• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.3
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• pp.584-587
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• 2011

In this work, the $TiO_2$ and $SnO_2$ thin films as blocking layers were coated directly onto the metal-mesh electrode surface to prevent unnecessary inflow of back-transfer electrons from the electrolyte ($I^-/I_3^-$) to the metal-mesh electrode. The DSCs were fabricated with working electrode of SUS mesh coated with blocking $TiO_2$ and $SnO_2$ layers, dye-attached mesoporous $TiO_2$ film, gel electrolyte and counter electrode of Pt-deposited F:$SnO_2$. From the experimental result, it was ascertained that the efficiency of metal electrode coated with $TiO_2$ by Dip-coating was superior to that of metal electrode coated with $SnO_2$ by Dip-coating and screen printing with the results of experiments. The photo-current conversion efficiency of the cell obtained from optimum fabrication condition was 3% ($V_{oc}$=0.61V, $J_{sc}$=11.64 mA/$cm^2$, ff=0.64) under AM1.5, 100 mW/$cm^2$ illumination.

• Korean Journal of Materials Research
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• v.6 no.8
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• pp.779-785
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• 1996

Thin $700^{\circ}C$films were formed through layer inversion of Co/Nb bilayer during rapid thermal annealing(RTA). The Nb interlayer seems to effectively prevent over-consumption of Si and to control the silicidation reaction by forming Co-Nb intermetallic compounds and removing the native oxide formed on Si substrate which interferes the uniform Co-Si interaction. The final layer structure of the Co/Nb bilayer after $700^{\circ}C$ RTA was found to be ${Nb}_{2}{O}_{3}$/${Co}_{2}$Si.CoSi/${NbCo}_{x}$/Nb(O, C)/${CoSi}_{2}$/ Si. The layer inversion and the formation of a stable CoSi, phase occurred above $700^{\circ}C$, and the Nb silicides were not found at any annealing temperature. These may be due to the formation of very stable Co-Nb intermetallic compounds and Nb oxides which limit the moving of Co and Si.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.256-256
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• 2016

기존의 디스플레이 기슬은 마스크를 통해 특정 부분에만 유기재료를 증착시키는 방법을 사용하였으나, 기판의 크기가 커짐에 따라 공정조건에 제약이 발생하였다. 이를 해결하기 위해 최근 용액 공정에 대한 연구가 활발히 진행되고 있다. 용액 공정은 기존 진공 증착 방식과 비교하였을 때 상온, 대기압에서 증착이 가능하며 경제적이고, 대면적 균일 증착에 유리하다는 장점이 있다. 반면, 용액 공정으로 제작한 소자는 시간이 지남에 따라 점차 전기적 특성이 변하는 aging effect를 보인다. Aging effect는 용액에 포함된 C기와 OH기 기반의 불순물의 영향으로 시간의 경과에 따라서 문턱전압, subthreshold swing 및 mobility 등의 전기적 특성이 변하는 현상으로 고품질의 박막을 형성하기 위해서는 고온의 열처리가 필요하다. 지금까지 고품질 박막 형성을 위한 열처리는 퍼니스 (furnace) 장비에서 주로 이루어졌는데, 시간이 오래 걸리고, 상대적으로 고온 공정이기 때문에 유리, 종이, 플라스틱과 같은 다양한 기판에 적용하기 어렵다는 단점이 있다. 따라서, 본 연구에서는 $100^{\circ}C$ 이하의 저온에서도 열처리가 가능한 microwave irradiation (MWI) 방법을 이용하여 solution-processed InGaZnO TFT를 제작하였고, 기존의 열처리 방식인 furnace로 열처리한 TFT 소자와 aging effect를 비교하였다. 먼저, solution-processed IGZO TFT를 제작하기 위해 p type Si 기판을 열산화시켜서 100 nm의 SiO2 게이트 산화막을 성장시켰고, 스핀코팅 방법으로 a-IGZO 채널층을 형성하였다. 증착후 열처리를 위하여 1000 W의 마이크로웨이브 출력으로 15분간 MWI를 실시하여 a-IGZO TFT를 제작하였고, 비교를 위하여 furnace N2 gas 분위기에서 $600^{\circ}C$로 30분간 열처리한 TFT를 준비하였다. 제작된 직후의 TFT 특성을 평가한 결과, MWI 열처리한 소자가 퍼니스 열처리한 소자보다 높은 이동도, 낮은 subthreshold swing (SS)과 히스테리시스 전압을 가지는 것을 확인하였다. 한편, aging effect를 평가하기 위하여 제작 후에 30일 동안의 특성변화를 측정한 결과, MWI 열처리 소자는 30일 동안 문턱치 전압(VTH)의 변화량 ${\Delta}VTH=3.18[V]$ 변화되었지만, furnace 열처리 소자는 ${\Delta}VTH=8.56[V]$로 큰 변화가 있었다. 다음으로 SS의 변화량은 MWI 열처리 소자가 ${\Delta}SS=106.85[mV/dec]$인 반면에 퍼니스 열처리 소자는 ${\Delta}SS=299.2[mV/dec]$이었다. 그리고 전하 트래핑에 의해서 발생하는 게이트 히스테리시스 전압의 변화량은 MWI 열처리 소자에서 ${\Delta}V=0.5[V]$이었지만, 퍼니스 열처리 소자에서 ${\Delta}V=5.8[V]$의 큰 수치를 보였다. 결과적으로 MWI 열처리 방식이 퍼니스 열처리 방식보다 소자의 성능이 우수할 뿐만 아니라 aging effect가 개선된 것을 확인할 수 있었고 차세대 디스플레이 공정에 있어서 전기적, 화학적 특성을 개선하는데 기여할 것으로 기대된다.

• The Proceeding of the Korean Institute of Electromagnetic Engineering and Science
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• v.14 no.3
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• pp.20-40
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• 2003

Since unloaded Q-value of a high-temperature superconductor(HTS) filter is very high, a bandpass filter(BPF) and a lowpass filter(LPF) with an increase of pole numbers can be fabricated without an increase of an insertion loss(IL) ; recently a 70-pole BPF is developed in USA. They have an abrupt skirt property and an excellent attenuation level for out-of band. Moreover, they can be miniaturized when lumped element resonators or the slow-wave characteristic are used. Technology of fabricating a HTS epitaxial film as well as a film of a 4 inch area also makes the planar type filter with a various structure and an enhanced power handling capability possible. Recently, the HTS filter subsystems composed of a planar-type HTS filters, a GaAs-based LNA and a mini-cryocooler are developed. The extended receiver front- end subsystems for mobile radio communications decrease the noise-figure level of the communication system and the frequency interference interacted adjacent bands, and increase the efficiency of frequency and the capacity of communication system. In this paper, theory for developing the HTS filter, its kinds, its design rules, its characteristics are reviewed. The feature of the research and market trends related to the HTS filter systems for the receiver front-end subsystem of mobile base station are surveyed.

• Solar Energy
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• v.12 no.2
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• pp.62-78
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• 1992

The solar cells of $ITO_{(n)}/Si_{(p)}$, which are ITO thin films deposited and heated on Si wafer 190[$^{\circ}C$], were fabricated by two source vaccum deposition method, and their electrical properties were investigated. Its maximum output is obtained when the com- position of the thin film consist of indium oxide 91[mole %] and thin oxide 9[mole %]. The cell characteristics can be improved by annealing but are deteriorated at temperature above 600[$^{\circ}C$] for longer than 15[min]. Also, we investigated the spectral response with short circuit current of the cells and found that the increasing of the annealing caused the peak shifted to the long wavelength region. And by experiment of the X-ray diffraction, it is shown to grow the grains of the thin film with increasment of annealing temperature. The test results from the $ITO_{(n)}/Si_{(p)}$ solar cell are as follows. short circuit current : Isc= 31 $[mW/cm^2]$ open circuit voltage : Voc= 460[mV] fill factor : FF=0.71 conversion efficiency : ${\eta}$=11[%]. under the solar energy illumination of $100[mW/cm^2]$.

• Journal of the Microelectronics and Packaging Society
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• v.31 no.1
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• pp.43-48
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• 2024

The discovery of a two-dimensional electron gas (2DEG) at the interface of LaAlO₃ (LAO) and SrTiO₃ (STO) substrates has sparked significant interest, providing a foundation for cutting-edge research in electronic devices based on complex oxide heterostructures. However, conventional methods for producing LAO thin films, typically employing techniques like pulsed laser deposition (PLD) within physical vapor deposition (PVD), are associated with high costs and challenges in precisely controlling the La and Al composition within LAO. In this study, we adopted a cost-effective alternative approach-solution-based processing-to fabricate LAO thin films and investigated their electrical properties. By adjusting the concentration of the precursor solution, we varied the thickness of LAO films from 2 to 65 nm and determined the sheet resistance and carrier density for each thickness. After vacuum annealing, the sheet resistance of the conductive channel ranged from 0.015 to 0.020 Ω·s^-1, indicating that electron conduction occurs not only at the LAO/STO interface but also into the STO bulk region, consistent with previous studies. These findings demonstrate the successful formation and control of 2DEG through solution-based processing, offering the potential to reduce process costs and broaden the scope of applications in electronic device manufacturing.

• Journal of the Korean Vacuum Society
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• v.15 no.5
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• pp.527-533
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• 2006

Spinel $LiNi_xMn_{2-x}O_4$ thin films were synthesized up to x = 0.9 by a sol-gel method employing spin-coating. The Ni-substituted films were found to maintain cubic structure at low x but to exhibit tetragonal structure for $x{\geq}0.6$. Such cubic-tetragonal phase transition indicates that $Ni^{3+}(d7)$ ions with low-spin $(t_{2g}^6,e_g^1)$ state occupy the octahedral sites of the compound, thus being subject to the Jahn-Teller distortion. By x-ray photoelectron spectroscopy both $Ni^{2+}$ and $Ni^{3+}$ ions were detected. Optical properties of the $LiNi_xMn_{2-x}O_4$ films were investigated by spectroscopic ellipsometry (SE) in the visible?ultraviolet range. The measured dielectric function spectra by SE mainly consist of broad absorption structures attributed to charge-transfer (CT) transitions, $O^{2-}(2p){\rightarrow}Mn^{4+}(3d)$ for 1.9 $(t_{2g})$ and $2.8{\sim}3.0$ eV $(e_g)$ structures and $O^{2-}(2p){\rightarrow}Mn^{3+}(3d)$ for 2.3 $(t_{2g})$ and $3.4{\sim}3.6$ eV $(e_g)$ structures. Also, sharp absorption structures were observed at about 1.6, 1.7, and 1.9 eV, interpreted as due to d-d crystal-field transitions within the octahedral $Mn^{3+}$ ion. The strengths of these absorption structures are reduced by the Ni substitution. Rapid reduction of the CT transition strength involving the eg states for x = 0.6 is attributed to the reduced wavefunction overlap between the $e_g$ and the $O^{2-}(2p)$ states due to the tetragonal extension of the lattice constant by the Jahn-Teller effect.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.283-289
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• 2001

Composite cathodes of 50/50 vol% LSM- YSZ (La$_{1-x}$Sr$_{x}$MnO$_3$-yttria stabilized zirconia) were deposited onto surface- Polished YSZ electrolytes by colloidal deposition technique. The cathode characteristics were then examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD) and studied by ac impedance spectroscopy (IS). The typical impedance spectra measured for an air/LSM- YSZ/YSZ/Pt/air cell at $700^{\circ}C$ were composed of two depressed arcs. Addition of YSZ to the LSM electrode significantly enlarged the triple-phase boundaries (TPB) length inside the electrode, which led to a pronounced decrease in cathodic resistivity of LSM-YSZ composite electrodes. Polishing the electrolyte surface to eliminate the influences of surface impurities and to enlarge the TPB length can further reduce cathode resistivity. The cathodic resistivity of the LSM- YSZ electrodes was a strong function of operation temperature, composition and particle size of cathode materials, applied current, and electrolyte surface roughness.

• Journal of Sensor Science and Technology
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• v.11 no.1
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• pp.54-59
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• 2002

This paper describes a new process technique for batch process of SOI(Si-on-Insulator) structures with buried cavities for MEMS(Micro Electro Mechanical System) applications by SDB(Si-wafer Direct Bonding) technology and electrochemical etch-stop. A low-cost electrochemical etch-stop method is used to control accurately the thickness of SOI. The cavities were made on the upper handling wafer by Si anisotropic etching. Two wafers are bonded with an intermediate insulating oxide layer. After high-temperature annealing($1000^{\circ}C$, 60 min), the SDB SOI structure with buried cavities was thinned by electrochemical etch-stop. The surface of the fabricated SDB SOI structure have more roughness that of lapping and polishing by mechanical method. This SDB SOI structure with buried cavities will provide a powerful and versatile substrate for novel microsensors arid microactuators.

• Korean Journal of Materials Research
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• v.8 no.12
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• pp.1138-1145
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• 1998

The sliding wear behavior of Ni-base hardfacing alloy, Deloro 50, was investigated at the contact stresses of 15ksi and 30ksi under the various wear environments. In air at room temperature, Deloro 50 showed lower wear resistance than Stellite 6 even at 15ksi due to the occurrence of severe adhesive wear. This seems to be caused by the lower hardness and work- hardening rate of Deloro 50 than those of Stellite 6. In water at room temperature, Deloro 50 showed as good wear resistance as Stellite 6 at 15ksi. It was considered to be due to that water could effectively prevent metal to metal contact through contacting asperities. However, Deloro 50 showed severe adhesive wear at 30ksi in water at room temperature. It seems to be that the water could not suppress adhesion wear at 30ksi. At $300^{\circ}C$ in air, Deloro 50 exhibited higher wear resistance than Stellite 6 even at 30ksi. It was considered that the oxide glaze layers formed on wear surface during sliding, effectively prevented direct metal-to-metal contacts.