• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.414.1-414.1
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• 2016

스크린 프린팅법을 이용한 태양전지의 전극은 주로 고가의 은을 사용하기에 태양전지의 저가화에 한계를 가지고 있다. 고효율 결정질 실리콘 태양전지의 원가절감의 문제 해결방안으로 박형 웨이퍼 연구개발이 많은 관심을 받고 있다. 본 연구에서는 은 전극을 대체 할 수 있는 니켈/구리 전극을 사용하였고, 박형 웨이퍼에서도 전극 공정이 가능한 도금법을 사용하여 전극을 형성 하였다. 니켈 전극형성은 광유도 도금법(Light-Induced Plating), 구리 전극형성은 광유도전해도금법(Light-Induced Electro Plating)을 이용하여 실험을 진행 하였다. 니켈 광유도 도금 공정시 공정시간 3 ~ 9분까지 가변하였다. 니켈실리사이드 형성 위해 열처리 공정을 $300{\sim}450^{\circ}C$까지 가변하였고 유지시간 30초 ~ 3분까지 가변하여 실험을 진행하였다. 니켈 도금 수용액의 pH 6 ~ 7.5까지 가변하여 실험하였다. 구리 광유도 전해도금 공정 전류밀도를 $1.6mA/cm^2{\sim}6.4mA/cm^2$까지 가변하여 실험을 진행 후, 전류밀도 $3.2mA/cm^2$로 시간 5 ~ 7분까지 가변하여 실험 하였다. 니켈 도금 공정 시간 5분, 니켈실리사이드 형성 열처리 온도 $350^{\circ}C$, 유지시간 1분에서 DIV(Dark I-V) 분석결과 가장 적은 누설전류를 확인하였다. 니켈 도금액 pH 6.5에서 니켈입자 및 구리입자의 균일성이 좋은 최적의 조건임을 확인하였다. 구리 도금 공정 전류밀도 $3.2mA/cm^2$, 시간 5분에서 TLM(Transmission Line Method) 측정결과 접촉 저항 $0.39{\Omega}$과 접촉 비저항 $12.3{\mu}{\Omega}{\cdot}cm^2$의 저항을 확인하였다. 도금법을 이용하여 전극을 형성함으로써 접촉저항 및 접촉 비저항이 낮고 전극 품질이 향상됨으로서 셀의 전류밀도 $42.49mA/cm^2$를 얻을 수 있었다.

• Resources Recycling
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• v.23 no.6
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• pp.30-39
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• 2014

The trajectories of PCB(Printed Circuit Board) particles in the corona discharge electrostatic separation was simulated. The PCB particles are prepared by crushing bare board, which disassembled from electronic components, consist mostly of copper and FR-4(Flame Retardant Level-4) Firstly, a model was established for calculating of detachment points of PCB particles from the rotating electrode in separator. The model of detachment points was derived from equilibrium of force such as gravity force, centrifugal force, electrostatic force. The trajectories of particles after detachment was calculated by acceleration derived from time-integrating method of motion equation. In this simulation, particle size, supplied voltage, rotation speed of rotating roll electrode and angle of induction electrode were adopted as variables. While the trajectories of FR-4 particles were affected by all variables, rotation speed of rotating roll electrode was dominant variables affecting trajectories of copper particles.

• Korean Chemical Engineering Research
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• v.54 no.3
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• pp.394-403
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• 2016

$H_2$ production by chemical looping is an efficient method to convert hydrocarbon fuel into hydrogen with the simultaneous capture of concentrated $CO_2$. This process involves the use of an iron based oxygen carrier that transfers pure oxygen from oxidizing gases to fuels by alternating reduction and oxidation (redox) reactions. The enhanced reactivities of copper oxide doped iron-based oxygen carrier were reported, however, the fundamental understandings on the interaction between $Fe_2O_3$ and CuO are still lacking. In this study, we studied the effect of dopant of CuO to $Fe_2O_3/ZrO_2$ particle on the morphological changes and the associated reactivity using various methods such as SEM/EDX, XRD, BET, TPR, XPS, and TGA. It was found that copper oxide acted as a chemical promoter that change chemical environment in the iron based oxygen carrier as well as a structural promoter which inhibit the agglomeration. The enhanced reduction reactivity was mainly ascribed to the increase in concentration of $Fe^{2+}$ on the surface, resulting in formation of charge imbalance and oxygen vacancies. The CuO doped $Fe_2O_3/ZrO_2$ particle also showed the improved reactivity in the steam oxidation compared to $Fe_2O_3/ZrO_2$ particle probably due to acting as a structural promoter inhibiting the agglomeration of iron species.

• Journal of Wetlands Research
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• v.17 no.4
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• pp.407-413
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• 2015

As the number of applications containing nanomaterials increase, aquatic ecosystem exposure to nanoparticles (NPs) is unavoidable. In this study, we carried out toxicity assessment to Au-nanoparticles(NPs) of Rana dybowskii eggs and tadpoles. Toxicity was recorded hatching rate, body condition(Snout-tail length, STL), and behavioral sensitivity. Behavioral sensitivity was analyzed to anti-predator behavior using Ethovision XT 9. Au-NPs did not show any toxicity of hatching rate and STL. But, Tadpoles exposed to Au-NPs decrease behavioral sensitivity of stimuli. This study has value of environmental toxicity evaluation because these results show the new way of toxicity assessment.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2016.11a
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• pp.154-154
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• 2016

다공성 수지상 구리분말은 그 구조적 특성으로 인해 다양한 촉매 분야에 사용되어왔으며, 본 연구에서는 전해도 금욕의 종류에 따라 수지상 구리의 표면적 특성에 대해 연구하였다. 도금욕의 종류($CuSO_4$, $CuCl_2$, $Cu_2P_2O_7$), 인가 전위, 도금시간(1, 5, 10, 30min)에 따른 수지상 형상을 비교하였다. SEM 이미지 분석 결과 황산구리와 염화구리 도금용액에서는 plate-like dendrite 형상이 관찰되었으며, 피로인산구리 도금용액에서는 needle-like dendrite 형상이 관찰되었다. 정전위 실험결과 도금용액별 한계전류밀도에서 음(-)의 방향으로 100mV 낮은 지점의 인가 전위 및 도금시간 10분에서 3가지 용액 모두 가장 미세한 수지상 입자가 관찰되었다. 도금용액별 겉보기 밀도 및 BET 비표면적을 측정해본 결과 미세한 수지상일수록 겉보기밀도는 낮게 비표면적은 크게 측정되었다. 가장 낮은 겉보기 밀도와 가장 높은 BET 비표면적을 가지는 용액은 염화구리 도금용액이었으며 그 값은 $0.951g/cm^3$, $1.8052m^2/g$이었다.

• Journal of the Korean Ceramic Society
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• v.37 no.9
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• pp.900-908
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• 2000

일반적인 유리용융과 열처리법을 이용하여 많은 양의 금속구리 미립자가 분산된 Zinc Phosphate 유리를 제조하였다. 금속산화물로는 Cu$_2$O를, 환원제로는 SnO를 사용하였다. XRD와 전자회절로부터 열처리에 의해 금속구리의 결정상이 석출됨을 알 수 있었고, TEM에 의해 석출상의 크기는 수~20nm 정도임을 알 수 있었다. 또한 570nm에서의 광흡수 피크로부터도 금속구리의 석출을 확인할 수 있었다. 석출입자의 크기와 흡광은 석출을 위한 열처리 온도와 시간이 증가함에 따라 증가하였다. XPS 스펙트럼으로는 구리의 산화상태 중 Cu$^{2+}$ 이온의 상태만을 분명히 할 수 있었다. 매질유리의 BO/NBO의 비는 열처리 전후 크게 변화가 없었으며, 열처리 후 Cu$^{2+}$ 이온이 다소 감소되는 경향을 보였다.

• Applied Chemistry for Engineering
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• v.34 no.5
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• pp.479-487
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• 2023

Copper is cost-effective and abundantly available as a biocidal coating agent for a wide range of material surfaces. Natural oxidation does not compromise the efficacy of copper, allowing it to maintain antimicrobial activity under prolonged exposure conditions. Furthermore, copper compounds exhibit a broad spectrum of antimicrobial activity against pathogenic yeast, both enveloped and non-enveloped types of viruses, as well as gram-negative and gram-positive bacteria. Contact killing of copper-coated surfaces causes the denaturation of proteins and damage to the cell membrane, leading to the release of essential components such as nucleotides and cytoplasm. Additionally, redox-active copper generates reactive oxygen species (ROS), which cause permanent cell damage through enzyme deactivation and DNA destruction. Owing to its robust stability, copper has been utilized in diverse forms, such as nanoparticles, ions, composites, and alloys, resulting in the creation of various coating methods. This mini-review describes representative coating processes involving copper ions and copper oxides on various material surfaces, highlighting the antibacterial and antiviral properties associated with different oxidation states of copper.

• Korean Chemical Engineering Research
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• v.43 no.4
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• pp.495-502
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• 2005

Copper was plated on the tungsten substrate by use of a direct copper electroless plating. The optimum deposition conditions were found to be with a concentration of $CuSO_4$ 7.615 g/L, EDTA of 10.258 g/L, and glyoxylic acid of 7 g/L, respectively. The solution temperature was maintained at $60^{\circ}C$. The pH was varied from 11.0 to 12.8. After the deposition, the properties of the copper film were investigated with X-ray diffractometer (XRD), Field emission secondary electron microscope (FESEM), Atomic force microscope (AFM), X-ray photoelectron spectroscope (XPS), and Rutherford backscattering spectroscope (RBS). The best deposition condition was founded to be the solution pH of 11.8. In the case of 10 min deposition at the pH of 11.8, the grain shape was spherical, Cu phase was pure without impurity peak ($Cu_2O$ peak), and the surface root mean square roughness was about 11 nm. The thickness of the film turned out to be 140 nm after deposition for 12 min and the deposition rate was found to be about 12 nm/min. Increase in pH induced a formation of $Cu_2O$ phase with a long rectangular grain shape. The pH control seems to play an important role for the orientation of Cu in electroless deposition. The deposited copper concentration was 99 atomic percent according to RBS. The resulting Cu/W film yielded a good adhesive strength, because Cu/W alloy forms during electroless deposition.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.10
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• pp.1023-1028
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• 2009

Cleaning is required following CMP (chemical mechanical planarization) to remove particles. The minimization of particle residue is required with each successive technology generation, and the cleaning of wafers becomes more complicated. In copper damascene process for interconnection structure, it utilizes 2-step CMP consists of Cu and barrier CMP. Such a 2-steps CMP process leaves a lot of abrasive particles on the wafer surface, cleaning is required to remove abrasive particles. In this study, the chemical mechanical cleaning(CMC) is performed various conditions as a cleaning process. The CMC process combined mechanical cleaning by friction between a wafer and a pad and chemical cleaning by CMC solution consists of tetramethyl ammonium hydroxide (TMAH) / benzotriazole (BTA). This paper studies the removal of abrasive on the Cu wafer and the cleaning efficiency of CMC process.

• Proceedings of the Korean Society of Marine Engineers Conference
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• 2000.11a
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• pp.61-67
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• 2000

Many research works for improving a boundary lubrication performance have been executed by using solid lubricants, and been tried to apply an engine lubrication. However those general lubricants like MoS$_2$ or PTFE have not been applied on engines due to the extreme conditions such as very high temperature and pressure by combustion process in a cylinder. A copper nickel alloy fine particle has been introduced and studied. In this Paper the lubricant using the alloy Particles is applied on a marine diesel engine and assessed by the engine performance test The results showed the increase of cylinder pressure related strongly to the engine efficiency as well as the improving the engine lubrication performance.