• Title/Summary/Keyword: 레티클 스테이지

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Design and Kinematic Analysis of the Reticle Stage for Lithography Using VCM (VCM을 이용한 리소그래피용 레티클 스테이지의 설계 및 기구학적 해석)

  • Oh, Min-Taek;Kim, Mun-Su;Kim, Jung-Han
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.17 no.3
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    • pp.86-93
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    • 2008
  • This paper presents a design of the reticle stage for lithography using VCM(Voice Coil Motor) and kinematic analysis. The stage has three axes for X,Y,${\theta}_z$, those actuated by three VCM's individually. The reticle stage has cross coupled relations between X,Y,${\theta}_z$ axes, and the closed solution of the forward/inverse kinematics were solved to get an accurate reference position. The reticle stage for lithography was designed for reaching both high accuracy and long stroke, which was $0.1{\mu}m$ (X,Y)/ $1{\mu}rad({\theta}_z)$ accuracies and relatively long strokes about 2mm (X,Y) and 2 degrees(${\theta}_z$). Also this research presents a rotational compensation algorithm for the precision gap sensor for the stage. Simulation results show the overall performance of the whole algorithm and the improvement quantity of the rotational compensation algorithm.

Design of the Low Hunting Controller for the Reticle Stage for Lithography (VCM을 이용한 노광기용 정밀 레티클 스테이지의 저진동 제어시스템 개발)

  • Kim, Mun-Su;Oh, Min-Taek;Kim, Jung-Han
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.17 no.4
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    • pp.51-58
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    • 2008
  • This paper presents a new design of the precision stage for the reticle in lithography process and a low hunting control method for the stage. The stage has three axes for X, Y, ${\theta}_z$ those actuated by three voice coil motors individually. The designed reticle stage system has three gap sensors and voice coil motors, and supported by four air bearings and the forward/inverse kinematics of the stage were solved to get an accurate reference position. When a stage is in regulating control mode, there always exist small fluctuations(stage hunting) in the stage movement. Because the low stage hunting characteristic is very important in recent lithography and nano-level applications, a special regulating controller for ultra low hunting is proposed in this paper. Also this research proposed the 2-step transmission system for preventing the noise infection from environmental devices. The experimental results showed the proposed regulating control system reduced hunting noise as 35nm(rms) when a conventional PID generates 77nm(rms) in the same mechanical system. Besides the reticle stage has 100nm linear accuracy and $1{\mu}rad$ rotation accuracy at the control frequency of 8kHz.