• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.234-234
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• 2010

최근 CMOS 소자 크기가 축소됨에 따라 소스와 드레인 영역에서의 접촉저항을 줄이기 위하여, 실리사이드 공정이 많이 연구되고 있다. 실리사이드 물질로서 NiSi는 낮은 저항률과 낮은 실리콘 소모, 낮은 공정온도, 등의 장점을 가지고 있다. 그러나, 실리사이드 형성으로 인한 나노소자의 소오스/드레인에서정션(junction) 누설전류의 증가는 큰 문제가 되므로 실리콘과 실리사이드 계면의 특성이 중요하다. 본 연구에서는 니켈을 이용한 실리사이드 형성시 계면 활성제인 에틸 요오드를 이용하여 실험을 진행하였다. 금속 유기 전구체인 MABONi을 사용하여 ALD 방식으로 증착 한 니켈 박막과 니켈 핵 형성시 계면활성제인 에틸요오드의 처리 방법에 따른 Ni-silicide 박막의 특성을 비교, 분석하였다. 먼저 자연산화막을 건식식각으로 제거한 뒤, 첫 번째 샘플에서는 10회의 주기로 초기 니켈을 증착한 뒤, 에틸요오드로 니켈의 표면 위를 처리하고, 다시 200회의 주기로 니켈을 증착하였으며, 두 번째는 첫 번째 방식에서 에틸요오드 주입 시 동시에 수소도 함께 주입하였다. 세 번째는 비교를 위해 에틸요오드 처리를 하지 않고 니켈 박막만을 증착 하였다. 이어서, 각 샘플을 급속 열처리 장비에서 $400^{\circ}C$부터 $900^{\circ}C$까지 각각 30sec간 열처리를 진행후, 반응하지 않은 잔여 니켈을 제거한 후, XRD(x-ray diffraction), AES(auger), 그리고 4-point probe 등을 이용하여 형성된 실리사이드의 특성을 분석하였다. 에틸요오드와 함께 수소를 주입한 경우 계면에서의 산소 불순물과 카본 성분이 효과적으로 제거되어 $400^{\circ}C$에서 $2.9{\Omega}/{\Box}$ 의 낮은 면저항을 가지는 NiSi가 형성되었고 모든 온도구간에서 다른 샘플에 비하여 가장 낮은 면저항 분포를 보였다. 이는 분해 흡착된 요오드에 의한 계면 특성 향상과 카본 성분이 포함된 잔여물들이 수소처리에 의해 효율적으로 제거되어 실리사이드의 특성이 향상되었기 때문이다. 계면활성제를 사용하지 않은 경우에는 $500^{\circ}C$에서 NiSi가 형성되었다. 반면에 에틸요오드로만 표면을 처리한 경우에는 니켈과 실리콘 계면에서의 카본 성분에 의하여 silicidation 이 충분히 일어나지 않았다. 이러한 결과는 향후 45nm 이하의 CMOS 공정상에서 소스와 드레인의 낮은 누설전류를 가지고, 접촉저항을 줄이기 위한 니켈 실리사이드 형성에 큰 도움을 줄 것으로 기대된다.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2001.05a
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• pp.349-352
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• 2001

In this paper, novel device structure in order to realize ultra fast and ultra small silicon devices are investigated using ultra-high vacuum chemical vapor deposition(UHVCVD) and Excimer Laser Annealing (ELA) for ultra pn junction formation. Based on these fundamental technologies for the deep sub-micron device, high speed and low power devices can be fabricated. These junction formation technologies based on damage-free process for replacing of low energy ion implantation involve solid phase diffusion and vapor phase diffusion. As a result, ultra shallow junction depths by ELA are analyzed to 10~20 nm for arsenic dosage (2$\times$10$^{14}$ $\textrm{cm}^2$), excimer laser source(λ=248nm) is KrF, and sheet resistances are measured to 1k$\Omega$/$\square$ at junction depth of 15nm.

• Journal of the Semiconductor & Display Technology
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• v.21 no.3
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• pp.105-109
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• 2022

For the realization of higher reliable transition metal dichalcogenide layer, molybdenum disulfide was formed on sapphire substrate by direct current sputtering and subsequent rapid thermal annealing process. Unlike RF sputtered MoS₂ thin films, DC sputtered showed no irregular holes and protrusions after annealing process from scanning electron microscope images. From atomic force microscope results, it was possible to investigate that surface roughness of MoS₂ thin films were more dependent on DC sputtering power then annealing temperature. On the other hand, the Raman scattering spectra showed the dependency of significant E¹_2g and A¹_g peaks on annealing temperatures.

• Journal of the Semiconductor & Display Technology
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• v.23 no.1
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• pp.88-91
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• 2024

The europium doped yttrium oxide (Y₂O₃:Eu³⁺) thin film was formed on a Si substrate by the conventional spin-coating process followed by rapid thermal annealing (RTA) treatment. The spinning profiles such as rotation speed, acceleration and holding times were controlled during the spin-coating process for the best condition of the Y₂O₃:Eu³⁺ thin film. The RTA treatment was conducted for several temperature in order to crystallize the spin coated film. The Y₂O₃:Eu³⁺ thin film presented best performance in the conditions of 4000 rpm, 30 s and 10 s of rotation speed, acceleration time and holding time, respectively, at a fixed RTA temperature of 900 ℃.

• Journal of Bio-Environment Control
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• v.9 no.1
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• pp.47-59
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• 2000

In order to investigate the physical and chemical properties of artificial culture media, the specimens were substituted with 5~20％ clay, 10~30％(w) quick lime, 5~l5％(w) burnt plaster and 10％(w) sawdust. Fly ash-clay bodies were sintered at 1,050~1,20$0^{\circ}C$ and then their properties were determined. It was found that 90FA10JC(fly ash ＋clay(90：10, ％(w)) specimen sintered at 1,15$0^{\circ}C$ for 10 min. had good physical and chemical properties. When this composition was supplement with 10％(w) sawdust, bulk density water absorption, apparent porosity, compressive strength and pH after 240 hrs curing time were 1.14, 54.4％, 39.5％, 54 kgf.cm$^{-2}$ and 7.1 respectively. The physical properties of fly ash-quick lime-burnt plaster system specimens were superior to FAJC systems. However, this composition we not suitable as a artificial culture media because of its high pH. In this study, it was shown that 90FA10JC10SD(90FA10JC ＋10％(w) sawdust) system exhibited the best physical properties.

• Journal of the Microelectronics and Packaging Society
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• v.10 no.2
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• pp.61-67
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• 2003

The interfacial reaction between ultra-small 58Bi-42Sn solder and Au/Ni/Ti under bump metallurgy (UBM) for ultra-fine flip chip application was investigated. The ultra-small 58Bi-42Sn solder bump, about $46{\mu}m$ in diameter, was fabricated by using the lift-off method and reflowed using the rapid thermal annealing (RTA) system. The intermetallic compounds were characterized using a secondary electron microscopy (SEM), an energy dispersive spectroscopy (EDS), and an x-ray diffractometer (XRD). The faceted and polygonal intermetallic compounds were found in the Bi-Sn solder bumps on $Au(0.1{\mu}m)/Ni/Ti$ UBM and they were indentified as $(Au_xBi_yNi_{1-x-y})Sn_2$ Phase. The intermetallic compounds grown from the $Au(0.1{\mu}m)/Ni/Ti$ UBMinterface were dispersed in the solder bump.

• Journal of the Korean Society of Food Science and Nutrition
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• v.30 no.6
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• pp.1095-1101
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• 2001

Spinach was minimally processed into the unseasoned side dish to be used for Korean food service industry, using the techniques of cook-chill and sous vide. Spinach was blanched at 10$0^{\circ}C$ for 6 minutes, vacuum-packaged in the unit of 500 g by plastic film of low gas permeability, pasteurized at 9$0^{\circ}C$ and then cooled rapidly at 3$^{\circ}C$. The chilled products were then stored at 3 and 1$0^{\circ}C$ with measurement in their quality. Six log cycle (6D) inactivation of Listeria monocytogenes and 13 log (13D) thermal destruction of Streptococcus faecalis were compared as two pasteurization conditions, which corresponded to heating for 22.8 and 30.0 minutes at 9$0^{\circ}C$, respectively. Milder heat processing based on 6D process of L monocytogenes gave better quality of color, texture, ascorbic acid and chlorophyll than the conditions of 13D process of S. faecalis. Any microbial growth in total aerobic, psychrophilic and anaerobic bacteria was not observed until 8 days at 1$0^{\circ}C$ and 14 days at 3$^{\circ}C$, which might be regarded as strict guidelines of shelf life. Storage times based on the changes in physical and chemical quality were longer than those based on strict microbial quality in case of the products pasteurized by 6D process of L. monocytogenes. The seasoned vegetables prepared from sous vide processed spinach were found to be inferior in sensory quality to those from freshly blanched one.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.38 no.11
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• pp.771-780
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• 2001

It is indispensable to use the process and device simulation tool in order to analyze accurately the electrical characteristics of ULSI CMOS devices, in addition to developing and manufacturing those devices. The 3D Monte Carlo (MC) simulation result is not efficient for large-area application because of the lack of simulation particles. In this paper is reported a new efficient simulation strategy for 3D MC ion implantation into large-area application using the 3D MC code of TRICSI(TRansport Ions into Crystal Silicon). The strategy is related to our newly proposed split-trajectory method and ion-splitting method(ion-shadowing approach) for 3D large-area application in order to increase the simulation ions, not to sacrifice the simulation accuracy for defects and implanted ions. In addition to our proposed methods, we have developed the cell based 3D interpolation algorithm to feed the 3D MC simulation result into the device simulator and not to diverge the solution of continuous diffusion equations for diffusion and RTA(rapid thermal annealing) after ion implantation. We found that our proposed simulation strategy is very computationally efficient. The increased number of simulation ions is about more than 10 times and the increase of simulation time is not twice compared to the split-trajectory method only.

• Journal of the Korean Magnetics Society
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• v.17 no.3
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• pp.141-146
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• 2007

A new class of LC-resonator for micro magnetic sensor device was invented and fabricated by means of MEMS technique. The micro LC-resonator consists of a solenoidal micro-inductor with a bundle of soft magnetic microwire cores and a capacitor connected in parallel to the micro-inductor. The core magnetic material is a tiny glass coated $Co_{83.2}B_{3.3}Si_{5.9}Mn_{7.6}$ microwire fabricated by a glasscoated melt spinning technique. The core materials were annealed at various temperatures $150^{\circ}C,\;200^{\circ}C\;,250^{\circ}C\;,$ and $300^{\circ}C$ for 1 hour in a vacuum to improve soft magnetic properties. The solenoidal micro-inductors fabricated by MEMS technique were $500{\sim}1,000{\mu}m$ in length with $10{\sim}20$ turns. The changes of inductance as a function of external magnetic field in micro-inductors with properly annealed microwire cores were varied as much as 370%. Since the permeability of ultra soft magnetic microwire is changing rapidly as a function of external magnetic field. The inductance ratio as well as magnetoimpedance ratio (MIR) in a LC-resonator was varied drastically as a function of external magnetic field. The MIR curves can be tuned very precisely to obtain maximum sensitivity. A prototype magnetic sensor device consisting of the developed microinductors with a multivibrator circuit was test successfully.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.331-331
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• 2012

InGaN/GaN 양자우물 LED소자의 내부양자효과 및 외부양자효과를 높이기 위해 많은 연구자들이 노력을 하고 있다. InGaN/GaN 양자우물 전광소자의 효율을 높이는 방법으로는 무분극 박막성장을 이용한 양자우물의 운반자 파동함수의 분리를 감소시키는 방법, 양자우물 위에 전자 차단층을 성장시키는 방법, 박막의 비발광 결함을 감소시키는 방법, 나노박막 또는 나노 입자를 이용한 표면 플라즈몬 효과를 이용하는 방법 등이 있다[1-3]. 본 연구에서는 은(Ag) 나노입자를 이용하여 InGaN/GaN 양자우물과 p-GaN 덮개층을 패턴에칭한 후, 그 위에 Ag 나노입자를 도포하여 표면 플라즈몬 효과를 이용한 InGaN/GaN 양자우물의 발광효율을 높이고자 하였다. c-면 방향의 사파이어에 유기화학금속증착법(MOCVD)으로 n-형 GaN를 2.0 ${\mu}m$ 성장한 후 그 위에 InGaN/GaN 양자우물 5층을 성장하였다. 또한 전자 차단층으로 AlGaN를 7 nm 증착한 후, p-type GaN를 100 nm 성장하였다. p-type GaN를 패턴하기 위해 포토리소그래피 와 유도결합 플라즈마 에칭공정을 거쳐 선 패턴을 형성하였는데, 이 때 에칭된 p-GaN 깊이는 약 90 nm 이었다. 에칭한 패턴크기가 LED소자의 전기적 및 광학적 특성에 미치는 영향을 알아보기 위해 전류-전압 측정과 photoluminescence 측정을 하였다. 그 후 급속열처리방법을 이용한 Ag 나노입자 형성과 표면플라즈몬이 소자의 발광효율에 미치는 영향에 대해 조사하였다.