• Title/Summary/Keyword: 상변화재료

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Development of a Numerical Simulator for Methane-hydrate Production (메탄 하이드레이트 생산 묘사를 위한 수치도구의 개발)

  • Shin, Hosung
    • Journal of the Korean Geotechnical Society
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    • v.30 no.9
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    • pp.67-75
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    • 2014
  • Methane gas hydrate which is considered energy source for the next generation has an urgent need to develop reliable numerical simulator for coupled THM phenomena in the porous media, to minimize problems arising during the production and optimize production procedures. International collaborations to improve previous numerical codes are in progress, but they still have mismatch in the predicted value and unstable convergence. In this paper, FEM code for fully coupled THM phenomena is developed to analyze methane hydrate dissociation in the porous media. Coupled partial differential equations are derived from four mass balance equations (methane hydrate, soil, water, and hydrate gas), energy balance equation, and force equilibrium equation. Five main variables (displacement, gas saturation, fluid pressure, temperature, and hydrate saturation) are chosen to give higher numerical convergence through trial combinations of variables, and they can analyze the whole region of a phase change in hydrate bearing porous media. The kinetic model is used to predict dissociation of methane hydrate. Developed THM FEM code is applied to the comparative study on a Masuda's laboratory experiment for the hydrate production, and verified for the stability and convergence.

Dependence of Microstructure and Optical Properties of Ag-In-Sb-Te Phase-Change Recording Thin Firms on Annealing Heat-Treatments (열처리 조건에 따른 Ag-In-Sb-Te 상변화 기록 박막의 미세 조직과 반사도의 관계)

  • Seo, H.;Park, J. W.;Choi, W. S.;Kim, M. R.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.05a
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    • pp.9-14
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    • 1996
  • The dependence of microstructural and optical properties of Ag-In-Sb-Te thin films on annealing heat-treatments was studied. It was found from the present work that the increase of reflectance after annealing heat-treatment is related with phase change of Ag-In-Sb-Te thin film from amorphous state to crystalline phases which involve Sb crystalline phase and AgInTe$_2$ stoichiometric phase. On the other hand, the reflectance is decreased after high temperature annealing (above 450$^{\circ}C$), due to the morphology .mange of film surface. For the purpose of practical application(erasable optical disk), we fabricated quadrilayered Ag-In-Sb-Te alloy disk, and annealed it with continuous laser beam. As result of this laser\ulcorner annealing treatment, we found that the increment of reflectance is 9.3% at 780nm wavelength. It might be considered that Ag-In-Sb-Te alloy optical disk is the big promising candidate for the erasable optical memory medium.

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Crystallization Characteristics of Reactively Sputtered Titanium Oxide Thin Films (반응성 스퍼터링된 산화 티타늄 박막의 결정화 특성)

  • Lee, Pil-H.;Ko, Kyung-H.;Ahn, Jae-H.;Lee, Soon-I.
    • Korean Journal of Materials Research
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    • v.6 no.8
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    • pp.852-857
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    • 1996
  • Crystallization characteristics of titanium oxide thin film during post-annealing of reactive sputter deposition were studied. Amorphous phases of as-deposited films were crystallized into rutile after annealing at $900^{\circ}C$ and anatase at $500^{\circ}C$, respectively when $O_2$ concentration during sputtering was more than 15%. However, rutile was the only phase obtainable after annealing if %$O_2$ was less than 10%. For these films, Magneli phase($Ti_nO_{2n-1}$) were crystallized below $500^{\circ}C$ at first place due to slow oxidation of nonstoichiometric films but $500^{\circ}{\sim}600^{\circ}C$ anatase with nonstoichiometry was crystallized for a short period. It was, therefore, concluded that crystal growth can proceed without phase transition if stoichiometric phase is formed at the first stage of crystallization, and that rutile, the most stable phase, was resulted from any oxygen deficient nonstoichiometric films.

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Phase Transformation and Dielectric Properties of <001> 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 Single Crystals (<001> 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 단결정의 상변화 및 유전 특성)

  • Lee, Eun-Gu;Lee, Jae-Gab
    • Korean Journal of Materials Research
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    • v.21 no.7
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    • pp.391-395
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    • 2011
  • The structure and dielectric properties of poled <001>-oriented 0.7Pb($Mg_{1/3}Nb_{2/3})O_3-0.3PbTiO_3$ (PMN-0.3PT) crystals have been investigated for orientations both parallel and perpendicular to the [001] poling direction. An electric field induced monoclinic phase was observed for the initial poled sample. The phase remained stable after the field was removed. A quite different temperature dependence of dielectric constant has been observed between heating and cooling due to an irreversible phase transformation. The results of mesh scans and temperature dependence of the dielectric constant demonstrate that the initial monoclinic phase changes to a single domain tetragonal phase at 370K and to a paraelectric cubic phase at 405K upon heating. However, upon subsequent cooling from the unpoled state, the cubic phase changes to a poly domain tetragonal phase and to a rhombohedral phase. In the ferroelectric tetragonal phase with a single domain state, the dielectric constant measured perpendicular to the poling direction was dramatically higher than that of the parallel direction. A large dielectric constant implies easier polarization rotation away from the polar axis. This enhancement is believed to be related to dielectric softening close to the morphotropic phase boundary and at the phase transition temperature.

Analysis of Monoclinic Phase Change and Microstructure According to High-temperature Heat Treatment of Oxide-doped YSZ (산화물이 Doping된 YSZ의 고온 열처리에 따른 Monoclinic 상변화 및 미세구조 분석)

  • Gye-Won, Lee;Yong-Seok, Choi;Chang-Woo, Jeon;In-Hwan, Lee;Yoon-Suk, Oh
    • Journal of Powder Materials
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    • v.29 no.6
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    • pp.468-476
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    • 2022
  • Yttria-stabilized zirconia (YSZ) has a low thermal conductivity, high thermal expansion coefficient, and excellent mechanical properties; thus, it is used as a thermal barrier coating material for gas turbines. However, during long-time exposure of YSZ to temperatures of 1200℃ or higher, a phase transformation accompanied by a volume change occurs, causing the YSZ coating layer to peel off. To solve this problem, YSZ has been doped with trivalent and tetravalent oxides to obtain coating materials with low thermal conductivity and suppressed phase transformation of zirconia. In this study, YSZ is doped with trivalent oxides, Nd2O3, Yb2O3, Al2O3, and tetravalent oxide, TiO2, and the thermal conductivity of the obtained materials is analyzed according to the composition; furthermore, the relative density change, microstructure change, and m-phase formation behavior are analyzed during long-time heat treatment at high temperatures.

A Study on Heat Dissipation Characteristics of PMMA Composite Films with Phase Change Material (상변화물질을 이용한 PMMA 복합필름의 방열 성능 향상에 관한 연구)

  • Kwon, Junhyuk;Yoon, Bumyong;Cho, Seung-hyun;Lee, Stephanie K.;Kim, Hyung-ick;Kim, Donghyun;Park, Kyungui;Suhr, Jonghwan
    • Composites Research
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    • v.30 no.5
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    • pp.288-296
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    • 2017
  • The focus of this study is to experimentally investigate the heat dissipation characteristics of poly (methyl methacrylate) (PMMA) composite films with phase change materials (PCM) to resolve heat build-up problems encountered in various electronic devices. In this study, two different types of phase change materials were used to fabricate the composite films by compression molding method and PCM paste sealing method then compared. It was observed in this study that the heat dissipation capability of PCM/PMMA composite films was remarkably enhanced by applying graphite sheet or graphene film into the composite due to their high thermal conductivity. These PCM/ PMMA composite films were attached on the hot spot inside smart phone and tested its surface temperature change according to time. The heat dissipation capability of PCM/PMMA composite film incorporated smart phone was increased 154% and hybrid PCM/PMMA composite film incorporated smart phone was increased 286% over the reference, respectively.

A Transmission Electron Microscopy Study on the Crystallization Behavior of In-Sb-Te Thin Films (In-Sb-Te 박막의 결정화 거동에 관한 투과전자현미경 연구)

  • Kim, Chung-Soo;Kim, Eun-Tae;Lee, Jeong-Yong;Kim, Yong-Tae
    • Applied Microscopy
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    • v.38 no.4
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    • pp.279-284
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    • 2008
  • The phase change materials have been extensively used as an optical rewritable data storage media utilizing their phase change properties. Recently, the phase change materials have been spotlighted for the application of non-volatile memory device, such as the phase change random access memory. In this work, we have investigated the crystallization behavior and microstructure analysis of In-Sb-Te (IST) thin films deposited by RF magnetron sputtering. Transmission electron microscopy measurement was carried out after the annealing at $300^{\circ}C$, $350^{\circ}C$, $400^{\circ}C$ and $450^{\circ}C$ for 5 min. It was observed that InSb phases change into $In_3SbTe_2$ phases and InTe phases as the temperature increases. It was found that the thickness of thin films was decreased and the grain size was increased by the bright field transmission electron microscopy (BF TEM) images and the selected area electron diffraction (SAED) patterns. In a high resolution transmission electron microscopy (HRTEM) study, it shows that $350^{\circ}C$-annealed InSb phases have {111} facet because the surface energy of a {111} close-packed plane is the lowest in FCC crystals. When the film was heated up to $400^{\circ}C$, $In_3SbTe_2$ grains have coherent micro-twins with {111} mirror plane, and they are healed annealing at $450^{\circ}C$. From the HRTEM, InTe phase separation was occurred in this stage. It can be found that $In_3SbTe_2$ forms in the crystallization process as composition of the film near stoichiometric composition, while InTe phase separation may take place as the composition deviates from $In_3SbTe_2$.

TEM Specimen Preparation Method of Gibbsite Powder for Quantitative Structure Analysis (정량 구조 분석을 위한 Gibbsite 분말의 TEM 시편 준비법)

  • Kim, Young-Min;Jeung, Jong-Man;Lee, Su-Jeong;Kim, Youn-Joong
    • Applied Microscopy
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    • v.32 no.4
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    • pp.311-317
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    • 2002
  • There is great requirement on the TEM specimen preparation method with particle size selectivity as a prerequisite for the quantitative structure analysis on the materials such as gibbsite powder, which generally forms a large agglomerate and shows a variation of transition process depending on their sizes. In this experiment, we made an attempt to give a methodology for the TEM specimen preparation of powder with the size selectivity. After mixing 1 wt% gibbsite powder with ethanol solvent, gibbsite suspension was prepared by application of ball-milling and ultrasonification with addition of 0.25 vol% dispersion agent, Darvan C, which was diluted into distilled water by the ratio 1:19. Appling the static sedimentation method to gibbsite suspension after estimation of the sedimentation time by the measurement of accumulative concentration variation, we acquired TEM specimens with well-dispersed and size selected gibbsite particles in nm scale. Overall picture of each sample was taken by SEM and morphology of each dispersed particle was imaged by TEM. Raw and processed gibbsite powders were also examined by XRD to investigate whether they were suffered from phase change during the process or not.

Thermal Annealing Effect on the Machining Damage for the Single Crystalline Silicon (단결정 실리콘의 기계적 손상에 대한 열처리 효과)

  • 정상훈;정성민;오한석;이홍림
    • Journal of the Korean Ceramic Society
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    • v.40 no.8
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    • pp.770-776
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    • 2003
  • #140 mesh and #600 mesh wheels were adopted to grind (111) and (100) oriented single crystalline silicon wafer and the grinding induced change of the surface integrity was investigated. For this purpose, microroughness, residual stress and phase transformation were analyzed for the ground surface. Microroughness was analyzed using AFM (Atomic Force Microscope) and crystal structure was analyzed using micro-Raman spectroscopy. The residual stress and phase transformation were also analyzed after thermal annealing in the air. As a result, microroughness of (111) wafer was larger than that of (100) wafer after grinding. It was observed using Raman spectrum that the silicon was transformed from diamond cubic Si-I to Si-III(body centered tetragonal) or Si-XII(rhombohedral). Residual stress relaxation was also shown in cavities which were produced after grinding. The thermal annealing was effective for the recovery of the silicon phase to the original phase and the residual stress relaxation.

Si3N4/AlN 이중층 구조 소자의 자가 정류 특성

  • Gwon, Jeong-Yong;Kim, Hui-Dong;Yun, Min-Ju;Kim, Tae-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.306.2-306.2
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    • 2014
  • 전자기기의 휴대성과 이동성이 강조되고 있는 현대사회에서 비휘발성 메모리는 메모리 산업에 있어 매우 매력적인 동시에 커다란 잠재성을 지닌다. 이미 공정의 한계에 부딪힌 Flash 메모리를 대신하여 10nm 이하의 공정이 가능한 상변화 메모리(Phase-Change Memory, PRAM), 스핀 주입 자화 반전 메모리(Spin Transfer Torque-Magnetic RAM, STT-MRAM), 저항 변화 메모리(Resistive Random Access Memory, ReRAM)가 차세대 비휘발성 메모리 후보로서 거론되고 있으며, 그 중에서도 ReRAM은 빠른 속도와 낮은 소비 전력, CMOS 공정 호환성, 그리고 비교적 단순한 3차원 적층 구조의 특성으로 인해 활발히 연구되고 있다. 특히 최근에는 질화물 또는 질소를 도핑한 산화물을 저항변화 물질로 사용하는 ReRAM이 보고되고 있는데, 이들은 동작전압이 낮을 뿐만 아니라 저항 변화(Resistive Switching, RS) 과정에서 일어나는 계면 산화를 방지할 수 있으므로 ReRAM의 저항 변화 재료로서 각광받고 있다. 그러나 Cell 단위의 ReRAM 소자를 Crossbar Array 구조에 적용시켰을 때 주변 Cell과의 저항 상태 차이로 인해 전류가 낮은 저항 상태(LRS)의 Cell로 흘러 의도치 않은 동작을 야기한다. 이와 같이 누설 전류(Leakage Current)로 인한 상호간의 간섭이 일어나는 Cross-talk 현상이 존재하며, 공정의 간소화와 집적도를 유지하면서 이 문제를 해결하는 것은 실용화하기에 앞서 매우 중요한 문제이다. 따라서, 본 논문에서는 Read 동작 시 발생하는 Cell과 Cell 사이의 Cross-talk 문제를 해결하기 위해 자가 정류 특성(Self-Rectifying)을 가지는 실리콘 질화물/알루미늄 질화물 이중층(Si3N4/AlN Bi-layer)으로 구성된 ReRAM 소자 구조를 제안하였으며, Sputtering 방법을 이용하여 제안된 소자를 제작하였다. 전압-전류 특성 실험결과, 제안된 구조에 대한 에너지 밴드 다이어그램 시뮬레이션 결과와 동일하게 Positive Bias 영역에서 자가 정류 특성을 획득하였고, 결과적으로 Read 동작 시 발생하는 Cross-talk 현상을 차단할 수 있는 결과를 확보하였다.

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