Korean Journal of Materials Research (한국재료학회지)
- Volume 6 Issue 8
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- Pages.852-857
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- 1996
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- 1225-0562(pISSN)
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- 2287-7258(eISSN)
Crystallization Characteristics of Reactively Sputtered Titanium Oxide Thin Films
반응성 스퍼터링된 산화 티타늄 박막의 결정화 특성
- Lee, Pil-H. (School of Mechanical and Industrial Engineering, Ajou University) ;
- Ko, Kyung-H. (School of Mechanical and Industrial Engineering, Ajou University) ;
- Ahn, Jae-H. (School of Mechanical and Industrial Engineering, Ajou University) ;
- Lee, Soon-I. (v)
- Published : 1996.08.01
Abstract
Crystallization characteristics of titanium oxide thin film during post-annealing of reactive sputter deposition were studied. Amorphous phases of as-deposited films were crystallized into rutile after annealing at
반응성 스퍼터링법을 이용하며 산화티타늄 박막을 10%~60%의 산소분압하에서 증착하고 열처리 온도와 시간에 따른 박막의 결정화 특성을 고찰하였다. 증착직후에 형성된 비정질 상은 열처리시 산소분압이 15% 이상인 경우에서는
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