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• Proceedings of the Korea Air Pollution Research Association Conference
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• Proceedings of the Korea Air Pollution Research Association Conference
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• Proceedings of the Korea Air Pollution Research Association Conference
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• 2004

• Proceedings of the Korea Air Pollution Research Association Conference
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• Proceedings of the Korean Powder Metallurgy Institute Conference
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좋은(sub=micron) 분해능을 갖는 Photoresist film의 방법에 의한 Micro-Lithography의 발달은 반도체, Electro-Optic 등의 첨단산업에 큰 기여를 하였다. 본 내용은 이러한 PR을 이용한 Lithography System의 광학적인 원리에 대해 소개하고자 한다.