• Title/Summary/Keyword: 다층박막 거울

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Analysis of Reflectivity for Interfacial Roughness of Depth-Graded W/Si Multilayer Mirror (두께 변화 W/Si 다층박막거울의 계면 거칠기에 대한 반사율 분석)

  • Chon, Kwon Su
    • Journal of the Korean Society of Radiology
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    • v.12 no.1
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    • pp.101-106
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    • 2018
  • Multilayer mirrors have widely been used for monochromatization of X-ray with high reflection efficiency. The reflected X-ray energy or wavelength is determined by the d-spacing of a multilayer mirror and the incidence angle. The reflectivity critically depends on the number of bilayers and surface roughness on each interface. The multilayer mirror has a structure of alternative deposition of high and low Z-elements on the substrate. Each interface should be considered in the calculation of reflectivity. In this paper, we examine the degradation of reflectivity by the inter-diffusion combined with surface roughness on each interface for a W/Si multilayer mirror. In the depth-graded W/Si multilayer mirror, the FWHMs for angle and energy were larger than them of the uniform multilayer mirror. Inter-diffusion considerable gave rise to the degradation of reflectivity. To obtain measured reflectivity closed to the expected reflectivity, the inter-diffusion on W-Si and Si-W interfaces should be considered.

Calculation of Reflectivity for W/Si Multilayer Mirror of Small d-Spacing (작은 두께주기를 갖는 W/Si 다층박막거울의 반사율 계산)

  • Chon, Kwon Su
    • Journal of the Korean Society of Radiology
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    • v.12 no.1
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    • pp.17-22
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    • 2018
  • Multilayer mirrors are optical elements that can replace single crystal optical elements such as silicon or germanium, and they have artificial diffraction plane of a thickness of several nanometers. We examined the first Bragg angle and the reduction of reflectivity by variation of layer thickness in a W/Si multilayer mirror of small d-spacing. A W/Si multilayer mirror for an incidence angle of $0.55^{\circ}$ and an energy of 17.5 keV was designed and showed a maximum reflectivity of 72.67%. When the thickness of tungsten or silicon layer was simultaneously changed, the first Bragg angle was shifted and the reflectivity was reduced. When there was a change in thickness for one layer of W/Si multilayer, no change in the reflectivity was showed but the unevenness of the envelope was observed. Reduction of reflectivity was also observed at random Gaussian thickness variations. It is possible to predict the tolerance of multilayer mirror by examining the reflectivity degradation according to the thickness change in the W/Si multilayer mirror of small d-spacing.

Optimum Design and Tolerance Analysis of Multilayer Mirror for Obtaining Characteristic X-ray of 17.5 keV (몰리브덴(Mo) 특성방사선 획득을 위한 다층박막 거울의 최적 설계 및 공차 분석)

  • Chon, Kwon-Su
    • Journal of the Korean Society of Radiology
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    • v.3 no.4
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    • pp.23-28
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    • 2009
  • Monochromatic X-ray can make a medical image of high contrast under a low radiation dose and can be easily generated by combining an X-ray tube and a multilayer mirror. A W/C multilayer mirror was optimally designed for a characteristic X-ray generated from a X-ray tube with Mo target. The d-spacing and the thickness ratio in design parameters were determined under the maximum-reflectivity condition. Tolerances for deposition and alignment of the W/C multilayer mirror were calculated. Within a deposition tolerance of 0.2nm and a alignment tolerance of ${\pm}0.01^{\circ}$, 85% of the theoretical peak reflectivity could be achieved. A multilayer mirror can be widely used for making medical images because of generating high fluence monochromatic X-ray.

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Acquisition of Monochromatic X-ray Using Multilayer Mirror (다층박막 거울을 이용한 단색 엑스선 획득)

  • Chon, Kwon-Su
    • Journal of radiological science and technology
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    • v.33 no.3
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    • pp.179-184
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    • 2010
  • A hard X-ray microscope system for obtaining images of nano-spatial resolution has been widely studied and requires monochromatic X-ray. A multilayer mirror of 84% reflectivity was designed to acquire tungsten characteristic X-ray of 8.4 keV from the white beam generated from an X-ray tube, and the C/W multilayer mirror of $50{\times}50\;mm$ size and 5.65 nm d-spacing was fabricated by the ion-beam sputtering system. The C/W multilayer had a uniformity of 99.5%, and the structure of the multilayer mirror was verified by a TEM image. The obtainable x-ray reflectivity for the C/W multilayer mirror at 8.4 keV was estimated from measuring the X-ray reflectivity using the copper characteristic X-ray of 8.05 keV. Monochromatic X-ray of 8.4 keV was generated by combining a X-ray tube, and the reflectivity and monochromaticity were 77.1% and 0.21 keV, respectively. Monochromatic X-ray generated from the combination of an X-ray tube and an C/W multilayer mirror has enough potential to use X-ray source for hard X-ray microscope system of laboratory size. If the C/W multilayer mirror of d-spacing of a few nanometers can be fabricated, monochromatic X-ray corresponded to 17.5 keV, molybdenum characteristic X-ray, can be obtained and applied to mammography in the medical application.

Improvement of Genetic Algorithm for Evaluating X-ray Reflectivity on Multilayer Mirror (다층박막 거울의 반사율 평가를 위한 유전 알고리즘의 개선)

  • Chon, Kwon Su
    • Journal of the Korean Society of Radiology
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    • v.14 no.1
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    • pp.69-75
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    • 2020
  • Multilayer mirrors have widely been used not only in the industry but also in the medical field. X-ray reflectivity was measured by X-ray diffractometer to evaluate the performance of W/C multilayer mirror with 40 layers. Genetic algorithm are used to obtain thickness, density, and interfacial roughness for each of the 40 layers. The existing uniform random selection causes a problem that the solution does not converge or the error increases even if it convergence. To reduce the time to calculate the fitness of the genetic algorithm, the genetic algorithm was written in C/C++ parallel programming. The genetic algorithm showed excellent scalability of linear time increase with increasing number of generation and population. The genetic algorithm was selected with uniform and Gaussian randomness of 1:1 to improve the convergence of solution. The improved genetic algorithm can be applied to characterize each layer of a sample with more than a few tens of layers, such as a multilayer mirror.

X-ray Radiography에 적합한 Double Multilayer Monochromaotr (DMM) 설계와 제작

  • Jeong, Sun-Yong;Yang, Seong-Seon;Im, Jae-Hong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.118-118
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    • 2013
  • DMM은 방사광가속기의 백색광으로부터 단색광을 추출하기 위해 두 개의 다층 박막 (multilayer) 거울을 사용하는데, 첫 번째 거울은 Bragg 반사를 통해 분광을 하여 단색광을 생산하는 용도이고, 두 번째 거울은 이 단색광을 반사시켜 지면과 평행하게 출사되게 하기 위함이다. 일반적으로 사용되는 DCM (Double Crystal Monochromator)과의 차이점은, Bragg 반사를 위해 DCM에서는 결정을 사용하는 반면 DMM은 밀도차이가 많이나는 두 종류의 물질을 교대로 쌓아 올린 다층 박막을 사용한다는 것이다. 다층 박막의 주기가 곧 Bragg 반사에서의 d-spacing이 되며, X-선 분광의 목적으로 사용되는 d-spacing은 10-50 $\AA$ 사이이다. DCM이 0.01% 대의 우수한 에너지 분해능을 보이는데 비해, DMM은 1% 정도이다. 이 때문에 출사광의 밝기가 DCM에 비해 100배 밝은 특징이 있어서 에너지 분해능보다 광량이 더 중요한 응용에서 DMM이 사용된다. X-선 영상이나 방사선치료가 바로 이러한 응용에 해당한다. DMM은 포항가속기연구소와 (주) 벡트론에서 공동 설계하였으며, (주)벡트론에서 제작하였다. 그림 1에 DMM의 외형과 내부 구조를 나타내었다. Bragg 각의 조절 범위는 0.24-0.9도 이다. 입사광과 출사광의 수직 방향 offset을 10 mm로 유지하기 위해 두 번째 다층 박막이 수평방향으로 1,000 mm 가량 이동할 수 있어야 한다. 이를 위해 두 대의 고니오미터 stage를 사용하여 각각 첫 번째 및 두 번째 다층 박막의 위치와 방향을 제어한다. 첫 번째 다층 박막을 제어하는 고니오미터 stage는 하부가 전체 프레임에 고정되어 있고, 이 고니오미터의 회전축에서 Bragg 각을 조절한다. 두 번째 다층 박막을 제어하는 고니오미터 stage는 높이방향과 수평방향으로 이동이 가능하다. 다층 박막의 pitch는 고니오미터의 회전축에서 조절한다. 그리고 tilt stage를 사용하여 다층 박막의 roll을 조절한다.

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Effects of a Dielectric Multilayer Mirror on the Lighting Efficiency of Organic Light-Emitting Diodes Studied by Optical Simulation (유전체 다층 거울이 유기발광다이오드의 광효율 향상에 미치는 영향에 관한 광학 시뮬레이션 연구)

  • Lee, Sung-Jun;Ko, Jae-Hyeon
    • Korean Journal of Optics and Photonics
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    • v.26 no.3
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    • pp.139-146
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    • 2015
  • The effects of a dielectric multilayer mirror on the efficiency of organic light-emitting diodes (OLEDs) were investigated by using optical simulation. Adoption of a dielectric mirror consisting of alternating SiN and $SiO_2$ layers narrowed the emission spectrum due to the microcavity effect, and increased the outcoupling efficiency by a few percent. The layer thicknesses of the dielectric mirror were adjusted to change the wavelength of the resonance mode, which may be used to increase the color purity.

Design of Omnidirectional Mirror Using Quarter-wave Dielectric Stacks (${\lambda}_0$/4 두께 유전체 다층 박막계를 이용한 전방향 거울의 설계)

  • 김성화;황보창권
    • Proceedings of the Optical Society of Korea Conference
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    • 2000.02a
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    • pp.180-181
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    • 2000
  • 일반적으로 광통신이나 고출력 레이저에 사용되는 광학 소자들 중 고반사율의 거울은 특정 파장과 특정 각도에 대해서만 민감하도록 설계되어 있다. 이것을 여러 파장의 빛을 여러 각도로 입사시키더라도 높은 반사율을 얻는다면, 소자의 효율을 향상시키는데 상당한 효과를 볼 수 있다. 은이나 알루미늄의 금속박막으로 제작되는 금속 거울은 제작하기 쉽고 입사파장과 금속의 재질에 관련되어 90 %이상의 반사율을 갖지만, 특정한 각도에서는 빛이 금속 내에 있는 자유 전자들에 의해 상당량 흡수되어 버린다. 따라서 금속 거울은 에너지의 손실이 적어야 하는 광통신이나 고출력 레이저와 같은 응용분야에는 사용될 수 없다. 이러한 흡수가 거의 없는 유전체 거울은 고굴절률과 저굴절률의 층이 λ$_{0}$/4의 광학 두께를 가지고 주기적으로 반복되는 구조를 갖는다. 이러한 λ$_{0}$/4 유전체 다층 박막계는 1-차원 photonic 결정 구조와 동일하게 다룰 수 있는데, 1-차원 photonic 결정 구조가 모든 입사각도에 대해서 전방향 반사를 보인다는 것을 이론과 실험적으로 증명하였다[1-3]. (중략)

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Property of Carbon Layer for C/W Multilayer Mirror (C/W 다층박막 거울의 탄소층 특성 Property of Carbon Layer for C/W Multilayer Mirror)

  • Park, Byoung-Hun;Choi, Hyung-Wouk;Oh, Sun-Ju;Yoon, Kwon-Ha;Chon, Kwon-Su
    • Journal of the Korean Society of Radiology
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    • v.4 no.4
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    • pp.33-36
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    • 2010
  • Multilayer mirrors are very useful for applications of high energy X-ray. X-rays of high energy require very small thickness, a few nanometers, in the d-spacing of a multilayer mirror. Each layer is composed of a multilayr mirror influences to interfacial roughness or interdiffusion which gives rise to degrade specular reflection. Carbon layer of 1 nm thick in a C/W multilayer mirror of 3.25 nm d-spacing was examined. Carbon as well as tungsten layers were very uniform, and there was no micro-structure in carbon layers. However, interdiffusion between carbon and tungste layers was observed by a transmission electron microscope.