• Title/Summary/Keyword: (110) orientation

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Property Changes of Ni-Co Film with the Change of Co Concentration in Sulfamate-chloride Bath (Sulfamate-Chloride Bath에서 Co 농도의 변화에 따른 Ni-Co 필름의 특성 변화)

  • Yoon, Pilgeun;Park, Deok-Yong
    • Journal of the Korean institute of surface engineering
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    • v.53 no.1
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    • pp.1-8
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    • 2020
  • Sulfamate-chloride baths were fabricated to study the properties of the electrodeposited Ni and NiCo thin films. The dependences of current efficiency, deposit composition of Ni and Co, residual stress, surface morphology and microstructure of electrodeposited Ni and NiCo thin films on CoCl2 concentration in sulfamate-chloride baths were investigated. The current efficiency was measured to be more than about 90%, independent of the changes of CoCl2 concentration in the baths. Residual stress of Ni and NiCo thin films was increased from about 45 to about 250 MPa with varying CoCl2 concentration from 0 to 0.210 M CoCl2 in the baths and then reached to a plateau, about 250 MPa above 0.420 M CoCl2 concentration. Nodular surface morphologies were observed at most CoCl2 concentrations in the baths except 0.210 M. NiCo thin film electrodeposited from the bath with 0.210 M CoCl2 concentration showed an acicular surface morphology. Pure Ni thin film consists of FCC(111), FCC(200), FCC(220), and FCC(311) peaks without any preferred orientation. On the other hand NiCo thin films make up of HCP(100), FCC(111), HCP(101), FCC(200), FCC(220) or HCP(110), FCC(311) or HCP(112) and FCC(222) peaks. It was revealed from the analysis of XRD result that FCC(111) peak at the NiCo thin film electrodeposited from the bath with 0.084 M CoCl2 concentration can be regarded as the preferred orientation. However the peak of the preferred orientation was changed to FCC(220) or HCP(110) above 0.084 M CoCl2 concentration in the baths. Then the intensity of FCC(220) or HCP(110) peak was gradually decreased with increasing CoCl2 concentration further. The crystalline size of pure Ni thin film was observed to be about 53 ㎛ and those of NiCo thin films were in the range of 35~45 ㎛.

Low Pressure Chemical Vapor Deposition of Silicon Carbide (탄화규소의 저압 화학증착)

  • 송진수;김영욱;김동주;최두진;이준근
    • Journal of the Korean Ceramic Society
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    • v.31 no.3
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    • pp.257-264
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    • 1994
  • The objectives of this study were to develop the low pressure chemical vapor deposition(LPCVD) process of SiC and to fabricate pure and dense SiC layer onto graphite substrate at low temperature. The deposition experiments were performed using the MTS-H2 system (30 torr) in the deposition temperature ranging from 100$0^{\circ}C$ to 120$0^{\circ}C$. The deposition rate of SiC was increased with the temperature. The rate controlling step can be classified from calculated results of the apparent thermal activation energy as follows; surface reaction below 110$0^{\circ}C$ and gas phase diffusion through a stagnant layer over 110$0^{\circ}C$. The deposited layer was $\beta$-SiC with a preferred orientation of (111) and the strongly faceted SiC deposits were observed over 115$0^{\circ}C$.

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Composition and Microstructure of Sn-Ni alloys Electrodeposits according to the Electrodeposits conditions (전해조건에 따른 Sn-Ni 합금도금층의 조성 및 조직 특성)

  • 예길촌;문근호;채영욱
    • Journal of the Korean institute of surface engineering
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    • v.30 no.3
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    • pp.202-212
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    • 1997
  • The composition and the microstructure of the Sn-Ni alloy electrodeposited in pyrophosphate bath were investigated according to the electrolysis conditions. The cathode current efficiency increased with the addition of $NH_4CI$ and glycine, while it decreased with the increase of current density. The Sn content of the alloy deposits increased with the increase of $NH_4CI$ in the bath. The alloys with 51~71wt.% Sn had the NiSn single phase structure. The preferred orientation of the single phase alloys changed from (110) to (110)+(101) with the increase of current density and cathode overpotential. The single phase alloys with 50~60wt.%Sn had the smooth surface structure with fine crystallite, while the multiphase alloys showed the surface structure with crystal size and cracks at high curret density.

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A Study on the Mediating Effects of Organizational Learning Orientation on the Relationship between Entrepreneurship of Corporate Members and Individual and Group Creativity (기업조직 구성원의 기업가정신과 개인 및 집단 창의성 관계에서 조직학습지향성의 매개효과에 관한 연구)

  • Song, Chan-Sub;Noh, Youn-Sook;Lee, Da-Jung;Lee, Sun-Kyu
    • Journal of Digital Convergence
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    • v.18 no.3
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    • pp.99-110
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    • 2020
  • This study deals with the relationship between entrepreneurship of corporate member and creativity at the organizational level by empirically analyzing the relationship between entrepreneurship, organizational learning orientation, individual creativity, and group creativity. In particular, the relationship between entrepreneurship and creativity focuses on analyzing the mediating effects of organizational learning orientation. Based on the literature research, the research model and hypothesis were established by explaining the relationship between entrepreneurship, individual and group creativity, and organizational learning orientation. 308 copies of the questionnaire were distributed and collected for manufacturing workers in Gyeongbuk, and empirical analysis was conducted through structural equations. As a result, it was confirmed that entrepreneurship has an influence on organizational learning orientation without directly affecting individual and group creativity. In addition, the effects of entrepreneurship on organizational learning orientation and organizational learning orientation on individual and group creativity were examined. These findings can provide Directions for organizational management from the cultural perspective by identifying the effects of entrepreneurship and organizational learning orientation at the organizational level.

Sericitization of Tourmaline in a Pegmatite: a HRTEM Study (페그마타이트에서 산출하는 전기석의 운모화작용: 고분해능 투과전자현미경(HRTEM) 연구)

  • 안중호;이정후
    • Journal of the Mineralogical Society of Korea
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    • v.9 no.1
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    • pp.7-16
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    • 1996
  • Partially sericitized tourmaline from a pegmatite, Black Hills, South Dakota, U.S.A., was investigated using high-resolution transmission electron microscopy (HRTEM). Muscovite occurs as the only alteration product of tourmaline, and it is developed extensively as narrow veinlets along the {110} and {100} cleavage directions of tourmaline, indicating that a cleavage-controlled alteration mechanism was dominant. Muscovite was characterized mainly as two-layer polytypes with minor stacking disorder, but tourmaline is almost free of structural defects. HRTEM images of tourmaline-muscovite interfaces revealed that the interfaces between two minerals are composed of well-defined {110} and {100} boundaries of tourmaline. The (001) of muscovite is in general parallel to the c-axis of tourmaline, but tourmaline and replacing muscovite do not show specific crystallographic orientation relationship; muscovite consists of numerous 100-1000$\AA$ thick subparallel packets, and the angles between the (001) of muscovite and (110) of tourmaline is highly variable. Al/Si ratios of both minerals suggest that tourmaline to muscovite alteration by late magnetic fluids has been facilitated by their similar Al/Si ratio in the incipient alteration stage, in that the hydration reaction with preservation of Al and Si would require only addition of K+ and H2O. Aluminous minerals other than muscovite were not characterized as the alteration products of tourmaline, indicating that tourmaline reacted directly to muscovite; the tourmaline alteration apparently occurred by the presence of residual fluids in which K+ is available and silica was not undersaturated.

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Hole Mobility Enhancement in (100)- and (110)-surfaces of Ultrathin-Body Silicon-on-Insulator Metal-Oxide-Semiconductors (Ultrathin-Body SOI MOSFETs에서 면방향에 따른 정공의 이동도 증가)

  • Kim, Kwan-Su;Koo, Sang-Mo;Chung, Hong-Bay;Jung, Jong-Wan;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.7-8
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    • 2007
  • We investigated the characteristics of UTB-SOI pMOSFETs with SOI thickness ($T_{SOI}$) ranging from 10 nm to 1 nm and evaluated the dependence of electrical characteristics on the silicon surface orientation. As a result, it is found that the subthreshold characteristics of (100)-surface UTB-SOI pMOSFETs were superior to (110)-surface. However, the hole mobility of (110)-surface were larger than that of (100)-surface. The enhancement of effective hole mobility at the effective field of 0.1 MV/ccm was observed from 3-nm to 5-nm SOI thickness range.

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Married Women's Decision on the Job Continuity after Childbirth (사무직 기혼여성의 출산후 취업지속 결정요인)

  • 이기영
    • Journal of Families and Better Life
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    • v.15 no.2
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    • pp.99-110
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    • 1997
  • The purpose of this study is to explore systemetically what makes working women continue or interrupt their job after childbirth, An empirical survey was conducted by using questionnaire and data from 194 women who had clerical job before first childbirth. The major findings are as follows : (1) The significant differences between the two groups are caused by family orientation, motherhood, average monthly wage of her own, emotional support, child carer in the family, maternal policy. (2) The probability of continuing job is higher when the public supports are offered to working married women than in case of being supported privately.

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Composition and microstructure of Silver-Tin alloy deposits from prophosphate bath (피로인산염욕을 사용한 은-주석 합금도금층의 조성 및 현미경 조직)

  • 예길촌;김용웅;김진수
    • Journal of the Korean institute of surface engineering
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    • v.26 no.3
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    • pp.143-148
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    • 1993
  • Composition and microstructures of Silver-Tin alloy deposits from a pyrophosphate bath were studied under the D.C. electrolysis conditions. Cathode current efficiency and throwing power of alloy deposits de-creased with increasing current density. Tin content of Ag-Sn alloy deposits decreased noticeably with the cur-rent density and with decreasing pH. The preferred orientation of the deposits tended to change in sequence of (110)longrightarrow(111)longrightarrow(100) texture with increasing the cathode overpotential. The surface structure of alloy deposits showed the smooth surface structure with fine crystallites.

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Structural Characteristics of $Y_2O_3$ Films Grown on Differently Surface-treated Si(111) by Ultrahigh Vacuum Ionized Cluster Beam (UHV-ICB 방법으로 Si(111) 기판위에 성장된 $Y_2O_3$ 박막의 구조적 특성에 관한 연구)

  • Lee, Dong-Hun;Seong, Tae-Yeon;Jo, Man-Ho;Hwang, Jeong-Nam
    • Korean Journal of Materials Research
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    • v.9 no.5
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    • pp.528-532
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    • 1999
  • Y$_2$O$_3$films were grown on SiO$_2$-covered Si(111), and hydrogen-terminated Si(111), and hydrogen-terminated Si(111) substrates at 50$0^{\circ}C$ by ultrahigh vacuum ionized cluster beam deposition (UHV-ICB). The microstructures and growth behavior of these films have been investigated by transmission electron diffraction (TED) and high-resolution transmission electron microscopy(HREM). The TED results show that the $Y_2$O$_3$grown on the SiO$_2$-Si has the epitaxial relationship of (11-1)Y$_2$O$_3$∥(111)Si and [-110]Y$_2$O$_3$∥[-110]Si. The film on the H-Si substrate contains YS\ulcorner and amorphous YSi\ulcornerO\ulcorner layers at the interface, having the orientation relationship each other. For the YSi\ulcorner and the Si substrate, the relationship is (0001)YSi\ulcorner∥(111)Si and [1-210]YSi\ulcorner∥∥[-110]Si. For the $Y_2$O$_3$and the YSi\ulcorner ; the relationship is as follows: (11-1)Y$_2$O$_3$∥(0001)YSi\ulcorner and [-110]Y$_2$O$_3$∥[1-210]YSi\ulcorner(111)Y$_2$O$_3$∥(0001)YSi\ulcorner and [-110]Y$_2$O$_3$∥[1-210]YSi\ulcorner. Explanation is given to describe the formation mechanisms of the interfacial phases of SiO\ulcorner, YSi\ulcornerO\ulcorner and YSi\ulcorner. It is shown that the crystallinity of the $Y_2$O$_3$film on the SiO$_2$-Si(111) is better than that of $Y_2$O$_3$on H-Si(111).

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Effect of Colloidal Silica and Pre-Coating of Cathode on Copper Electrodeposited Film (구리 전착층에 미치는 콜로이달실리카 및 음극 Pre-Coating의 영향)

  • Lee, Sang-Baek;Yun, Jeong-Mo;Park, Hyeong-Ho;Bae, In-Seong;Kim, Byeong-Il
    • Korean Journal of Materials Research
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    • v.11 no.7
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    • pp.569-574
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    • 2001
  • The crystal structure, surface morphology and preferred orientation of the copper electrodeposit were investigated by the using sulfate bath with $SiO_2$suspensions and the cathode substrate Au sputtered. As by the addition of colloidal silica in copper electrolytic bath and Au pre-coating on substrate, the crystal particles of deposits was fined-down, made uniform and the account of particles were increased. Hardness of copper electrodeposits with colloidal silica increased about 15% in comparison with that of pure copper deposit film and (111), (200) and (311) plane of X-ray diffraction patterns were almost swept away, so preferred orientation of the copper deposits changed from (111) to (110) plane by codeposit $SiO_2$ and precoating the substrate.

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