• 한국소음진동공학회논문집
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• 제16권7호
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• pp.739-745
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• 2006

This paper presents a novel type of hybrid dispensing head for IC fabrication and surface mount technology. The proposed mechanism consists of solenoid valve and piezoelectric stack as actuators, and provides positive-displacement and jet dispensing. The positive-displacement dispensing can produce desired adhesive amount without viscosity effect, while the jet dispensing can produce high precision adhesive amount. In order to determine the relationship between required voltage of the piezoelectric actuator and needle displacement, both static and dynamic analysis are undertaken, In addition, finite element analysis is performed in order to find optimal design parameters. Dispensing flow rate and pressure in the chamber are evaluated through fluid dynamic model.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 2006년도 춘계학술대회논문집
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• pp.821-826
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• 2006

This paper presents a novel type of hybrid dispensing head for IC fabrication and surface mount technology. The proposed mechanism consists of solenoid valve and piezoelectric stack as actuators, and provides positive-displacement and jet dispensing. The positive-displacement dispensing can produce desired adhesive amount without viscosity effect, while the jet dispensing can produce high precision adhesive amount. In order to determine the relationship between required voltage of the piezo actuator and needle displacement, both static and dynamic analysis are undertaken, In addition, finite element analysis is performed in order to find optimal design parameters. Dispensing flow rate and pressure in the chamber are evaluated through fluid dynamic model.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2012년도 춘계학술대회 논문집
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• pp.495-496
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• 2012

• 한국세라믹학회:학술대회논문집
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• 한국세라믹학회 2003년도 추계총회 및 연구발표회 초록집
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• pp.171.1-171
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• 2003

• 대한기계학회논문집B
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• 제41권5호
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• pp.365-372
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• 2017

결정질 실리콘 태양전지의 전면전극은 수광면적을 극대화하면서도 전기적 저항을 최소화하기 위하여 미세하면서도 높은 종횡비로 형성되어야 한다. 기존의 전면전극 형성공정은 스크린 인쇄가 이용되었으나, 스크린 제판 개구부의 선폭보다 인쇄된 전극의 선폭이 1.3~2.2 배 넓게 형성되는 문제 때문에 $40{\mu}m$ 급 미만의 미세전극을 형성하기 위해서는 스크린 제판의 개구부는 $30{\mu}m$ 이하여야 한다. 그러나, 개구부가 미세화될수록 인쇄압력의 증가, 실버 페이스트 전이 불량률 상승 및 메쉬 마크로 인한 전극의 전기적 저항 상승과 같은 문제들이 발생한다. 본 연구에서는 스크린 인쇄를 대체하기 위한 차세대 인쇄방식으로서 스크류 펌프방식의 디스펜싱 인쇄를 소개하고, 기존 인쇄방식과 차별화되는 점들에 대해 논의하도록 한다.

• 드라이브 ㆍ 컨트롤
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• 제6권2호
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• pp.26-33
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• 2009

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2005년도 제17회 워크샵 및 추계학술대회
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• pp.647-647
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• 2005

• 한국정밀공학회지
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• 제29권8호
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• pp.913-919
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• 2012

This paper presents results for dispensing and measuring micro-particles using a pneumatic dispensing system. Particle-suspended liquid droplets were dispensed and analyzed quantitatively at various particle concentrations and applied pressures. By using a developed experimental setup, the number of particles and the particle volume ratio in sequentially dispensed droplets were measured. Hydrophilic and hydrophobic surfaces were tested to find a suitable surface for counting the number of particle. It was confirmed that the dispensed particles concentrated into the center of the droplet on the smooth CD surface after evaporation of liquid. As the applied positive pressure increased, the number of particles per droplet increased consistently and the volume fraction of particles remained constant.

• 제어로봇시스템학회논문지
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• 제10권7호
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• pp.604-610
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of transferred nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a $5\times5\times0.09$ in. quartz stamp whose critical dimension is 377 nm was fabricated using the etching process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply the fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer. Experiments have shown that the multi-dispensing method can enable UV-NIL using a large-area stamp.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 춘계학술대회 논문집
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• pp.633-636
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• 2005

Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. As with other nanoimprint methods, ultraviolet-nanoimprint lithography (UV-NIL) resolution appears to be limited only by template resolution, and offers a significant cost of ownership reduction when compared to other next generation lithography (NGL) methods such as EUVL and 157 nm lithography. The purpose of this paper is to suggest optimum values of control parameters of Imprio 100 manufactured by Molecular Imprint, Inc., which is the first commercially available UV-NIL tool, for sound nanoimprint. UV-NIL experiments were performed on Imprio 100 to find dispensing recipe for avoiding air entrapment. Dispensing recipe related to residual layer thickness and uniformity was optimized and 40 nm thick residual layer was achieved.