• 한국결정성장학회지
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• 제24권5호
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• pp.202-206
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• 2014

$V_2O_5$ 박막에서의 PL 특성을 조사하기 위해 RF 스퍼터링법을 이용하여 비정질과 결정질 $V_2O_5$ 박막을 제작하였고, 10~300 K의 온도까지 PL 스펙트럼을 측정하였다. 상온에서 성장된 비정질 박막에서는 ~505 nm를 중심으로 하는 하나의 PL 피크만이 관찰되었고, 결정질 $V_2O_5$ 박막에서는 505 nm를 중심으로 하는 피크와 산소결함에 의한 것으로 알려진 ~695 nm를 중심으로 하는 피크가 관찰되었다. 비정질과 결정질 $V_2O_5$ 박막에서 관찰되는 505 nm에서의 PL 피크의 위치는 온도에 강한 의존성을 보였고, 그 값은 300 K에서 2.45 eV였고, 10 K에서 2.35 eV였다. 505 nm에서의 PL은 $V_2O_5$에서의 밴드 에너지 전이에 의한 것이었으며, 또한 온도의 감소에 따른 피크 위치 에너지의 감소는 전자-포논 상호작용의 감소에 의한 격자팽창효과의 감소 때문이었다.

• 한국결정학회지
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• 제6권1호
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• pp.27-35
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• 1995

1-tert-butoxycarbonyl-4-[N-(tert-butoxycarbonyl)-N-(ethoxycarbonylmethyl)amino]-3-phenylsulfonylpyrrolidind [C24H36O8N2S;이하 BEP]의 분자 및 결정구조를 X-선 회절법으로 연구하였다. 이 결정의 분자는 C24H36O8N2S, 삼사정계이고 공간군은 P1이다. 단위세포 길이는 a=11.363(8)Å, b=11.589(6)Å, c=11.013(10)Å,α=95.32(6)°,β=98.64(7)°,γ=79.57(5)°,V=1406.8(18)Å3, t=293K, Z=2이다. 구조해석에 사용한 X-선은 CuKα선(λ=1.5418Å)을 사용하였다. 분자구조는 직접법으로 풀었으며 최소자승법으로 정밀화하였다. 최종 신뢰도 R값은 F≥4 σ(F)인 3621개의 회절반점에 대하여 R=9.78% 이었다.

• 한국대기환경학회지
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• 제20권4호
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• pp.451-463
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• 2004

The performance of disk-type catalytic filters impregnated by TiO$_2$ or TiO$_2$-3Al$_2$O$_3$ㆍ 2SiO$_2$ supports and V$_2$O$_{5}$ catalyst was evaluated for selective catalytic reduction (SCR) of NO with ammonia as a reductant. XRD, FT -IR, BET and SEM were used to characterize the catalytic filters prepared in this work. Optimal V$_2$O$_{5}$ loading and reaction temperature for V$_2$O$_{5}$/TiO$_2$ catalytic filters were 3-6 wt.% and 350-40$0^{\circ}C$ at GHSV 14,300 $hr^{-1}$ in the presence of oxygen, respectively. With increasing the V$_2$O$_{5}$ loading from 0.5 to 6 wt%, NO conversion increased from 24 to 96% at 40$0^{\circ}C$ and 14.300$hr^{-1}$, and maintained at 80% over in the V$_2$O$_{5}$ loading range of 3-6 wt.% and then dropped at V$_2$O$_{5}$ loading of 7wt.% over. In comparing V$_2$O$_{5}$/ TiO$_2$ and V$_2$O$_{5}$/ TiO$_2$-3Al$_2$O$_3$ㆍ2SiO$_2$ catalytic fillers, which have same 3wt.% V$_2$O$_{5}$ loading, the V$_2$O$_{5}$/ TiO$_2$-3A1$_2$O$_3$ㆍ2SiO$_2$ catalytic filter showed higher activity than V$_2$O$_{5}$/ TiO$_2$ catalytic filter, but higher differential pressure drops owing to its low air permeability. low air permeability.

• JSTS:Journal of Semiconductor Technology and Science
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• 제7권4호
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• pp.281-286
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• 2007

In this paper, sub-circuits for 24 GHz phase locked 100ps(PLLs) using $0.5{\mu}m$ SiGe HBT are presented. They are 24 Ghz voltage controlled oscillator(VCO), 24 GHz to 12 GHz regenerative frequency divider(RFD) and 12 GHz to 1.5 GHz static frequency divider. $0.5{\mu}m$ SiGe HBT technology, which offers transistors with 90 GHz fMAX and 3 aluminum metal layers, is employed. The 24 GHz VCO employed series feedback topology for high frequency operation and showed -1.8 to -3.8 dBm output power within tuning range from 23.2 GHz to 26 GHz. The 24 GHz to 12 GHz RFD, based on Gilbert cell mixer, showed 1.2 GHz bandwidth around 24 GHz under 2 dBm input and consumes 44 mA from 3 V power supply including I/O buffers for measurement. ECL based static divider operated up to 12.5 GHz while generating divide by 8 output frequency. The static divider drains 22 mA from 3 V power supply.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.415-418
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• 2001

The I-V characteristics and its stability of ZPCCL-based ceramic varistors doped with La$_2$O$_3$in the range of 0.0~4.0 mol% were investigated. The density of ceramics was increased in the range of 4.7~5.8 g/cm$^3$ with increasing La$_2$O$_3$content. As La$_2$O$_3$content is increased, the varistor voltage was decreased in the range of 503.49-9.42 V/mm up to 2.0 mol%, whereas increasing La$_2$O$_3$content further caused it to increase. The ZPCCL-based varistors were characterized by nonlinearity, in which the nonlinear exponent is in the range of 3.05~82.43 and leakage current is in the range of 0.24-100.22 $\mu$A. Among ZPCCL-based varistors, 0.5 mol% added-varistors exhibited an excellent nonlinearity, in which the nonlinear exponent is 82.43 and the leakage current is 0.24 $\mu$A. Furthermore, they exhibited a high stability, in which the variation rate of the varistor voltage and the nonlinear exponent was -1.11% and -6.72%, respectively, under DC stress, such as (0.80 V$_{1mA}$9$0^{\circ}C$/12h)+(0.85 V$_{1mA}$115$^{\circ}C$//12h) +(0.90 V$_{1mA}$12$0^{\circ}C$//12h)+(0.95 V$_{1mA}$1$25^{\circ}C$//12h)+(0.95 V$_{1mA}$15$0^{\circ}C$//12h). Consequently, it was estimated that ZPCCL-based ceramics will be applied to development of Pr$_{6}$O$_{11}$ based ZnO varistors having a high performance.e.rformance.e.

• 한국재료학회지
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• 제10권12호
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• pp.807-811
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• 2000

MFISFET (Metal-ferroelectric-nsulator-semiconductor-field effect transistor)에의 적용을 위해 CeO$_2$와 SrBi$_2$Ta$_2$O$_{9}$ 박막을 각각 r.f. sputtering 및 pulsed laser ablation법으로 제조하였다. CeO$_2$ 박막은 증착시 스퍼터링개스비 (Ar:O$_2$)에 따른 특성을 고찰하였다. Si(100) 기판 위에 $700^{\circ}C$에서 증착된 CeO$_2$ 박막들은 (200)방향으로 우선방향성을 가지고 성장하였고 $O_2$ 개스량이 증가함에 따라 박막의 우선방향성, 결정립도 및 표면거칠기는 감소하였다. C-V특성에서는 Ar:O$_2$가 1 : 1인 조건에서 제조된 박막이 가장 양호한 특성을 보였다. 제조된 박막들의 누설전류값은 100kV/cm의 전계에서 $10^{-7}$ ~$10^{-8}$ A의 차수를 보였다. CeO$_2$/Si 기판위에 성장된 SBT는 다결정질상의 치밀한 구조를 가지고 성장을 하였다 80$0^{\circ}C$에서 열처리된 SBT박막으로 구성된 MFIS구조의 C-V 특성에서 memory window 폭은 0.9V를 보였으며 5V에서 4$\times$$10^{-7}$ A/$\textrm{cm}^2$의 누설전류밀도를 보였다.

• 전기학회논문지
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• 제63권9호
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• pp.1233-1238
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• 2014

In this thesis, it is investigated the characteristics of Dye Sensitized Solar Cell (DSSC) according to variation of $TiO_2$ thickness (6, 12, 18, and $24{\mu}m$) and three distinct $TiO_2$ sintering temperatures (350, 450 and $550^{\circ}C$) by XRD, SEM, I-V and UV-Vis spectrophotometer. According to sintering temperature, $TiO_2$ was transformed into the anatase structure at $350^{\circ}C$, rutile structure at $550^{\circ}C$ and further into the two structure at $450^{\circ}C$. With increasing thickness up to $18{\mu}m$ and sintering temperature up to $450^{\circ}C$, respectively, the irradiance rate increased in the range of 9~26 percent and 2.80~5.10 percent. Whereas a further increase to $24{\mu}m$ and $550^{\circ}C$, the irradiance rate decrease in the range of 4~11 percent and 30~47 percent. The conversion efficiency increased in the range of 2.80~5.01 and 3.03~5.01 with increasing thickness up to $18{\mu}m$ and sintering temperature up to $450^{\circ}C$. By contrast, increase to $24{\mu}m$ and $550^{\circ}C$, the conversion efficiency decreased in the range of 3.31~5.01 and 2.80~3.89, respectively. The DSSC that thickness of $TiO_2$ were $18{\mu}m$ and sintered at $450^{\circ}C$ exhibited the most excellent characteristics, in which open-circuit voltage, short-circuit current, Fill Factor and conversion efficiency are 0.69 V, $11.4mA/cm^2$, 0.64 and 5.01%, respectively.

• 한국전기전자재료학회논문지
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• 제24권12호
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• pp.969-976
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• 2011

In this study we aims to evaluate the effects of 1/3 mol% $Co_3O_4$ addition on the reaction, microstructure development, resultant electrical properties, and especially the bulk trap and grain boundary properties of $ZnO-Bi_2O_3-Sb_2O_3$ (Sb/Bi=2.0, 1.0, and 0.5) system (ZBS). The samples were prepared by conventional ceramic process, and characterized by XRD, density, SEM, I-V, impedance and modulus spectroscopy (IS & MS) measurement. In addition of $Co_3O_4$ in $ZnO-Bi_2O_3-Sb_2O_3$ (ZBSCo), the phase development, density, and microstructure were controlled by Sb/Bi ratio. Pyrochlore on cooling was reproduced in all systems. The more homogeneous microstructure was obtained in ZBSCo (Sb/Bi=1.0) system. In ZBSCo, the varistor characteristics were improved drastically (non-linear coefficient ${\alpha}$=23~50) compared to ZBS. Doping of $Co_3O_4$ to ZBS seemed to form $V^{\cdot}_o$(0.33 eV) as dominant defect. From IS & MS, especially the grain boundary of Sb/Bi=0.5 system is composed of electrically single barrier (0.93 eV) and somewhat sensitive to ambient oxygen with temperature.

• Bulletin of the Korean Chemical Society
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• 제8권1호
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• pp.1-3
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• 1987

The crystal structure of $K_5Na_2[SbW_6O_{24}]{\cdot}12H_2O$ has been determined. Final R = 0.081 for 890 observed independent reflections collected by diffractometry. Crystal data as follows; trigonal, space group R3m, a = 9.794(1) ${\AA},\;{\alpha}$ = 84.72$(1)^{\circ}$, Z = 1. The heteropolyanion has a structure with point symmetry $D_{3d}$ (3m), of the ideal Anderson-type heteropolyanion. The Sb-W and W-W distances are 3.259(2) and 3.259(3) ${\AA}$. Three types of W-O ($W-O_t,\;W-O_b\;and\;W-O_c$) distances are 1.73(2), 1.95(4) and 2.20(3) ${\AA}$. The Sb-O distance is 1.97(3) ${\AA}$.

• 한국결정성장학회지
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• 제24권3호
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• pp.106-110
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• 2014

Atomic layer deposition(ALD)을 이용하여 $Al_2O_3$ 박막을 형성하고 이에 대한 패시베이션 특성에 대한 연구를 수행하였다. ALD로 증착된 $Al_2O_3$ 박막은 $400^{\circ}C$ 5분간 후속 열처리 공정 후에도 $Al_2O_3$ - 실리콘 계면 반응 없이 비정질 상태를 유지할 만큼 구조적으로 안정한 특성을 나타내었다. 후속 열처리 후 $Al_2O_3$ 박막의 패시베이션 특성이 향상되었으며, 이는 field effective 패시베이션과 화학적 패시베이션 효과가 동시에 상승에 기인하는 것으로 판단된다. $Al_2O_3$ 박막의 음고정 전하를 정량적으로 평가하기 위해서 후속 열처리 공정을 거친 $Al_2O_3$ 박막을 이용하여 metal-oxide-semiconductor(MOS) 소자를 제작하고 capacitance-voltage(C-V) 분석을 수행하였다. C-V 결과로부터 추출된 flatband voltage($V_{FB}$)와 equivalent oxide thickness(EOT)의 관계식을 통하여 $Al_2O_3$ 박막의 고정음전하는 $2.5{\times}10^{12}cm^{-2}$로 계산되었으며, 이는 본 연구에서 제시된 $Al_2O_3$ 박막 공정이 N-type 실리콘 태양전지의 패시베이션 공정에 응용 가능하다는 것을 의미한다.