• 한국재료학회지
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• 제15권8호
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• pp.508-513
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• 2005

[ $TiO_2-Fe_2O_3$ ] nanocomposite powders for magnetic photocatalyst were synthesized by sol-gel process, in which $TiO_2$ photocatalytic layer was formed on the surface of $\gamma-Fe_2O_3$ magnetic core. Transmission electron microscopy (TEM) observation and X-ray diffractometry (XRD) analysis revealed that$\gamma-Fe_2O_3$ nanoparticles, $10\~20nm$ in diameter, were coated by $TiO_2$ shell of 5nm in thickness and $TiO_2$ was anatase phase. Also hydroxyl group (-OH) used to decompose organic compounds was detected by Fourier transformation infrared spectrometry(FT-IR) analysis. UV-Visible spectrophotometry results showed that light absorption occurred in the wavelength range of $400\~700 nm$, and the band gap energy $(E_g)$ of powder was 1.8 eV. Finally it was found that the coercivity $(H({ci})$ and saturation magnetization $(M_s)$ of the powder were 79 Oe and 14.8 emu/g, respectively as experimental vibrating sample magnetometer (VSM) measurements.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 C
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• pp.1162-1164
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• 1995

In this paper, $TiO_2$-xmol%$V_2O_5$, x=0.0, 1.0, 2.0, 3.0 specimens are fabricated by Sol-Gel method. For the improvement of humidity sensitive characteristics for specimens, their microstructures are analysed and the optimum processing condition is established. Grain size increases with substitution rate of $V^{5+}$, on $Ti^{4+}$ site. Their humidity sensitive characteristics is good at 1mol% of $V_2O_5$ rate and heat-treated at $700^{\circ}C$. The capacitance of specimens decreases with frequency.

• 마이크로전자및패키징학회지
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• 제12권1호
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• pp.21-26
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• 2005

The field effect transistors (FETs) were fabricated ell $Y_2O_3/Si(100)$ substrates by the conventional memory processes and sol-gel process using $(Bi,La)Ti_3O_{12}(BLT)$ ferroelectric gate materials. The remnant polarization ($2Pr = Pr^+-Pr^-$) int Pt/BLT/Pt/Si capacitors increased from $22 {\mu}C/cm^2$ to $30{\mu}C/ cm^2$ at 5V as the annealing temperature increased from $700^{\circ}C$ to $750^{\circ}C$. There was no drastic degradation in the polarization values after applying the retention read pulse for $10^{5.5}$ seconds. The capacitance-voltage data of $Pt/BLT/Y_2O_3/Si$ capacitors at 5V input voltage showed that the memory window voltage decreased from 1.4V to 0.6V as the annealing temperature increased from $700^{\circ}C$ to $750^{\circ}C$. The leakage current of the $Pt/BLT/Y_2O_3/Si$ capacitors annealed at $750^{\circ}C$ was about $510^{-8}A/cm^2$ at 5V. From the drain currents versus gate voltages ($V_G$) for $Pt/BLT/Y_2O_3/Si(100)$ FET devices, the memory window voltages increased from 0.3V to 0.8V with increasing tile $V_G$ from 3V to 5V.

• Transactions on Electrical and Electronic Materials
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• 제6권2호
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• pp.51-56
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• 2005

Ferroelectric Bi$_{3.35}$Sm$_{0.65}$Ti$_{3}$O$_{12}$(BSmT) thin films were synthesized using a sol-gel process. Bi(TMHD)$_{3}$, Sm$_{5}$(O$^{i}$Pr)13, Ti(O$^{i}$Pr)4 were used as the precursors, which were dissolved in 2­methoxyethanol. The BSmT thin films were deposited on Pt/TiO$_{x}$/SiO$_{2}$/Si substrates by spin­coating. The electrical properties of the thin films were enhanced using rapid thermal annealing process (RTA) at 600 $^{circ}$C for 1 min in O$_{2}$. Thereafter, the thin films were annealed from 600 to 720 $^{circ}$C in oxygen ambient for 1 hr, which was followed by post-annealed for 1 hr after depositing a Pt electrode to enhance the electrical properties. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to analyze the crystallinity and surface morphology of layered perovskite phase, respectively. The remanent polarization value of the BSmT thin films annealed at 720 $^{circ}$C after the RTA treatment was 35.31 $\mu$C/cmz at an applied voltage of 5 V.

• Bulletin of the Korean Chemical Society
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• 제32권8호
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• pp.2671-2676
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• 2011

Nanocrystalline $TiO_2$ spherical particle (NP) with a dimension of 5 ${\times}$ 5.5 nm and several nanorods (NR) with different aspect ratios (diameter ${\times}$ length: 5 ${\times}$ 8.5, 4 ${\times}$ 15, 4 ${\times}$ 18 and 3.5 ${\times}$ 22 nm) were selectively synthesized by a solvothermal process combined with non-hydrolytic sol-gel reaction. With varying the molar ratio of TTIP to oleic acid from 1:1 to 1:16, the NRs in the pure anatase phase were elongated to the c-axis direction. The prepared NP and NRs were applied for the formation of nanoporous $TiO_2$ layers in dye-sensitized solar cell (DSSC). Among them, NR2 ($TiO_2$ nanorod with 4 ${\times}$ 15 nm) exhibited the highest cell performance: Its photovoltaic conversion efficiency (${\eta}$) of 6.07%, with $J_{sc}$ of 13.473 mA/$cm^2$, $V_{oc}$ of 0.640 V, and FF of 70.32%, was 1.44 times that of NP with a size of 5 ${\times}$ 5.5 nm. It was observed from the transient photoelectron spectroscopy and the incident photon to current conversion efficiency (IPCE) spectra that the $TiO_2$ films derived from NR2 demonstrate the longest electron diffusion length ($L_e$) and the highest external quantum efficiency (EQE).

• 한국표면공학회지
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• 제29권6호
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• pp.788-796
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• 1996

$TiO_2$ films prepared by RF magnetron sputtering, electron beam evaporation, ion assisted deposition (IAD) and sol-gel method are prepared on c-Si substrate and vitreous silica substrate respectively. From the transmission spectra of $TiO_2$ films on vitreous silica substrate in the spectral region from 190 nm to 900 nm, k($\lambda$) of $TiO_2$ is obtained. Using k($\lambda$) in the interband transition region the coefficients of the quantum mechanical dispersion relation of an amorphous $TiO_2$ and hence n($\lambda$) including the optically opaque region of above fundamental transition energy are obtained. The spectroscopic ellipsometry spectra of $TiO_2$ films in the spectral region of 1.5-5.0eV are model analyzed to get the film packing density variation versus i) substrate material, ii) film thickness and iii) film growth technique. The complex refractive index change of these $TiO_2$ films versus water condensation is also studied. Film micro-structures by SE modelling results are compared with those by atomic force microscopy images and X-ray diffraction data.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 추계학술대회 발표 논문집
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• pp.170-173
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• 2006

Ferroelectric $Bi_{3.35}Sm_{0.65}Ti_3O_{12}(BST)$ thin films were deposited on $Pt(111)/Ti/SiO_2/Si(100)$ substrates by a sol-gel spin-coating process. In this experiments, $Bi(TMHD)_3$, $Sm_5(O^iPr)_{13}$, $Ti(O^iPr)_4$ were used as precursors, which were dissolved in 2-methoxyethanol. Thereafter, the thin films with the thickness, of 240nm were annealed from 600 to $720^{\circ}C$ in oxygen atmosphere for 1 hr, and post-annealed in oxygen atmosphere for 1 hr after deposition of Pt electrode to enhance the electrical properties. The remanent polarization and coercive voltage of the BST thin films annealed at $720^{\circ}C$ were $19.48\;{\mu}C/cm^2$ and 3.40 V, respectively, and a fatigue-free characteristics. As a result, Sm-substituted bismuth titanate films with good ferroelectric properties and excellent fatigue resistance are useful candidates for ferroelectric memory applications.

• Korean Chemical Engineering Research
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• 제40권6호
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• pp.725-728
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• 2002

NOx와 먼지 동시 제거용 기능성 여과포 개발의 일환으로 $V_2O_5/TiO_2$ 계열의 상용촉매를 사용하여 P-84, Nomex, PTFE 여과포에 코팅하였다. 사용된 코팅 방법은 Sol-gel법, Spray 법 그리고 Dip 코팅 방법이었으며 코팅방법이 여과포의 NOx 제거 반응에 미치는 영향을 조사하였다. NOx 제거반응실험은 여과포의 작동온도에 맞는 $100-250^{\circ}C$의 반응온도범위에서, 공간속도 $5,000hr^{-1}$, 산소농도 6%, $NH_3/NO$ 몰비는 1.0의 조건하에서 수행되었다. 본 연구에서 시도된 세 가지 코팅 방법 중 촉매량의 조절 및 균일한 코팅이 용이한 Sol-gel법에 의해 제조된 기능성여과포가 가장 좋은 NOx 전환율을 나타냈다.

• 대한전자공학회논문지SD
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• 제42권1호
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• pp.1-8
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• 2005

Sol-gel 법을 이용하여 Pt/TiO/sub x/SiO₂/Si 기판 위에 3.14×10/sup -4/㎠ 의 상부전극 면적을 갖는 PLT(5) 박막을 제작하여 스위칭 및 retention 특성에 대해 연구하였다. 4V 에서 3.56×10/sup -7/A/㎠의 누설전류밀도 값을 갖는 우수한 PLT(5) 박막에 펄스전압을 2V 에서 5V 까지 인가하였다. 펄스전압 증가에 따라 스위칭 시간은 0.52㎲ 에서부터 0.14㎲ 까지 감소하는 경향을 나타냈으며, 부하저항을 50Ω 에서 3.3Ω 으로 증가시킴에 따라 스위칭 시간이 0.14㎲에서 13.7㎲ 로 증가하는 것이 관찰되었다. 인가된 펄스 전압에 대한 스위칭 시간의 관계로부터 구한 활성화 에너지(Ea) 는 135kV/cm 이었다. PLT(5) 박막의 이력곡선과 분극 스위칭 실험으로부터 구한 switched charge density 사이의 오차는 약 10% 정도로 비교적 잘 일치하였으며, retention 특성은 105s 이후에도 약 8% 정도의 우수한 분극 감소 특성을 나타내었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.172-173
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• 2006

Metal-ferroelectric-insulator-semiconductor (MFIS) structures with $Bi_{3.35}La_{0.75}Ti_3O_{12}$ (BLT) ferroelectric film and Zirconium oxide ($ZrO_2$) layer were fabricated on p-type Si(100). $ZrO_2$ and BLT films were prepared by sol-gel technique. Surface morphologies of $ZrO_2$ and BLT film were measured by atomic force microscope (AFM). The electrical characteristics of Au/$ZrO_2$/Si and Au/BLT/$ZrO_2$/Si film were investigated by C-V and I-V measurements. No hysteretic characteristics was observed in the C-V curve of the Au/$ZrO_2$/Si structure. The memory window width m C-V curve of the Au/BLT/$ZrO_2$/Si diode was about 1.3 V for a voltage sweep of ${\pm}5$ V. The leakage current of Au/$ZrO_2$/Si and Au/BLT/$ZrO_2$/Si structures were about $3{\times}10^{-8}$ A at 30 MV/cm and $3{\times}10^{-8}$ A at 3 MV/cm, respectively.