• Title/Summary/Keyword: 디스펜싱

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Design of a New Dispensing System Featuring Piezoelectric Actuator (압전 작동기를 이용한 새로운 디스펜싱 시스템 설계)

  • Hung, Nguyen Quoc;Choi, Min-Kyu;Yoon, Bo-Young;Choi, Seung-Bok
    • Transactions of the Korean Society for Noise and Vibration Engineering
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    • v.16 no.7 s.112
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    • pp.739-745
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    • 2006
  • This paper presents a novel type of hybrid dispensing head for IC fabrication and surface mount technology. The proposed mechanism consists of solenoid valve and piezoelectric stack as actuators, and provides positive-displacement and jet dispensing. The positive-displacement dispensing can produce desired adhesive amount without viscosity effect, while the jet dispensing can produce high precision adhesive amount. In order to determine the relationship between required voltage of the piezoelectric actuator and needle displacement, both static and dynamic analysis are undertaken, In addition, finite element analysis is performed in order to find optimal design parameters. Dispensing flow rate and pressure in the chamber are evaluated through fluid dynamic model.

Design of a New Dispensing System Featuring Piezoelectric Actuator (압전 작동기를 이용한 새로운 디스펜싱 시스템 설계)

  • Hung, Nguyen Quoc;Choi, Min-Kyu;Yoon, Bo-Young;Choi, Seung-Bok
    • Proceedings of the Korean Society for Noise and Vibration Engineering Conference
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    • 2006.05a
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    • pp.821-826
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    • 2006
  • This paper presents a novel type of hybrid dispensing head for IC fabrication and surface mount technology. The proposed mechanism consists of solenoid valve and piezoelectric stack as actuators, and provides positive-displacement and jet dispensing. The positive-displacement dispensing can produce desired adhesive amount without viscosity effect, while the jet dispensing can produce high precision adhesive amount. In order to determine the relationship between required voltage of the piezo actuator and needle displacement, both static and dynamic analysis are undertaken, In addition, finite element analysis is performed in order to find optimal design parameters. Dispensing flow rate and pressure in the chamber are evaluated through fluid dynamic model.

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Study on Front Side Metallization of Crystalline Silicon Solar Cells Using a Screw Pumped Dispenser (스크류 펌프 디스펜싱 인쇄를 이용한 결정질 실리콘 태양전지 전면전극 제작에 대한 연구)

  • Chung, Hae Wook;Shin, Dong-Youn
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.41 no.5
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    • pp.365-372
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    • 2017
  • Finger electrodes on a crystalline silicon solar cell are required to be constructed as narrow and thick as possible in order to minimize shading losses and electrical resistance. The most common means to construct high-aspect ratio finger electrodes has been screen-printing, but it has difficulty achieving fine finger electrodes because the as-printed finger width is generally wider by 1.3-2.2 times the screen opening width. Consequently, it requires an extremely small screen opening (below $30{\mu}m$) in order to achieve a finger width below $40{\mu}m$. However, the use of such a small screen opening could result in various problems, such as high printing pressure, defective transport of silver paste, and high electrical resistance due to unfavorable mesh marks left on the finger electrodes. In this study, dispensing printing with a screw pump is introduced as an alternative to conventional screen-printing and its unique traits in the front side metallization of crystalline silicon solar cells is discussed.

Micro-particles in a Nanoliter Droplet Dispensed by a Pneumatic Dispensing System and Its Measurement (공압 디스펜싱 시스템을 이용한 나노리터 액적에 포함된 미세 입자의 분주 및 측정)

  • Lee, Sang-Min;Kim, Joon-Won
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.8
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    • pp.913-919
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    • 2012
  • This paper presents results for dispensing and measuring micro-particles using a pneumatic dispensing system. Particle-suspended liquid droplets were dispensed and analyzed quantitatively at various particle concentrations and applied pressures. By using a developed experimental setup, the number of particles and the particle volume ratio in sequentially dispensed droplets were measured. Hydrophilic and hydrophobic surfaces were tested to find a suitable surface for counting the number of particle. It was confirmed that the dispensed particles concentrated into the center of the droplet on the smooth CD surface after evaporation of liquid. As the applied positive pressure increased, the number of particles per droplet increased consistently and the volume fraction of particles remained constant.

UV nanoimprint lithography using a multi-dispensing method (다중 디스펜싱 방법에 의한 UV-나노임프린트 리소그래피)

  • 심영석;손현기;신영재;이응숙;정준호
    • Journal of Institute of Control, Robotics and Systems
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    • v.10 no.7
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    • pp.604-610
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    • 2004
  • Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. Since the resolution of transferred nanostructures depends strongly upon that of nanostamps, the nanostamp fabrication technology is a key technology to UV-NIL. In this paper, a $5\times5\times0.09$ in. quartz stamp whose critical dimension is 377 nm was fabricated using the etching process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. To effectively apply the fabricated 5-in. stamp to UV-NIL on a 4-in. Si wafer, we have proposed a new UV-NIL process using a multi-dispensing method as a way to supply resist on a wafer. Experiments have shown that the multi-dispensing method can enable UV-NIL using a large-area stamp.

The Minimization of Residual Layer Thickness by using optimized dispensing method in UVnanoimprint Lithography Process (UV 나노임프린트 리소그래피 공정에서 레지스트 도포의 최적화를 통한 잔류층 두께의 최소화)

  • Kim K.D.;Jeong J.H.;Sim Y.S.;Lee E.S.;Kim J.H.;Cho Y.K.;Hong S.C.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.633-636
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    • 2005
  • Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. As with other nanoimprint methods, ultraviolet-nanoimprint lithography (UV-NIL) resolution appears to be limited only by template resolution, and offers a significant cost of ownership reduction when compared to other next generation lithography (NGL) methods such as EUVL and 157 nm lithography. The purpose of this paper is to suggest optimum values of control parameters of Imprio 100 manufactured by Molecular Imprint, Inc., which is the first commercially available UV-NIL tool, for sound nanoimprint. UV-NIL experiments were performed on Imprio 100 to find dispensing recipe for avoiding air entrapment. Dispensing recipe related to residual layer thickness and uniformity was optimized and 40 nm thick residual layer was achieved.

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