• Title/Summary/Keyword: 건식 공정

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Dry Etching of Pt/RuO$_{2}$ for Pb(Zr,Ti)O$_{3}$ by High Density Plasma (고밀도 플라즈마를 이용한 PZT용 Pt/RuO$_{2}$ 이중박막의 식각)

  • Lee, Jong-Geun;Park, Se-Geun
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.3
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    • pp.1-5
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    • 2000
  • Inductively coupled plasma (ICP) excited by a spiral planar antenna is used to etch elctrodes for PZT capacitors. Pt/RuO$_{2}$ bilayers are tested as bottom electrodes for PZT capacitors in order to utilize better leakage characteristics of Pt and easy etch characteristics of RuO$_{2}$ at the same time. The etch rates and selectivities to SiO$_{2}$ hard mask have been measured for each of Pt and RuO$_{2}$ in terms of various plasma conditions. As Cl$_{2}$ ratio increases in $O_{2}$/Cl$_{2}$ mixture, the etch rate of Pt increases while that of RuO$_{2}$ reaches the highest near 10 % of Cl$_{2}$. Optimum gas mixture ratio has been determined for etching Pt and RuO$_{2}$ bilayers sequentially, and sub-half micron patterning is demonstrated.

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Study on uranium metalization yield of spent pressurized water reactor fuels and oxidation behavior of fission products in uranium metals (사용후핵연료의 우라늄 금속 전환율 측정 및 전환체 내 핵분열생성물의 산화거동 연구)

  • Choi, Ke Chon;Lee, Chang Heon;Kim, Won Ho
    • Analytical Science and Technology
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    • v.16 no.6
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    • pp.431-437
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    • 2003
  • Metalization yield of uranium oxide to uranium metal from lithium reduction process of spent pressurized water reactor (PWR) fuels was measured using thermogravimetric analyzer. A reduced metal produced in the process was divided into a solid and a powder part, and each metalization yield was measured. Metalization yield of the solid part was 90.7~95.9 wt%, and the powder being 77.8~71.5 wt% individually. Oxidation behaviour of the quartemary alloy was investigated to take data on the thermal oxidation stability necessary for the study on dry storage of the reduced metal. At $600{\sim}700^{\circ}C$, weight increments of alloy of Mo, Ru, Rh and Pd was 0.40~0.55 wt%. Phase change on the surface of the alloy was started at $750^{\circ}C$. In particular, Mo was rapidly oxidized and then the alloy lost 0.76~25.22 wt% in weight.

Error Characteristics of Clamp-on Ultrasonic Flowmeters Depending on Location of Sensors and Downstream Straight Run of Bent Pipe (곡관후단의 직관거리와 센서위치에 따른 초음파유량계의 오차특성)

  • Lee, Dong-Keun;Cho, Yong
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.35 no.8
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    • pp.861-868
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    • 2011
  • Flowmeters that measure the amount of fluid passing through conduits must kept accurate by comparison and the periodic calibration. The reference meters used are clamp-on meters that mount sensors on the outer wall of the pipe. They are called 1-path, 2-path or 4-path flowmeters depending on the number of sensors. We selected a flowmeter mainly used for K-water as test a flowmeter. We carried out experiments to find the intrinsic error of the flowmeter and errors in the downstream of a double bent pipe. The results show that there are the sensor locations that meet the tolerance. We suggested the angle of the sensor, the straight run from the downstream of the bent pipe and the number of sensors. So it is possible to improve the water treatment process and increase the accounted water rate by upgraded flow measurement technology.

Comparison of Design Concepts for Four Different Entrained-Bed Coal Gasifier Types with CFD Analysis (CFD 해석을 통한 4종의 건식 분류층 석탄가스화기 설계개념 비교)

  • Yun, Yongseung;Ju, Jisun;Lee, Seung Jong
    • Applied Chemistry for Engineering
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    • v.22 no.5
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    • pp.566-574
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    • 2011
  • Coal gasifier is a key component for achieving high efficiency in integrated gasification combined cycle and indirect coal liquefaction. Although there have been several successful coal gasifiers that were commercially proven, many different design configurations are still possible for a simple and reliable gasifier operation. Four different gasifier design concepts of dry-feeding were compared in terms of residence time, exit syngas temperature and syngas composition. First, cold-flow simulation was applied to pre-select the configuration concepts, and the hot-flow simulation including chemical reactions was performed to compare the concepts at more actual gasifier operating conditions. There are many limitations in applying CFD method in gasifier design, particularly in estimating slag behavior and slag-tap design. However, the CFD analysis proved to be useful in comparing the widely different gasifier design concepts as a pre-selection tool.

A Chemical Reaction Calculation and a Semi-Empirical Model for the Dynamic Simulation of an Electrolytic Reduction of Spent Oxide Fuels (산화물 사용후핵연료 전해환원 화학 반응 계산 및 동적 모사를 위한 반실험 모델)

  • Park, Byung-Heung;Hur, Jin-Mok;Lee, Han-Soo
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.8 no.1
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    • pp.19-32
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    • 2010
  • Electrolytic reduction technology is essential for the purpose of adopting pyroprocessing into spent oxide fuel as an alternative option in a back-end fuel cycle. Spent fuel consists of various metal oxides, and each metal oxide releases an oxygen element depending on its chemical characteristic during the electrolytic reduction process. In the present work, an electrolytic reduction behavior was estimated for voloxidized spent fuel based on the assumption that each metal-oxygen system is independent and behaves as an ideal solid solution. The electrolytic reduction was considered as a combination of a Li recovery and chemical reactions between the metal oxides such as uranium oxide and the produced Li metal. The calculated result revealed that most of the metal oxides were reduced by the process. It was evaluated that a reduced fraction of lanthanide oxides increased with a decreasing $Li_2O$ concentration. However, most of the lanthanides were expected to be stable in their oxide forms. In addition, a semi-empirical model for describing $U_3O_8$ electrolytic reduction behavior was proposed by considering Li diffusion and a chemical reaction between $U_3O_8$ and Li. Experimental data was used to determine model parameters and, then, the model was applied to calculate the reduction yield with time and to estimate the required time for a 99.9% reduction.

Current Status on Gold Smelting Technology (금제련(金製鍊) 기술(技術)의 현황(現況))

  • Kim, Byung-Su;Kim, Chi-Kwon;Sohn, Jeong-Soo
    • Resources Recycling
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    • v.16 no.3 s.77
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    • pp.3-11
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    • 2007
  • Presently, most of gold is smelted from gold concentrates and anode slimes. Anode slimes are by-products of nonferrous smelters such as lead and copper. In addition, gold is recovered from waste dental and medical materials, waste gold coating solution, and waste printed circuit boards (waste PCBs). The smelting method of gold from gold concentrates and various wastes containing high concentration of gold is largely divided into chlorination, cyanidation, and amalgamation methods. For the anode slimes, electrolysis method is usually used, which largely consists of roasting, high temperature melting and electrolysis processes. Also, various wastes containing low concentration of gold are mainly treated by pyrometallursical processes. In the paper, current status on gold smelting technology is reviewed, and a novel process for gold smelting which is researched in the recent is briefly introduced.

Trends on Technology of Eco-friendly Metal and Ceramic Nanoparticle Inks for Direct Printing (다이렉트 프린팅용 청정 금속 및 세라믹 나노 입자 잉크 기술 동향)

  • Hong, Sung-Jei;Kim, Jong-Woong;Han, Chul-Jong;Kim, Young-Sung;Hong, Tae-Whan
    • Journal of the Microelectronics and Packaging Society
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    • v.17 no.2
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    • pp.1-9
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    • 2010
  • In this paper, trends on technology of metal and ceramic nanoparticle inks using eco-friendly process were reviewed. There are two types of eco-friendly processes, dry and wet. In case of dry process, gas evaporation process was being used to synthesize the ultrafine nanoparticles. Also, in case of wet process, low temperature process excluding harmful elements such as $Cl^-$ and ${NO_3}^-$ was being used to synthesize the ultrafine nanoparticles. Sizes of nanoparticles were less than 10 nm using the eco-friendly processes, and the nanoparticles were well dispersed into ink solvent. The ink was successfully applied to fabricate directly printed pattern.

Effect of Si Wafer Ultra-thinning on the Silicon Surface for 3D Integration (삼차원 집적화를 위한 초박막 실리콘 웨이퍼 연삭 공정이 웨이퍼 표면에 미치는 영향)

  • Choi, Mi-Kyeung;Kim, Eun-Kyung
    • Journal of the Microelectronics and Packaging Society
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    • v.15 no.2
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    • pp.63-67
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    • 2008
  • 3D integration technology has been a major focus of the next generation of IC industries. In this study Si wafer ultra-thinning has been investigated especially for the effect of ultra-thinning on the silicon surface. Wafers were grinded down to $30{\mu}m\;or\;50{\mu}m$ thickness and then grinded only samples were compared with surface treated samples in terms of surface roughness, surface damages, and hardness. Dry polishing or wet etching treatment has been applied as a surface treatment. Surface treated samples definitely showed much less surface damages and better roughness. However, ultra-thinned Si samples have the almost same hardness as a bulk Si wafer.

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반도체 세정 공정용 가스 클러스터 장치 내 발생 클러스터 크기 분포에 관한 수치해석적 예측

  • Kim, Ho-Jung;Choe, Hu-Mi;Yun, Deok-Ju;Lee, Jong-U;Gang, Bong-Gyun;Kim, Min-Su;Park, Jin-Gu;Kim, Tae-Seong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.40-40
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    • 2011
  • 반도체 소자의 미세화와 더불어 세정공정의 중요성이 차지하는 비중이 점점 커지고, 이에 따라 세정 기술 개발에 대한 요구가 증대되고 있다. 기존 세정 기술은 화학약품 위주의 습식 세정 방식으로 패턴 손상 및 대구경화에 따른 어려움이 있다. 따라서 건식세정 방식이 활발하게 도입되고 있으며 대표적인 것이 에어로졸 세정이다. 에어로졸 세정은 기체상의 작동기체를 이용하여 에어로졸을 형성하고 표면 오염물질과 직접 물리적 충돌을 함으로써 세정한다. 하지만 이 또한 생성되는 에어로졸 내 발생 입자로 인해 패턴 손상이 발생하며 이러한 문제점을 극복하기 위하여 대두되는 것이 가스클러스터 세정이다. 가스 클러스터란 작동기체의 분자가 수십에서 수백 개 뭉쳐 있는 형태를 뜻하며 이렇게 형성된 클러스터는 수 nm 크기를 형성하게 된다. 그리고 짧은 시간의 응축에 의해 수십 nm 크기까지 성장하게 된다. 에어로졸 세정과 다르게 클러스터가 성장할 환경과 시간을 형성하지 않음으로써 작은 클러스터를 형성하게 되며 이로 인해 패턴 손상 없이 오염입자를 제거하게 된다. 이러한 가스 클러스터 세정을 최적화하기 위해서는 설계 단계부터 노즐 내부 유동의 수치해석에 기반한 입자 크기 분포를 계산하여 반영하는 것이 필요하다. 따라서 본 연구에서는 상용 수치해석 프로그램을 이용하여 세정 환경을 조성하는 조건에서의 노즐 내부 유동을 해석하고, 이를 통해 얻어진 수치를 이용하여 aerosol general dynamic equation (GDE)를 계산하여 발생하는 클러스터의 크기 분포를 예측하였다. GDE 계산 시 입자의 크기 분포를 나타내기 위해서는 여러 가지 방법이 존재하나 본 연구에서는 각 입자 크기 노드별 개수 농도를 계산하였다. 노즐 출구에서의 가스 클러스터 크기를 예측하기 위하여 먼저, 노즐 내부 유속 및 온도 분포 변화를 해석하였다. 이를 통하여 온도가 급격하게 낮아져 생성된 클러스터의 효과적 가속 및 에너지 전달이 가능함을 확인할수 있었다. 이에 기반하여 GDE를 이용한 입자 크기를 예측한 결과 수 나노 크기의 초기 클러스터가 형성되어 온도가 낮아짐에 따라 성장하는 것을 확인할 수 있었으며, 최빈값의 분포가 실험적 측정값과 일치하는 경향을 가지는 것을 볼 수 있었다. 이는 향후 확장된 영역에서의 유동 해석과 증발 등 세부 요소를 고려한 계산을 통해 가스 클러스터 세정 공정의 최적화된 설계에 도움이 될 것이다.

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V3Si 나노입자 메모리소자의 열적안정성 및 전하누설 근원분석

  • Kim, Dong-Uk;Lee, Dong-Uk;Jo, Seong-Guk;Kim, Eun-Gyu;Lee, Se-Won;Jeong, Seung-Min;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.302-302
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    • 2012
  • 최근 비 휘발성 메모리 시장의 확대와 수요가 많아지면서, 비휘발성 메모리 소자의 제작에 대한 연구가 활발히 진행되고 있다. 특히, 실리사이드 나노입자를 적용한 소자는 현 실리콘 기반의 반도체 공정의 적용이 용이하다. 따라서 본 연구에서는 실리사이드 계열의 화합물 중에서 일함수가 4.63 eV인 Vanadium silicide (V3Si) 나노입자 메모리소자를 제작하여 전기적 특성과 열 안정성에 대하여 알아보았다. p-Si기판에 약 6nm 두께의 SiO2 터널층을 건식 산화 방법으로 성장시킨 후 V3Si 나노입자를 제작하기 위해서 V3Si 금속박막을 스퍼터링 방법으로 4 nm~6 nm의 두께로 터널 절연막 위에 증착시켰다. 그리고 컨트롤 절연막으로 SiO2를 초고진공 스퍼터를 이용하여 50 nm 증착하였고, 급속 열처리 방법으로 질소 분위기에서 $800^{\circ}C$의 5초 동안 열처리하여 V3Si 나노 입자를 형성하였다. 마지막으로 200 nm두께의 Al을 증착하고, 리소그래피 공정을 통하여 채널 길이와 너비가 각각 $2{\mu}m$, $5{\mu}m$, $10{\mu}m$를 가지는 트랜지스터를 제작하였다. 제작된 시편의 V3Si 나노입자의 크기와 균일성은 투과 전자 현미경으로 확인하였고, 후 열처리 공정 이후 V3Si의 존재여부의 확인을 위해서 X-ray 광전자 분광법의 표면분석기술을 이용하여 확인하였다. 소자의 전기적인 측정은 Agilent E4980A LCR meter, 1-MHz HP4280A와 HP 8166A pulse generator, HP4156A precision semiconductor parameter analyzer을 이용하여 측정온도를 $125^{\circ}C$까지 변화시키면서 전기적인 특성을 확인하였다. 본 연구에서는 온도에 선형적 의존성을 가지는 전하누설 모델인 T-model 을 이용하여 나노입자 비휘발성 메모리소자의 전하누설 근원을 확인한 후, 메모리 소자의 동작 특성과의 물리적인 연관성을 논의하였다. 이를 바탕으로 나노입자 비휘발성 메모리소자의 열적안정성을 확보하고 소자 특성향상을 위한 최적화 구조를 제안하고자 한다.

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