• Title/Summary/Keyword: 다이아몬드상 카본

Search Result 66, Processing Time 0.022 seconds

A variation of elastic modulus of very thin diamond-like carbon films with deposition condition (증착조건에 따른 극미세 다이아몬드상 카본 박막의 탄성률 변화거동)

  • 정진원;이광렬;은광용;고대홍
    • Journal of the Korean Vacuum Society
    • /
    • v.10 no.4
    • /
    • pp.387-395
    • /
    • 2001

  • The elastic modulus and the structural evolution were examined with the film thickness in polymeric, hard, graphitic diamond-like carbon (DLC) films. The DLC films used in the present study were prepared by radio frequency plasma assisted chemical vapor deposition (r.f.-PACVD) from $C_6H_6\;and\;CH_4$ gas. Elastic modulus of very thin DLC film was measured by free overhang method. This method has an advantage over the other methods. Because the substrate was removed by etching technique, the measured value is not affected by the mechanical property of the substrate. The structural evolution was investigated by the G-peak position of the Raman spectrum. The polymeric and graphitic films exhibited the decreased elastic modulus with decreasing film thickness. In polymeric films, the reason was that more polymeric film had been deposited in the initial stage of the film growth and in graphitic film more graphic films which had been deposited in the initial stage decreased the elastic modulus. The G-peak position of the Raman spectrum confirmed this result. On the other hand, the hard film showed the constant elastic modulus regardless to the film thickness. The structural change was not observed in this range of the film thickness.

  • PDF

The control of the structure and properties of tetrahedral amorphous carbon films prepared by Filtered Vacuum Arc (FVA 증착법에 의해 합성된 ta-C 박막의 구조 및 물성 제어)

  • 이철승;신진국;김종국;이광렬;윤기현
    • Journal of the Korean Vacuum Society
    • /
    • v.11 no.1
    • /
    • pp.8-15
    • /
    • 2002

  • Tetrahedral amorphous carbon(ta-C) films were deposited by the filtered vacuum arc(FVA) process. The FVA process has many advantages such as high ionization ratio and the ion energy, which is suitable for dense amorphous carbon film deposition. However, the energy of the carbon ion cannot be readily controlled by manipulating the arc source parameters. In order to control the film properties in wide range, we investigated the dependence of the film properties on the substrate bias voltage. The mechanical properties and the density of the film exhibit the maximum values at about -100 V of the bias voltage. The maximum values of hardness and density were respectively 54$\pm$3 GPa and 3.6$\pm$0.4 g/㎤, which are 3 to 5 times higher than those of the films deposited by RF PACVD or ion beam process. The details of the atomic bond structure were analysed by Raman and NEXAFS spectroscopy. The change in the film properties for various bias voltages could be understood in the view of the $sp^2$ and $sp^3$ bond fraction in the deposited films.

  • PDF KSCI