• Proceedings of the Optical Society of Korea Conference
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• 2004.07a
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• pp.226-227
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• 2004

• Journal of the Korean Society for Precision Engineering
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• v.21 no.6
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• pp.15-21
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• 2004

반도체 제조산업과 나노, 바이오 산업의 비약적 발전에 따라 게이트 산화막(gate oxide)과 같이 반도체 제조공정에서 사용되는 유전체 박막(dielectric film)의 두께는 수 $\mu\textrm{m}$에서 수 nm 에 이르기까지 다양할 뿐 아니라 얇아지고 있으며, 또한 이러한 박막들이 다층으로 복잡하게 적층된 다층 박막의 응용이 높아지는 추세이다. 따라서, 반도체 및 광통신 소자, 발광소자, 바이오 칩 어레이 등과 같은 나노박막을 이용하는 산업에서는 박막의 두께 측정을 더욱 정확하고, 보다 빠르며 효율적으로 측정할 수 있는 박막 두께 측정용 계측기가 요구된다.(중략)

• Journal of the Korean Vacuum Society
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• v.2 no.1
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• pp.92-98
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• 1993

Si 기판 위에 증착된 Al 박막을 질소 ECR 플라즈마에 노출시켜 시료를 제작하고 분광타원해석법으로 분석한 결과 Al박막에 질화층이 형성되었음을 확인하였다. 사용한 질소 ECR 플라즈마의 전자온도와 전자밀도는 챔버내의 위치에 따라 각각 10~20eV, 0.9~1.2$\times$1011/㎤의 값을 보였다. 질소 ECR 플라즈마에 노출된 기판은 급격한 온도상승을 보였으며 노출시킨 뒤 5~6분이 지나면 $500^{\circ}C$ 근처에서 포화상태를 이루었다. 분광타원해석상수인 $\Delta$와 Ψ를 분석한 결과 증착된 Al의 두께는 시료에 따라 $140~160AA$이었고 표면에 형성된 AIN 층의 두께는 질소 ECR 플라즈마에 노출된 시간이 길수록 그리고 시료의 위치가 공명지점에 가까울수록 증가하였다. AlN층의 두께가 노출시간의 제곱근에 비례하는 것으로부터 AlN층은 Al의 표면에 흡착된 질소가 Al속으로 확산하여 이루어진 것으로 설명하였다.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.34-35
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• 2003

광통신 분야에서 광신호의 장거리 전송에 따른 세기 감소를 보강하기 위해 쓰이는 광섬유증폭기는 현재 1.3 $\mu\textrm{m}$ 대역, 1.45 $\mu\textrm{m}$ 대역 및 1.5 $\mu\textrm{m}$ 대역에서 작동하는 희토류 이온 첨가 광섬유 광증폭기가 개발되어 쓰이고 있다. 한편 ETRI에서는 기존 광통신에 쓰이는 광 증폭기에 추가해 더 넓은 파장대를 광통신에 쓸 수 있도록 하는 새로운 파장대역의 광 증폭기 구현을 가능케하고 나아가 광통신 용량을 기존보다 휠씬 더 큰 10 Tbps급 이상으로 늘이기 위해 1.6 $\mu\textrm{m}$ 파장대인 U 밴드대 광증폭기용 광섬유인 Pr 첨가 셀레나이드 유리 조성의 신소재를 개발하였는데, 본 연구에서는 Ge-Sb-Ga-Se 계열의 Pr 첨가 셀레나이드 유리의 굴절률을 분광타원 법 (spectroscopic ellipsometry)을 사용하여 결정하였다. (중략)

• Proceedings of the Korean Vacuum Society Conference
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• 1998.02a
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• pp.97-98
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• 1998

• Proceedings of the Optical Society of Korea Conference
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• 1997.08a
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• pp.13-13
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• 1997

• Journal of the Korean Vacuum Society
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• v.16 no.2
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• pp.134-140
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• 2007

Optical structure of $V_{2}O_{5}$ thin films were analyzed and confirmed, the films were deposited in oxygen partial pressure 0% and 10% by RF magnetron sputtering system. Measurements of the elliptic constants were made in the range of $0.75{\sim}4.0\;eV$ by using phase modulated spectroscopic ellipsometer. The elliptic constants of the thin films were analyze by Double Amorphous dispersion relation. The calculated n, k spectra of $V_{2}O_{5}$ layer were obtained over the range of $0.75{\sim}4.0\;eV$ photon energy. SEM and XRD measurements were also made to validate the ellipsometric analysis and they give good agreement with the structural properties of the films. It was found that optical structure of the $V_{2}O_{5}$ layer has a 3 phase(roughness/film/substrate) and optical absorption properties are greatly depend on the partial pressure of the oxygen.

• Journal of the Korean Vacuum Society
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• v.18 no.2
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• pp.133-140
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• 2009

$Ta_{2}O_{5}$ thin films were deposited by RF magnetron sputtering method under various RF power, substrates and oxygen partial pressure. Elliptic constants were measured by using a phase modulated spectroscopic ellipsometer and analyzed with the Tauc-Lorentz dispersion formula and best fit method in the range of 310$\sim$1239 nm. Also, transmittance spectra of the films were measured by UV -Vis spectrophotometer in the range of 300$\sim$1000 nm. From these data, thickness of $Ta_{2}O_{5}$ and surface layer were analyzed and changes of magnitude and shape of dispersion of optical constants according to fabricated conditions were measured. Also, to evaluate thickness and optical constants data analyzed by Tauc-Lorentz dispersion formula, the measured and analyzed transmittance spectra were compared. In result of the comparison, two spectra were in good agreement each other. Accordingly, it indicates that our ellipsometric analysis is valid.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.15 no.4
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• pp.157-161
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• 2005

Spectroscopic ellipsomerty measurements of the complex dielectric function of the CdTe thin films grown on GaAs(100) substrates by hot wall epitaxy have been performed in 1.5${\~}$5.5 eV photon energy range at room temperature. The spectroscopic ellipsometer spectra revealed distinct structures at energies of the $E_l,\;E_1+{\Delta}_1$, and $E_2$ critical points. These energies were decreased with increasing thickness of CdTe thin films.

• Korean Journal of Optics and Photonics
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• v.14 no.6
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• pp.594-599
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• 2003

By using the spectroscopic ellipsometry, we have measured and analyzed the optical characteristics of P $r^3$$^{+}$-doped selenide glasses of Ge-Sb-Se system, a strong candidate material for U band fiber amplifiers. The ellipsometric spectra measured in the transparent wavelengths range of the material were all fitted to a model consisting of ambient/roughness/thin fil $m_strate structures to obtain simultaneously the optical properties such as refractive index, in terms of Sellmeier parameters and film structure of P $r^3$$^{+}$-doped selenide glasses. Repeated measurements on different positions in both polished faces rendered to verify positional dependence of measured spectre-ellipsometric data. Hence, the model made possible the analysis of the optical characteristics of the glasses. Even though surface roughness was mainly responsible for the position dependencies, the averaged refractive indexes were as precise as to reflect the minute compositional change tantamount to 1 mol%. The measured refractive indexes are useful for design of core and clad compositions of single-mode selenide optical fibers.