• Title/Summary/Keyword: 경사노광

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Hybrid UV Lithography for 3D High-Aspect-Ratio Microstructures (하이브리드 자외선 노광법을 이용한 3차원 고종횡비 미소구조물 제작)

  • Park, Sungmin;Nam, Gyungmok;Kim, Jonghun;Yoon, Sang-Hee
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.40 no.8
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    • pp.731-736
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    • 2016
  • Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

Fabrication of 3-D Structures by Inclined and Rear-side Exposures (선택적 경사 노광과 후면 노광에 의한 3차원 구조물의 제작)

  • 이준섭;신현준;문성욱;송석호;김태엽
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.53 no.1
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    • pp.47-52
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    • 2004
  • 3D microstructures with different side-wall angles and different scales are fabricated by both methods of inclined exposure and rear-side exposure at each of selected areas on a same substrate. Conventional methods of inclined exposure are used to make side-walls with a same inclined angle on one substrate and to get a scale error due to front-side exposure through thick photoresist layer, But, by using the proposed method, we are able to fabricate 3D microstructures on a same substrate with various side-wall angles and accurate dimensions as the original design. In the rear-side exposure, UV exposure light reflects from the chromium mask pattern after passing through the thick photoresist layer, resulting in fabrication of well-defined, inclined 3D structures inside the thick photoresist layer.

Prediction of Photopolymer Solidification for Inclined Laser Beam Exposure (레이저 빛의 경사노광 시 광 경화성 수지의 경화형상 예측)

  • Kim, Young-Hyun;Lim, Jong-Seon;Yu, Gyu-Sang;Lee, In-Hwan;Ko, Tae-Jo
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.8
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    • pp.98-104
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    • 2010
  • It has been reported that the photopolymer solidification in the stereolithogrpahy process is mainly depend on the laser exposure conditions such as laser power and scanning speed. However, these researches were focused on the vertical laser exposure onto the surface of the photopolymer. In this research, we developed a mathematical model for the photopolymer solidification under the inclined laser beam exposure. Using the developed mathematical model, the photopolymer solidifications were simulated varying inclined laser exposure conditions. Developed mathematical model was in good agreement with the experimental result. This research can be applied to improve the surface roughness in the stereolithogrpahy process.

Development of Micro-Optical Patterned LCD-LGP using UV Inclined-Exposure Process (UV 경사노광에 의한 미세광학패턴 LCD-도광판)

  • Hwang C. J.;Kim J. S.;Ko Y. B.;Heo Y. M.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.51-54
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    • 2005
  • Light Guide Plate (LGP) of LCD-BLU(Back Light Unit) is manufactured by forming optical pattern with $5\~100um$ in diameter on the LGP by means of sand blasting or etching method. However, in order to improve the luminance of LCD-LGP, the design of optical pattern has introduced UV inclined-exposure process in this study. This micro-optical pattern, which has asymmetric elliptical column shaped pattern, can change low viewing-angle to high viewing-angle, as well as it contribute to diffusion of light. As a result, this type of micro-optical pattern can introduce the highly luminance. The PR structure obtained in the stage of lithography has asymmetric elliptical column shape and it is processed into a micro-optical pattern. Optical design with this kind of micro-optical pattern, mold fabrication by electroplating and LGP molding with injection molding are under way.

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Fabrication Method of 3D Feed Horn Shape MEMS Antenna Array Using MRPBI(Mirror Reflected Parallel Beam Illuminator) with Inclined X-Y-Z Stage (MRPBI를 이용한 3D Feed Horn Shape MEMS Antenna Array의 제조)

  • Park, Jong-Yeon;Kim, Kun-Tae;Moon, Sung;Pak, Jung-Ho;Park, Jong-Oh
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1914-1917
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    • 2001
  • 3D Feed Horn Shape MEMS Antenna Array는 적외선 이미지 소자 또는 Tera hertz band 등에서 많은 응용을 할 수 있는 장점을 가진 MEMS 구조체 이다. 하지만 일반적인 MEMS 공정을 이용해서 3D Feed Horn Shape MEMS antenna array를 구현하기는 적합하지 않았다. 본 논문에서는 마스크와 웨이퍼가 일체 된 형태의 경사된 척이 초 저속으로 회전하면서 노광을 할 수 있는 새로운 방식과 미러 반사구조를 이용해서 평행광을 얻을수 있는 노광장치 (MRPBI : Mirror Reflected Parallel Beam Illuminator) System제작방법을 제안하였다. 3D Feed Horn Shape MEMS Antenna의 구조적인 high apect ratio의 특성에 의해서 SU-8과 PMER Negative Photo resist를 이용한 기본적인 실험을 통해 3D 구조체의 구현 가능성을 증명하였다. 또한 Microbolometer의 성능향상을 위한 이론적인 3D MEMS Antenna Model들을 HFSS(High Frequency Structure Simulator)을 이용해서 그 최적구조를 제안하고 3D MEMS Antenna Gain 값을 비교 분석하였다.

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Detectivity Improvement of Microbolometer by Coupling 3D Feed Horn Antenna (3차원 피드 혼 안테나 결합을 통한 볼로미터의 감지도 향상)

  • Kim, Kun-Tae;Park, Jong-Yeon;Moon, Sung;Park, Jung-Ho;Park, Jong-Oh
    • Proceedings of the KIEE Conference
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    • 2001.07c
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    • pp.1899-1901
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    • 2001
  • 본 논문에서는 3차원 feed horn 안테나를 볼로미터에 결합함으로써 감지도(Detectivity)를 향상시킨 비가시광 영상 감지 소자를 제안하였다. Feed horn 안테나의 우수한 지향성(Directivity)를 통해서 주위의 잡음 성분을 제거함으로써 감지도의 향상을 확인할 수 있었다. 안테나와 볼로미터와의 결합 손실을 줄이기 위해서 볼로미터의 흡수층의 모양을 원형의 형태로 하였으며 크기도 안테나 폭과 일치를 시켰다. 또한 열적 고립 구조를 만들기 위한 지지 다리의 모양도 원형의 형태로 하여서 전체 길이를 증가 시켰으며 이로 인해 열전도도(Thermal conductance)를 $4.65{\times}10^{-8}$[W/K]까지 낮출 수 있었 다. 설계된 소자의 감지도는 $2.37{\times}10^{9}$[$cm\sqrt{Hz}/W$]을 나타내었으며 안테나 결합을 통한 감지도의 향상을 확인 할 수 있었다. 볼로미터의 제작은 MEMS 기술을 이용한 표면미세가공(Surface micromachining)법으로 열적 고립 구조체를 제작할 수 있으며 3차원 feed horn안테나는 SU-8이라는 음성 감광제를 경사회전노광시켜서 제작할 수 있다.

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Fabrication of A 3-facet Mirror Using the LIGA Process (LIGA 공정을 이용한 삼면반사체 제작)

  • Oh, Dong-Young;Jung, Dong-Kwan;Park, Noh Y.;Chang, Suk-Sang;Lee, Seung-Seop
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.8
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    • pp.172-179
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    • 2000
  • In this paper a technology for the fabrication of the oblique structure using the LIGA process will be presented. The fabricated microstructure is a tetrahedral 3- facet mirror. The mirror has an equilateral triangular base of hundreds ${\mu}m$ length mirror-like three side-facets inclined to the base at 45$^{\circ}$ and knife edges. Two regular triangles of 45$^{\circ}$ and tan-12. After development the shaded part of the PMMA the tetrahedral mirror remains, The completed mirror shows excellent aspects of mirror-like facets and knife-edges. By controlling the gap between the mask and the substrate the size of mirror easily can be changed. This mirror would be used as a laser beam splitter for the feedback control of the HDD slider.

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