• 제목/요약/키워드: 엑시머 레이저

검색결과 121건 처리시간 0.026초

엑시머 레이저를 이용한 3차원 마이크로가공 (Three Dimensional Micromachining using Excimer laser)

  • 최경현;배창현;이석희
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 1997년도 추계학술대회 논문집
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    • pp.1076-1079
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    • 1997
  • A new 3D micromachining method, called Hole Area Modulation(HAM), has been introduced and experimentally confirmed its feasibility. In this method, information on the depth of machining is converted to the sizes of small holes in the mask. The machining is carried out with a simple 2D movement of the workpiece. This method can be applied for machining various kinds of microcavities in various materials. In this paper, a mathematical model for excimer laser micromachining based on HAM and also determination of the optimal laser ablation conditions(width, Hole radius, step size, path, etc.) is completed by employing using Genetic Algorithm(GA).

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KrF 엑시머 레이저를 이용한 용융실리카의 미세 습식 식각가공 (Micromachining of Fused Silica by KrF Excimer Laser Induced Wet Etching)

  • 백병선;이종길;전병희;김헌영
    • 소성∙가공
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    • 제11권7호
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    • pp.601-607
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    • 2002
  • Optically transparent materials such as fused silica, quartz and crystal have become important in the filed of optics and optoelectronics. Laser ablation continues to grow as an important technique for micromachining and surface modification of various materials, because many problems caused by direct contact between tools and workpiece can be avoided. Especially, laser ablation with excimer lasers enables fine micromachining of transparent materials such as fused silica, quartz and crystal, etc. In this study, laser-induced wet etching of fused silica in organic solution was conducted. KrF excimer laser was used as a light source and acetone solution of pyrene was used as etchant. Changing the number of laser pulses, micro holes of various depths are fabricated.

엑시머 레이저를 이용하여 결정화한 PECVD 및 LPCVD 비정질 실리콘 박막의 특성 분석 (An Analysis of Characteristics of PECVD and LPCVD a-Si Films Crystallized by Excimer Laser)

  • 장근호;이성규;전명철;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 하계학술대회 논문집 C
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    • pp.1239-1242
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    • 1994
  • We have characterized XeCl excimer-laser-induced crystallization of thin amorphous silicon films deposited by PECVD (${\alpha}-Si:H$) and LPCVD(${\alpha}-Si$). The electrical and optical properties and surface roughness of crystallized thin films have been measured. The dc conductivities, crystallinity and surface roughness of the films increased as the laser energy density and shot density were increased. Also, we have investigated the effects of 2-step annealing employing SPC and ELA. The properties of 2-step annealed films were better than those of films annealed by ELA only.

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유전자 알고리즘을 이용한 엑시머 레이저가공의 최적조건 선정 (Determination of Optimal Excimer Laser Ablation Conditions Using Genetic Algorithm)

  • 배창현;최경현;이석희
    • 한국공작기계학회논문집
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    • 제11권6호
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    • pp.17-23
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    • 2002
  • A new 3D micromachining method called Hole Area Modulation(HAM), has been introduced to enhance the current micromachining technology. In this method, information on the depth of machining is converted to the sizes of small holes in the mask. The machining is carried out with a simple 2D movement of the workpiece. This method can be applied for machining various kinds of microcavities in various materials. In this paper, a machematical model for excimer laser micromachining based on HAM and also determination of optimal laser ablation conditions(width hole radius, step size, path, etc.) is performed by Genetic Algorithm(GA).

PLC형 WDM 방향성 결합기와 UV 조사에 의한 파장 천이 효과 (PLC-Type WDM directional coupler and the effect of wavelength shift by UV irradiation)

  • 한상필;박태상;최영복;강민정;김상인;박수진;정기태
    • 한국광학회지
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    • 제11권1호
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    • pp.33-36
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    • 2000
  • 일반적으로 광섬유 격자에 사용되고 있는 KrF 엑시머 레이저를 광출력 스펙트럼 파장천이용으로 이용하였다. 실험 결과, FHD에 의해서 제작된 PLC형 WDM 방향성결합기에서는 UV에 의한 파장천이효과가 비교적 큼을 알 수 있었다. UV 노출량에 의한 파장천이량을 측정하여 UV 노출량에 따른 실리카 광도파로의 유효굴절률 변화량을 계산하였다.

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KrF 엑시머 레이저에 의한 ITO 박막의 어블레이션과 표면특성관찰 (The ablation of ITO thin films by KrF Eximer laser and its characteristics)

  • Lee, Kyoung-Cheol;Lee, Cheon
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.511-514
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    • 2000
  • This work aimed to develop ITO (Indium Tin Oxide) thin films ablation with a KrF Eximer laser required for the application in flat panel display, especially patterning into small geometry on a large substrate area. The threshold fluence for ablating ITO on glass substrate is about 0.1 J/cm$^2$. And its value is much smaller than using third harmonic Nd:YAG laser. Through the optical microscope measurement the surface color of the damaged ITO is changed into dark brown and irradiated spot is completely isolated form the undamaged surroundings by laser light. The XPS analysis showed that the relative surface concentration of Sn and In were essentially unchanged (In :Sn=5:1) after irradiating Eximer laser. Using aluminium mask made by second harmonic Nd:YAG laser the ITO patterning is carried out.

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엑시머 레이저를 이용한 저온 다결정 실리콘 박막 트랜지스터의 특성 (Characteristics of low temperature poly-Si thin film transistor using excimer laser annealing)

  • 강수희;김영훈;한진우;서대식;한정인
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.430-431
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    • 2006
  • This letter reports the fabrication of polycrystalline silicon thin-film transistors (poly-Si TFT) on flexible plastic substrates using amorphous silicon (a-Si) precursor films by sputter deposition. The a-Si films were deposited with mixture gas of argon and helium to minimize the argon incorporation into the film. The precursor films were then laser crystallized using XeCl excimer laser irradiation and a four-mask-processed poly-Si TFTs were fabricated with fully self-aligned top gate structure.

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평판도파로 브래그격자 제조 및 온도에 따른 파장변화 측정 (Fabrication of Planar Waveguide Bragg Grating and Measurement of Wavelength Change for Temperature)

  • 한준모;서영진;백세종;임기건;최두선
    • 한국광학회:학술대회논문집
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    • 한국광학회 2003년도 하계학술발표회
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    • pp.214-215
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    • 2003
  • 평면광도파로 브래그격자는 광도파로 내부의 코어의 굴절률을 주기적으로 또는 비주기적으로 변화시켜 특정 파장의 빛을 반사시키거나 투과손실로 작용하게하는 광소자이다. 이러한 광소자는 광가감다중화기, 분산보상기, 파장선택형 반사거울, 파장제거필터, 증폭기의 이득평탄화, 광스위치등 여러분야의 소자 개발의 핵심적인 기능을 부여한다. UV 엑시머레이저의 출력을 게르마늄이 첨가된 실리카 유리에 조사하여 격자구조를 형성시키는 방법이 Hill 등에 의해 발표되었고 이후, 홀로그래피 방법, 위상마스크 방법등 여러 가지의 광섬유 격자 형성방법을 활용하여 여러종류의 광통신소자들이 연구되었다. (중략)

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레이저 이온화 이온트랩 질량분석법을 이용한 금속 및 세라믹 시료의 원소분석에 관한 연구 (Study on elemental analysis of metal and ceramic samples by using laser ablation ion trap mass spectrometry(LAITMS))

  • 송규석;박현국;차형기;이상천
    • 분석과학
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    • 제15권1호
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    • pp.7-14
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    • 2002
  • 본 연구에서는 레이저 애블레이션 이온 트랩 질량분석법을 이용하여 금속 및 세라믹 시료들에 대한 원소분석을 수행하였고, 이때 이온화 장치로는 XeCI 엑시머 레이저를 사용하였고 검출장치로서 이온트랩 질량 분석기를 사용하였다. 시료는 트랩의 바깥에 장착하여 시료의 교환이 매우 쉽도록 하였고 고체시료의 분석에 있어서 매우 효과적임을 밝혔다. 헬륨기체의 압력이나 이온저장시간, 초기질량제한 RF 전압 등에 대한 기초 실험을 통하여 실험의 최적 조건을 구하였고 (헬륨 기체압력 $1{\times}10^{-4}$ Torr 이온 저장시간 100 ms 초기 질량 제한전압 $1150V_{p-p}$), 이 결과를 토대로 금속시료(구리, 몰리브데늄)와 세라믹 시료(알루미나 세라믹, 지르코니아 세라믹) 들에 대한 원소분석을 수행하였다.

파장 가변형 KrF 에시머 레이저를 이용한 층류 비예혼합 수소 화염에서의 2차원적 온도 및 농도 계측 (Planar Imaging of Temperature and Concentration of a Laminar Nonpremixed $H_2$/$N_2$flame Using a Tunable KrF Excimer Laser)

  • 김군홍;진성호;김용모;박경석;김세원;김경수
    • 대한기계학회논문집B
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    • 제24권12호
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    • pp.1580-1587
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    • 2000
  • Rayleigh scattering and laser induced predissociative fluorescence are employed for capturing two-dimensional images of temperature and species concentration in a laminar nonpremixed flame of a diluted hydrogen jet. Rayleigh scattering cross-sections are experimentally obtained ar 248nm. Dispersed LIPF spectra of OH and O$_2$ are also measured in a flame in order to confirm the excitation of single vibronic state of OH and O$_2$ .OH and O$_2$ are excited on the P$_1$(8) line of the A $^2\Sigma ^+(v^`=3) - X^2\pi (V^"=0)$ band and R(17) line of the Schumann-Runge band B $^3\Sigma _u^-(v^`=0) - X ^3\Sigma _g^-(v^"=6)$, respectively. Fluorescence spectra of OH and Hot O$_2$ are captured and two-dimensional images of the hydrogen flame field are successfully visualized.