• Title/Summary/Keyword: 박막 밀도

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Phase Controlled Thin Film Loop Antenna for Multi-media Devices (멀티미디어단말기용 박막형 위상제어루프 안테나)

  • Shin, Cheon-Woo
    • Journal of Korea Multimedia Society
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    • v.12 no.7
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    • pp.971-978
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    • 2009
  • The paper is a phase controlled loop antenna for multi-media devices. We developed a phase control loop pattern arrangement methods for loop antenna in mobile devices like as a cell phone and PCS, WCDMA. In the loop antenna pattern, arrange close adhesive the loop antenna pattern $180^\circ$ cycle in wave length, the radiated electro-magnetic wave from close adhesive loop pattern become to coherent wave than the phase controlled loop antenna has high efficiency and high radiation gain. To acquire a wide band width on phase controlled loop antenna, we arrange a multiple phase controlled loop pattern that has a different length each other. Different length for each other loop pattern cause a different frequency that we can acquire a wide band width for loop antenna from close adhesive phase control. In experiment, we designed a CDMA850 mobile multi-media antenna in 20mm$\times$20mm area thickness 0.4mm, the radiation efficiency is over 60% and radiation gain is over 0dBi.

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Improvement of Electrical Properties of Diamond MIS (Metal-Insulator- Semiconductor) Interface by Gate Insulator and Application to Metal-Insulator- Semiconductor Field Effect Transistors (게이트 절연막에 의한 다이아몬드 MIS (Metal-Insulator-Semiconductor) 계면의 전기적 특성 개선과 전계효과 트랜지스터에의 응용)

  • Yun, Young
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.14 no.6
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    • pp.648-654
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    • 2003
  • Diamond MIS(Metal-Insulator-Semiconductor) diodes and MISFETs(Metal-Insulator-Semiconductor Field Effect Transistors) were fabricated by employing various fluorides as gate insulator, and their electrical properties were closely investigated by means of C-V measurements. The A1/BaF$_2$/diamond MIS structure exhibited outstanding electrical properties. The MIS diode showed a very low surface state density of ∼10$\^$10//$\textrm{cm}^2$ eV near the valence band edge, and the observed effective mobility(${\mu}$$\_$eff/) of the MISFET was 400 $\textrm{cm}^2$/Vs, which is the highest value obtained until now in the diamond FET. From the chemiphysical point of view, the above result might be explained by the reduction of adsorbed-oxygen on the diamond surface via strong chemical reaction by the constituent Ba atom in the insulator during the film deposition(Oxygen-Gettering Effect).

First-principle study: Optical phonon mode and Born effective charge of strained Sr$TiO_3$ and $BaTiO_3$ lattices (제일원리적 계산에 의한 격자 변형된 Sr$TiO_3$$BaTiO_3$ 격자의 optical phonon mod와 Born effective charge의 특성)

  • 김이준;정동근;김주호;이재찬
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.55-55
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    • 2003
  • Ferroelectric 물질은 고유전성, 자발분극과 전기장에 따른 유전상수의 변화 등의 특성을 가지고 있으므로 많은 연구가 진행중이다. 이러한 ferroelectric 물질의 유전 특성에 미치는 요소로는 물질의 조성비, 박막의 스트레스, 결정성 등이 있다. 특히 스트레스에 대한 연구가 활발히 진행중이다. 본 연구에서 산화물 인공격자를 이용하여 단일박막에서 얻을 수 없는 격자변형도를 얻어 격자 변형이 박막의 유전특성에 미치는 영향을 연구하였다. BaTiO$_3$ (BTO)/SrTiO$_3$ (STO) 산화물 인공격자를 Pulsed laser deposition (PLD)법으로 (La,Sr)CoO$_3$ 전극이 코팅된 MGO (100) 단결정 기판위에 증착시켰다. 적층 주기에 변화를 주어 BTO와 STO 각각 1.01~1.095와 0.925 ~ 1.003의 단일 막에서는 얻을 수 없는 격자 변형도를 얻었다. 이 실험적 데이터를 기초로 하여 density functional theory (DFT)라고 불리는 범함수밀도론를 기초한 제일원리적 계산 방법을 통하여 격자 변형된 SrTiO$_3$의 구조적, 전기적 특성을 계산하였다. SrTiO$_3$와 BaTiO$_3$ 격자의 안정성을 분석하기 위하여 Vienna Ab-intio Simulation Package (VASP) code가 사용되었다. SrTiO$_3$와 BaTiO$_3$ 산화물 격자의 안정성 분석 후, frozen-phonon 계산 방법을 사용하여 zone-centered optical phonon mode가 계산되었으며, mode effective charge는 Berry-phase polarization 으로부터 얻어졌다. SrTiO$_3$ 격자가 격자변형이 일어나지 않은 상태로부터 c/a= 0.985로 격자 변형 이 일어남에 따라 optical phonon mode는 점차 hardening되었다. BaTiO$_3$ 격자의 경우 SrTiO$_3$ 격자와는 달리 격자 변형이 1.01~1.023으로 진행됨에 따라 optical phonon mode의 증가를 가져왔으나 Born effective charge의 증가하였으며, 더 이상 격자 변형이 진행됨에 따라 optical phonon mode의 감소를 가져왔으나 Born effective charge의 증가 유전상수는 증가했다. 격자 변형이 SrTiO$_3$ 와 BaTiO$_3$ 산화물 격자의 optical phonon mode와 Born effective charge에 크게 영향을 미쳤다.

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Design of Light Trapping System of Thin Film Solar Cell Using Phase Field Method (페이즈 필드법을 이용한 박막형 태양전지의 광포획층 설계)

  • Heo, Namjoon;Yoo, Jeonghoon
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.38 no.9
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    • pp.973-978
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    • 2014
  • This study focused on the design of the reflecting layer of a light trapping system fora thin film solar cell using topology optimization based on the phase field method. Therefore, incident light was caused to propagate in the desired direction by reflecting it from this layer, which is the design domain. The same method was applied to the conceptual design of an infrared stealth structure in near infrared range. The results using the phase field method were compared with those using the density method. The design objective was to maximize the Poynting vector value representing the energy flux, which was measured in a measuring domain to control the reflected wave direction. A finite element analysis and optimization process were performed using the commercial package COMSOL combined with the MATLAB programming.

Growth of $Al_xTa_{1-x}$ Alloy Thin Films by RE-Magnetron Sputter and Evaluation of Structural and Electrical Properties (E-Magnetron 스퍼터링에 의한 $Al_xTa_{1-x}$ 합금박막의 성장 및 구조적, 전기적 특성 분석)

  • 송대권;이종원;전종한
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.2
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    • pp.55-59
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    • 2003
  • In this study, $Al_xTa_{1-x}$(x=0.0∼1.0) alloy thin films were grown by RF-Magnetron sputtering system, and the structural, mechanical and electrical properties of samples were examined by 4-point probe, XRD, AFM and micro-Vickers hardness profiler. The electrical resistivity was maximum and the crystal quality was optimum for the samples with Al content x=0.245 (Al 24.5 at.%). Regarding the surface hillock formation, the hillock density decreased with an increase of Al content for the low Al content range, and the hillock was eliminated for the sample with Al=24.5 at.%. The hillock density increased with the further increase of Al content. The high values of micro-Vickers hardness were obtained for the samples with x=0.2∼0.45. The results obtained demonstrate that the crystal quality, electrical resistivity, surface morphology and micro-hardness are closely inter-related, and that the optimum physical properties are obtained for the sample with x=0.245.

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Molybdenum 후면전극을 통한 CIGS우선배향성의 제어 및 변환효율에 미치는 영향

  • Yun, Ju-Heon;Kim, Jong-Geun;Yun, Gwan-Hui;Park, Jong-Geuk;Kim, Won-Mok;Baek, Yeong-Jun;Seong, Tae-Yeon;Jeong, Jeung-Hyeon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.368-368
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    • 2011
  • 최근에 보고된 양질의 고효율Cu(In,Ga)Se2 (CIGS) 태양전지는 CIGS광흡수층이 강한 (220:204) 우선배향성을 갖는 것으로 알려져 있다 [1]. 이러한 CIGS우선배향성은 Se 증착압력, Na농도, 기판온도 및 Mo후면전극의 표면상태에 영향을 받는 것으로 알려져 있지만 정확한 상호관계는 아직 명확히 알려져 있지 않으며, 특히 Mo후면전극의 영향에 대해서는 체계적인 연구결과조차 극히 드문 상황이다 [2]. 본 연구에서는 CIGS 박막의 우선배향성에 대해 Mo후면전극의 미세구조가 미치는 영향 및 이에 따른 cell특성의 변화에 대해서 연구하였다. Mo후면전극의 미세구조는 2 mTorr~16 mTorr까지 증착압력을 변화시켜 제어되었고, CIGS광흡수층은 이렇게 준비된 Mo후면전극상에 3단계 동시증밥법(3-stage process)을 사용하여 형성하였다. XRD를 통한 박막의 우선배향성 평가에서, Mo 증착압력에 대한 IGS I(300)/I(006) 및 CIGS I(220:204)/I(112)의 거동은 Mo 미세구조와 밀접한 관련이 있는 잔류응력(residual stress)의 변화 거동과 상당히 일치함을 보였다. 이에 반해, 높은 압력의 Mo위에 형성된 강한 (220:204) 우선배향성의 CIGS와 bare-glass위에서 형성된 강한 (112) 우선배향성의 CIGS내 Na농도는 서로 유사하였다. 상기의 결과는 Mo미세구조 그 자체가 CIGS 박막 우선배향성의 원인이 됨을 나타낸다. Selenized Mo시편의 XRD분석 및 IGS/Mo 시편의 TEM분석결과을 통해 MoSe2의 반응성이 잔류응력과 비례하는 Mo in-gain 밀도에 의존하는 함을 알 수 있었고, 이러한 MoSe2반응성(reactivity)과 IGS우선배향성 사이에 상당히 밀접한 관련이 있으며 이에 CIGS의 우선배향성이 결정됨을 확인하였다. 마지막으로, Mo변수에 의해 제작된 cell의 특성분석으로부터 cell의 효율이 주로 VOC의 증가에 기인하여 CIGS (220:204) 우선배향성의 정도에 비례하였다.

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Sputtering Pressures Dependence on Magnetic Switching Volumes of CoSm/Cr Magnetic Thin Films (스퍼터링 압력에 따른 CoSm/Cr자성 박막의 Magnetic Switching Volumes)

  • 정순영;김성봉
    • Journal of the Korean Magnetics Society
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    • v.10 no.5
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    • pp.232-236
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    • 2000
  • CoSm thin films with a Cr underlayer have received continuous attention as a potential material for a high density longitudinal magnetic recording media. In this study the Ax gas sputtering pressure effects on the magnetic properties of CoSm thin films, which were fabricated by using a dc magnetron sputtering machine, were investigated. The magnetic switching volume is especially important parameter to understand the thermal stability of the written information, magnetization reversal process and media noise. Therefore, in this paper the effects of sputtering pressure on the magnetic switching volume of CoSm thin films grown on Cr underlayer with the same sputtering conditions was studied. As the Ar sputtering pressure during sputtering of the CoSm magnetic layer increases from 5 to 30 mTorr, the measured switching volumes decreased from 9.0 to 5.2$\times$10$^{-18}$ cm$^3$. The calculated diameter of switching unit from V* was less than 22 nm, which satisfies the Sharrock's requirement on the thermal stability of the high density longitudinal magnetic recording media.

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Patterning of Y-Ba-Cu-O thin films by rdactive ion etching(RIE) (활성이온식각법에 의한 Y-Ba-Cu-O고온초전도 박막의 미세선 제작)

  • Park, Jong-Hyeok;Han, Taek-Sang;Kim, Yeong-Hwan;Choe, Sang-Sam
    • Korean Journal of Materials Research
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    • v.3 no.2
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    • pp.151-157
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    • 1993
  • Abstract We have fabricated Y-Ba-Cu-O superconducting thin films by in-situ on-axis rf magnetron sputtering method using $Y_1$B$a_2$C${u_4}\;{_2O_x}$ nonstoichiometric target. Reactive ion etching (RIE) method was used in patterning the films. We have investigated the properties of patterned films, and compared the properties of the films before and after patterning. As the line width of the pattern decreases from 5${\mu}$m to 2${\mu}$m, a slight but not significant degradation in superconducting properties of the patterned films is observed. The bridge patterns are found to have clean edges and good electrical properties enough to be applied in device applications. From the result of this research, the possibility of submicron patterning by RlE is confirmed.

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Fabrication and Characterization of Sn1-xSixO2 Anode for Lithium Secondary Battery by R.F. Magnetron Sputtering Method (R.F. Magnetron Sputtering을 이용한 리튬이차전지 부극용 Sn1-xSixO2의 제조 및 특성)

  • Lee, Sang-Heon;Park, Keun-Tae;Son, Young-Guk
    • Journal of the Korean Ceramic Society
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    • v.39 no.4
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    • pp.394-400
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    • 2002
  • Tin oxide thin films doped with silicon as anodes for lithium secondary battery were fabricated by R. F. magnetron sputtering technique. The electrochemical results for lithium secondary battery anodes showed that addition of silicon decreases the oxidic state of tin, and, hence, reduced the irreversible capacity during the first discharge/charge cycle. The (110),(101),(211) planes were grown with increasing substrate temperatures. The reversible capacity of thin films fabricated in conditions of $300^{\circ}C$ substrate temperature and 7:3 $Ar:O_2$ ratio was 700 mAh/g.

Effects of the Post-annealing of Insulator on the Electrical Properties of Metal/Ferroelectric/Insulator/Semiconductor Structure (절연막이 후 열처리가 Metal/Ferroelectric/Insulator/Semiconductor 구조의 전기적 특성에 미치는 영향)

  • 원동진;왕채현;최두진
    • Journal of the Korean Ceramic Society
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    • v.37 no.11
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    • pp.1051-1057
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    • 2000
  • TiO$_2$와 CeO$_2$박막을 Si 위에 증착한 후 MOCVD법에 의해 PbTiO$_3$박막을 증착하여 MFIS 구조를 형성하였다. 절연층의 후열처리가 절연층 및 MFIS 구조의 전기적 특성에 미치는 영향을 관찰하기 위해 산소분위기와 $600^{\circ}C$~90$0^{\circ}C$의 온도범위에서 후 열처리를 행하였고, C-V 특성 및 누설전류 특성을 분석하였다. CeO$_2$와 TiO$_2$박막의 유전상수는 증착 직후 6.9와 15였으며, 90$0^{\circ}C$ 열처리를 행한 후 약 4.9와 8.8로 감소하였다. 누설전류밀도 역시 증착 직후 각각 7$\times$$10^{-5}$ A/$ extrm{cm}^2$와 2.5$\times$$10^{-5}$ A/$\textrm{cm}^2$에서 90$0^{\circ}C$ 열처리를 거친 후에 약 4$\times$$10^{-8}$ A/$\textrm{cm}^2$와 4$\times$$10^{-9}$ A/$\textrm{cm}^2$로 감소하였다. Ellipsometry 시뮬레이션을 통해 계산된 계면층의 두께는 90$0^{\circ}C$에서 약 115$\AA$(CeO$_2$) 및 140$\AA$(TiO$_2$)까지 증가하였다. 계면층은 MFIS 구조에서 강유전층에 인가되는 전계를 감소시켜 항전계를 증가시켰고, charge injection을 방지하여 Al/PbTiO$_3$/CeO$_2$(90$0^{\circ}C$, $O_2$)/Si 구조의 경우 $\pm$2 V~$\pm$10 V의 측정범위에서 memory window가 계속 증가하는 것을 보여주었다.

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