• Journal of the Korean Ceramic Society
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• v.35 no.3
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• pp.294-302
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• 1998

$Pb_{1+x}$($Fe_{0.5}$$Nb_{0.5}$)$O_3$ films have been synthesized on Pt/Ti/$SiO_2$/Si substrates using rfmagnetron sputtering Concentration of Fe and Nb in the deposited films was adjusted to near stoichiometry through the control of target composition, Films deposited with adjusted to near stoichiometry showed better electrical properties such as dielectic and leakage characteristics. Crystallinity and dielectric constant increased with increasing excess PbO upto 9 mol% This study also showed that dielectric constant and leakage current characteristics improved by optimum content of $O_2$ flow during deposition.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.6
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• pp.1175-1177
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• 2011

The SBN thin films were deposited on Pt/Ti/$SiO_2$/Si and p-type Si(100) substrate by rf magnetron sputtering method using $Sr_{0.7}Bi_{2.3}Nb_2O_9$ ceramic target. SBN thin films deposited were annealed at 600~800[$^{\circ}C$] by furnace in oxygen atmosphere during 40min. The polarization characteristics have been investigated to confirm the possibility of the SBN thin films for the application to destructive read out ferroelectric random access memory. The maximum remanent polarization and the coercive voltage are 0.6[${\mu}C/cm^2$], 1.2[V] respectively at annealing temperature of 800[$^{\circ}C$]. The leakage current density was the $2.57{\times}10^{-6}[A/cm^2]$ at an applied voltage of 5[V] at annealing temperature of 650[$^{\circ}C$]. Also, the fatigue characteristics of SBN thin films did not change up to $10^8$ switching cycles.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1248_1249
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• 2009

The $Sr_{0.7}Bi_{2.3}Nb_2O_9$(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/$SiO_2$/Si) using RF sputtering method with RF power and Ar/$O_2$ ratio. The size of grain of SBN thin films were increased with the increase of Ar/$O_2$ ratio and RF power respectively. Also, the crystallinity of SBN thin films were increased remarkably at RF power and Ar/$O_2$ ratio were 80[W] and 80/20, respectively.

• 한국신재생에너지학회:학술대회논문집
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• 2009.06a
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• pp.403-405
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• 2009

RF-스퍼터링법을 사용하여 메탄올 산화반응을 위해 박막형 전극을 제조하였다. 전극은 텅스텐 탄화물(WC)과 텅스텐 산화물($WO_3$), 그리고 백금(Pt) 타겟을 이용하였으며 그 구조적 특성과 전기화학적 특성을 TEM(Transmission electron microscopy와 CV(Cyclic Voltametry)를 통하여 촉매적 활성을 측정해 보았다. 같은 양의 백금과의 활성을 비교하고 활성을 확인하였다.

• The Transactions of the Korean Institute of Electrical Engineers P
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• v.58 no.4
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• pp.538-540
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• 2009

The SBN thin films were deposited at substrate temperature of 300[$^{\circ}C$] on Pt-coated electrode (Pt/Ti/$SiO_2$/Si(100)) using RF sputtering method. The grain and crystallinity of SBN thin films were increased with the increase of annealing temperature. The dielectric constant(150) of SBN thin film was obtained by annealing temperature above 750[$^{\circ}C$]. The voltage dependence of dielectric loss showed a value within 0.01 in voltage ranges of -5~+5[V]. The capacitance characteristics showed a stable value of about 0.7[${\mu}F/cm^2$].

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1998.11a
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• pp.239-242
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• 1998

The (S $r_{0.85}$C $a_{0.15}$)Ti $O_3$ (SCT) thin films are deposited on Pt-coated electrode using RF magnetron sputtering method at various substrate temperature. Dielectric constant of SCT thin films is increased with increased as the deposition temperature and changes almost linearly in temperature ranges from -80 to +90[$^{\circ}C$]. The drastic decrease of dielectric constant and increase of dielectric loss in SCT thin films is observed above 200[kHz]. V-I characteristics of SCT thin films show the increasing leakage current with the increases of deposition temperature.ure.

• Journal of the Korean Ceramic Society
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• v.31 no.7
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• pp.731-738
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• 1994

TiN films were deposited on high speed steels by plasma assisted chemical vapor deposition (PACVD), cathode arc ion plating (CAIP) and reactive magnetron sputtering (RMS). The properties of the films deposited by the three different methods were compared. The preferred oriented plane of PACVD-TiN is (200) and those of CAIP-TiN and RMS-TiN are (111). PACVD-TiN shows a dome surface and a microstructure having small grains. CAIP-TiN shows the highest microhardness and the best adhesion strength of the three because it has a dense microstructure and an ill-defined interface. But is shows the greatest surface roughness due to the Ti droplet created by the arc. RMS-TiN shows a microstructure having large voids so that its properties in microhardness and adhesion are the worst of the three.

• Proceedings of the KIEE Conference
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• 1998.07d
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• pp.1346-1348
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• 1998

Tungsten oxide($WO_3$) thin films were prepared by reactive magnetron sputtering in an $Ar/O_2$ atmosphere from a compressed powder $WO_3$ target and their electrochromic(EC) phenomena were investigated. PEO-$LiClO_4$-PC polymer electrolyte can easely be formed into thin films and showed high transmittance. Such electrolyte have electrochromic properties suitable for large-scale electrochromic devices. For the devices using $WO_3$ thin films of 1500, 2500, $4000{\AA}$ thickness with glass/ITO/$WO_3$/PEO-$LiClO_4$-PC/ITO/glass structure, an optical modulation of $50{\sim}60%$ were obtained at a potential range of $1{\sim}2V$. It has shown that transmittance and reflectance of light could be electrically controlled by low applied voltage.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.908-912
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• 2003

비대칭 마그네트론 스퍼터링법을 사용하여 실리콘 기판위에 hydrogenated amorphous carbon (a-C:H) 박막을 성장시켰다. DC Power 와 $Ar/C_2H_2$ 의 분압을 변화시켜 증착조건을 형성하고 성장된 다이아몬드상 카본박막의 물성을 관찰하였다. DC 전압에 따라 증착율과 표면 거칠기는 감소하는 한편 박막의 경도는 증가한다. 또한 $Ar/C_2H_2$의 분압이 낮을 때 박막의 특성을 보여주는 G 피크가 낮은 wavenumber로 이동하는 것을 알 수 있다.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.11a
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• pp.695-698
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• 2004

최근 고유가 시대를 맞으면서 대체 에너지로서 무한자원인 태양빛을 이용하는 염료감응형 태양전지에 대한 관심이 급증하고 있으며, 이미 오래전부터 이에 대한 연구는 이루어져왔다. 한편, 염료감응형 태양전지를 구성하는 여러 분야 중 산화물 전극이나 전해질 또는 염료에 대한 연구는 많은 관심속에 진행되어오고 있는데 반해 상대전극에 대한 연구는 미비한 실정이다. 이에 본 연구에서는, 일반적으로 태양전지의 상대전극으로 사용되어오고 있는 Pt를 스퍼터링법 및 전기도금법을 이용하여 증착한 후 AFM을 통한 표면 형상 및 전기화학적 특성을 바탕으로 비교하여 태양전지의 상대전극으로서 적합한 제조 조건을 결정하였다.