• 한국진공학회지
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• 제11권1호
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• pp.50-58
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• 2002

Si 기판 위에 GaN의 성장은 Si이 사파이어보다 값이 저렴하고, 기존의 Si의 직접회로 공정에 GaN를 쉽게 접목시킬 수 있는 측면에서 다양한 장점이 있다. 그러나, Si은 GaN와의 격자상수와 열팽창계수의 차이가 사파이어보다 크며, 이로 인해 격자부정합에 의한 여러 결함을 발생시킨다. 따라서, Si 기판 위에 고품질의 GaN를 얻기 위해서는 AlN과 같은 완충층을 사용하여 격자부정합에 의한 결함을 줄여야 한다. 본 연구에서는 Si (111) 기판 위에 MOCVD, 스퍼터링과 MOMBE의 3가지 방법으로 결정성이 다른 3가지 유형의 AlN 완충층을 얻은 후, MOCVD법으로 GaN를 증착시켜 각각의 성장특성을 비교하였다. AlN 완충층과 GaN의 격자결합, 완충층의 표면 거칠기가 격자결함에 미치는 영향, 결정성, 성장방향, 결함(공공, 적층결함, 전위) 등을 TEM, XRD를 이용해 비교 분석하였다. AlN완충층의 결정성은 GaN의 성장에 있어 매우 큰 영향을 미치는 것을 확인할 수 있었다. 초기 성장과정에서 MOCVD과 MOMBE 법으로 성장시킨 AlN 완충층은 GaN 초기 성장에서 out-of-plane의 성장방향이 틀어지는 것을 감소시켜 주었다.

• 한국결정성장학회지
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• 제34권1호
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• pp.8-15
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• 2024

다양한 광학 재료에 사용되는 CaF₂ 단결정은 밴드갭(12 eV)이 크고, 넓은 파장영역에서 투과율이 뛰어나며 낮은 굴절률과 분산을 가지는 특징이 있다. 이런 우수한 특성을 바탕으로 최근 리소그래피(Lithography) 공정에서 짧은 파장의 광원에서도 사용가능한 렌즈의 재료로 CaF₂ 단결정이 주목받고 있다. 다만 CaF₂의 경우 157 nm에서 재료 고유의 복굴절이 존재하며, 이로 발생한 수차는 (100)면과 (111)면의 결합을 통해 보상할 수 있기 때문에 면 방향에 따른 특성을 조사하는 것이 필요하다. 이 연구에서는 초크랄스키(Czochralski) 방법으로 성장하여 상용화 된 CaF₂ 단결정 웨이퍼를 이용하여 면 방향에 따른 결정성, 광학적 특성을 분석하였다. 특히 chemical etching을 통해 etch pit의 형태가 면 방향에 따라 다르게 나타나는 것을 확인하였고, 결함 분석을 통해 결정 내 전위의 배열과 결함의 존재가 etch pit 형상에 영향을 주는 것을 확인하였다.

• 한국초전도학회:학술대회논문집
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• 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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• pp.392-396
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• 1999

Superconducting YBa$_2Cu_3O_{7-{\delta}}$(YBCO) thin films were grown on Hastelloy(Ni-Cr-Mo alloys) with CeO$_2$ buffer layer in-situ by pulsed laser deposition in a multi-target processing chamber. To apply superconducting property on power transmission line, we have deposited YBCO thin film on flexible metallic substrate. However, it is difficult to grow the YBCO films on flexible metallic substrates due to both interdiffusion problem between metallic substrate and superconducting overlayers and non-crystallization of YBCO on amorphous substrate. It is necessary to use a buffer layer to overcome the difficulties. We have chosen CeO$_2$ as a buffer layer which has cubic structure of 5.41 ${\AA}$ lattice parameter and only 0.2% of lattice mismatch with 3.82 ${\AA}$ of a-axis lattice parameter of YBCO on [110] direction of CeO$_2$ In order to enhance the crystallization of YBCO films on metallic substrates, we deposited CeO$_2$ buffer layers with varying temperature and 02 pressure. By XRD, it is observed that dominated film orientation is strongly depending on the deposition temperature of CeO$_2$ layer. The dominated orientation of CeO$_2$ buffer layer is changed from (200) to(111) by increasing the deposition temperature and this transition affects the crystallization of YBCO superconducting film on CeO$_2$ buffered Hastelloy.

• 한국세라믹학회지
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• 제52권6호
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• pp.441-448
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• 2015

Silicon carbide (SiC) coatings for tri-isotropic (TRISO) nuclear fuel particles were fabricated using a chemical vapor deposition (CVD) process onto graphite. A micro-tensile-testing system was developed for the mechanical characterization of SiC coatings at high temperatures. The fracture strength of the SiC coatings was characterized by the developed micro-tensile test in the range of $25^{\circ}C$ to $1000^{\circ}C$. Two types of CVD-SiC films were prepared for the micro-tensile test. SiC-A exhibited a large grain size (0.4 ~ 0.6 m) and the [111] preferred orientation, while SiC-B had a small grain size (0.2 ~ 0.3 mm) and the [220] preferred orientation. Free silicon (Si) was co-deposited onto SiC-B, and stacking faults also existed in the SiC-B structure. The fracture strengths of the CVD-SiC coatings, as measured by the high-temperature micro-tensile test, decreased with the testing temperature. The high-temperature fracture strengths of CVD-SiC coatings were related to the microstructure and defects of the CVD-SiC coatings.

• 한국전기전자재료학회논문지
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• 제25권9호
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• pp.717-722
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• 2012

In this work, we study on the effects of the oxygen pressure on the structural and crystalline of MgZnO thin films. MgZnO thin films were deposited on p-Si (111) substrates by using pulsed laser deposition. The X-ray diffraction analysis and energy-dispersive X-ray results revealed that as the oxygen pressure increased and Mg content in the MgZnO films decreased. Also Crystal structure was changed from cubic rock salt to hexagonal wurtzite. Alpha step and atomic force microscopy results showed that the thickness of the films are about 100 nm, and it has been found that the MgZnO (002) preferred orientation were deposited with increasing the oxygen pressure. Therefore, the effect of the preferred orientation, the crystallization grew in the form of the columnar; Grain size and RMS of the films were increased with increasing oxygen pressure.

• 한국항해항만학회지
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• 제28권1호
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• pp.105-111
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• 2004

본 연구는 수변공간의 친환경적 개발 가능성을 모색하는네 목표를 두고 있다. 따라서 본 연구에서는 근대의 기계론적 가치관에 대하여, 최근 과학 분야에서 새로운 발전 또는 친환경적 패러다임으로 등장한 유기적 세계관의 특징에 주목하여 워터프론트의 개발 방향성을 총체성ㆍ복합성ㆍ역동성ㆍ상보성 등 4가지로 설정하였다. 한편 구체적인 워터프론트 디자인 요소를 도시ㆍ건축의 장소적, 의장적, 시각적 특성을 통하여 검토하였다. 그리고 이를 토대로 친환경적 수변공간의 유기적 개발 방향성과 구체적 디자인 요소간의 상관관계 및 사례 제시를 통하여 유기적 특성을 활용한 워터프론트 디자인 요소를 제시하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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• pp.108-111
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• 2002

CIGS film has been fabricated on soda-lime glass, which is coated with Mo film. by multi-source evaporation process. The films has been prepared with thickness of 1.0 ${\mu}m$, 1.75${\mu}m$, 2.0${\mu}m$, 2.3${\mu}m$, and 3.0${\mu}m$. X-ray diffraction analysis with film thickness shows that CIGS films exhibit a strong (112) preferred orientation. Furthermore. CIGS films exhibited distinctly decreasing the full width of half-maximum and (112) preferred peak with film thickness. Also, The film's microstructure, such as the preferred orientation, the full width at half-maximum(FWHM), and the interplanar spacing were examined by X-ray diffraction. The preparation condition and the characteristics of the unit layers were as followings ; Mo back contact DC sputter, CIGS absorber layer : three-stage coevaporation, CdS buffer layer : chemical bath deposition, ZnO window layer : RF sputtering, $MgF_2$ antireflectance : E-gun evaporation

• 한국진공학회지
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• 제16권5호
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• pp.343-347
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• 2007

Glass disk상에 대향 타겟식 스퍼터링(Facing Target Sputtering) 방식을 이용하여 $0.1\;{\AA}/s$의 낮은 증착속도로 증착시킬 경우 b.c.c. (100)면 우선배향성을 확인하였으며, 그 위에 Pt박막을 증착시킨 경우 hetero-epitaxial 성장에 의해 Pt박막이(111)의 조밀면이 아닌 (100)면이 우선배향 되었다. 이렇게 형성된 Fe (100)/Pt (100) 이층막(두께 각 3 nm)을 $600\;^{\circ}C$ 수소분위기에서 열처리함에 의해 막전체에 걸쳐서 f.c.t. (00n)면을 형성시키는 데 성공하고, 또한 Fe (100)면 상에 Pt 박막을 증착시키는 동안 열처리를 하고 증착 이후 수소분위기에서 열처리함에 의해 열처리 시간 및 온도를 크게 낮출 수 있음을 확인하였다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.95.1-95.1
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• 2012

Very High Temperature gas cooler Reactor (VHTR) has been considered as one of the most promising nuclear reactor because of many advantages including high inherent safety to avoid environmental pollution, high thermal efficiency and the role of secondary energy source. The TRISO coated fuel particles used in VHTR are composed of 4 layers as OPyC, SiC, IPyC and buffer PyC. The significance of CVD-SiC coatings used in tri-isotropic(TRISO) nuclear coated fuel particles is to maintain the strength of the whole particle. Various methods have been proposed to evaluate the mechanical properties of CVD-SiC film at room temperature. However, few works have been attempted to characterize properties of CVD-SiC film at high temperature. In this study, micro tensile system was newly developed for mechanical characterization of SiC thin film at elevated temperature. Two kinds of CVD-SiC films were prepared for micro tensile test. SiC-A had [111]-preferred orientation, while SiC-B had [220]-preferred orientation. The free silicon was co-deposited in SiC-B coating layer. The fracture strength of two different CVD-SiC films was characterized up to $1000^{\circ}C$.The strength of SiC-B film decreased with temperature. This result can be explained by free silicon, observed in SiC-B along the columnar boundaries by TEM. The presence of free silicon causes strength degradation. Also, larger Weibull-modulus was measured. The new method can be used for thin film material at high temperature.

• 한국전기전자재료학회논문지
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• 제16권9호
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• pp.795-800
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• 2003

The dielectric and piezoelectric properties of the xPb(A $l_{0.5}$N $b_{0.5}$) $O_3$-(1-x)Pb(Z $r_{0.52}$ $Ti_{0.48}$) $O_3$ [xPAN-(1-x)PZT] thin films by pulsed laser deposition (PLD) were investigated as a function of PAN contents. The effect of texture on dielectric and piezoelectric properties of the 0.05PAN-0.95PZT thin films having the highest piezoelectric constant( $d_{33}$) was studied more precisely. For 0$\leq$x$\leq$0.15 compositions in xPAN-(1-x)PZT thin films, the well-developed perovskite phase with (111) preferred orientation was obtained at the deposition temperature of 50$0^{\circ}C$. With increasing PAN content, remanent polarization and coercive field decreased. The dielectric constant increased with an increase of PAN content until it reached 1450 at $\chi$= 0.05, and then decreased for higher PAN content. The maximum points of dielectric constant coincides with the maximum points of the piezoelectric constant $d_{33}$.33/.33/././.