure from 1 to 10 mTorr. The density of electron measured by Langmuir probe was over $10^{11}/\textrm{cm}^3$ and the temperature varied between 3 and 5 eV as the process conditions were changed. Bias modulation was adopted as a new method to improve the selectivity of $SiO_2$on Si in $C_4F_8$ (octafluorocyclobutane) plasma. The selectivity was improved as the duty ratio decreased, but the etch rate of $SiO_2$decreased below 400$\AA$/min. $H_2$addition to $C_4F_8$ plasma showed that the etch selectivity could be higher than 50 and the etch rate of $SiO_2$over 2000$\AA$/min when 60% $H_2$was added.

• Journal of the Korean Society for Aeronautical & Space Sciences
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• v.48 no.6
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• pp.479-487
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• 2020

A new double-pulse laser system that combines Raman and laser induced plasma spectroscopy (LIPS) in a single unit is proposed. The study attempts to enhance the laser induced plasma signals while simultaneously extracting the desired molecular signals from Raman spectroscopy. In low pressure conditions such as the lunar atmosphere, the measuring of plasma emission is hard because of the low electron density and short persistence time causing a rapid plasma expansion. Furthermore, in the integration of the detecting system aimed at space exploration, the minimization of laser system is important in terms of the payload mass. Simultaneous molecular and atomic detection that gave highly resolved spectral data at pressure below 0.07 torr is demonstrated amongst eight rock samples test. The plasma stacking produced from the double-pulse laser enhanced the signal intensity of calcium and oxygen lines in calcite matrix by twofold, compared to a conventional LIPS.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1799-1800
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• 2007

Radial Basis Function Network (RBFN)을 이용하여 플라즈마 전자밀도를 모델링하였다. RBFN의 예측성능은 학습인자의 함수로 최적화하였다. 체계적인 모델링을 위해 통계적인 실험계획법이 적용되었으며, 실험은 반구형 유도 결합형 플라즈마 장비를 이용하여 수행이 되었다. 전자밀도 측정에는 Langmuir probe가 이용되었다. 최적화된 GA-RBFN모델을 일반 RBFN모델과 비교하였으며, 11%정도 모델의 예측성능을 향상시켰다.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1938-1939
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• 2007

Radial Basis Function Network (RBFN)을 이용하여 플라즈마 전자밀도를 모델링하였다. RBFN의 예측성능은 학습인자의 함수로 최적화하였다. 체계적인 모델링을 위해 통계적인 실험계획법이 적용되었으며, 실험은 반구형 유도결합형 플라즈마 장비를 이용하여 수행이 되었다. 전자밀도측정에는 Langmuir probe가 이용되었다. 최적화된 RBFN모델을 통계적인 회귀 모델과 비교하였으며, 59%정도 모델의 예측성능을 향상시켰다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.439-439
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• 2010

다양한 가스 방전에서의 전자에너지 분포함수 측정을 통하여 E-H mode 전이에 대한 연구를 하였다. 단원자 가스 방전에서는, 압력이 증가함에 따라 E-mode에서 H-mode로의 전이를 위한 인가 파워는 크게 바뀌지 않았다. 하지만, 다원자 가스에서는 압력이 증가함에 따라 상당히 높은 인가 파워가 필요하였다. 이것은 다원자 가스에서 압력이 증가함에 따라, 해리, 진동 및 회절 운동, 그리고 음이온 생성으로 인한 플라즈마 밀도의 감소에 의한 것이다. 그에 따라, H-mode 전이를 위한 충분한 플라즈마 밀도를 생성하기 위해서 더 큰 인가 파워가 필요하게 된다. 이러한 연구는 혼합가스에서도 측정하였다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.06a
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• pp.56-57
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• 2001

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.06a
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• pp.15-16
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• 2001