• Title/Summary/Keyword: 반사방지 코팅

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Stabilization of Output Pulses from a Passively Q-switched Nd:YVO4 Laser Pumped by a Continuous-wave Laser Diode (연속 발진 다이오드 레이저로 여기된 수동형 Q-스위치 Nd:YVO4 레이저의 출력 펄스 안정화)

  • Ahn, Seung-In;Park, Yune-Bae;Yeo, Hwan-Seop;Lee, Joon-Ho;Lee, Kang-In;Yi, Jong-Hoon
    • Korean Journal of Optics and Photonics
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    • v.20 no.5
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    • pp.276-280
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    • 2009
  • A Cr:YAG crystal was used as a saturable absorber for passive Q-switching of a Nd:$YVO_4$ laser which was pumped by a 1-W continuous wave laser diode. The first surface of the Cr:YAG was high-reflection coated for the pump wavelength. The high-reflection coating improved the absorption efficiency of the pump beam in the Nd:$YVO_4$ through double pass absorption. It also prevented pump beam induced partial bleaching of the Cr:YAG. The peak-to-peak pulse fluctuation of passively Q-switched laser output was approximately 4 %. The minimum pulse-width was measured to be 7.11 ns. Also, the average pulse repetition rate was 9 kHz and the maximum output power was 16.27 mW.

산화아연 나노막대/PDMS 제작기술과 광학적 특성 연구

  • Go, Yeong-Hwan;Lee, Su-Hyeon;Yu, Jae-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.474-474
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    • 2013
  • PDMS는 미세패턴을 위해 소프트 리소그래피 널리 활용되어질 뿐만 아니라, 재질이 투명하고 탄성과 강한 내구성을 갖고 있어 유연한 광학 및 전자소자에 이용될 수 있다. 최근에는, 이러한 PDMS를 서브파장구조(subwavelength grating structure)를 형성하거나 텍스쳐(texture)표면구조를 이용한 효과적인 반사방지막(antireflection coating)기판을 제작하여 태양전지 및 디스플레이 소자의 성능을 발전시키는 연구가 활발히 진행되고 있다. 한편, 수열합성법(hydrothermal method)이나 전기화학증착법(electrodeposition method)으로 비교적 간단한 공정을 통해서 다양한 기판위에 산화아연(ZnO) 나노막대(nanorod)를 수직정렬로 성장시킬 수 있는데, 이러한 구조는 반사방지특성의 유효 굴절률 분포(effective refractive index profile)를 갖고 있기 때문에 LED나 태양전지에 성능을 개선할 수 있다. 이에 본 연구에서는 수열합성법을 통해 성장된 수직 정렬된 산화아연 나노막대를 이용한 PDMS 표면의 미세패턴 형성하여 광학적 특성을 분석하였다. 실험을 위해, 스퍼터링을 통해서 산화아연 시드층을 형성한 후, 질산아연헥사수화물과 헥사메틸렌테트라민을 수용액에 담가두어 산화아연 나노막대를 성장시켰으며, PDMS의 베이스와 경화제의 질량비를 10:1으로 용액을 준비하여 수직 정렬된 산화아연 나노막대 표면을 casting method으로 코팅하여 열경화 처리하였다. 제작된 샘플의 형태, 구조 광특성을 관찰하기 위해서 전계방출형전자현미경, X선 회절 분석기, 분광 광도계를 이용하였다.

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Silicon Containing Bottom Anti-Reflective Coating for ArF Photolithography (ArF 포토리소그라피공정을 위한 실리콘이 함유된 반사방지막코팅)

  • Lee, Jun-Ho;Kim, Hyung-Gi;Kim, Myung-Woong;Lim, Young-Toek;Park, Joo-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.66-66
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    • 2006
  • Development of ArF Photo-lithography process has proceeded with the increase of numerical aperature (NA) and the decrease of resist thickness. It makes many problems such as cost and process complexity. A novel spin-on hard mask system is proposed to overcome many problems Spin-on hard mask composed of two layers of siloxane and carbon. The optical thickness of two layers is designed from reflectivity measurement at specified n, k respectively. The property of photo-resist shows different results according to Si contents. Si-contents was measured XPS(X-ray Photoelectron spectroscopy).

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The Characterization of Electromagnetic Shielding of $SiO_2$/ITO Nano Films with Transition Metal Ions (전이금속이 첨가된 $SiO_2$/ITO 나노박막의 전자파 차폐특성)

  • 신용욱;김상우;손용배;윤기현
    • Journal of the Korean Ceramic Society
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    • v.38 no.1
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    • pp.15-21
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    • 2001
  • 전자파 차폐 및 반사방지용으로 사용되는 SiO$_2$/ITO 이층박막의 전기적 특성에 미치는 전이금속이온의 영향에 대해 고찰하고 전자파 차폐이론식으로부터 박막의 전도특성에 모사하여 효과적인 전자파 차폐효과를 얻기 위한 전도막을 설계하고자 하였다. ITO 상층부에 전이금속염을 첨가한 실리카 복합졸을 코팅하여 SiO$_2$/ITO 이층막을 제조한 결과 최저 표면저항치를 나타내는 첨가량은 전이금속의 종류에 따라 차이를 보이지만 Sn 및 Zn이 첨가된 졸로부터 형성된 박막은 $10^{5}$Ω/$\square$ 이하의 낮은 저항치를 보였으며 가장 안정된 표면저하을 나타내었다. 또한 전자파 차폐효과와 전도박막의 표면저항을 차폐이론식으로부터 모사한 결과 Zn과 Sn의 전이금속염이 첨가된 SiO$_2$/ITO 투명전도막은 TCO99에서 정한 전자파 차폐기준에 부합하였다.다.

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Stray Light Analysis of a Compact Imaging Spectrometer for a Microsatellite STSAT-3 (과학기술위성3호 부탑재체 소형영상분광기 미광 해석)

  • Lee, Jin Ah;Lee, Jun Ho
    • Korean Journal of Optics and Photonics
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    • v.23 no.4
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    • pp.167-171
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    • 2012
  • This paper reports on the stray light analysis results of a compact imaging spectrometer (COMIS) for a microsatellite STSAT-3. COMIS images Earth's surface and atmosphere with ground sampling distances of 27 m at the 18~62 spectral bands (0.4 ~ 1.05 ${\mu}m$) for the nadir looking at an altitude of 700 km. COMIS has an imaging telescope and an imaging spectrometer box into which three electronics PCBs are embedded. The telescope images a $27m{\times}28km$ area of Earth surface onto a slit of dimensions $11.8{\mu}m{\times}12.1mm$. This corresponds to a ground sampling distance of 27 m and a swath width of 28 km for nadir looking posture at an altitude of 700 km. Then the optics relays and disperses the slit image onto the detector thereby producing a monochrome image of the entrance slit formed on each row of detector elements. The spectrum of each point in the row is imaged along a detector column. The optical mounts and housing structures are designed in order to prevent stray light from arriving onto the image and so deteriorating the signal to noise ratio (SNR). The stray light analysis, performed by a non-sequential ray tracing software (LightTools) with three dimensional housing and lens modeling, confirms that the ghost and stray light arriving at the detector plane has the relative intensity of ${\sim}10^{-5}$ and furthermore it locates outside the concerned image size i.e. the field of view of the optics.

Damage Measurement for Molybdenum Thin Film Using Reflection-Type Digital Holography (반사형 디지털 홀로그래피를 이용한 Molybdenum 박막의 손상 측정)

  • Kim, Kyeong-Suk;Jung, Hyun-Il;Shin, Ju-Yeop;Ma, Hye-Joon;Kwon, Ik-Hwan;Yang, Seung-Pill;Hong, Chung-Ki;Jung, Hyun-Chul
    • Journal of the Korean Society for Nondestructive Testing
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    • v.35 no.2
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    • pp.141-149
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    • 2015
  • In the fabrication of electronic circuits used in electronic products, molybdenum thin films are deposited on semiconductors to prevent oxidation. During the deposition, the presence of a particle or dust at the interface between the thin film and substrate causes the decrease of adhesion, performance, and life cycle. In this study, a damage measurement targeting two kinds of glass substrate, with and without particles, was performed in order to measure the change in the molybdenum thin film deposition area in the presence of a particle. Clean and dirty molybdenum thin film specimens were fabricated and directly deposited on a substrate using the sputtering method, and a reflection-type digital holographic interferometer was configured for measuring the damage. Reflection-type digital holography has several advantages; e.g., the configuration of the interferometer is simple, the measurement range can be varied depending on the magnification of a microscopic lens, and the measuring time is short. The results confirm that reflection-type digital holography is useful for the measurement of the damage and defects of thin films.

Characterization of Selectively Absorbing Properties of Indium Tin Oxide Thin Films by UV-VIS-IR Spectroscopy (UV-VIS-IR 분광법에 의한 산화 인듐 주석 박막의 선택적 투과 흡수 특성 관찰)

  • Lee, Jeon-Kook;Lee, Dong-Heon;Cho, Nam-Hee
    • Analytical Science and Technology
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    • v.5 no.1
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    • pp.135-142
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    • 1992
  • Indium tin oxide(ITO) films coated on the window glass selectively transmit the solar energy and infrared. We call this system passive solar collectors. Selectively absorbing properties of sol gel dip coated ITO films were characterized by UV-VIS-NIR spectroscopy. The effects of heat treating temperature, time, atmosphere, substrate and barrier layers are concerned. Indium tin oxide films heat-treated at $500^{\circ}C$ in a reducing atmosphere show intrinsic properties. Efficiency of solar energy transmittance was enhanced by coating of $SiO_2-ZrO_2$ as an alkali ion barrier layer. Energy was saved by the double layers of $SiO_2-ZrO_2$ and ITO since solar energy is transmitted and heat generated inside(${\lambda}$ > 2700nm) is reflected.

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GaInZnO 박막의 전자적.전기적 특성

  • Kim, Gyeom-Ryong;Lee, Sang-Su;Lee, Gang-Il;Park, Nam-Seok;Gang, Hui-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.165-165
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    • 2010
  • GaInZnO는 투명 비정질 산화물 반도체로서 태양전지, 평판 액정 디스플레이, 잡음방지 코팅, 터치 디스플레이 패널, 히터, 광학 코팅 등 여러 응용에 쓰인다. 이 논문에서는 투명전자소자로 관심을 모으고 있는 GaInZnO의 전자적 그리고 전기적 특성을 측정하였다. GaInZnO 박막은 $SiO_2$ (100)/Si 기판위에 RF 마그네트론 스퍼터링 증착법으로 $Ga_2O_3:In_2O_3:ZnO$의 조성이 2:2:1로 된 타겟을 가지고 박막을 성장시켰다. 성장한 후에 RTP를 이용하여 30분간 열처리 하였다. GaInZnO의 전자적 특성을 나타내는 띠틈 및 실리콘 기판과의 원자가 띠 오프셋 값을 측정하였으며, 이 값들을 통해 GaInZnO박막과 실리콘 기판과의 띠 정렬도 수행하였다. 띠틈은 반사 전자 에너지 손실 분광법(REELS)을 이용하여 측정하였고, 원자가 띠 오프셋은 광전자 분광법(XPS)을 이용하여 측정하였다. 열처리 온도가 $400^{\circ}C$까지는 띠틈의 변화 및 XPS 결합에너지의 변화가 없는 것으로 보아 열적안정성이 우수함을 알 수 있다. 반면 $450^{\circ}C$에서의 띠틈이 감소하는 것으로 보아 $450^{\circ}C$에서는 열적안정성이 깨지는 것을 알 수 있다. GaInZnO 박막을 채널 층으로 하고 전극은 알루미늄(Al)으로 된 TFT를 제작하여 전기적 특성을 조사하였다. TFT 특성 결과 이동도가 약, subthreshold swing(S.S)이 약 1.5 V/decade, 점멸비가 약 $10^7$으로 측정되었다. 유리 위에 증착시킨 GaInZnO 박막의 투과율을 측정해본 결과 모든 시료가 가시광선 영역에서 80%이상의 투과율을 갖는 것으로 보아 투명전극소자로 응용이 가능하다는 것을 알 수 있었다.

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Fabrication of Hydrophobic Anti-Reflection Coating Film by Using Sol-gel Method (Sol-gel 법을 이용한 내오염 반사방지 코팅막 제조)

  • Kim, Jung-Yup;Lee, Ji-Sun;Hwang, Jonghee;Lim, Tae-Young;Lee, Mi-Jai;Hyun, Soong-Keun;Kim, Jin-Ho
    • Korean Journal of Materials Research
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    • v.24 no.12
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    • pp.689-693
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    • 2014
  • Anti-reflection coating films have used to increase the transmittance of displays and enhance the efficiency of solar cells. Hydrophobic anti-reflection coating films were fabricated on a glass substrate by sol-gel method. To fabricate an anti-reflection film with a high transmittance, poly ethylene glycol (PEG) was added to tetraethyl orthosilicate (TEOS) solution. The content of PEG was changed from 1 to 4 wt% in order to control the morphology, thickness, and refractive index of the $SiO_2$ thin films. The reflectance and transmittance of both sides of the coated thin film fabricated with PEG 4 wt% solution were 0.3% and 99.4% at 500 nm wavelength. The refractive index and thickness of the thin film were n = 1.29 and d = 105 nm. Fluoro alkyl silane (FAS) was used for hydrophobic treatment on the surface of the anti-reflection thin film. The contact angle was increased from $13.2^{\circ}$ to $113.7^{\circ}$ after hydrophobic treatment.

Anti-Reflective Coating with Hydrophilic/Abraion-Resistant Properties using TiO2/SiOxCy Double-Layer Thin Film (TiO2/SiOxCy 이중 박막을 이용한 투명 친수성/내마모성 반사방지 코팅)

  • Lee, Sung-jun;Lee, Min-kyo;Park, Young-chun
    • Journal of the Korean institute of surface engineering
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    • v.50 no.5
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    • pp.345-351
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    • 2017
  • A double-layered anti-reflective coating with hydrophilic/abrasion-resistant properties was studied using anatase titanium dioxide($TiO_2$) and silicon oxycarbide($SiO_xC_y$) thin film. $TiO_2$ and $SiO_xC_y$ thin films were sequentially deposited on a glass substrate by DC sputtering and PECVD, respectively. The optical properties were measured by UV-Vis-NIR spectrophotometer. The abrasion-resistance and the hydrophilicity were observed by a taber abrasion tester and a contact angle analyzer, respectively. The $TiO_2/SiO_xC_y$ double-layer thin film had an average transmittance of 91.3%, which was improved by 10% in the visible light region (400 to 800 nm) than that of the $TiO_2$ single-layer thin film. The contact angle of $TiO_2/SiO_xC_y$ film was $6.9^{\circ}$ right after UV exposure. After 9 days from the exposure, the contact angle was $10.2^{\circ}$, which was $33^{\circ}$ lower than that of the $TiO_2$ single-layer film. By the abrasion test, $SiO_xC_y$ film showed a superior abrasion-resistance to the $TiO_2$ film. Consequently, the $TiO_2/SiO_xC_y$ double-layer film has achieved superior anti-reflection, hydrophilicity, and abrasion resistance over the $TiO_2$ or $SiO_xC_y$ single-layer film.