• 대한전기학회:학술대회논문집
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• 대한전기학회 2002년도 하계학술대회 논문집 C
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• pp.1985-1987
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• 2002

Silicon bulk micromachined micromirrors are designed and fabricated for out-of-plane right angle reflection. The micromirror is comprised of a minor plate, springs, magnetic bars and electrodes. Single crystalline silicon is used for a flatness improvement of a mirror plate. Out-of-plane right angle reflection requires a 45 degree operation of the micromirror. The micromirrors are operated by applying a magnetic field, which is generated by a coil located below a substrate. For an individual mirror operation, each mirror is clamped using an electrostatic force against the electromagnetic force. Angular deflections are measured and compared with theoretical data. The micro mirror operates up to 45 degree when magnetic field is 4 kA/m which is generated by a 115 mA coil current Simple addressing is tested, and it is shown that a clamping voltage is less than 5V.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권8호
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• pp.487-494
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• 2000

This paper describes the design, fabrication and experiments of surface-micromachined aluminum micromirror array with hidden pin-joints. Instead of the conventional elastic spring components as connection between mirror plate and supporting structure, we used pin-joint composed of pin and staples to support the mirror plate. The placement of pin-joint under the mirror plate makes large active surface area possible. These flexureless micromirrors are driven by electrostatic force. As the mirror plate has discrete deflection angles, the device can be ap;lied to adaptive optics and digitally-operating optical applications. Four-level metal structural layers and semi-cured photoresist sacrificial layers were used in the fabrication process and sacrificial layers were removed by oxygen plasma ashing. Static characteristics of fabricated samples were measured and compared with modeling results.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권5호
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• pp.263-266
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• 2006

An optical microphone was developed using a dual-core multi-mode fiber block and a membrane type micromirror. The fiber block serves as a compact optical head, and the micromirror as a reflective diaphragm. The micromirror is designed to be suspended through a silicon bar connected t a frame, allowing for displacement induced by acoustic waves. The optical head is implemented by integrating two multi-mode fibers in a single block, and used to transfer light signals between it and the diaphragm. For the assembled microphone, its static characteristics were observed to reveal the operating point defined as the optimum distance between the optical head and the diaphragm. And its dynamic response was tested to exhibit a frequency bandwidth of 3 kHz with the variation of $\sim5dB$.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2260-2262
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• 2000

In this paper, micromirror which can rotate 45 degree is designed, analyzed and fabricated. The micromirror is parallel to the substrate initially. When external magnetic field is applied, a micromirror can rotate to align its easy axis to the field. The size of micromirror array is $10{\times}10$. The mirror plate and spring is made of aluminium, and nickel is used as soft magnetic material. To obtain 45 degree angular deflection, dimension ratio between stopper length and thickness of sacrificial layer is properly selected. By using electrostatic force, individual actuation is possible.

• 한국정밀공학회지
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• 제24권8호통권197호
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• pp.138-143
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• 2007

Microstereolithography technology is similar to the conventional stereolithography process and enables to fabricate a complex 3D microstructure. This is divided into scanning and projection type according to aiming at precision and fabrication speed. The scanning MSL fabricates each layer using position control of laser spot on the resin surface, whereas the projection MSL fabricates one layer with one exposure using a mask. In the projection MSL, DMD used to generate dynamic pattern consists of $1024{\times}768$ micromirrors which have $13.68{\mu}m$ per side. The fabrication range and resolution are determined by the field of view of the DMD and the magnification of the projection lens. If using the projection lens with high power, very fine microstructures can be fabricated. In this paper, the projection MSL system adapted to a large surface for array-type fabrication is presented. This system covers the meso range, which is defined as the intermediate range between micro and macro, with a resolution of a few ${\mu}m$. The fabrication of array-type microstructures has been demonstrated to verify the performance of implemented system.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 추계학술대회 논문집 학회본부
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• pp.612-614
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• 1997

Silicon based micro mirror array is a highly efficient component for use in optical applications such as adaptive optical systems and optical correlators. A micro mirror array designed, fabricated and tested here is consisted of $5{\times}5$ single layer polysilicon, electrostatically driven actuators. In this paper, deflection characteristics and pull-in behavior of the actuators for analog control was studied and particularly, the influence of the residual stress in flexure beams for the restorative force of actuators was considered. The springs are modeled as a residual stress-free spring and a spring with residual stress. In calculation, a mirror with the residual stress-free springs has 30.3N/m spring constant and 31.1V pull-in voltage. On the other hand, a mirror with the stressed springs has 23.6N/m and 27.4V respectively. The experimental result, which is 20.5N/m and 25.5V, shows that the stressed springs ore well modeled.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2000년도 춘계학술대회논문집
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• pp.1521-1527
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• 2000

A micromirror actuated by piezoelectric unimorph cantilevers is proposed as a tine-tracking device for high-density optical data storage. Bending motions of the metal/PZT/metal unimorphs translate an integrated micromirror along the out-of-plane vertical direction. The micromirror alters the optical path of the incident laser beam and linearly steers the reflected laser beam by its out-of-plane parallel actuation. Numerical analysis shows that the actuated micromirror can satisfy the tracking speed imposed by the requirement on the access time for the high-density optical data storage up to few tens Gbitlin2 owing to the light mass of the micromirror. In this paper, preliminary characteristics of the micro-machined PZT actuated micromirror (PAM) are reported. Only a 360 nm-thick PZT film deposited by sol-gel process shows both good electrical and mechanical characteristics for the fine-tracking actuator. The micromirror can be easily actuated up to several micrometers under low voltage operation condition well below 10 volts.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 추계학술대회 논문집 학회본부
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• pp.618-620
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• 1997

A $50{\times}50{\mu}m^2$ aluminum micromirror array is fabricated using shadow evaporation process. The fabrication process is very simple with use of shadow evaporation process, and the micromirror array has a high fill-factor. The static and dynamic characteristics such as deflection angle vs. applied voltage, step response, and frequency response are measured using a contact free optical measurement technique. The downward threshold voltage was 8 V, step response time was $13.5{\mu}s$ when 32 V step voltage applied, and a resonance observed at 11kHz. The lifetime of micromirror with anti-stiction coating was tested and micromirror operated successfully over 200 million cycles of touch-down operations.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2257-2259
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• 2000

This paper reports on the design, fabrication and driving experiment of micro mirror array(MMA) for lithography process to apply to biochip fabrication Photolithography technology is applied to activate specific area on the surface of modified glass surface, DNA monomers are bound on the activated area of the glass surface. After repeat of DNA monomer synthesizing process, DNA single strand probes could be solid-synthesized on the glass substrate. Without using photomask, photolithography process is tried using micro mirror array(MMA). Photomask or mask alignment is not required in maskless photolithography process using micro mirror array.

• 한국생산제조학회지
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• 제19권6호
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• pp.834-840
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• 2010

Photo lithography process is very important technology to fabricate highly integrated micro patterns with high precision for semiconductor and display industries. Up to now, mask type lithography process has been generally used for this purpose; however, it is not efficient for small quantity and/or frequently changing products. Therefore, in order to obtain higher productivity and lower manufacturing cost, the mask type lithography process should be replaced. In this study, a maskless lithography system using the DMD(Digital Micromirror Device) is developed, and the exposure condition and optical properties are analyzed and simulated for a single beam case. From the proposed experimental conditions, required exposure experiments were preformed, and the results were investigated. As a results, 10${\mu}m$ spots can be generated at optimal focal length.