• Title/Summary/Keyword: (110) silicon

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Study on the Sinterability of Silicon Substituted Hydroxyapatite (Si 치환 Hydroxyapatite의 소결 특성에 관한 연구)

  • Lee, Yoon-Joo;Kim, Young-Hee;Kim, Soo-Ryong;Jung, Sang-Jin;Riu, Do-Hyung;Song, Hee;Jun, Moo-Jin
    • Journal of the Korean Ceramic Society
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    • v.40 no.11
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    • pp.1096-1101
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    • 2003
  • Si -substituted hydroxyapatite has been prepared to obtain biomaterials having an improved biocompatibility. From FT-IR, XRD, and ICP analyses, it was confirmed that the single-phase of hydroxyapatite substituted by Si has formed. Si- substituted hydroxyapatite of up to 2 wt% for Si keeps its original structures intact for the sintering temperatures of up to 1200$^{\circ}C$. However, it is observed that the ion substitutions by the amount higher than the above ratios for the hydroxyapatite leads to destabilize original structures of the hydroxyapatite and to produce tricalcium phosphate and calcium phosphate silicate phases when the samples were sintered at 1l00$^{\circ}C$ or higher.

Streptomyces lincolnensis에 의한 Lincomycin 생산에 소포제의 영향

  • Lee, Yu-Ri;Lee, Mi-Ja;Jeong, Yeon-Ho;Jeon, Gye-Taek;Jeong, Yong-Seop
    • 한국생물공학회:학술대회논문집
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    • 2000.04a
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    • pp.279-282
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    • 2000
  • The effect of three antifoam agents: PPG(polypropylene glycol), PEG(polyethylene glycol) and CA-110(aquous emulsion with 16% silicon oil component), was examined on the lincomycin production during cultivation of S. lincolnensis. Both PEG and PPG were effective in foam depressing during the flask cultures. As a result, the lincomycin production was enhanced upto about 400 mg/L in a optimized medium (OP-1) containing PEG or PPG. In contrast, the effect of antifoam agents in flasks was not remarkable for the various initial concentrations ranging from 0.5 g/L to 5 g/L with the basic medium(UP-1). But the lincomycin production in small fermentor showed the great different results in comparison with that in flasks under the same conditions. The lincomycin productions in small fermentor were 325 mg/L and 130 mg/L respectively for the following initial PPG concentrations, 0.5 g/L and 1 g/L.

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Synthesis of Silica Aerogel and Thin Film Coating at Ambient (상입하에서의 실리카 에어로겔의 합성 및 박막코팅(I))

  • 양희선;최세영
    • Journal of the Korean Ceramic Society
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    • v.34 no.2
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    • pp.188-194
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    • 1997
  • Wet gel with surface modification by TMCS was redispersed in EtOH and redispersed silica sol for coat-ing was prepared. After spin coating of redispersed sol was conducted on silicon substrate, processes of drying(8$0^{\circ}C$) and heat treatment(>25$0^{\circ}C$) were, followed at ambient pressure. The influence of heat treat-ment of properties of film was observed, changing temperature at heat treatment. The optimum redisp-ersion condition for stable silica sol was wet gel:EtOH=1g:110$m\ell$ and the concentration and viscosity of redispersed silica sol with average particle size of 30nm were 0.11 M, 2.0-2.2 cP respectively. Crack-free thin film with the refractive index of 1.14 and thickness of 400 nm was obtained through drying at 8$0^{\circ}C$ and subsequent heat treatment at 45$0^{\circ}C$ for 2 hrs respectively after spin coating of 1500rpm, 10 times.

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As ZnO2 Thin Film Manufacturing Time Increases, the Thin Film Particle Growth Plane and a Study on the Direction of Particle Growth (ZnO2 박막 제조 시간의 증가에 따라 박막 입자 성장면과 입자 성장 방향에 관한 연구)

  • Jung, Jin
    • Journal of Integrative Natural Science
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    • v.14 no.1
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    • pp.1-5
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    • 2021
  • A zinc oxide thin film was made by varying the deposition time on the silicon(110) substrate by using a radio frequency sputtering time of 60 minutes, 120 minutes and 180 minutes. As a result of analyzing the grain growth surface of the ZnO2 thin film using an X-ray diffraction apparatus, the directions of the main growth plane (002) and (103) planes of the thin film were significantly affected by the deposition time. As a result of observing the particle growth of the ZnO2 thin film through an electron scanning microscope, it was observed that in the initial stage of deposition of the ZnO2 thin film, an incubation time was required during which growth was stagnant, and then particle growth occurred again after a certain period of time. As a result of chemical analysis of the ZnO2 thin film, the increase in the deposition time did not change with the amount of oxygen in the ZnO2 thin film, but a change in the composition of Zn was observed, indicating that the deposition time of the thin film had an effect on the Zn component in the thin film.

COMPARISON OF DIFFUSION COEFFICIENTS AND ACTIVATION ENERGIES FOR AG DIFFUSION IN SILICON CARBIDE

  • KIM, BONG GOO;YEO, SUNGHWAN;LEE, YOUNG WOO;CHO, MOON SUNG
    • Nuclear Engineering and Technology
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    • v.47 no.5
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    • pp.608-616
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    • 2015
  • The migration of silver (Ag) in silicon carbide (SiC) and $^{110m}Ag$ through SiC of irradiated tristructural isotropic (TRISO) fuel has been studied for the past three to four decades. However, there is no satisfactory explanation for the transport mechanism of Ag in SiC. In this work, the diffusion coefficients of Ag measured and/or estimated in previous studies were reviewed, and then pre-exponential factors and activation energies from the previous experiments were evaluated using Arrhenius equation. The activation energy is $247.4kJ{\cdot}mol^{-1}$ from Ag paste experiments between two SiC layers produced using fluidized-bed chemical vapor deposition (FBCVD), $125.3kJ{\cdot}mol^{-1}$ from integral release experiments (annealing of irradiated TRISO fuel), $121.8kJ{\cdot}mol^{-1}$ from fractional Ag release during irradiation of TRISO fuel in high flux reactor (HFR), and $274.8kJ{\cdot}mol^{-1}$ from Ag ion implantation experiments, respectively. The activation energy from ion implantation experiments is greater than that from Ag paste, fractional release and integral release, and the activation energy from Ag paste experiments is approximately two times greater than that from integral release experiments and fractional Ag release during the irradiation of TRISO fuel in HFR. The pre-exponential factors are also very different depending on the experimental methods and estimation. From a comparison of the pre-exponential factors and activation energies, it can be analogized that the diffusion mechanism of Ag using ion implantation experiment is different from other experiments, such as a Ag paste experiment, integral release experiments, and heating experiments after irradiating TRISO fuel in HFR. However, the results of this work do not support the long held assumption that Ag release from FBCVD-SiC, used for the coating layer in TRISO fuel, is dominated by grain boundary diffusion. In order to understand in detail the transport mechanism of Ag through the coating layer, FBCVD-SiC in TRISO fuel, a microstructural change caused by neutron irradiation during operation has to be fully considered.

Wafer Level Vacuum Packaged Out-of-Plane and In-Plane Differential Resonant Silicon Accelerometers for Navigational Applications

  • Kim, Illh-Wan;Seok, Seon-Ho;Kim, Hyeon-Cheol;Kang, Moon-Koo;Chun, Kuk-Jin
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.5 no.1
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    • pp.58-66
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    • 2005
  • Inertial-grade vertical-type and lateral-type differential resonant accelerometers (DRXLs) are designed, fabricated using one process and tested for navigational applications. The accelerometers consist of an out-of-plane (for z-axis) accelerometer and in-plane (for x, y-axes) accelerometers. The sensing principle of the accelerometer is based on gap-sensitive electrostatic stiffness changing effect. It says that the natural frequency of the accelerometer can be changed according to an electrostatic force on the proof mass of the accelerometer. The out-of-plane resonant accelerometer shows bias stability of $2.5{\mu}g$, sensitivity of 70 Hz/g and bandwidth of 100 Hz at resonant frequency of 12 kHz. The in-plane resonant accelerometer shows bias stability of $5.2{\mu}g$, sensitivity of 128 Hz/g and bandwidth of 110 Hz at resonant frequency of 23.4 kHz. The measured performances of two accelerometers are suitable for an application of inertial navigation.

A Study on Improvement Lifetime of Passive Matrix Organic Light Emitting Diode using Single Layer Thin Film (PMOLED의 수명향상을 위한 단일박막구조의 봉지기술에 관한 연구)

  • Ki, Hyun-Chul;Kim, Sun-Hoon;Kim, Doo-Gun;Kim, Hyo-Jin;Kim, Hwe-Jong;Hong, Kyung-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.282-283
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    • 2009
  • In the research, we have proposed a novel encapsulation with simple process and steady film for external environment in comparison with conventional encapsulation method. This was designed to cover the emitting organic material from air. Silicon 야oxide was used for thin film of encapsulation and the deposition thickness of the organic film was 220 nm. Operating voltage of green OLED with encapsulation was 5.5 V and luminance was 7.370 cd/$m^2$ at the applied voltage of 14.5 V. Luminance was measured in 10 hour intervals at the air-exposed condition. After 110 hours and 300 hours, luminances of green OLED were 7,368 and 7,367 cd/$m^2$, respectively. Luminance of green JLED doesn't decrease until 300 hours. As a results, proposed encapsulation can increase the life time of green OLED.

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X-ray Rocking Curve Analysis of Post-Annealed 3 MeV P+ Implanted Silicon (3MeV P+ 이온주입된 실리콘의 열처리에 따른 X-ray Rocking Curve 분석)

  • 조남훈;장기완;김창수;이정용;노재상
    • Journal of the Korean Vacuum Society
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    • v.4 no.1
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    • pp.109-117
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    • 1995
  • 고에너지 이온주입시 격자결함의 생성 및 열처리 거동이 double crystal X-ray와 단면 TEM을 사용하여 연구되었다. 3MeV P+ 이온주입한 실리콘의 DCXRD 분석 결과조사량 증가에 따라 모재 내의 변형량은 증가하였다. HRTEM 분석 결과 고에너지 이온주입시 결함은 표면 부근에 희박하고 Rp 부근에 집중되어 있었다. 또한 이온주입 상태의 결함층은 dark band의 형태로 존재하였으며 열처리시 이차결함은 이곳으로부터 생성됨이 관찰되었다. 3MeV P+,$1X1015extrm{cm}^2$의 조건으로 이온주입된 실리콘 시편의 열처리에 따른 X-ray rocking curve 분석을 통하여 열처리 온도가 $550^{\circ}C$에서 $700^{\circ}C$로 증가함에 따라 모재 내부의 최대 변형량이 7X10-4에서 2.9X10-4으로 감소함이 관찰되었다. 특히 $550^{\circ}C$ 열처리한 시편의 경우 표면으로부터$-1.5mu$m 영역에 작은 변형층이 넓게 잔존하였으며 열처리온도를 $700^{\circ}C$로 증가한 경우 제거되었다. 이온주입시 생성된 일차결함들은 $700^{\circ}C$ 열처리시 $60^{\circ}$ 전위와 <112> 막대 모양 결함, $1000^{\circ}C$ 열처리시 <110>방향의 전위루프로 열처리 조건에 따라 여러 가지 모양의 이차결함으로 변화하였다. 고에너지 이온주입에 의해 발생한 이차결함은 고온에서도 안정하여 고온 열처리에 의한 제거가 용이하지 않았다.

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Proximity Effect in Nb/Gd Layers

  • Jung, Dong-Ho;Char, K.
    • Progress in Superconductivity
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    • v.12 no.2
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    • pp.110-113
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    • 2011
  • We have grown a Nb/Gd bilayer on a$SiO_2$/Si substrate by using a DC magnetron sputtering system, which was fabricated in situ with silicon stencil masks. In order to investigate proximity effect of the Nb/Gd bilayer, we used a planar tunnel junction with an AlOx tunnel barrier by oxidizing the Al ground electrode at the bottom. A $Co_{60}Fe_{40}$ backing of Al was deposited so as to reduce the superconductivity of the Al, ensuring a normal counterelectrode. With a 50-nm-thick Nb layer, we have measured dI/dV (dynamic conductance) by varying the thickness of Gd, which can reveal the density of states (DOS) of the Nb/Gd bilayer as a function of the Gd thickness resulting from the proximity effect of a superconductor/ferromagnet bilayer (S/F). The SF proximity effect in Nb/Gd will be discussed in comparison to our previous results of the CoFe/Nb, Ni/Nb and CuNi/Nb proximity effect; Gd is expected to show different effects since Gd has f-electrons, while CoFe, Ni, and CuNi have only d-electrons. Our studies will focus on the triplet correlation in a superconducting pair.

Frequency Response Estimation of 1.3 ㎛ Waveguide Integrated Vertical PIN Type Ge-on-Si Photodetector Based on the Analysis of Fringing Field in Intrinsic Region

  • Seo, Dongjun;Kwon, Won-Bae;Kim, Sung Chang;Park, Chang-Soo
    • Current Optics and Photonics
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    • v.3 no.6
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    • pp.510-515
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    • 2019
  • In this paper, we introduce a 1.3-㎛ 25-GHz waveguide-integrated vertical PIN type Ge-on-Si photodetector fabricated using a multi-project wafers service based on fringing field analysis in the depletion region. In general, 1.3-㎛ photodetectors fabricated using a commercial foundry service can achieve limited bandwidths because a significant amount of photo-generated carriers are located within a few microns from the input along the device length, and they are influenced by the fringing field, leading to a longer transit time. To estimate the response time, we calculate the fringing field in that region and the transit time using the drift velocity caused by the field. Finally, we compare the estimated value with the measured one. The photodetector fabricated has a bandwidth of 20.75 GHz at -1 V with an estimation error of <3 GHz and dark current and responsivity of 110 nA and 0.704 A/W, respectively.