• Title/Summary/Keyword: $V_2I$

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R&D activities of a-Si:H thin film solar cells by LG Electronics

  • Lee, Don-Hui
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2007.04a
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    • pp.19-19
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    • 2007
  • Recently, we have developed p-i-n hydrogenated amorphous silicon (a-Si:H) single junction (SJ) thin film solar cells with RF (13,56MHz) plasma enhanced chemical vapor deposition (PECVD) systems, and also successfully fabricated the mini-modules (>300$cm^2$), using laser scribing technique to form an integrated series connection, The efficiency of a mini-module was 7.4% (Area=305$cm^2$, $I_{SC}$=0.25A, $V_{OC}$=14.74V, FF=62%).

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I-V Characteristics of Praseodymium-Based ZnO Varistors Doped with Neodymium (네오디뮴이 첨가된 프라세오디뮴계 ZnO 바리스터의 I-V 특성)

  • 박춘현;윤한수;남춘우
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.312-316
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    • 1999
  • I-V characteristics of Praseodymium-based ZnO varistor doped with $Nd_2O_3$ in the range 0.0-2.0mol% sintered at 130$0^{\circ}C$ and 135$0^{\circ}C$ were investigated. In the all sides, ZnO varistors sintered at $1300^{\circ}C$ exhibited much better varistor characteristics than that at 135$0^{\circ}C$. All ZnO varistors doped with $Nd_2O_3$ sintered at $1300^{\circ}C$ exhibited good varistor characteristics but particularly ZnO varistor doped with l.Omol% $Nd_2O_3$ exhibited the best characteristics, which the nonlinear is 65.2 and the leakage current is 4.5pA. It is estimated that ZnO varistor doped with l.Omol% $Nd_2O_3$ will begin to be sufficiently used as basic composition to fabricate a good varistor.

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ADMISSIBILITY AND CONNECTEDNESS IM KLEINEN IN HYPERSPACES

  • Baik, Bong Shin;Rhee, Choon Jai
    • Honam Mathematical Journal
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    • v.36 no.4
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    • pp.913-919
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    • 2014
  • We investigate the relationships between the space X and the hyperspaces concerning admissibility and connectedness im kleinen. The following results are obtained: Let X be a Hausdorff continuum, and let A, $B{\in}C(X)$ with $A{\subset}B$. (1) If X is c.i.k. at A, then X is c.i.k. at B if and only if B is admissible. (2) If A is admissible and C(X) is c.i.k. at A, then for each open set U containing A there is a continuum K and a neighborhood V of A such that $V{\subset}IntK{\subset}K{\subset}U$. (3) If for each open subset U of X containing A, there is a continuum B in C(X) such that $A{\subset}B{\subset}U$ and X is c.i.k. at B, then X is c.i.k. at A. (4) If X is not c.i.k. at a point x of X, then there is an open set U containing x and there is a sequence $\{S_i\}^{\infty}_{i=1}$ of components of $\bar{U}$ such that $S_i{\longrightarrow}S$ where S is a nondegenerate continuum containing the point x and $S_i{\cap}S={\emptyset}$ for each i = 1, 2, ${\cdots}$.

Fabrication of CdS Solar Cells Prepared by Chemical Pyrolysis Deposition (화학적 열분해방법에 의한 CdS 태양전지의 제작)

  • 고정곤;김홍복;허윤성
    • Journal of the Korea Safety Management & Science
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    • v.4 no.2
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    • pp.199-207
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    • 2002
  • The polycrystalline CdS of large scale were grown by chemical pyrolysis deposition for $Cu_2$S/CdS heterojunction solar cells. For high quality CdS polycrystalline thin films, the chemical solution was deposited on indium tin oxide(ITO) glasses at the temperature of 50$0^{\circ}C$ for 15 second and annealed at 35$0^{\circ}C$ for 20 minute or 50$0^{\circ}C$ for 30 second. To fabricate high efficiency solar cells, optical and electrical properties, morphology by SEM and x-ray diffraction on polycrystalline CdS thin films were investigated. From the I-V characteristics of $Cu_2$S/CdS heterojunction, the open circuit voltage, $V_{oc}$ was 0.7 V and the short circuit current, $I_{sc}$ was 4.2 mA. We found that the fill factor(FF) was 0.5 and the efficiency was 2.5%.

Phytochemical Constituents of Artemisia stolonofera

  • Kwon, Hak-Cheol;Choi, Sang-Un;Lee, Kang-Ro
    • Archives of Pharmacal Research
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    • v.24 no.4
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    • pp.312-315
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    • 2001
  • Repeated column chromatographic separation of the $CH_{2}Cl_{2}$ extract of Artemisia stolonofera (Asteraceae) led to the isolation of a triterpene (I), a sesquiterpene (II), two aromatic compounds (III and IV) and a benzoquinone (V). Their structures were determined by spectroscopic means to be simiarenol (I), (1S,7S)-1 $\beta$-hydroxygermacra-4(15),5, 10(14)-triene (II), 3'-methoxy-4'-hydroxy-trans-cinnamaldehyde (III), vanillin(IV) and 2,6-dimethoxy-1,4-benzoquinone (V), respectively. Among these products, compound V showed significant cytotoxicity against five human tumor cell lines in vitro, A549 (non small cell lung adenocarcinoma), SK-OV-3 (ovarian), SK-MEL-2 (skin melanoma), XF498 (CNS) and HCT15 (colon) with ED_{50}$ values ranging from 1.33~4.22${\mu}g/ml$.

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The characteristics of electrochemical etch-stop in THAH/IPA/pyrazine solution (TMAH/IPA/pyrazine 용액에서의 전기화학적 식각정지특성)

  • Chung, G.S.;Park, C.S.
    • Journal of Sensor Science and Technology
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    • v.7 no.6
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    • pp.426-431
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    • 1998
  • This paper describes electrochemical etch-stop characteristics in THAH/IPA/pyrazine solution. I-V curves of n- and p-type Si in THAH/IPA/pyrazine solution were obtained. OCP(Open Circuit Potential) and PP (Passivation Potential) of p-type Si were -1.2 V and 0.1 V, and of n-type Si were -1.3 V and -0.2 V, respectively. Both n- and p-type Si, etching rates were abruptly decreased at potentials anodic to the PP. The etch-stop characteristics in THAH/IPA/pyrazine solution were observed. Since accurate etching stop occurs at pn junction, Si diaphragms having thickness of epi-layer were fabricated. Etching rate is highest at optimum etching condition, TMAH 25wt.%/IPA 17vol.%/pyrazine 0.1g/100ml. thus the elapsed time of etch-stop was reduced.

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삼중접합 실리콘 박막 태양전지 고효율화를 위한 a-$SiO_x$ 상부전지 특성 연구

  • Lee, JiEun;Jo, Jun Sik;Park, Sang Hyun;Yoon, Kyung Hoon;Song, Jinsoo;Kim, Dong Hwan;Lee, Jeong Chul
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.63.2-63.2
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    • 2010
  • 삼중접합 태양전지에 상부전지로 이용되는 a-SiO:H 태양전지는 PECVD(Plasma Enhanced Chemical Vapour Deposition)을 이용하여 증착하였다. i a-SiO:H는 $CO_2/SiH_4$ 비율을 변화하여 밴드갭을 조절하였다. $CO_2/SiH_4$가 0에서 0.43으로 증가 할수록 밴드갭이 1.74 eV에서 1.94 eV로 증가하는 경향을 보였다. 이는 FTIR에서 나타난 결과인 Si-O-Si 결합의 증가 때문인 것으로 판단한다. 그에 반해서 광 전도도는 감소하는 경향을 보였다.그러나 암전도도와 광전도도의 비율인 광민감도는 $10^5$에서 $10^4$의 값으로 비정질 태양전지에 적용가능한 값을 보였다. 이러한 박막 특성을 가진 i a-SiO:H를 이용하여 비정질 실리콘 태양전지를 제작한 결과 $CO_2/SiH_4$의 비율이 증가함에 따라 태양전지의 $V_{oc}$가 0.8 V에서 0.5 V로 현저하게 감소하였고, $J_{sc}$와 FF 역시 11 $mA/cm^2$에서 4 $mA/cm^2$, 69%에서 50%로 감소하였다. 단위박막 결함을 측정하는 CPM(Constant Photocurrent Method)을 이용하여 i a-SiO:H 내부에 $10^{16}cm^{-3}$ 정도의 내부 결함을 관찰하였고 이는 태양전지의 특성 감소와 관련이 있는 것으로 판단한다.

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Electrical Characteristics of Solution-processed Cu(In,Ga)S2 Thin Film Solar Cells (용액 공정으로 만든 Cu(In,Ga)S2 박막태양전지의 전기적 특성)

  • Kim, Ji Eun;Min, Byoung Koun;Kim, Dong-Wook
    • Current Photovoltaic Research
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    • v.2 no.2
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    • pp.69-72
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    • 2014
  • We investigated current-voltage (I-V) and capacitance (C)-V characteristics of solution-processed thin film solar cells, consisting of $Cu(In,Ga)S_2$ and $CuInS_2$ stacked absorber layers. The ideality factors, extracted from the temperature-dependent I-V curves, showed that the tunneling-mediated interface recombination was dominant in the cells. Rapid increase of both series- and shunt-resistance at low temperatures would limit the performance of the cells, requiring further optimization. The C-V data revealed that the carrier concentration of the $CuInS_2$ layer was about 10 times larger than that of the $Cu(In,Ga)S_2$ layer. All these results could help us to find strategies to improve the efficiency of the solution-processed thin film solar cells.

Design of a 2.5GHz Quadrature LC VCO with an I/Q Mismatch Compensator (I/Q 오차 보정 회로를 갖는 2.5GHz Quadrature LC VCO 설계)

  • Byun, Sang-Jin;Shim, Jae-Hoon
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.48 no.2
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    • pp.35-43
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    • 2011
  • In this paper, an analysis on I/Q mismatch characteristics of a quadrature LC VCO(Voltage controlled oscillator) is presented. Based on this analysis, a new I/Q mismatch compensator is proposed. The proposed I/Q mismatch compensator utilizes an amplitude mismatch detector rather than the conventional phase mismatch detector requiring much more wide frequency bandwidth. To verify the proposed circuit, a 2.5GHz quadrature LC VCO was designed in a $0.18{\mu}m$ CMOS process and tested. Test results show that an amplitude mismatch detector achieves similar I/Q mismatch compensation performance as that of the conventional phase mismatch detector. The I/Q mismatch compensator consumes 0.4mA from 1.8V supply voltage and occupies $0.04mm^2$.

Pillar Type Silicon-Oxide-Nitride-Oxide-Silicon Flash Memory Cells with Modulated Tunneling Oxide

  • Lee, Sang-Youl;Yang, Seung-Dong;Yun, Ho-Jin;Jeong, Kwang-Seok;Kim, Yu-Mi;Kim, Seong-Hyeon;Lee, Hi-Deok;Lee, Ga-Won;Oh, Jae-Sub
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.5
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    • pp.250-253
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    • 2013
  • In this paper, we fabricated 3D pillar type silicon-oxide-nitride-oxide-silicon (SONOS) devices for high density flash applications. To solve the limitation between erase speed and data retention of the conventional SONOS devices, bandgap-engineered (BE) tunneling oxide of oxide-nitride-oxide configuration is integrated with the 3D structure. In addition, the tunneling oxide is modulated by another method of $N_2$ ion implantation ($N_2$ I/I). The measured data shows that the BE-SONOS device has better electrical characteristics, such as a lower threshold voltage ($V_{\tau}$) of 0.13 V, and a higher $g_{m.max}$ of 18.6 ${\mu}A/V$ and mobility of 27.02 $cm^2/Vs$ than the conventional and $N_2$ I/I SONOS devices. Memory characteristics show that the modulated tunneling oxide devices have fast erase speed. Among the devices, the BE-SONOS device has faster program/erase (P/E) speed, and more stable endurance characteristics, than conventional and $N_2$ I/I devices. From the flicker noise analysis, however, the BE-SONOS device seems to have more interface traps between the tunneling oxide and silicon substrate, which should be considered in designing the process conditions. Finally, 3D structures, such as the pillar type BE-SONOS device, are more suitable for next generation memory devices than other modulated tunneling oxide devices.