• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.103-103
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• 2000

강한 결정 방향 의존성과 낮은 항정계를 갖는 Bi4Ti3O12 강유전체 박막은 NDRO형 비휘발성 강유전체 메모리 분야에서 매우 유망한 재료이다. 이를 위해서는 실리콘 기판과의 계면조절과 실리콘 기판성에서 고품질의 강유전성 박막을 성장시키는 기술이 필수적이다. MOCVD에 의한 Bi4Ti3O12 의 증착에서는 Bi 성분의 강한 휘발 특성과 낮은 반응성으로 인하여 조성과 두께 등의 조절이 매우 어렵다. 따라서 화학기상증착의 기구를 이해하고 제어하는 기술이 양질의 박막을 얻는데 필수적이다. 본 연구에서는 유기금속 원료 TPB, TIP 과 산소를 이용하여 실리콘 기판위에 Bi4Ti3O12 강유전체 박막을 증착할 때, 증착 변수의 변화에 따른 박막의 증착 거동과 구조적, 전기적 특성을 연계하여 분석하였다. 특히 기판부착력이 낮고 휘발성이 강한 Bi의 특성으로 인한 문제를 개선하기 위하여 TIP원료를 주기적으로 공급, 중단을 반복하는 펄스주입법을 고안하여 그 효과를 살펴보았다. 실리콘 기판위에서 TiO2의 증착속도는 실험온도 영역에서 온도에 따라 변화하지 않는 전형적인 물질 전달에 의해 지배되는 양상을 나타내었다. 반면 Bi2O3 경우에는 50$0^{\circ}C$ 이상에서 급격하게 증착속도가 감소하는 특이한 경향을 나타내었으며 이는 Bi2O3의 높은 휘발성 때문일 것이다. Bi4Ti3O12 박막은 온도증가에 따라 증착속도가 증가한 후 $600^{\circ}C$ 이상에서 포화되는 경향을 보였다. 이로부터 실리콘 기판위에서의 Bi4Ti3O12 박막의 증착 모델을 제시하였다. Bi2O3에 비해 상대적으로 표면 부착력이 월등히 큰 TiO2가 우선적으로 실리콘 펴면에 형성된 후 TPB 유기금속 원료가 이 TiO2와 반응하는 과정으로 Bi4Ti3O12 박막이 증착된다. $600^{\circ}C$이상에서는 증착 변수들을 바꾸어도 물성이 변하지 않는 자기조절기능이 있음을 알 수 있었는데 이는 고온에서의 Bi2O3의 강한 휘발성 때문일 것이다. 실리콘 기판에서 층상 페로브스카이트 상은 58$0^{\circ}C$ 이상에서 형성되며, 매우 좁은 온도 변화에도 결정구조, 박막현상 및 성분이 크게 바뀌는 온도에 민감한 증착거동이 관찰되었다. 증착 모델에서 예견되는 Bi의 불리함을 개선하기 위해 펄스주입법을 실시한 경우 Bi의 성분량이 증가되었고 결정성이 향상되었다. 이로부터 펄스주입법이 박막내에 부족하기 쉬운 Bi를 보충하여 박막의 특성을 개선함을 확인하였다. Bi4Ti3O12 박막의 증착온도에 따른 누설전류 특성 측정 결과 증착온도가 감소할수록 누설전류가 감소함을 알 수 있었고 펄스주입법이 연속주입법보다 더 낮은 누설전류를 보임을 알았다. 펄스주입법의 경우 -2.5V 인가 시의 누설전류는 7.4$\times$10-8A/cm2에서 1.3$\times$10+7A/cm2의 매우 우수한 값을 가졌다. 연속 주입법에 의해 증착된 박막은 C-V 측정 결과 강유전성 이력이 나타나지 않았으나, $600^{\circ}C$ 이상에서 펄스주입법에 의해 증착된 박박은 강유전성 이력을 나타내었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.107-107
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• 2000

최근 반도체 소자의 고집적화 및 대용량화의 경향에 다라 MOSFET 소자 제작에 이동되는 게이트 산화막의 두께가 수 nm 정도까지 점점 얇아지는 추세이고 Giga-DRAM급 차세대 UNSI소자를 제작하기 위해 5nm이하의 게이트 절연막이 요구된다. 이런 절연막의 두께감소는 게이트 정전용량을 증가시켜 트랜지스터의 속도를 빠르게 하며, 동시에 저전압동작을 가능하게 하기 때문에 게이트 산화막의 두께는 MOS공정세대가 진행되어감에 따라 계속 감소할 것이다. 따라서 절연막 두께는 소자의 동작 특성을 결정하는 중요한 요소이므로 이에 대한 정확한 평가 방법의 확보는 공정 control 측면에서 필수적이다. 그러나, 절연막의 두께가 작아지면서 게이트 산화막과 crystalline siliconrksm이 계면효과가 박막의 두께에 심각한 영향을 주기 때문에 정확한 두께 계측이 어렵고 계측방법에 따라서 두께 계측의 차이가 난다. 따라서 차세대 반도체 소자의 개발 및 양산 체계를 확립하기 위해서는 산화막의 두께가 10nm보다 작은 1nm-5nm 수준의 박막 시료에 대한 두께 계측 방법이 확립이 되어야 한다. 따라서, 본 연구에서는 습식 산화 공정으로 제작된 3nm-7nm 의 게이트 절연막을 현재까지 알려진 다양한 두께 평가방법을 비교 연구하였다. 절연막을 MEIS (Medim Energy Ion Scattering), 0.015nm의 고감도를 가지는 SE (Spectroscopic Ellipsometry), XPS, 고분해능 전자현미경 (TEM)을 이용하여 측정 비교하였다. 또한 polysilicon gate를 가지는 MOS capacitor를 제작하여 소자의 Capacitance-Voltage 및 Current-Voltage를 측정하여 절연막 두께를 계산하여 가장 좋은 두께 계측 방법을 찾고자 한다.다. 마이크로스트립 링 공진기는 링의 원주길이가 전자기파 파장길이의 정수배가 되면 공진이 일어나는 구조이다. Fused quartz를 기판으로 하여 증착압력을 변수로 하여 TiO2 박막을 증착하였다. 그리고 그 위에 은 (silver)을 사용하여 링 패턴을 형성하였다. 이와 같이 공진기를 제작하여 network analyzer (HP 8510C)로 마이크로파 대역에서의 공진특서을 측정하였다. 공진특성으로부터 전체 품질계수와 유효유전율, 그리고 TiO2 박막의 품질계수를 얻어내었다. 측정결과 rutile에서 anatase로 박막의 상이 변할수록 유전율은 감소하고 유전손실은 증가하는 결과를 나타내었다.의 성장률이 둔화됨을 볼 수 있다. 또한 Silane 가스량이 적어지는 영역에서는 가스량의 감소에 의해 성장속도가 둔화됨을 볼 수 있다. 또한 Silane 가스량이 적어지는 영역에서는 가스량의 감소에 의해 성장속도가 줄어들어 성장률이 Silane가스량에 의해 지배됨을 볼 수 있다. UV-VIS spectrophotometer에 의한 비정질 SiC 박막의 투과도와 파장과의 관계에 있어 유리를 기판으로 사용했으므로 유리의투과도를 감안했으며, 유리에 대한 상대적인 비율 관계로 투과도를 나타냈었다. 또한 비저질 SiC 박막의 흡수계수는 Ellipsometry에 의해 측정된 Δ과 Ψ값을 이용하여 시뮬레이션한 결과로 비정질 SiC 박막의 두께를 이용하여 구하였다. 또한 Tauc Plot을 통해 박막의 optical band gap을 2.6~3.7eV로 조절할 수 있었다. 20$0^{\circ}C$이상으로 증가시켜도 광투과율은 큰 변화를 나타내지 않았다.부터 전분-지질복합제의 형성 촉진이 시사되었다.이것으로 인하여 호화억제에 의한 노화 방지효과가 기대되었지만 실제로 빵의 노화는 현저히 진행되었다

• Korean Journal of Materials Research
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• v.10 no.10
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• pp.665-670
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• 2000

Linear annealing method was developed to increase the bond strength of Si wafer pair mated at room tem­perature instead of conventional furnace annealing method. It has been known that the interval of the two mating wafer surfaces decreases and the density of gaseous phases generated at the interface increases with increase in an-nealing temperature. The new annealing method consisting of one heat source and light reflecting mirror used these two phenomena and was applied to Si$\mid$$\mid$Si and Si$\mid$$\mid$$SiO_2/Si$ bonding. The bonding interface observed directly by using IR camera and HRTEM showed clear bonding interface without any unbonded areas except the area generated by the dusts inserted into the mating interface at the room temperature. Crack opening method and direct tensile test was ap­pplied to measure the bond strength. The two methods showed similar results. The bond strength increased continuous­tly with the increase of annealing temperature.

• Applied Chemistry for Engineering
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• v.16 no.2
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• pp.250-256
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• 2005

Coating appearance is the most important problem in automotive industry. To increase the coating appearance quality, the corrosion resistance and the coating adhesion on metal substrates must be basically solved. The phosphating film made by the pretreatment of metal substrate is important factor to increase the coating adhesion. During the cathodic electrodeposition, the pH at the cathode surface increases up to about 12. In such a highly alkaline condition, the dissolution of metal substrate and phosphate film occurs. These phenomena result in the decrease of the bonding strength between the phosphating film and the substrate. Generally, the structure of zinc phosphating film is hopeite or phosphophyllite. It has been known that the phosphophyllite film contains better corrosion resistance and paint adhesion for hot water immersion test because of the decrease of dissolving amount of both metal substrate and phosphating film during the cathodic electrodeposition. It is found that the addition of Ni and Mn composition increase P-ratio and then can improve the paint adhesion on metal surface and the corrosion resistance.

• Korean Journal of Materials Research
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• v.4 no.5
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• pp.600-607
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• 1994

Optimum exper~mental conditions were established for the growth of heteroepitaxial GaAs layers on InP using liquid phase epitaxy (LPE) technique. Results showed that the optimum growth temperature was $720^{\circ}C$ at a cooling rate of $0.5^{\circ}C$/min. Surface morphology of the grown layers significantly improved by addition of about 0.005wt% Se to the Ga growth melt, which effectively suppressed melt-back of InP substrates into the melt during the initial stage of growth. It was observed that the quality of GaAs layers also improved substantially when the substrates patterned with grating structure were used, as determined by the (400) double crystal X-ray diffraction. The transmission electron microscopy observation indicated t.hat the misfit dislocations interact with each other at the grating region, resulting in a lower dislocation density in the upper GaAs layer.

• Journal of the Korean Magnetics Society
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• v.18 no.4
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• pp.147-153
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• 2008

It has been well-known that the Fe/GaAs heterostructure has a small lattice mismatch of 1.4% between Fe and GaAs, and the Fe layer is grown epitaxially on the the GaAs substrate. There are rich physics are observed in the GaAs/Fe interface, and the spininjection is actively studied due to its potential applications for spintronics devices. We fabricated Fe wedge layer in the thickness range $0{\sim}3.4$ nm on the GaAs(100) surface with 5-nm thick Au capping layer. The magnetic anisotropy of the Fe/GaAs system was investigated by employing Brillouin light scattering(BLS) measurements in this study. The spin wave excitation of Fe layer was studied as the function of intensity and the in-plane angle of external magnetic field, and thickness of Fe layer. Also these various dependences were analyzed with analytic expression of spin wave surface mode in order to determine the magnetic anisotropies. It has been found that the GaAs/Fe/Au system has additional uniaxial magnetic anisotropy, while the bulk Fe has biaxial anisotropy. The uniaxial anisotropy shows increasing dependency respected to decreasing thickness of Fe layer while biaxial anisotropy is reduced with Fe film thickness. This result allows the analysis that the uniaxial anisotropy is originated from interface between GaAs surface and Fe layer.

• Clean Technology
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• v.27 no.4
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• pp.277-290
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• 2021

A supercapacitor, also called an ultracapacitor or an electrochemical capacitor, stores electrochemical energy by the adsorption/desorption of electrolytic ions or a fast and reversible redox reaction at the electrode surface, which is distinct from the chemical reaction of a battery. A supercapacitor features high specific power, high capacitance, almost infinite cyclability (~ 100,000 cycle), short charging time, good stability, low maintenance cost, and fast frequency response. Supercapacitors have been used in electronic devices to meet the requirements of rapid charging/discharging, such as for memory back-up, and uninterruptible power supply (UPS). Also, their use is being extended to transportation and large industry applications that require high power/energy density, such as for electric vehicles and power quality systems of smart grids. In power generation using intermittent power sources such as solar and wind, a supercapacitor is configured in the energy storage system together with a battery to compensate for the relatively slow charging/discharging time of the battery, to contribute to extending the lifecycle of the battery, and to improve the system power quality. This article provides a concise overview of the principles, mechanisms, and classification of energy storage of supercapacitors in accordance with the electrode materials. Also, it provides a review of the status of recent research and patent, product, and market trends in supercapacitor technology. There are many challenges to be solved to meet industrial demands such as for high voltage module technologies, high efficiency charging, safety, performance improvement, and competitive prices.

• Journal of the Korea institute for structural maintenance and inspection
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• v.23 no.2
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• pp.51-59
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• 2019

There is increasingly more research focusing on the application of FRP reinforcing bars as an alternative material for steel reinforcing bars, but most such research look at short term behavior of FRP reinforced structures. In this study, the microscopic analysis and tensile behavior of Basalt and Glass FRP bars under freezing-thawing and alkaline conditions were experimentally evaluated. After 100 cycles of the freezing and thawing, the tensile strength and elastic modulus of FRP bars decreased by about 5%. In the case of microstructure of FRP bars during the initial 20 days, no significant damages of FRP bar sections were found under $20^{\circ}C$ alkaline solution; however, the specimens immersed in $60^{\circ}C$ alkaline solution were found to experience resin dissolution, fiber damage and the separation of the resin-fiber interface. In the alkaline environment, the strength decrease of about 10% occurred in the environment at $20^{\circ}C$ for 100 days, but the tensile strength of FRPs exposed for 500 days decreased by 50%. At temperature of $40^{\circ}C$ and $60^{\circ}C$, an abrupt decrease in the strength was observed at 50 and 100 days. Especially, the tensile strength decrease of Basalt fiber Reinforced Polymer bars showed more severe degradation due to the damage caused by dissolution of resin matrix and fiber swelling in alkaline solution. Therefore, in order to improve the long-term performance of the surface braided FRPr reinforcing bars, surface treatment is required to ensure alkali resistance.

• Journal of the Microelectronics and Packaging Society
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• v.28 no.2
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• pp.71-79
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• 2021

In this study, we have successfully fabricated the Sn-Ni paste and evaluated the bonding properties for high-temperature endurable EV (Electric Vehicle) power module applications. From evaluating of the micro-structural changes in the TLPS (Transient Liquid Phase Sintering) joints with Sn and Ni contents in the Sn-Ni pastes, a lack of Ni powders and Ni particle agglomerations by Ni surplus were observed in the Sn-20Ni and Sn-50Ni joints (in wt.%), respectively. In contrast, relatively dense microstructures are observed in the Sn-30Ni and Sn-40Ni TLPS joints. From differential scanning calorimetry (DSC) thermal analysis results of the fabricated Sn-Ni paste and TLPS bonded joints, we confirmed that the complete reactions of Sn with Ni to form Ni-Sn intermetallic compounds (IMCs) at bonding temperatures occurred, and there is no remaining Sn in the joints after TLPS bonding. In addition, the interfacial reactions and IMC phase changes of the Sn-30Ni joints under various bonding temperatures were reported, and their mechanical shear strength were investigated. The TLPS bonded joints were mainly composed of residual Ni particles and Ni₃Sn₄ intermetallic phase. The average shear strength tended to increase with increasing bonding temperature. Our results indicated a high shear strength value of approximately 30 MPa at a bonding temperature of 270 ℃ and a bonding time of 30 min.

• Journal of the Society of Cosmetic Scientists of Korea
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• v.48 no.2
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• pp.87-95
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• 2022

This study is about the development of transparent cleansing water with one of the beta-hydroxy acids (BHA), salicylic acid, and capryloyl salicylic acid, which is one of the lipo-hydroxy acids (LHA). Transparent appearance was stabilized by increasing the solubility of lipophilic salicylic acid and capryloyl salicylic acid in water using ethanol, polyol, and sodium hydroxide, and supplementing suspension and deposition using a double micelle structure of two types of PEG surfactants. Cleansing water applied with this technology was developed, and makeup removing ability and skin texture improvement ability were confirmed using an optical camera and an image analyzer. This solubilization technology is proposed as a new approach of LHA, which has been difficult to apply due to its low solubility in water, and is expected to help in the development of new chemical peeling products.